JPWO2019213000A5 - - Google Patents
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- JPWO2019213000A5 JPWO2019213000A5 JP2020560344A JP2020560344A JPWO2019213000A5 JP WO2019213000 A5 JPWO2019213000 A5 JP WO2019213000A5 JP 2020560344 A JP2020560344 A JP 2020560344A JP 2020560344 A JP2020560344 A JP 2020560344A JP WO2019213000 A5 JPWO2019213000 A5 JP WO2019213000A5
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- JP
- Japan
- Prior art keywords
- deflector
- electron
- electron beam
- trim
- additional
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 claims 59
- 201000009310 astigmatism Diseases 0.000 claims 6
- 230000005855 radiation Effects 0.000 claims 6
- 230000003068 static effect Effects 0.000 claims 4
- 238000004626 scanning electron microscopy Methods 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023005964A JP2023033554A (ja) | 2018-05-02 | 2023-01-18 | 走査型電子顕微法システム |
| JP2025005928A JP7745790B2 (ja) | 2018-05-02 | 2025-01-16 | 走査型電子顕微法システム |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/969,555 US10438769B1 (en) | 2018-05-02 | 2018-05-02 | Array-based characterization tool |
| US15/969,555 | 2018-05-02 | ||
| PCT/US2019/029764 WO2019213000A1 (en) | 2018-05-02 | 2019-04-30 | Array-based characterization tool |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023005964A Division JP2023033554A (ja) | 2018-05-02 | 2023-01-18 | 走査型電子顕微法システム |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| JP2021522659A JP2021522659A (ja) | 2021-08-30 |
| JPWO2019213000A5 true JPWO2019213000A5 (https=) | 2022-02-28 |
| JP2021522659A5 JP2021522659A5 (https=) | 2022-02-28 |
| JP7271572B2 JP7271572B2 (ja) | 2023-05-11 |
Family
ID=68102068
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020560344A Active JP7271572B2 (ja) | 2018-05-02 | 2019-04-30 | アレイ型特性解明ツール |
| JP2023005964A Pending JP2023033554A (ja) | 2018-05-02 | 2023-01-18 | 走査型電子顕微法システム |
| JP2025005928A Active JP7745790B2 (ja) | 2018-05-02 | 2025-01-16 | 走査型電子顕微法システム |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023005964A Pending JP2023033554A (ja) | 2018-05-02 | 2023-01-18 | 走査型電子顕微法システム |
| JP2025005928A Active JP7745790B2 (ja) | 2018-05-02 | 2025-01-16 | 走査型電子顕微法システム |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10438769B1 (https=) |
| EP (1) | EP3765886A4 (https=) |
| JP (3) | JP7271572B2 (https=) |
| KR (2) | KR102608083B1 (https=) |
| CN (2) | CN115047608A (https=) |
| TW (1) | TWI780324B (https=) |
| WO (1) | WO2019213000A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11239048B2 (en) * | 2020-03-09 | 2022-02-01 | Kla Corporation | Arrayed column detector |
| WO2022122320A1 (en) * | 2020-12-10 | 2022-06-16 | Asml Netherlands B.V. | Charged-particle beam apparatus with beam-tilt and methods thereof |
| JP7680923B2 (ja) * | 2021-09-16 | 2025-05-21 | 株式会社ニューフレアテクノロジー | マルチ電子ビーム検査装置、多極子アレイの制御方法、及びマルチ電子ビーム検査方法 |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4390789A (en) * | 1981-05-21 | 1983-06-28 | Control Data Corporation | Electron beam array lithography system employing multiple parallel array optics channels and method of operation |
| JPS6293931A (ja) * | 1985-10-19 | 1987-04-30 | Nippon Telegr & Teleph Corp <Ntt> | 荷電ビ−ム露光装置 |
| EP0281743B1 (de) * | 1987-02-02 | 1994-03-30 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Detektorobjectiv für Rastermikroskope |
| US4926054A (en) * | 1988-03-17 | 1990-05-15 | Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh | Objective lens for focusing charged particles in an electron microscope |
| JP2775812B2 (ja) * | 1989-02-21 | 1998-07-16 | 株式会社ニコン | 荷電粒子線装置 |
| WO1999034397A1 (en) * | 1997-12-23 | 1999-07-08 | Koninklijke Philips Electronics N.V. | Sem provided with an electrostatic objective and an electrical scanning device |
