JP2019536250A5 - - Google Patents

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JP2019536250A5
JP2019536250A5 JP2019529641A JP2019529641A JP2019536250A5 JP 2019536250 A5 JP2019536250 A5 JP 2019536250A5 JP 2019529641 A JP2019529641 A JP 2019529641A JP 2019529641 A JP2019529641 A JP 2019529641A JP 2019536250 A5 JP2019536250 A5 JP 2019536250A5
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Japan
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charged particle
array
lens
particle beam
primary charged
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JP2019529641A
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Japanese (ja)
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JP2019536250A (ja
JP6728498B2 (ja
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JP2019529641A 2016-12-01 2017-11-27 試験片を検査する方法および荷電粒子マルチビーム装置 Active JP6728498B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/366,482 US10453645B2 (en) 2016-12-01 2016-12-01 Method for inspecting a specimen and charged particle multi-beam device
US15/366,482 2016-12-01
PCT/EP2017/080506 WO2018099854A1 (en) 2016-12-01 2017-11-27 Method for inspecting a specimen and charged particle multi-beam device

Publications (3)

Publication Number Publication Date
JP2019536250A JP2019536250A (ja) 2019-12-12
JP2019536250A5 true JP2019536250A5 (https=) 2020-01-30
JP6728498B2 JP6728498B2 (ja) 2020-07-22

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JP2019529641A Active JP6728498B2 (ja) 2016-12-01 2017-11-27 試験片を検査する方法および荷電粒子マルチビーム装置

Country Status (7)

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US (1) US10453645B2 (https=)
EP (1) EP3549153A1 (https=)
JP (1) JP6728498B2 (https=)
KR (1) KR102179897B1 (https=)
CN (1) CN110214361B (https=)
TW (1) TWI709992B (https=)
WO (1) WO2018099854A1 (https=)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112041965B (zh) * 2018-05-01 2025-01-14 Asml荷兰有限公司 多束检查装置
US10438769B1 (en) * 2018-05-02 2019-10-08 Kla-Tencor Corporation Array-based characterization tool
DE102018115012A1 (de) 2018-06-21 2019-12-24 Carl Zeiss Microscopy Gmbh Teilchenstrahlsystem
TWI744671B (zh) * 2018-08-03 2021-11-01 日商紐富來科技股份有限公司 電子光學系統及多射束圖像取得裝置
EP3624167A1 (en) * 2018-09-14 2020-03-18 FEI Company Multi-electron-beam imaging appartus with improved perormance
US10748739B2 (en) * 2018-10-12 2020-08-18 Kla-Tencor Corporation Deflection array apparatus for multi-electron beam system
US10784070B2 (en) * 2018-10-19 2020-09-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device, field curvature corrector, and methods of operating a charged particle beam device
SG11202112463SA (en) * 2019-05-31 2021-12-30 Asml Netherlands Bv Multiple charged-particle beam apparatus and methods of operating the same
DE102019004124B4 (de) * 2019-06-13 2024-03-21 Carl Zeiss Multisem Gmbh Teilchenstrahl-System zur azimutalen Ablenkung von Einzel-Teilchenstrahlen sowie seine Verwendung und Verfahren zur Azimut-Korrektur bei einem Teilchenstrahl-System
DE102019005362A1 (de) * 2019-07-31 2021-02-04 Carl Zeiss Multisem Gmbh Verfahren zum Betreiben eines Vielzahl-Teilchenstrahlsystems unter Veränderung der numerischen Apertur, zugehöriges Computerprogrammprodukt und Vielzahl-Teilchenstrahlsystem
US10923313B1 (en) * 2019-10-17 2021-02-16 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device and method of operating a charged particle beam device
JP7539464B2 (ja) * 2019-10-21 2024-08-23 アプライド マテリアルズ イスラエル リミテッド 標本を検査する方法および荷電粒子ビーム装置
NL2024065B1 (en) * 2019-10-21 2021-06-22 Univ Delft Tech Multi-beam charged particle source with alignment means
TWI821618B (zh) * 2019-12-19 2023-11-11 荷蘭商Ａｓｍｌ荷蘭公司 藉由多光束裝置執行以形成樣本之影像的方法及相關的多光束裝置
NL2024694B1 (en) * 2020-01-17 2021-09-08 Delmic Ip B V Apparatus and method for projecting an array of multiple charged particle beamlets on a sample
US11257657B2 (en) * 2020-02-18 2022-02-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device with interferometer for height measurement
WO2021165135A1 (en) * 2020-02-21 2021-08-26 Asml Netherlands B.V. Inspection apparatus
KR102817129B1 (ko) 2020-02-21 2025-06-05 에이에스엠엘 네델란즈 비.브이. 하전 입자 검사 툴, 검사 방법
EP3882951A1 (en) * 2020-03-19 2021-09-22 FEI Company Charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets
US11380511B2 (en) * 2020-03-24 2022-07-05 Fei Company Charged particle beam source
DE102020115183B4 (de) * 2020-06-08 2026-01-29 Carl Zeiss Multisem Gmbh Teilchenstrahlsystem mit Multiquellensystem sowie Mehrstrahl-Teilchenmikroskop
EP3937205A1 (en) * 2020-07-06 2022-01-12 ASML Netherlands B.V. Charged-particle multi-beam column, charged-particle multi-beam column array, inspection method
WO2022058253A2 (en) * 2020-09-17 2022-03-24 Asml Netherlands B.V. Charged particle assessment tool, inspection method
US11699564B2 (en) * 2020-10-23 2023-07-11 Nuflare Technology, Inc. Schottky thermal field emitter with integrated beam splitter
KR20230122666A (ko) 2020-12-23 2023-08-22 에이에스엠엘 네델란즈 비.브이. 하전 입자 광학 디바이스
US11705301B2 (en) * 2021-01-19 2023-07-18 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam manipulation device and method for manipulating charged particle beamlets
US11869743B2 (en) * 2021-05-11 2024-01-09 Kla Corporation High throughput multi-electron beam system
EP4095881A1 (en) * 2021-05-25 2022-11-30 ASML Netherlands B.V. Charged particle device
JP7680923B2 (ja) * 2021-09-16 2025-05-21 株式会社ニューフレアテクノロジー マルチ電子ビーム検査装置、多極子アレイの制御方法、及びマルチ電子ビーム検査方法
US11651934B2 (en) 2021-09-30 2023-05-16 Kla Corporation Systems and methods of creating multiple electron beams
JP7105022B1 (ja) 2022-03-31 2022-07-22 株式会社Photo electron Soul 電子銃、電子線適用装置およびマルチ電子ビームの形成方法
CN118302838A (zh) * 2021-11-24 2024-07-05 Asml荷兰有限公司 用于电压对比度检查的带电粒子束装置及其方法
US12165831B2 (en) * 2022-05-31 2024-12-10 Kla Corporation Method and system of image-forming multi-electron beams
US20240212968A1 (en) * 2022-12-23 2024-06-27 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Lens for a charged particle beam apparatus, charged particle beam apparatus, and method of focusing a charged particle beam
US12542253B2 (en) 2023-02-28 2026-02-03 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle optics, charged particle beam apparatus, and method for scanning a charged particle beam
CN118588522B (zh) * 2024-08-06 2024-11-08 北京惠然肯来科技中心(有限合伙) 用于带电粒子束装置的载物单元及相关产品
CN119517703B (zh) * 2024-11-15 2025-10-31 深圳后浪实验室科技有限公司 一种离子束聚焦系统

