JP5232901B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

Info

Publication number
JP5232901B2
JP5232901B2 JP2011161217A JP2011161217A JP5232901B2 JP 5232901 B2 JP5232901 B2 JP 5232901B2 JP 2011161217 A JP2011161217 A JP 2011161217A JP 2011161217 A JP2011161217 A JP 2011161217A JP 5232901 B2 JP5232901 B2 JP 5232901B2
Authority
JP
Japan
Prior art keywords
substrate
gas
liquid
exposure apparatus
air outlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2011161217A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011223034A (ja
JP2011223034A5 (enExample
Inventor
康文 西井
秀和 菊地
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Sendai Nikon Corp
Original Assignee
Nikon Corp
Sendai Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Sendai Nikon Corp filed Critical Nikon Corp
Priority to JP2011161217A priority Critical patent/JP5232901B2/ja
Publication of JP2011223034A publication Critical patent/JP2011223034A/ja
Publication of JP2011223034A5 publication Critical patent/JP2011223034A5/ja
Application granted granted Critical
Publication of JP5232901B2 publication Critical patent/JP5232901B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2011161217A 2011-07-22 2011-07-22 露光装置及びデバイス製造方法 Expired - Fee Related JP5232901B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011161217A JP5232901B2 (ja) 2011-07-22 2011-07-22 露光装置及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011161217A JP5232901B2 (ja) 2011-07-22 2011-07-22 露光装置及びデバイス製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2005180600A Division JP4884708B2 (ja) 2005-06-21 2005-06-21 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2011223034A JP2011223034A (ja) 2011-11-04
JP2011223034A5 JP2011223034A5 (enExample) 2012-11-08
JP5232901B2 true JP5232901B2 (ja) 2013-07-10

Family

ID=45039509

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011161217A Expired - Fee Related JP5232901B2 (ja) 2011-07-22 2011-07-22 露光装置及びデバイス製造方法

Country Status (1)

Country Link
JP (1) JP5232901B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9323160B2 (en) * 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
CN109427550B (zh) * 2017-08-31 2021-04-16 沈阳芯源微电子设备股份有限公司 一种增粘单元hmds吹扫结构

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3747566B2 (ja) * 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
SG121818A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1498778A1 (en) * 2003-06-27 2005-01-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
JP2011223034A (ja) 2011-11-04

Similar Documents

Publication Publication Date Title
JP4884708B2 (ja) 露光装置及びデバイス製造方法
JP5338938B2 (ja) 液浸部材、液浸露光装置、及びデバイス製造方法。
JP5545320B2 (ja) 露光装置及びデバイス製造方法
TWI631426B (zh) 液浸構件、曝光裝置、曝光方法、元件製造方法
CN102714141B (zh) 液浸构件、曝光装置、曝光方法及元件制造方法
CN104838470A (zh) 具备防振装置的曝光装置
WO2006080516A1 (ja) 露光装置及びデバイス製造方法
JP4802604B2 (ja) 露光装置、露光方法、及びデバイス製造方法
JP4622595B2 (ja) 露光装置及びデバイス製造方法
JP2010205914A (ja) 露光装置、露光方法、及びデバイス製造方法
JP5005226B2 (ja) 露光装置及びデバイス製造方法、液体保持方法
JP5232901B2 (ja) 露光装置及びデバイス製造方法
JP5753613B2 (ja) 露光装置、露光方法、及びデバイス製造方法
WO2006106907A1 (ja) 露光装置、露光方法及びデバイス製造方法
JP4807086B2 (ja) 露光装置、露光方法、及びデバイス製造方法
JP5375843B2 (ja) 露光装置、露光方法、及びデバイス製造方法
JP2006310827A (ja) 露光装置、露光方法、及びデバイス製造方法
JP5343958B2 (ja) 露光装置、露光方法、及びデバイス製造方法
JP2006093291A (ja) 露光装置及びデバイス製造方法
JP2011114315A (ja) 液浸部材、露光装置、露光方法、及びデバイス製造方法
HK1210871B (zh) 具备防振装置的曝光装置
HK1172996A (en) Liquid-immersion member, exposing device, exposing method, and device manufacturing method

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20110803

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120926

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130226

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130325

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20160329

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 5232901

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees