JP2011223034A5 - - Google Patents
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- Publication number
- JP2011223034A5 JP2011223034A5 JP2011161217A JP2011161217A JP2011223034A5 JP 2011223034 A5 JP2011223034 A5 JP 2011223034A5 JP 2011161217 A JP2011161217 A JP 2011161217A JP 2011161217 A JP2011161217 A JP 2011161217A JP 2011223034 A5 JP2011223034 A5 JP 2011223034A5
- Authority
- JP
- Japan
- Prior art keywords
- exposure apparatus
- air outlet
- substrate
- liquid
- path space
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims 14
- 239000000758 substrate Substances 0.000 claims 13
- 239000007788 liquid Substances 0.000 claims 7
- 238000011084 recovery Methods 0.000 claims 6
- 238000001514 detection method Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000005871 repellent Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011161217A JP5232901B2 (ja) | 2011-07-22 | 2011-07-22 | 露光装置及びデバイス製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011161217A JP5232901B2 (ja) | 2011-07-22 | 2011-07-22 | 露光装置及びデバイス製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005180600A Division JP4884708B2 (ja) | 2005-06-21 | 2005-06-21 | 露光装置及びデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011223034A JP2011223034A (ja) | 2011-11-04 |
| JP2011223034A5 true JP2011223034A5 (enExample) | 2012-11-08 |
| JP5232901B2 JP5232901B2 (ja) | 2013-07-10 |
Family
ID=45039509
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011161217A Expired - Fee Related JP5232901B2 (ja) | 2011-07-22 | 2011-07-22 | 露光装置及びデバイス製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5232901B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9323160B2 (en) * | 2012-04-10 | 2016-04-26 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium |
| CN109427550B (zh) * | 2017-08-31 | 2021-04-16 | 沈阳芯源微电子设备股份有限公司 | 一种增粘单元hmds吹扫结构 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3747566B2 (ja) * | 1997-04-23 | 2006-02-22 | 株式会社ニコン | 液浸型露光装置 |
| SG121818A1 (en) * | 2002-11-12 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| EP1498778A1 (en) * | 2003-06-27 | 2005-01-19 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
-
2011
- 2011-07-22 JP JP2011161217A patent/JP5232901B2/ja not_active Expired - Fee Related
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