JP2021522659A5 - - Google Patents

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Publication number
JP2021522659A5
JP2021522659A5 JP2020560344A JP2020560344A JP2021522659A5 JP 2021522659 A5 JP2021522659 A5 JP 2021522659A5 JP 2020560344 A JP2020560344 A JP 2020560344A JP 2020560344 A JP2020560344 A JP 2020560344A JP 2021522659 A5 JP2021522659 A5 JP 2021522659A5
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JP
Japan
Prior art keywords
electron
deflector
electron beam
trim
additional
Prior art date
Application number
JP2020560344A
Other languages
English (en)
Japanese (ja)
Other versions
JP2021522659A (ja
JP7271572B2 (ja
JPWO2019213000A5 (https=
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Publication date
Priority claimed from US15/969,555 external-priority patent/US10438769B1/en
Application filed filed Critical
Publication of JP2021522659A publication Critical patent/JP2021522659A/ja
Publication of JPWO2019213000A5 publication Critical patent/JPWO2019213000A5/ja
Publication of JP2021522659A5 publication Critical patent/JP2021522659A5/ja
Priority to JP2023005964A priority Critical patent/JP2023033554A/ja
Application granted granted Critical
Publication of JP7271572B2 publication Critical patent/JP7271572B2/ja
Priority to JP2025005928A priority patent/JP7745790B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2020560344A 2018-05-02 2019-04-30 アレイ型特性解明ツール Active JP7271572B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2023005964A JP2023033554A (ja) 2018-05-02 2023-01-18 走査型電子顕微法システム
JP2025005928A JP7745790B2 (ja) 2018-05-02 2025-01-16 走査型電子顕微法システム

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/969,555 US10438769B1 (en) 2018-05-02 2018-05-02 Array-based characterization tool
US15/969,555 2018-05-02
PCT/US2019/029764 WO2019213000A1 (en) 2018-05-02 2019-04-30 Array-based characterization tool

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023005964A Division JP2023033554A (ja) 2018-05-02 2023-01-18 走査型電子顕微法システム

Publications (4)

Publication Number Publication Date
JP2021522659A JP2021522659A (ja) 2021-08-30
JPWO2019213000A5 JPWO2019213000A5 (https=) 2022-02-28
JP2021522659A5 true JP2021522659A5 (https=) 2022-02-28
JP7271572B2 JP7271572B2 (ja) 2023-05-11

Family

ID=68102068

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2020560344A Active JP7271572B2 (ja) 2018-05-02 2019-04-30 アレイ型特性解明ツール
JP2023005964A Pending JP2023033554A (ja) 2018-05-02 2023-01-18 走査型電子顕微法システム
JP2025005928A Active JP7745790B2 (ja) 2018-05-02 2025-01-16 走査型電子顕微法システム

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2023005964A Pending JP2023033554A (ja) 2018-05-02 2023-01-18 走査型電子顕微法システム
JP2025005928A Active JP7745790B2 (ja) 2018-05-02 2025-01-16 走査型電子顕微法システム

Country Status (7)

Country Link
US (1) US10438769B1 (https=)
EP (1) EP3765886A4 (https=)
JP (3) JP7271572B2 (https=)
KR (2) KR102608083B1 (https=)
CN (2) CN115047608A (https=)
TW (1) TWI780324B (https=)
WO (1) WO2019213000A1 (https=)

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US11239048B2 (en) * 2020-03-09 2022-02-01 Kla Corporation Arrayed column detector
WO2022122320A1 (en) * 2020-12-10 2022-06-16 Asml Netherlands B.V. Charged-particle beam apparatus with beam-tilt and methods thereof
JP7680923B2 (ja) * 2021-09-16 2025-05-21 株式会社ニューフレアテクノロジー マルチ電子ビーム検査装置、多極子アレイの制御方法、及びマルチ電子ビーム検査方法

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WO1999034397A1 (en) * 1997-12-23 1999-07-08 Koninklijke Philips Electronics N.V. Sem provided with an electrostatic objective and an electrical scanning device
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JP4493495B2 (ja) 2002-07-11 2010-06-30 アプライド マテリアルズ インコーポレイテッド サブミクロン断面を有する構造素子の断面特徴を決定するためのシステム及び方法
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JP4977509B2 (ja) * 2007-03-26 2012-07-18 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP5107812B2 (ja) * 2008-07-08 2012-12-26 株式会社日立ハイテクノロジーズ 検査装置
DE102008062450B4 (de) * 2008-12-13 2012-05-03 Vistec Electron Beam Gmbh Anordnung zur Beleuchtung eines Substrats mit mehreren individuell geformten Partikelstrahlen zur hochauflösenden Lithographie von Strukturmustern
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