JP2011213717A5 - - Google Patents
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- Publication number
- JP2011213717A5 JP2011213717A5 JP2011055907A JP2011055907A JP2011213717A5 JP 2011213717 A5 JP2011213717 A5 JP 2011213717A5 JP 2011055907 A JP2011055907 A JP 2011055907A JP 2011055907 A JP2011055907 A JP 2011055907A JP 2011213717 A5 JP2011213717 A5 JP 2011213717A5
- Authority
- JP
- Japan
- Prior art keywords
- acid
- ester
- mercapto
- alkyl
- optionally substituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 125000000217 alkyl group Chemical group 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 125000000623 heterocyclic group Chemical group 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- -1 3-mercapto-ethylpropyl Chemical group 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000004404 heteroalkyl group Chemical group 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229940117986 sulfobetaine Drugs 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- PSBDWGZCVUAZQS-UHFFFAOYSA-N (dimethylsulfonio)acetate Chemical compound C[S+](C)CC([O-])=O PSBDWGZCVUAZQS-UHFFFAOYSA-N 0.000 description 1
- MHGUSQPDQPUNQD-UHFFFAOYSA-N 2-(2,2-disulfoethyldisulfanyl)ethane-1,1-disulfonic acid Chemical compound OS(=O)(=O)C(S(O)(=O)=O)CSSCC(S(O)(=O)=O)S(O)(=O)=O MHGUSQPDQPUNQD-UHFFFAOYSA-N 0.000 description 1
- YXEXMVJHQLWNGG-UHFFFAOYSA-N 3-(3,3-disulfopropyldisulfanyl)propane-1,1-disulfonic acid Chemical compound OS(=O)(=O)C(S(O)(=O)=O)CCSSCCC(S(O)(=O)=O)S(O)(=O)=O YXEXMVJHQLWNGG-UHFFFAOYSA-N 0.000 description 1
- FULCXPQDMXUVSB-UHFFFAOYSA-N 3-(3-sulfanylpropylsulfonyloxy)propane-1-sulfonic acid Chemical compound OS(=O)(=O)CCCOS(=O)(=O)CCCS FULCXPQDMXUVSB-UHFFFAOYSA-N 0.000 description 1
- WRBSVISDQAINGQ-UHFFFAOYSA-N 3-(dimethylcarbamothioylsulfanyl)propane-1-sulfonic acid Chemical compound CN(C)C(=S)SCCCS(O)(=O)=O WRBSVISDQAINGQ-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- WTOULJJLZODBBU-UHFFFAOYSA-N SCCCS(=O)(=O)CCCS Chemical compound SCCCS(=O)(=O)CCCS WTOULJJLZODBBU-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- UOIBDPBAZXAMJP-UHFFFAOYSA-N [NH+]1=CC=CC=C1.[Na].C(CC)S(=O)(=O)[O-] Chemical compound [NH+]1=CC=CC=C1.[Na].C(CC)S(=O)(=O)[O-] UOIBDPBAZXAMJP-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- SOUPVZCONBCBGI-UHFFFAOYSA-M potassium;3-sulfanylpropane-1-sulfonate Chemical compound [K+].[O-]S(=O)(=O)CCCS SOUPVZCONBCBGI-UHFFFAOYSA-M 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000000126 substance Chemical group 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/661,311 US8262895B2 (en) | 2010-03-15 | 2010-03-15 | Plating bath and method |
| US12/661311 | 2010-03-15 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011213717A JP2011213717A (ja) | 2011-10-27 |
| JP2011213717A5 true JP2011213717A5 (https=) | 2016-04-14 |
| JP6054595B2 JP6054595B2 (ja) | 2016-12-27 |
Family
ID=43941913
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011055907A Active JP6054595B2 (ja) | 2010-03-15 | 2011-03-14 | めっき浴および方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8262895B2 (https=) |
| EP (1) | EP2366694B1 (https=) |
| JP (1) | JP6054595B2 (https=) |
| KR (1) | KR101739413B1 (https=) |
| CN (1) | CN102304218B (https=) |
