JP7271572B2 - アレイ型特性解明ツール - Google Patents

アレイ型特性解明ツール Download PDF

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Publication number
JP7271572B2
JP7271572B2 JP2020560344A JP2020560344A JP7271572B2 JP 7271572 B2 JP7271572 B2 JP 7271572B2 JP 2020560344 A JP2020560344 A JP 2020560344A JP 2020560344 A JP2020560344 A JP 2020560344A JP 7271572 B2 JP7271572 B2 JP 7271572B2
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Japan
Prior art keywords
deflector
electro
electron
trim
electron beam
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JP2020560344A
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English (en)
Japanese (ja)
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JP2021522659A (ja
JPWO2019213000A5 (https=
JP2021522659A5 (https=
Inventor
アレックス リプキンド
アロン ローゼンタール
フランク チリス
ジョン ゲーリング
ローレンス ムライ
ロバート ハイネス
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KLA Corp
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KLA Corp
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Publication of JP2021522659A publication Critical patent/JP2021522659A/ja
Publication of JPWO2019213000A5 publication Critical patent/JPWO2019213000A5/ja
Publication of JP2021522659A5 publication Critical patent/JP2021522659A5/ja
Priority to JP2023005964A priority Critical patent/JP2023033554A/ja
Application granted granted Critical
Publication of JP7271572B2 publication Critical patent/JP7271572B2/ja
Priority to JP2025005928A priority patent/JP7745790B2/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1477—Scanning means electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/151—Electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Computer Vision & Pattern Recognition (AREA)
JP2020560344A 2018-05-02 2019-04-30 アレイ型特性解明ツール Active JP7271572B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2023005964A JP2023033554A (ja) 2018-05-02 2023-01-18 走査型電子顕微法システム
JP2025005928A JP7745790B2 (ja) 2018-05-02 2025-01-16 走査型電子顕微法システム

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/969,555 US10438769B1 (en) 2018-05-02 2018-05-02 Array-based characterization tool
US15/969,555 2018-05-02
PCT/US2019/029764 WO2019213000A1 (en) 2018-05-02 2019-04-30 Array-based characterization tool

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023005964A Division JP2023033554A (ja) 2018-05-02 2023-01-18 走査型電子顕微法システム

Publications (4)

Publication Number Publication Date
JP2021522659A JP2021522659A (ja) 2021-08-30
JPWO2019213000A5 JPWO2019213000A5 (https=) 2022-02-28
JP2021522659A5 JP2021522659A5 (https=) 2022-02-28
JP7271572B2 true JP7271572B2 (ja) 2023-05-11

Family

ID=68102068

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2020560344A Active JP7271572B2 (ja) 2018-05-02 2019-04-30 アレイ型特性解明ツール
JP2023005964A Pending JP2023033554A (ja) 2018-05-02 2023-01-18 走査型電子顕微法システム
JP2025005928A Active JP7745790B2 (ja) 2018-05-02 2025-01-16 走査型電子顕微法システム

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2023005964A Pending JP2023033554A (ja) 2018-05-02 2023-01-18 走査型電子顕微法システム
JP2025005928A Active JP7745790B2 (ja) 2018-05-02 2025-01-16 走査型電子顕微法システム

Country Status (7)

Country Link
US (1) US10438769B1 (https=)
EP (1) EP3765886A4 (https=)
JP (3) JP7271572B2 (https=)
KR (2) KR102608083B1 (https=)
CN (2) CN115047608A (https=)
TW (1) TWI780324B (https=)
WO (1) WO2019213000A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11239048B2 (en) * 2020-03-09 2022-02-01 Kla Corporation Arrayed column detector
WO2022122320A1 (en) * 2020-12-10 2022-06-16 Asml Netherlands B.V. Charged-particle beam apparatus with beam-tilt and methods thereof
JP7680923B2 (ja) * 2021-09-16 2025-05-21 株式会社ニューフレアテクノロジー マルチ電子ビーム検査装置、多極子アレイの制御方法、及びマルチ電子ビーム検査方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020117967A1 (en) 2001-02-23 2002-08-29 Gerlach Robert L. Electron beam system using multiple electron beams
US20020125428A1 (en) 2000-12-22 2002-09-12 Krans Jan Martijn SEM provided with a secondary electron detector having a central electrode
US20030001095A1 (en) 2001-07-02 2003-01-02 Schlumberger Technologies, Inc. Method and apparatus for multiple charged particle beams
WO2004008255A2 (en) 2002-07-11 2004-01-22 Applied Materials, Inc. Method and apparatus for measuring critical dimensions with a particle beam
JP2010020919A (ja) 2008-07-08 2010-01-28 Hitachi High-Technologies Corp 検査装置
JP2010062586A (ja) 2005-12-15 2010-03-18 Nuflare Technology Inc 荷電粒子ビーム描画方法及び荷電粒子ビーム描画装置
JP2013097869A (ja) 2011-10-28 2013-05-20 Ebara Corp 試料観察装置及び試料観察方法
US20180068825A1 (en) 2016-09-08 2018-03-08 Kla-Tencor Corporation Apparatus and Method for Correcting Arrayed Astigmatism in a Multi-Column Scanning Electron Microscopy System

