KR102608083B1 - 어레이 기반 특성화 툴 - Google Patents

어레이 기반 특성화 툴 Download PDF

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Publication number
KR102608083B1
KR102608083B1 KR1020237007799A KR20237007799A KR102608083B1 KR 102608083 B1 KR102608083 B1 KR 102608083B1 KR 1020237007799 A KR1020237007799 A KR 1020237007799A KR 20237007799 A KR20237007799 A KR 20237007799A KR 102608083 B1 KR102608083 B1 KR 102608083B1
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KR
South Korea
Prior art keywords
deflector
electro
optical
electron beam
sem
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Korean (ko)
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KR20230037694A (ko
Inventor
알렉스 립킨드
알론 로센탈
프랑크 칠레스
존 젤링
로렌스 머레이
로버트 헤이네스
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케이엘에이 코포레이션
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1477—Scanning means electrostatic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/151—Electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Computer Vision & Pattern Recognition (AREA)
KR1020237007799A 2018-05-02 2019-04-30 어레이 기반 특성화 툴 Active KR102608083B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US15/969,555 US10438769B1 (en) 2018-05-02 2018-05-02 Array-based characterization tool
US15/969,555 2018-05-02
KR1020207034236A KR102547554B1 (ko) 2018-05-02 2019-04-30 어레이 기반 특성화 툴
PCT/US2019/029764 WO2019213000A1 (en) 2018-05-02 2019-04-30 Array-based characterization tool

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020207034236A Division KR102547554B1 (ko) 2018-05-02 2019-04-30 어레이 기반 특성화 툴

Publications (2)

Publication Number Publication Date
KR20230037694A KR20230037694A (ko) 2023-03-16
KR102608083B1 true KR102608083B1 (ko) 2023-11-29

Family

ID=68102068

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020237007799A Active KR102608083B1 (ko) 2018-05-02 2019-04-30 어레이 기반 특성화 툴
KR1020207034236A Active KR102547554B1 (ko) 2018-05-02 2019-04-30 어레이 기반 특성화 툴

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020207034236A Active KR102547554B1 (ko) 2018-05-02 2019-04-30 어레이 기반 특성화 툴

Country Status (7)

Country Link
US (1) US10438769B1 (https=)
EP (1) EP3765886A4 (https=)
JP (3) JP7271572B2 (https=)
KR (2) KR102608083B1 (https=)
CN (2) CN115047608A (https=)
TW (1) TWI780324B (https=)
WO (1) WO2019213000A1 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11239048B2 (en) * 2020-03-09 2022-02-01 Kla Corporation Arrayed column detector
WO2022122320A1 (en) * 2020-12-10 2022-06-16 Asml Netherlands B.V. Charged-particle beam apparatus with beam-tilt and methods thereof
JP7680923B2 (ja) * 2021-09-16 2025-05-21 株式会社ニューフレアテクノロジー マルチ電子ビーム検査装置、多極子アレイの制御方法、及びマルチ電子ビーム検査方法

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US20020117967A1 (en) * 2001-02-23 2002-08-29 Gerlach Robert L. Electron beam system using multiple electron beams
JP2013097869A (ja) 2011-10-28 2013-05-20 Ebara Corp 試料観察装置及び試料観察方法

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JPS6293931A (ja) * 1985-10-19 1987-04-30 Nippon Telegr & Teleph Corp <Ntt> 荷電ビ−ム露光装置
EP0281743B1 (de) * 1987-02-02 1994-03-30 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Detektorobjectiv für Rastermikroskope
US4926054A (en) * 1988-03-17 1990-05-15 Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh Objective lens for focusing charged particles in an electron microscope
JP2775812B2 (ja) * 1989-02-21 1998-07-16 株式会社ニコン 荷電粒子線装置
WO1999034397A1 (en) * 1997-12-23 1999-07-08 Koninklijke Philips Electronics N.V. Sem provided with an electrostatic objective and an electrical scanning device
US6633034B1 (en) * 2000-05-04 2003-10-14 Applied Materials, Inc. Method and apparatus for imaging a specimen using low profile electron detector for charged particle beam imaging apparatus including electrostatic mirrors
DE60105199T2 (de) 2000-12-22 2005-08-11 Fei Co., Hillsboro Sem mit einem sekundärelektronendetektor mit einer zentralelektrode
US6750455B2 (en) 2001-07-02 2004-06-15 Applied Materials, Inc. Method and apparatus for multiple charged particle beams
JP4493495B2 (ja) 2002-07-11 2010-06-30 アプライド マテリアルズ インコーポレイテッド サブミクロン断面を有する構造素子の断面特徴を決定するためのシステム及び方法
AU2003276779A1 (en) * 2002-10-30 2004-05-25 Mapper Lithography Ip B.V. Electron beam exposure system
TWI323004B (en) * 2005-12-15 2010-04-01 Nuflare Technology Inc Charged particle beam writing method and apparatus
JP4977509B2 (ja) * 2007-03-26 2012-07-18 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP5107812B2 (ja) * 2008-07-08 2012-12-26 株式会社日立ハイテクノロジーズ 検査装置
DE102008062450B4 (de) * 2008-12-13 2012-05-03 Vistec Electron Beam Gmbh Anordnung zur Beleuchtung eines Substrats mit mehreren individuell geformten Partikelstrahlen zur hochauflösenden Lithographie von Strukturmustern
US8071942B2 (en) * 2009-03-20 2011-12-06 Physical Electronics USA, Inc. Sample holder apparatus to reduce energy of electrons in an analyzer system and method
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US9431209B2 (en) 2014-08-26 2016-08-30 Hermes-Microvision, Inc. Apparatus of plural charged particle beams with multi-axis magnetic lenses
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WO2016182948A1 (en) * 2015-05-08 2016-11-17 Kla-Tencor Corporation Method and system for aberration correction in electron beam system
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CN108027499B (zh) * 2015-09-23 2021-02-12 科磊股份有限公司 用于多波束扫描式电子显微系统的聚焦调整的方法及系统
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US20020117967A1 (en) * 2001-02-23 2002-08-29 Gerlach Robert L. Electron beam system using multiple electron beams
JP2013097869A (ja) 2011-10-28 2013-05-20 Ebara Corp 試料観察装置及び試料観察方法

Also Published As

Publication number Publication date
JP2021522659A (ja) 2021-08-30
JP7271572B2 (ja) 2023-05-11
KR102547554B1 (ko) 2023-06-23
US10438769B1 (en) 2019-10-08
WO2019213000A1 (en) 2019-11-07
EP3765886A1 (en) 2021-01-20
JP2023033554A (ja) 2023-03-10
KR20200139257A (ko) 2020-12-11
CN115047608A (zh) 2022-09-13
JP2025061364A (ja) 2025-04-10
CN112136070A (zh) 2020-12-25
CN112136070B (zh) 2022-06-10
EP3765886A4 (en) 2022-11-09
TW202001970A (zh) 2020-01-01
TWI780324B (zh) 2022-10-11
JP7745790B2 (ja) 2025-09-29
KR20230037694A (ko) 2023-03-16

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