| TW (1) | TWI427066B (https=) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8268157B2 (en) * | 2010-03-15 | 2012-09-18 | Rohm And Haas Electronic Materials Llc | Plating bath and method |
| WO2011135716A1 (ja) * | 2010-04-30 | 2011-11-03 | 荏原ユージライト株式会社 | 新規化合物およびその利用 |
| US8454815B2 (en) | 2011-10-24 | 2013-06-04 | Rohm And Haas Electronics Materials Llc | Plating bath and method |
| CN102888628B (zh) * | 2012-10-11 | 2015-04-01 | 合肥奥福表面处理科技有限公司 | Pet基材的fpc板材电镀镍工作液 |
| CN105229095A (zh) * | 2012-12-14 | 2016-01-06 | 蓝立方知识产权有限责任公司 | 高含固量环氧树脂涂料 |
| US20140238868A1 (en) | 2013-02-25 | 2014-08-28 | Dow Global Technologies Llc | Electroplating bath |
| JP6211185B2 (ja) | 2013-11-06 | 2017-10-11 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | レベラーとしての窒素含有ポリマー |
| WO2015074190A1 (en) | 2013-11-20 | 2015-05-28 | Rohm And Haas Electronic Materials Llc | Polymers containing benzimidazole moieties as levelers |
| US9439294B2 (en) * | 2014-04-16 | 2016-09-06 | Rohm And Haas Electronic Materials Llc | Reaction products of heterocyclic nitrogen compounds polyepoxides and polyhalogens |
| US9809891B2 (en) | 2014-06-30 | 2017-11-07 | Rohm And Haas Electronic Materials Llc | Plating method |
| US9725816B2 (en) | 2014-12-30 | 2017-08-08 | Rohm And Haas Electronic Materials Llc | Amino sulfonic acid based polymers for copper electroplating |
| US9611560B2 (en) | 2014-12-30 | 2017-04-04 | Rohm And Haas Electronic Materials Llc | Sulfonamide based polymers for copper electroplating |
| US9783905B2 (en) | 2014-12-30 | 2017-10-10 | Rohm and Haas Electronic Mateirals LLC | Reaction products of amino acids and epoxies |
| CN104562102A (zh) * | 2014-12-31 | 2015-04-29 | 苏州福莱盈电子有限公司 | 一种高深度盲孔电镀铜溶液 |
| CN105002527B (zh) * | 2015-07-31 | 2017-06-16 | 广东光华科技股份有限公司 | 整平剂溶液及其制备方法和应用 |
| CN105132977B (zh) * | 2015-08-31 | 2017-12-29 | 广东东硕科技有限公司 | 一种用于线路板制造的调整液及其制备方法 |
| US10988852B2 (en) | 2015-10-27 | 2021-04-27 | Rohm And Haas Electronic Materials Llc | Method of electroplating copper into a via on a substrate from an acid copper electroplating bath |
| TWI762731B (zh) * | 2017-11-08 | 2022-05-01 | 美商羅門哈斯電子材料有限公司 | 銅電鍍組合物及在基板上電鍍銅之方法 |
| TWI703148B (zh) * | 2017-11-08 | 2020-09-01 | 美商羅門哈斯電子材料有限公司 | 銅電鍍組合物及在基板上電鍍銅之方法 |
| EP3781729B1 (en) * | 2018-04-20 | 2024-09-25 | Basf Se | Composition for tin or tin alloy electroplating comprising suppressing agent |
| CN110016699B (zh) * | 2019-05-29 | 2021-05-04 | 广州旗泽科技有限公司 | 一种电镀铜填孔整平剂及其制备方法和应用 |
| CN111876799A (zh) * | 2020-07-07 | 2020-11-03 | 广东硕成科技有限公司 | 一种适用于背板孔金属化组合物及其孔金属化方法 |
| JP7530759B2 (ja) * | 2020-07-28 | 2024-08-08 | 上村工業株式会社 | 無電解パラジウムめっき浴 |
| CN115894908B (zh) * | 2021-09-30 | 2025-06-06 | 华为技术有限公司 | 聚合物、整平剂及其制备方法、电镀液和电镀方法 |
| CN118812835A (zh) * | 2024-06-19 | 2024-10-22 | 广东省科学院化工研究所 | 一种含2-取代苯并咪唑基团整平剂及其制备方法与应用 |
Family Cites Families (51)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL172828B (nl) * | 1951-10-03 | Degussa | Werkwijze voor het bereiden van katalysatoren voor de oxydatie van onverzadigde aldehyden tot onverzadigde carbonzuren en aldus gevormde katalysator. | |
| US3536654A (en) * | 1966-12-27 | 1970-10-27 | Shell Oil Co | Heat-curable solution coating compositions of an epoxy-amine adduct and an imidazole,their preparation and use |
| US4066625A (en) * | 1967-05-02 | 1978-01-03 | Amicon Corporation | Unitary curable resin compositions |