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US4390789A (en) * 1981-05-21 1983-06-28 Control Data Corporation Electron beam array lithography system employing multiple parallel array optics channels and method of operation
JPS6293931A (ja) * 1985-10-19 1987-04-30 Nippon Telegr & Teleph Corp <Ntt> 荷電ビ−ム露光装置
EP0281743B1 (de) * 1987-02-02 1994-03-30 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Detektorobjectiv für Rastermikroskope
US4926054A (en) * 1988-03-17 1990-05-15 Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh Objective lens for focusing charged particles in an electron microscope
JP2775812B2 (ja) * 1989-02-21 1998-07-16 株式会社ニコン 荷電粒子線装置
WO1999034397A1 (en) * 1997-12-23 1999-07-08 Koninklijke Philips Electronics N.V. Sem provided with an electrostatic objective and an electrical scanning device
US6633034B1 (en) * 2000-05-04 2003-10-14 Applied Materials, Inc. Method and apparatus for imaging a specimen using low profile electron detector for charged particle beam imaging apparatus including electrostatic mirrors
AU2003276779A1 (en) * 2002-10-30 2004-05-25 Mapper Lithography Ip B.V. Electron beam exposure system
JP4977509B2 (ja) * 2007-03-26 2012-07-18 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
DE102008062450B4 (de) * 2008-12-13 2012-05-03 Vistec Electron Beam Gmbh Anordnung zur Beleuchtung eines Substrats mit mehreren individuell geformten Partikelstrahlen zur hochauflösenden Lithographie von Strukturmustern
US8071942B2 (en) * 2009-03-20 2011-12-06 Physical Electronics USA, Inc. Sample holder apparatus to reduce energy of electrons in an analyzer system and method
JP5934965B2 (ja) * 2012-04-26 2016-06-15 国立研究開発法人理化学研究所 電子線装置
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WO2016182948A1 (en) * 2015-05-08 2016-11-17 Kla-Tencor Corporation Method and system for aberration correction in electron beam system
US10366862B2 (en) * 2015-09-21 2019-07-30 KLA-Tencor Corporaton Method and system for noise mitigation in a multi-beam scanning electron microscopy system
CN108027499B (zh) * 2015-09-23 2021-02-12 科磊股份有限公司 用于多波束扫描式电子显微系统的聚焦调整的方法及系统
US10515778B2 (en) * 2016-03-16 2019-12-24 Ngr Inc. Secondary particle detection system of scanning electron microscope
US10453645B2 (en) * 2016-12-01 2019-10-22 Applied Materials Israel Ltd. Method for inspecting a specimen and charged particle multi-beam device

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020125428A1 (en) 2000-12-22 2002-09-12 Krans Jan Martijn SEM provided with a secondary electron detector having a central electrode
US20020117967A1 (en) 2001-02-23 2002-08-29 Gerlach Robert L. Electron beam system using multiple electron beams
US20030001095A1 (en) 2001-07-02 2003-01-02 Schlumberger Technologies, Inc. Method and apparatus for multiple charged particle beams
WO2004008255A2 (en) 2002-07-11 2004-01-22 Applied Materials, Inc. Method and apparatus for measuring critical dimensions with a particle beam
JP2010062586A (ja) 2005-12-15 2010-03-18 Nuflare Technology Inc 荷電粒子ビーム描画方法及び荷電粒子ビーム描画装置
JP2010020919A (ja) 2008-07-08 2010-01-28 Hitachi High-Technologies Corp 検査装置
JP2013097869A (ja) 2011-10-28 2013-05-20 Ebara Corp 試料観察装置及び試料観察方法
US20180068825A1 (en) 2016-09-08 2018-03-08 Kla-Tencor Corporation Apparatus and Method for Correcting Arrayed Astigmatism in a Multi-Column Scanning Electron Microscopy System

Also Published As

Publication number Publication date
JP2021522659A (ja) 2021-08-30
KR102547554B1 (ko) 2023-06-23
US10438769B1 (en) 2019-10-08
WO2019213000A1 (en) 2019-11-07
EP3765886A1 (en) 2021-01-20
JP2023033554A (ja) 2023-03-10
KR20200139257A (ko) 2020-12-11
CN115047608A (zh) 2022-09-13
JP2025061364A (ja) 2025-04-10
CN112136070A (zh) 2020-12-25
CN112136070B (zh) 2022-06-10
KR102608083B1 (ko) 2023-11-29
EP3765886A4 (en) 2022-11-09
TW202001970A (zh) 2020-01-01
TWI780324B (zh) 2022-10-11
JP7745790B2 (ja) 2025-09-29
KR20230037694A (ko) 2023-03-16

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