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020145113A1 (en) * 2001-04-09 2002-10-10 Applied Materials, Inc. Optical signal transmission for electron beam imaging apparatus
WO2004034044A1 (en) * 2002-10-08 2004-04-22 Applied Materials Israel, Ltd. Methods and systems for process monitoring using x-ray emission
EP1432008B1 (en) * 2002-12-17 2010-05-05 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Multi-axis compound lens, beam system making use of the compound lens, and method using the compound lens
CN101103417B (zh) * 2003-09-05 2012-06-27 卡尔蔡司Smt有限责任公司 粒子光学系统和排布结构,以及用于其的粒子光学组件
EP1753010B1 (en) * 2005-08-09 2012-12-05 Carl Zeiss SMS GmbH Particle-optical system
JP5237734B2 (ja) 2008-09-24 2013-07-17 日本電子株式会社 収差補正装置および該収差補正装置を備える荷電粒子線装置
US9530613B2 (en) * 2011-02-18 2016-12-27 Applied Materials Israel, Ltd. Focusing a charged particle system
CN104428866A (zh) * 2012-05-14 2015-03-18 迈普尔平版印刷Ip有限公司 带电粒子光刻系统和射束产生器
NL2009053C2 (en) * 2012-06-22 2013-12-24 Univ Delft Tech Apparatus and method for inspecting a surface of a sample.
EP2879155B1 (en) * 2013-12-02 2018-04-25 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Multi-beam system for high throughput EBI
NL2012780B1 (en) * 2014-05-08 2016-02-23 Univ Delft Tech Apparatus and method for inspecting a sample using a plurality of charged particle beams.
US10236156B2 (en) 2015-03-25 2019-03-19 Hermes Microvision Inc. Apparatus of plural charged-particle beams
US9607805B2 (en) 2015-05-12 2017-03-28 Hermes Microvision Inc. Apparatus of plural charged-particle beams
CN108027499B (zh) * 2015-09-23 2021-02-12 科磊股份有限公司 用于多波束扫描式电子显微系统的聚焦调整的方法及系统
US9984848B2 (en) * 2016-03-10 2018-05-29 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Multi-beam lens device, charged particle beam device, and method of operating a multi-beam lens device
US9922796B1 (en) * 2016-12-01 2018-03-20 Applied Materials Israel Ltd. Method for inspecting a specimen and charged particle multi-beam device
US10176965B1 (en) * 2017-07-05 2019-01-08 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Aberration-corrected multibeam source, charged particle beam device and method of imaging or illuminating a specimen with an array of primary charged particle beamlets

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