| FR1566468A (https=) * | 1968-03-04 | 1969-05-09 | ||
| DE2007968A1 (de) | 1970-01-16 | 1971-07-22 | R.T. Vanderbilt Company, Inc., New York, N.Y. (V.St.A.) | Propy lenoxid-Imidazol-Reaktionsprodukte, Verfahren zu ihrer Herstellung und ihre Verwendung als Hartungsmittel fur Epoxidharze |
| US3954575A (en) * | 1972-11-10 | 1976-05-04 | Dipsol Chemicals Co., Ltd. | Zinc electroplating |
| US3843667A (en) * | 1973-09-12 | 1974-10-22 | M Cupery | N-imidazole compounds and their complex metal derivatives |
| DE2525264C2 (de) * | 1975-06-04 | 1984-02-16 | Schering AG, 1000 Berlin und 4709 Bergkamen | Alkalisches cyanidfreies Zinkbad und Verfahren zur galvanischen Abscheidung von Zinküberzügen unter Verwendung dieses Bades |
| SU535301A1 (ru) | 1975-07-08 | 1976-11-15 | Днепропетровский Ордена Трудового Красного Знамени Государственный Университет Им.300-Летия Воссоединения Украины С Россией | Производные 1,2-диалкилбензимидазола, про вл ющие гипотензивное действие |
| US4038161A (en) * | 1976-03-05 | 1977-07-26 | R. O. Hull & Company, Inc. | Acid copper plating and additive composition therefor |
| US4038171A (en) * | 1976-03-31 | 1977-07-26 | Battelle Memorial Institute | Supported plasma sputtering apparatus for high deposition rate over large area |
| DE2725930C2 (de) | 1976-06-12 | 1986-06-12 | Mitsubishi Petrochemical Co., Ltd., Tokio/Tokyo | Verfahren zur Herstellung eines Anionenaustauscherharzes und Verwendung derselben zur Herstellung einer Anionenaustauschermembran |
| BE857754A (fr) * | 1976-08-18 | 1978-02-13 | Celanese Polymer Special Co | Composition de resine pour revetements, notamment par electrodeposition cathodique |
| US4211725A (en) * | 1977-11-10 | 1980-07-08 | Milliken Research Corporation | Nitrogen containing compositions |
| US4169772A (en) * | 1978-11-06 | 1979-10-02 | R. O. Hull & Company, Inc. | Acid zinc plating baths, compositions useful therein, and methods for electrodepositing bright zinc deposits |
| CA1151182A (en) | 1979-08-10 | 1983-08-02 | Marvin L. Kaufman | Chemically modified imidazole curing catalysts for epoxy resins and powder coatings containing them |
| US4397717A (en) * | 1981-02-10 | 1983-08-09 | Elektro-Brite Gmbh & Co. Kg. | Alkaline zinc electroplating bath with or without cyanide content |
| CH646956A5 (de) * | 1981-12-15 | 1984-12-28 | Ciba Geigy Ag | Imidazolide. |
| JPS58147416A (ja) | 1982-02-26 | 1983-09-02 | Hitachi Ltd | エポキシ樹脂組成物 |
| EP0145654B2 (de) * | 1983-11-09 | 1992-05-13 | Ciba-Geigy Ag | Verfahren zum Innenauskleiden von Rohren oder Rohrteilstücken |
| US5026872A (en) * | 1984-02-01 | 1991-06-25 | American Cyanamid | Aromatic ether-ketone polyamines, intermediates and products, and methods for preparing same |
| US4536261A (en) * | 1984-08-07 | 1985-08-20 | Francine Popescu | Alkaline bath for the electrodeposition of bright zinc |
| JPS61286369A (ja) | 1985-06-11 | 1986-12-16 | Shikoku Chem Corp | ２―フェニル―４，５―ジベンジルイミダゾール及び該化合物の合成方法 |
| US4730022A (en) * | 1987-03-06 | 1988-03-08 | Mcgean-Rohco, Inc. | Polymer compositions and alkaline zinc electroplating baths |
| US4792383A (en) * | 1987-10-27 | 1988-12-20 | Mcgean-Rohco, Inc. | Polymer compositions and alkaline zinc electroplating baths and processes |
| JPH01219188A (ja) * | 1988-02-26 | 1989-09-01 | Okuno Seiyaku Kogyo Kk | 亜鉛−ニッケル合金めっき浴 |
