JP2011180185A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2011180185A5 JP2011180185A5 JP2010041472A JP2010041472A JP2011180185A5 JP 2011180185 A5 JP2011180185 A5 JP 2011180185A5 JP 2010041472 A JP2010041472 A JP 2010041472A JP 2010041472 A JP2010041472 A JP 2010041472A JP 2011180185 A5 JP2011180185 A5 JP 2011180185A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- general formula
- carbon atoms
- represented
- chemically amplified
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000004432 carbon atom Chemical group C* 0.000 claims description 25
- 239000000203 mixture Substances 0.000 claims description 25
- 229920002120 photoresistant polymer Polymers 0.000 claims description 23
- 229920000642 polymer Polymers 0.000 claims description 23
- -1 iodonium cation Chemical class 0.000 claims description 21
- 229910052731 fluorine Inorganic materials 0.000 claims description 20
- 150000001875 compounds Chemical class 0.000 claims description 18
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 18
- 125000000217 alkyl group Chemical group 0.000 claims description 15
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 14
- 239000011737 fluorine Substances 0.000 claims description 14
- 239000002253 acid Substances 0.000 claims description 13
- 125000003118 aryl group Chemical group 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- 229920005601 base polymer Polymers 0.000 claims description 10
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 10
- 150000003839 salts Chemical class 0.000 claims description 10
- 125000001424 substituent group Chemical group 0.000 claims description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 8
- 239000000178 monomer Substances 0.000 claims description 8
- 239000003431 cross linking reagent Substances 0.000 claims description 7
- 125000001153 fluoro group Chemical group F* 0.000 claims description 7
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 7
- 239000003377 acid catalyst Substances 0.000 claims description 6
- 125000003342 alkenyl group Chemical group 0.000 claims description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 6
- 230000037048 polymerization activity Effects 0.000 claims description 6
- 125000005843 halogen group Chemical group 0.000 claims description 5
- 125000000962 organic group Chemical group 0.000 claims description 5
- 229910052717 sulfur Inorganic materials 0.000 claims description 5
- 125000004434 sulfur atom Chemical group 0.000 claims description 5
- 125000002723 alicyclic group Chemical group 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- 125000003368 amide group Chemical group 0.000 claims description 4
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 4
- 125000005355 arylox oalkyl group Chemical group 0.000 claims description 4
- 150000001768 cations Chemical class 0.000 claims description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 4
