TWI780324B - 掃描電子顯微術系統、電子光學系統及表徵系統 - Google Patents

掃描電子顯微術系統、電子光學系統及表徵系統 Download PDF

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Publication number
TWI780324B
TWI780324B TW108114249A TW108114249A TWI780324B TW I780324 B TWI780324 B TW I780324B TW 108114249 A TW108114249 A TW 108114249A TW 108114249 A TW108114249 A TW 108114249A TW I780324 B TWI780324 B TW I780324B
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Taiwan
Prior art keywords
deflector
electron
electron beam
optical
trimmed
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TW108114249A
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English (en)
Chinese (zh)
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TW202001970A (zh
Inventor
亞歷克斯 里普金
亞隆 羅森瑟
法藍克 區利塞
約翰 葛林
勞倫斯 穆雷
羅伯特 海尼斯
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美商克萊譚克公司
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Publication of TW202001970A publication Critical patent/TW202001970A/zh
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Publication of TWI780324B publication Critical patent/TWI780324B/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1477—Scanning means electrostatic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/151—Electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Electron Sources, Ion Sources (AREA)
TW108114249A 2018-05-02 2019-04-24 掃描電子顯微術系統、電子光學系統及表徵系統 TWI780324B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/969,555 2018-05-02
US15/969,555 US10438769B1 (en) 2018-05-02 2018-05-02 Array-based characterization tool

Publications (2)

Publication Number Publication Date
TW202001970A TW202001970A (zh) 2020-01-01
TWI780324B true TWI780324B (zh) 2022-10-11

Family

ID=68102068

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108114249A TWI780324B (zh) 2018-05-02 2019-04-24 掃描電子顯微術系統、電子光學系統及表徵系統

Country Status (7)

Country Link
US (1) US10438769B1 (https=)
EP (1) EP3765886A4 (https=)
JP (3) JP7271572B2 (https=)
KR (2) KR102547554B1 (https=)
CN (2) CN115047608A (https=)
TW (1) TWI780324B (https=)
WO (1) WO2019213000A1 (https=)

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US11239048B2 (en) * 2020-03-09 2022-02-01 Kla Corporation Arrayed column detector
US20240021404A1 (en) * 2020-12-10 2024-01-18 Asml Netherlands B.V. Charged-particle beam apparatus with beam-tilt and methods thereof
JP7680923B2 (ja) * 2021-09-16 2025-05-21 株式会社ニューフレアテクノロジー マルチ電子ビーム検査装置、多極子アレイの制御方法、及びマルチ電子ビーム検査方法
US20250357071A1 (en) * 2024-05-17 2025-11-20 Fei Company Scanning deflector

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US20030001095A1 (en) * 2001-07-02 2003-01-02 Schlumberger Technologies, Inc. Method and apparatus for multiple charged particle beams
US20100237240A1 (en) * 2009-03-20 2010-09-23 Physical Electronics USA, Inc. Sample holder apparatus to reduce energy of electrons in an analyzer system and method
TW201511065A (zh) * 2013-08-30 2015-03-16 Hermes Microvision Inc 具有多光軸磁透鏡之多帶電粒子束裝置
US20170084423A1 (en) * 2015-09-21 2017-03-23 Kla-Tencor Corporation Method and System for Noise Mitigation in a Multi-Beam Scanning Electron Microscopy System
TW201721224A (zh) * 2015-09-23 2017-06-16 克萊譚克公司 用於多波束掃描式電子顯微系統之聚焦調整之方法及系統
TW201833968A (zh) * 2016-12-01 2018-09-16 以色列商應用材料以色列公司 用於檢查試樣之方法以及帶電粒子多束裝置

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US20020117967A1 (en) * 2001-02-23 2002-08-29 Gerlach Robert L. Electron beam system using multiple electron beams
US20030001095A1 (en) * 2001-07-02 2003-01-02 Schlumberger Technologies, Inc. Method and apparatus for multiple charged particle beams
US20100237240A1 (en) * 2009-03-20 2010-09-23 Physical Electronics USA, Inc. Sample holder apparatus to reduce energy of electrons in an analyzer system and method
TW201511065A (zh) * 2013-08-30 2015-03-16 Hermes Microvision Inc 具有多光軸磁透鏡之多帶電粒子束裝置
US20170084423A1 (en) * 2015-09-21 2017-03-23 Kla-Tencor Corporation Method and System for Noise Mitigation in a Multi-Beam Scanning Electron Microscopy System
TW201721224A (zh) * 2015-09-23 2017-06-16 克萊譚克公司 用於多波束掃描式電子顯微系統之聚焦調整之方法及系統
TW201833968A (zh) * 2016-12-01 2018-09-16 以色列商應用材料以色列公司 用於檢查試樣之方法以及帶電粒子多束裝置

Also Published As

Publication number Publication date
CN112136070B (zh) 2022-06-10
EP3765886A1 (en) 2021-01-20
KR20200139257A (ko) 2020-12-11
KR102608083B1 (ko) 2023-11-29
JP2023033554A (ja) 2023-03-10
KR20230037694A (ko) 2023-03-16
KR102547554B1 (ko) 2023-06-23
CN112136070A (zh) 2020-12-25
EP3765886A4 (en) 2022-11-09
TW202001970A (zh) 2020-01-01
US10438769B1 (en) 2019-10-08
WO2019213000A1 (en) 2019-11-07
JP7271572B2 (ja) 2023-05-11
CN115047608A (zh) 2022-09-13
JP2025061364A (ja) 2025-04-10
JP7745790B2 (ja) 2025-09-29
JP2021522659A (ja) 2021-08-30

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