| DE4010548A1 (de) * | 1990-04-02 | 1991-10-10 | Schering Ag | Imidazolylderivate, ihre verwendung als haertungsmittel in epoxidharzzusammensetzungen, sie enthaltende haertbare epoxidharzzusammensetzungen und epoxidharzformkoerper |
| JPH03277631A (ja) | 1990-08-31 | 1991-12-09 | Mitsubishi Petrochem Co Ltd | 新規な高分子四級塩の製造方法 |
| SU1743158A1 (ru) | 1990-09-04 | 1998-02-20 | Институт физико-органической химии и углехимии АН УССР | 1-глицидилимидазолы в качестве соотвердителей эпоксидных смол |
| JPH07228572A (ja) | 1994-02-18 | 1995-08-29 | Japan Energy Corp | 新規ベンズイミダゾールフッ素誘導体及びその製造方法並びにそれを用いる金属表面処理剤 |
| US5607570A (en) * | 1994-10-31 | 1997-03-04 | Rohbani; Elias | Electroplating solution |
| JPH1030015A (ja) | 1996-07-15 | 1998-02-03 | Kansai Paint Co Ltd | エポキシ樹脂用硬化触媒及びそれを用いてなる熱硬化性塗料組成物 |
| DE69703739T2 (de) | 1997-10-02 | 2001-06-13 | Hexcel Corp., Pleasanton | Epoxidharzhärter |
| KR100659544B1 (ko) * | 1999-11-12 | 2006-12-19 | 에바라 유지라이토 코포레이션 리미티드 | 비아 필링 방법 |
| US6610192B1 (en) * | 2000-11-02 | 2003-08-26 | Shipley Company, L.L.C. | Copper electroplating |
| US6515237B2 (en) * | 2000-11-24 | 2003-02-04 | Hitachi Chemical Company, Ltd. | Through-hole wiring board |
| JP4392168B2 (ja) * | 2001-05-09 | 2009-12-24 | 荏原ユージライト株式会社 | 銅めっき浴およびこれを用いる基板のめっき方法 |
| US7226939B2 (en) * | 2002-02-12 | 2007-06-05 | Chandavarkar Mohan A | Thienopyridine analogues with antifungal activity and process thereof |
| JP4249438B2 (ja) * | 2002-07-05 | 2009-04-02 | 日本ニュークローム株式会社 | 銅―錫合金めっき用ピロリン酸浴 |
| JP3789107B2 (ja) * | 2002-07-23 | 2006-06-21 | 株式会社日鉱マテリアルズ | 特定骨格を有するアミン化合物及び有機硫黄化合物を添加剤として含む銅電解液並びにそれにより製造される電解銅箔 |
| JP4183999B2 (ja) * | 2002-07-29 | 2008-11-19 | 日鉱金属株式会社 | イミダゾールアルコールを有効成分とする表面処理剤 |
| US7128822B2 (en) * | 2003-06-04 | 2006-10-31 | Shipley Company, L.L.C. | Leveler compounds |
| KR100804293B1 (ko) | 2004-03-31 | 2008-02-18 | 아사히 가세이 케미칼즈 가부시키가이샤 | 에폭시 수지용 경화제 및 에폭시 수지 조성물 |
| TW200613586A (en) * | 2004-07-22 | 2006-05-01 | Rohm & Haas Elect Mat | Leveler compounds |
| EP1741804B1 (en) * | 2005-07-08 | 2016-04-27 | Rohm and Haas Electronic Materials, L.L.C. | Electrolytic copper plating method |
| US7662981B2 (en) * | 2005-07-16 | 2010-02-16 | Rohm And Haas Electronic Materials Llc | Leveler compounds |
| JP5497261B2 (ja) | 2006-12-15 | 2014-05-21 | ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． | インジウム組成物 |
| JP2008266722A (ja) | 2007-04-20 | 2008-11-06 | Ebara Udylite Kk | パルス銅めっき浴用添加剤およびこれを用いたパルス銅めっき浴 |
| DE502008002080D1 (de) * | 2008-06-02 | 2011-02-03 | Autotech Deutschland Gmbh | Pyrophosphathaltiges Bad zur cyanidfreien Abscheidung von Kupfer-Zinn-Legierungen |
| US20110220512A1 (en) * | 2010-03-15 | 2011-09-15 | Rohm And Haas Electronic Materials Llc | Plating bath and method |
| US8268157B2 (en) * | 2010-03-15 | 2012-09-18 | Rohm And Haas Electronic Materials Llc | Plating bath and method |
-
2010
- 2010-03-15 US US12/661,311 patent/US8262895B2/en active Active
-
2011
- 2011-03-14 JP JP2011055907A patent/JP6054595B2/ja active Active
- 2011-03-15 TW TW100108655A patent/TWI427066B/zh active
- 2011-03-15 CN CN2011101283127A patent/CN102304218B/zh active Active
- 2011-03-15 KR KR1020110023055A patent/KR101739413B1/ko active Active
- 2011-03-15 EP EP11158233.4A patent/EP2366694B1/en active Active
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