- 125000005188 oxoalkyl group Chemical group 0.000 claims description 4
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 125000005196 alkyl carbonyloxy group Chemical group 0.000 claims description 3
- 125000003277 amino group Chemical group 0.000 claims description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 3
- 125000000686 lactone group Chemical group 0.000 claims description 3
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 claims description 3
- SUHKRPZNXYWWED-UHFFFAOYSA-N [4-(2-methylprop-2-enoyloxy)phenyl]-phenyliodanium Chemical compound C1=CC(OC(=O)C(=C)C)=CC=C1[I+]C1=CC=CC=C1 SUHKRPZNXYWWED-UHFFFAOYSA-N 0.000 claims description 2
- XKMKQFBRTQEVQI-UHFFFAOYSA-N [4-[(2-methylpropan-2-yl)oxy]phenyl]-phenyliodanium Chemical compound C1=CC(OC(C)(C)C)=CC=C1[I+]C1=CC=CC=C1 XKMKQFBRTQEVQI-UHFFFAOYSA-N 0.000 claims description 2
- 239000003513 alkali Substances 0.000 claims description 2
- 125000002947 alkylene group Chemical group 0.000 claims description 2
- OXCNKQDVXWNXFX-UHFFFAOYSA-N bis(4-ethylphenyl)iodanium Chemical compound C1=CC(CC)=CC=C1[I+]C1=CC=C(CC)C=C1 OXCNKQDVXWNXFX-UHFFFAOYSA-N 0.000 claims description 2
- HKWWDSQUZURFQR-UHFFFAOYSA-N bis(4-methylphenyl)iodanium Chemical compound C1=CC(C)=CC=C1[I+]C1=CC=C(C)C=C1 HKWWDSQUZURFQR-UHFFFAOYSA-N 0.000 claims description 2
- DNFSNYQTQMVTOK-UHFFFAOYSA-N bis(4-tert-butylphenyl)iodanium Chemical compound C1=CC(C(C)(C)C)=CC=C1[I+]C1=CC=C(C(C)(C)C)C=C1 DNFSNYQTQMVTOK-UHFFFAOYSA-N 0.000 claims description 2
- LYJGVKFBGRMSKS-UHFFFAOYSA-N bis[4-(2-methylbutan-2-yl)phenyl]iodanium Chemical compound C1=CC(C(C)(C)CC)=CC=C1[I+]C1=CC=C(C(C)(C)CC)C=C1 LYJGVKFBGRMSKS-UHFFFAOYSA-N 0.000 claims description 2
- 238000010894 electron beam technology Methods 0.000 claims description 2
- 125000004185 ester group Chemical group 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- PEAQLBQIIXRSKF-UHFFFAOYSA-N phenyl-(4-prop-2-enoyloxyphenyl)iodanium Chemical compound C1=CC(OC(=O)C=C)=CC=C1[I+]C1=CC=CC=C1 PEAQLBQIIXRSKF-UHFFFAOYSA-N 0.000 claims description 2
- KTNLYTNKBOKXRW-UHFFFAOYSA-N phenyliodanium Chemical compound [IH+]C1=CC=CC=C1 KTNLYTNKBOKXRW-UHFFFAOYSA-N 0.000 claims description 2
- 230000007261 regionalization Effects 0.000 claims description 2
- 125000005647 linker group Chemical group 0.000 description 6
- 125000000524 functional group Chemical group 0.000 description 5
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 3
- MFNBODQBPMDPPQ-UHFFFAOYSA-N (4-tert-butylphenyl)-diphenylsulfanium Chemical compound C1=CC(C(C)(C)C)=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 MFNBODQBPMDPPQ-UHFFFAOYSA-N 0.000 description 2