| US6633034B1 (en) * | 2000-05-04 | 2003-10-14 | Applied Materials, Inc. | Method and apparatus for imaging a specimen using low profile electron detector for charged particle beam imaging apparatus including electrostatic mirrors |
| DE60105199T2 (de) | 2000-12-22 | 2005-08-11 | Fei Co., Hillsboro | Sem mit einem sekundärelektronendetektor mit einer zentralelektrode |
| US6797953B2 (en) | 2001-02-23 | 2004-09-28 | Fei Company | Electron beam system using multiple electron beams |
| US6750455B2 (en) | 2001-07-02 | 2004-06-15 | Applied Materials, Inc. | Method and apparatus for multiple charged particle beams |
| JP4493495B2 (ja) | 2002-07-11 | 2010-06-30 | アプライド マテリアルズ インコーポレイテッド | サブミクロン断面を有する構造素子の断面特徴を決定するためのシステム及び方法 |
| AU2003276779A1 (en) * | 2002-10-30 | 2004-05-25 | Mapper Lithography Ip B.V. | Electron beam exposure system |
| TWI323004B (en) * | 2005-12-15 | 2010-04-01 | Nuflare Technology Inc | Charged particle beam writing method and apparatus |
| JP4977509B2 (ja) * | 2007-03-26 | 2012-07-18 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡 |
| JP5107812B2 (ja) * | 2008-07-08 | 2012-12-26 | 株式会社日立ハイテクノロジーズ | 検査装置 |
| DE102008062450B4 (de) * | 2008-12-13 | 2012-05-03 | Vistec Electron Beam Gmbh | Anordnung zur Beleuchtung eines Substrats mit mehreren individuell geformten Partikelstrahlen zur hochauflösenden Lithographie von Strukturmustern |
| US8071942B2 (en) * | 2009-03-20 | 2011-12-06 | Physical Electronics USA, Inc. | Sample holder apparatus to reduce energy of electrons in an analyzer system and method |
| JP5890652B2 (ja) * | 2011-10-28 | 2016-03-22 | 株式会社荏原製作所 | 試料観察装置及び試料観察方法 |
| JP5934965B2 (ja) * | 2012-04-26 | 2016-06-15 | 国立研究開発法人理化学研究所 | 電子線装置 |
| US9105440B2 (en) * | 2013-08-30 | 2015-08-11 | Hermes Microvision, Inc. | Apparatus of plural charged particle beams with multi-axis magnetic lens |
| US9431209B2 (en) | 2014-08-26 | 2016-08-30 | Hermes-Microvision, Inc. | Apparatus of plural charged particle beams with multi-axis magnetic lenses |
| NL2013411B1 (en) * | 2014-09-04 | 2016-09-27 | Univ Delft Tech | Multi electron beam inspection apparatus. |
| CN111261481B (zh) * | 2015-03-24 | 2022-12-16 | 科磊股份有限公司 | 用于带电粒子显微镜的方法及系统 |
| WO2016182948A1 (en) * | 2015-05-08 | 2016-11-17 | Kla-Tencor Corporation | Method and system for aberration correction in electron beam system |
| US10366862B2 (en) * | 2015-09-21 | 2019-07-30 | KLA-Tencor Corporaton | Method and system for noise mitigation in a multi-beam scanning electron microscopy system |
| CN108027499B (zh) * | 2015-09-23 | 2021-02-12 | 科磊股份有限公司 | 用于多波束扫描式电子显微系统的聚焦调整的方法及系统 |
| US10515778B2 (en) * | 2016-03-16 | 2019-12-24 | Ngr Inc. | Secondary particle detection system of scanning electron microscope |
| US10497536B2 (en) * | 2016-09-08 | 2019-12-03 | Rockwell Collins, Inc. | Apparatus and method for correcting arrayed astigmatism in a multi-column scanning electron microscopy system |
| US10453645B2 (en) * | 2016-12-01 | 2019-10-22 | Applied Materials Israel Ltd. | Method for inspecting a specimen and charged particle multi-beam device |
-
2018
- 2018-05-02 US US15/969,555 patent/US10438769B1/en active Active
-
2019
- 2019-04-24 TW TW108114249A patent/TWI780324B/zh active
- 2019-04-30 CN CN202210723696.5A patent/CN115047608A/zh active Pending
- 2019-04-30 KR KR1020237007799A patent/KR102608083B1/ko active Active
- 2019-04-30 CN CN201980029659.0A patent/CN112136070B/zh active Active
- 2019-04-30 EP EP19797080.9A patent/EP3765886A4/en active Pending
- 2019-04-30 JP JP2020560344A patent/JP7271572B2/ja active Active
- 2019-04-30 KR KR1020207034236A patent/KR102547554B1/ko active Active
- 2019-04-30 WO PCT/US2019/029764 patent/WO2019213000A1/en not_active Ceased
-
2023
- 2023-01-18 JP JP2023005964A patent/JP2023033554A/ja active Pending
-
2025
- 2025-01-16 JP JP2025005928A patent/JP7745790B2/ja active Active
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