- QVLLTVALUYGYIX-UHFFFAOYSA-N [4-[(2-methylpropan-2-yl)oxy]phenyl]-diphenylsulfanium Chemical compound C1=CC(OC(C)(C)C)=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 QVLLTVALUYGYIX-UHFFFAOYSA-N 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- LTYMSROWYAPPGB-UHFFFAOYSA-O diphenylsulfanium Chemical compound C=1C=CC=CC=1[SH+]C1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-O 0.000 description 2
- 238000005191 phase separation Methods 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 2
- 239000012953 triphenylsulfonium Substances 0.000 description 2
- ZMOJTPABCOWEOS-UHFFFAOYSA-N tris(4-tert-butylphenyl)sulfanium Chemical compound C1=CC(C(C)(C)C)=CC=C1[S+](C=1C=CC(=CC=1)C(C)(C)C)C1=CC=C(C(C)(C)C)C=C1 ZMOJTPABCOWEOS-UHFFFAOYSA-N 0.000 description 2
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical group CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 description 1
- IXIBAGNHKIGPIS-UHFFFAOYSA-N (3-tert-butylphenyl)-diphenylsulfanium Chemical compound CC(C)(C)C1=CC=CC([S+](C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 IXIBAGNHKIGPIS-UHFFFAOYSA-N 0.000 description 1
- QAEDNLDMOUKNMI-UHFFFAOYSA-O (4-hydroxyphenyl)-dimethylsulfanium Chemical compound C[S+](C)C1=CC=C(O)C=C1 QAEDNLDMOUKNMI-UHFFFAOYSA-O 0.000 description 1
- KTIDSNSNBAWBBO-UHFFFAOYSA-N (4-methoxyphenyl)-dimethylsulfanium Chemical compound COC1=CC=C([S+](C)C)C=C1 KTIDSNSNBAWBBO-UHFFFAOYSA-N 0.000 description 1
- WVJWZSMLVUMNOA-UHFFFAOYSA-N 1-(2-methoxynaphthalen-1-yl)thiolan-1-ium Chemical compound COC1=CC=C2C=CC=CC2=C1[S+]1CCCC1 WVJWZSMLVUMNOA-UHFFFAOYSA-N 0.000 description 1
- VMMIZNKPCLNGSS-UHFFFAOYSA-N 1-(2-oxo-2-phenylethyl)tetrahydrothiophenium Chemical compound C=1C=CC=CC=1C(=O)C[S+]1CCCC1 VMMIZNKPCLNGSS-UHFFFAOYSA-N 0.000 description 1
- CEZIJESLKIMKNL-UHFFFAOYSA-N 1-(4-butoxynaphthalen-1-yl)thiolan-1-ium Chemical compound C12=CC=CC=C2C(OCCCC)=CC=C1[S+]1CCCC1 CEZIJESLKIMKNL-UHFFFAOYSA-N 0.000 description 1
- FUBAYNPDUBRNJU-UHFFFAOYSA-N 1-(4-methoxynaphthalen-1-yl)thiolan-1-ium Chemical compound C12=CC=CC=C2C(OC)=CC=C1[S+]1CCCC1 FUBAYNPDUBRNJU-UHFFFAOYSA-N 0.000 description 1
- BXDQBLZUFFMESW-UHFFFAOYSA-N 1-[(2-methylpropan-2-yl)oxy]-4-phenylsulfanylbenzene Chemical compound C1=CC(OC(C)(C)C)=CC=C1SC1=CC=CC=C1 BXDQBLZUFFMESW-UHFFFAOYSA-N 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- UBBXNOYRIIDDIA-UHFFFAOYSA-N 2-(dimethylamino)-5-hydroxybenzoic acid Chemical compound CN(C)C1=CC=C(O)C=C1C(O)=O UBBXNOYRIIDDIA-UHFFFAOYSA-N 0.000 description 1
- RAYWEEAHFPENGA-UHFFFAOYSA-N 2-(dimethylamino)-5-iodobenzoic acid Chemical compound CN(C)C1=CC=C(I)C=C1C(O)=O RAYWEEAHFPENGA-UHFFFAOYSA-N 0.000 description 1
- DVVXXHVHGGWWPE-UHFFFAOYSA-N 2-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=CC=C1C(O)=O DVVXXHVHGGWWPE-UHFFFAOYSA-N 0.000 description 1
- QPNFUBAIQZJEPO-UHFFFAOYSA-N 2-[4-(dibutylamino)-2-hydroxybenzoyl]benzoic acid Chemical group OC1=CC(N(CCCC)CCCC)=CC=C1C(=O)C1=CC=CC=C1C(O)=O QPNFUBAIQZJEPO-UHFFFAOYSA-N 0.000 description 1
- BMOLHINGTIUDQR-UHFFFAOYSA-N 2-[4-(dimethylamino)phenyl]-2-hydroxybutanedioic acid Chemical compound CN(C)C1=CC=C(C(O)(CC(O)=O)C(O)=O)C=C1 BMOLHINGTIUDQR-UHFFFAOYSA-N 0.000 description 1
- KQGHTOZUPICELS-UHFFFAOYSA-N 2-[4-(dimethylamino)phenyl]acetic acid Chemical compound CN(C)C1=CC=C(CC(O)=O)C=C1 KQGHTOZUPICELS-UHFFFAOYSA-N 0.000 description 1
- RUOCONOTVDYHSS-UHFFFAOYSA-N 2-[4-(dimethylamino)phenyl]butanoic acid Chemical compound CCC(C(O)=O)C1=CC=C(N(C)C)C=C1 RUOCONOTVDYHSS-UHFFFAOYSA-N 0.000 description 1
- QLFOCZZNJVZGKW-UHFFFAOYSA-N 2-[4-(dimethylamino)phenyl]propanoic acid Chemical compound OC(=O)C(C)C1=CC=C(N(C)C)C=C1 QLFOCZZNJVZGKW-UHFFFAOYSA-N 0.000 description 1
- KDSMPWRNJRQEOB-UHFFFAOYSA-N 2-butoxy-1-naphthalen-1-ylthiolan-1-ium Chemical compound C(CCC)OC1[S+](CCC1)C1=CC=CC2=CC=CC=C12 KDSMPWRNJRQEOB-UHFFFAOYSA-N 0.000 description 1
- NEGFNJRAUMCZMY-UHFFFAOYSA-N 3-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=CC(C(O)=O)=C1 NEGFNJRAUMCZMY-UHFFFAOYSA-N 0.000 description 1
- KKIMCXNVTFWYGD-UHFFFAOYSA-N 3-[4-(dimethylamino)phenyl]-2-oxopropanoic acid Chemical compound CN(C)C1=CC=C(CC(=O)C(O)=O)C=C1 KKIMCXNVTFWYGD-UHFFFAOYSA-N 0.000 description 1
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical group C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 description 1
- HSVJMWXLGNHXNV-UHFFFAOYSA-N 4-(dibutylamino)benzoic acid Chemical compound CCCCN(CCCC)C1=CC=C(C(O)=O)C=C1 HSVJMWXLGNHXNV-UHFFFAOYSA-N 0.000 description 1
- SKEWDMHIDJWKDP-UHFFFAOYSA-N 4-(diethylamino)-2-methoxybenzoic acid Chemical compound CCN(CC)C1=CC=C(C(O)=O)C(OC)=C1 SKEWDMHIDJWKDP-UHFFFAOYSA-N 0.000 description 1
- BFGAZEMSGFEFGF-UHFFFAOYSA-N 4-(diethylamino)-2-methylbenzoic acid Chemical compound CCN(CC)C1=CC=C(C(O)=O)C(C)=C1 BFGAZEMSGFEFGF-UHFFFAOYSA-N 0.000 description 1
- LNYTUARMNSFFBE-UHFFFAOYSA-N 4-(diethylazaniumyl)benzoate Chemical compound CCN(CC)C1=CC=C(C(O)=O)C=C1 LNYTUARMNSFFBE-UHFFFAOYSA-N 0.000 description 1
- YDIYEOMDOWUDTJ-UHFFFAOYSA-N 4-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=C(C(O)=O)C=C1 YDIYEOMDOWUDTJ-UHFFFAOYSA-N 0.000 description 1
- SDUINJZCAHJFQQ-UHFFFAOYSA-N 4-(dipentylamino)benzoic acid Chemical compound CCCCCN(CCCCC)C1=CC=C(C(O)=O)C=C1 SDUINJZCAHJFQQ-UHFFFAOYSA-N 0.000 description 1
- SQLBFVMSEWIEJW-UHFFFAOYSA-N 4-(dipropylamino)benzoic acid Chemical compound CCCN(CCC)C1=CC=C(C(O)=O)C=C1 SQLBFVMSEWIEJW-UHFFFAOYSA-N 0.000 description 1
- FUJGGJSOHFEAAT-UHFFFAOYSA-O 4-dibenzothiophen-5-ium-5-ylphenol Chemical compound C1=CC(O)=CC=C1[S+]1C2=CC=CC=C2C2=CC=CC=C21 FUJGGJSOHFEAAT-UHFFFAOYSA-O 0.000 description 1
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- PDNMQOJVYOKKJF-UHFFFAOYSA-N 5-(4-methylphenyl)dibenzothiophen-5-ium Chemical compound C1=CC(C)=CC=C1[S+]1C2=CC=CC=C2C2=CC=CC=C21 PDNMQOJVYOKKJF-UHFFFAOYSA-N 0.000 description 1
- JXKOUBZHRIUEGF-UHFFFAOYSA-N 5-(4-tert-butylphenyl)dibenzothiophen-5-ium Chemical compound C1=CC(C(C)(C)C)=CC=C1[S+]1C2=CC=CC=C2C2=CC=CC=C21 JXKOUBZHRIUEGF-UHFFFAOYSA-N 0.000 description 1
- CYTXUPXHVXSDML-UHFFFAOYSA-N 5-bromo-2-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=C(Br)C=C1C(O)=O CYTXUPXHVXSDML-UHFFFAOYSA-N 0.000 description 1
- TYTDINDFLWOUBN-UHFFFAOYSA-N 5-chloro-2-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=C(Cl)C=C1C(O)=O TYTDINDFLWOUBN-UHFFFAOYSA-N 0.000 description 1
- IEHGSIUPPIZJGG-UHFFFAOYSA-N 5-phenyldibenzothiophen-5-ium Chemical compound C1=CC=CC=C1[S+]1C2=CC=CC=C2C2=CC=CC=C21 IEHGSIUPPIZJGG-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N Benzoic acid Natural products OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 0 COC(C(*)(CC(C[I+])I)F)=O Chemical compound COC(C(*)(CC(C[I+])I)F)=O 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- JDURJWAOXLNXCM-UHFFFAOYSA-N O=C1CCCCC1SCC1CCCCC1 Chemical compound O=C1CCCCC1SCC1CCCCC1 JDURJWAOXLNXCM-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical group C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- QDXMEMNNXCKAQY-UHFFFAOYSA-N [3,4-bis[(2-methylpropan-2-yl)oxy]phenyl]-diphenylsulfanium Chemical compound C1=C(OC(C)(C)C)C(OC(C)(C)C)=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 QDXMEMNNXCKAQY-UHFFFAOYSA-N 0.000 description 1
- OMLJUIAUVMCBHU-UHFFFAOYSA-N [3-[(2-methylpropan-2-yl)oxy]phenyl]-diphenylsulfanium Chemical compound CC(C)(C)OC1=CC=CC([S+](C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 OMLJUIAUVMCBHU-UHFFFAOYSA-N 0.000 description 1
- FLVJCWKJUGNAFO-UHFFFAOYSA-N [4-[2-[(2-methylpropan-2-yl)oxy]-2-oxoethoxy]phenyl]-diphenylsulfanium Chemical compound C1=CC(OCC(=O)OC(C)(C)C)=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FLVJCWKJUGNAFO-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- KXTLQDCRCQWSMA-UHFFFAOYSA-N bis(3,4-ditert-butylphenyl)-phenylsulfanium Chemical compound C1=C(C(C)(C)C)C(C(C)(C)C)=CC=C1[S+](C=1C=C(C(=CC=1)C(C)(C)C)C(C)(C)C)C1=CC=CC=C1 KXTLQDCRCQWSMA-UHFFFAOYSA-N 0.000 description 1
- JZGOMSFHILFPSI-UHFFFAOYSA-N bis(3-tert-butylphenyl)-phenylsulfanium Chemical compound CC(C)(C)C1=CC=CC([S+](C=2C=CC=CC=2)C=2C=C(C=CC=2)C(C)(C)C)=C1 JZGOMSFHILFPSI-UHFFFAOYSA-N 0.000 description 1
- KIOLOPDZCNDWNX-UHFFFAOYSA-N bis(4-tert-butylphenyl)-phenylsulfanium Chemical compound C1=CC(C(C)(C)C)=CC=C1[S+](C=1C=CC(=CC=1)C(C)(C)C)C1=CC=CC=C1 KIOLOPDZCNDWNX-UHFFFAOYSA-N 0.000 description 1
- OZVDNRKZPHUHHH-UHFFFAOYSA-N bis[3,4-bis[(2-methylpropan-2-yl)oxy]phenyl]-phenylsulfanium Chemical compound C1=C(OC(C)(C)C)C(OC(C)(C)C)=CC=C1[S+](C=1C=C(OC(C)(C)C)C(OC(C)(C)C)=CC=1)C1=CC=CC=C1 OZVDNRKZPHUHHH-UHFFFAOYSA-N 0.000 description 1
- AQHLARFCQRKNIZ-UHFFFAOYSA-N bis[3-[(2-methylpropan-2-yl)oxy]phenyl]-phenylsulfanium Chemical compound CC(C)(C)OC1=CC=CC([S+](C=2C=CC=CC=2)C=2C=C(OC(C)(C)C)C=CC=2)=C1 AQHLARFCQRKNIZ-UHFFFAOYSA-N 0.000 description 1
- LNNMPUCAOZRXCW-UHFFFAOYSA-N bis[4-(dimethylamino)phenyl]-[4-[(2-methylpropan-2-yl)oxy]phenyl]sulfanium Chemical compound C1=CC(N(C)C)=CC=C1[S+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(OC(C)(C)C)C=C1 LNNMPUCAOZRXCW-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000005708 carbonyloxy group Chemical group [*:2]OC([*:1])=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000007942 carboxylates Chemical group 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- ORBNOOYFBGZSCL-UHFFFAOYSA-N dimethyl(naphthalen-2-yl)sulfanium Chemical compound C1=CC=CC2=CC([S+](C)C)=CC=C21 ORBNOOYFBGZSCL-UHFFFAOYSA-N 0.000 description 1
- GMEXDATVSHAMEP-UHFFFAOYSA-N dimethyl(phenyl)sulfanium Chemical compound C[S+](C)C1=CC=CC=C1 GMEXDATVSHAMEP-UHFFFAOYSA-N 0.000 description 1
- VNXOCEVHAOVHRM-UHFFFAOYSA-N diphenyl(thiophen-2-yl)sulfanium Chemical compound C1=CSC([S+](C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 VNXOCEVHAOVHRM-UHFFFAOYSA-N 0.000 description 1
- OWZDULOODZHVCQ-UHFFFAOYSA-N diphenyl-(4-phenylsulfanylphenyl)sulfanium Chemical compound C=1C=C([S+](C=2C=CC=CC=2)C=2C=CC=CC=2)C=CC=1SC1=CC=CC=C1 OWZDULOODZHVCQ-UHFFFAOYSA-N 0.000 description 1
- ORKZATPRQQSLDT-UHFFFAOYSA-N diphenylmethanethiol Chemical compound C=1C=CC=CC=1C(S)C1=CC=CC=C1 ORKZATPRQQSLDT-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 150000002148 esters Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- UIWMMUSDNIMEBK-UHFFFAOYSA-N naphthalen-2-yl(diphenyl)sulfanium Chemical compound C1=CC=CC=C1[S+](C=1C=C2C=CC=CC2=CC=1)C1=CC=CC=C1 UIWMMUSDNIMEBK-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 125000005740 oxycarbonyl group Chemical group [*:1]OC([*:2])=O 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- VRAWXSCCKYEDOG-UHFFFAOYSA-N tribenzylsulfanium Chemical compound C=1C=CC=CC=1C[S+](CC=1C=CC=CC=1)CC1=CC=CC=C1 VRAWXSCCKYEDOG-UHFFFAOYSA-N 0.000 description 1
- NRZWQKGABZFFKE-UHFFFAOYSA-N trimethylsulfonium Chemical compound C[S+](C)C NRZWQKGABZFFKE-UHFFFAOYSA-N 0.000 description 1
- CECPFQZDKXOJLX-UHFFFAOYSA-N tris(3,4-ditert-butylphenyl)sulfanium Chemical compound C1=C(C(C)(C)C)C(C(C)(C)C)=CC=C1[S+](C=1C=C(C(=CC=1)C(C)(C)C)C(C)(C)C)C1=CC=C(C(C)(C)C)C(C(C)(C)C)=C1 CECPFQZDKXOJLX-UHFFFAOYSA-N 0.000 description 1
- KCKZNRIIFSOYQK-UHFFFAOYSA-N tris(3-tert-butylphenyl)sulfanium Chemical compound CC(C)(C)C1=CC=CC([S+](C=2C=C(C=CC=2)C(C)(C)C)C=2C=C(C=CC=2)C(C)(C)C)=C1 KCKZNRIIFSOYQK-UHFFFAOYSA-N 0.000 description 1
- DMJFWVWYOPMJIK-UHFFFAOYSA-N tris[3,4-bis[(2-methylpropan-2-yl)oxy]phenyl]sulfanium Chemical compound C1=C(OC(C)(C)C)C(OC(C)(C)C)=CC=C1[S+](C=1C=C(OC(C)(C)C)C(OC(C)(C)C)=CC=1)C1=CC=C(OC(C)(C)C)C(OC(C)(C)C)=C1 DMJFWVWYOPMJIK-UHFFFAOYSA-N 0.000 description 1
- HENPLGIMUIZOJQ-UHFFFAOYSA-N tris[3-[(2-methylpropan-2-yl)oxy]phenyl]sulfanium Chemical compound CC(C)(C)OC1=CC=CC([S+](C=2C=C(OC(C)(C)C)C=CC=2)C=2C=C(OC(C)(C)C)C=CC=2)=C1 HENPLGIMUIZOJQ-UHFFFAOYSA-N 0.000 description 1
- YNIMTIPTLNZOMC-UHFFFAOYSA-N tris[4-(dimethylamino)phenyl]sulfanium Chemical compound C1=CC(N(C)C)=CC=C1[S+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 YNIMTIPTLNZOMC-UHFFFAOYSA-N 0.000 description 1
- PNXQORBBJALXKA-UHFFFAOYSA-N tris[4-[(2-methylpropan-2-yl)oxy]phenyl]sulfanium Chemical compound C1=CC(OC(C)(C)C)=CC=C1[S+](C=1C=CC(OC(C)(C)C)=CC=1)C1=CC=C(OC(C)(C)C)C=C1 PNXQORBBJALXKA-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010041472A JP5007846B2 (ja) | 2010-02-26 | 2010-02-26 | 化学増幅ネガ型レジスト組成物及びパターン形成方法 |
| US13/033,647 US8859181B2 (en) | 2010-02-26 | 2011-02-24 | Chemically amplified negative resist composition and patterning process |
| CN201110141668.4A CN102253600B (zh) | 2010-02-26 | 2011-02-25 | 化学放大负性抗蚀剂组合物和图案形成方法 |
| TW100106397A TWI446113B (zh) | 2010-02-26 | 2011-02-25 | 化學增幅負型光阻組成物及圖型之形成方法 |
| EP11001591A EP2362267B1 (en) | 2010-02-26 | 2011-02-25 | Chemically amplified negative resist composition and patterning process |
| KR1020110016896A KR101623604B1 (ko) | 2010-02-26 | 2011-02-25 | 화학 증폭 네가티브형 레지스트 조성물 및 패턴 형성 방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010041472A JP5007846B2 (ja) | 2010-02-26 | 2010-02-26 | 化学増幅ネガ型レジスト組成物及びパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011180185A JP2011180185A (ja) | 2011-09-15 |
| JP2011180185A5 true JP2011180185A5 (https=) | 2011-10-27 |
| JP5007846B2 JP5007846B2 (ja) | 2012-08-22 |
Family
ID=43978062
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010041472A Active JP5007846B2 (ja) | 2010-02-26 | 2010-02-26 | 化学増幅ネガ型レジスト組成物及びパターン形成方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8859181B2 (https=) |
| EP (1) | EP2362267B1 (https=) |
| JP (1) | JP5007846B2 (https=) |
| KR (1) | KR101623604B1 (https=) |
| CN (1) | CN102253600B (https=) |
| TW (1) | TWI446113B (https=) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5585123B2 (ja) * | 2010-02-26 | 2014-09-10 | セントラル硝子株式会社 | 含フッ素不飽和カルボン酸オニウム塩類 |
| JP5561192B2 (ja) * | 2010-02-26 | 2014-07-30 | 信越化学工業株式会社 | 高分子化合物及びこれを用いた化学増幅ポジ型レジスト組成物並びにパターン形成方法 |
| JP5703197B2 (ja) * | 2011-01-18 | 2015-04-15 | 富士フイルム株式会社 | 化学増幅型レジスト組成物、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク、並びに、高分子化合物 |
| JP5365651B2 (ja) * | 2011-02-28 | 2013-12-11 | 信越化学工業株式会社 | 化学増幅ネガ型レジスト組成物及びパターン形成方法 |
| JP2013003512A (ja) * | 2011-06-21 | 2013-01-07 | Tokyo Ohka Kogyo Co Ltd | レジスト組成物及びレジストパターン形成方法 |
| JP5556765B2 (ja) * | 2011-08-05 | 2014-07-23 | 信越化学工業株式会社 | ＡｒＦ液浸露光用化学増幅ポジ型レジスト材料及びパターン形成方法 |
| JP5745368B2 (ja) * | 2011-09-02 | 2015-07-08 | 富士フイルム株式会社 | ネガ型感活性光線性又は感放射線性樹脂組成物、並びに、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク |
| JP5836256B2 (ja) * | 2011-11-30 | 2015-12-24 | 富士フイルム株式会社 | パターン形成方法、感活性光線性又は感放射線性樹脂組成物、レジスト膜、及び電子デバイスの製造方法 |
| JP6175226B2 (ja) * | 2012-09-28 | 2017-08-02 | 富士フイルム株式会社 | パターン形成方法、半導体製造用の感活性光線性又は感放射線性樹脂組成物、及び電子デバイスの製造方法 |
| JP5819810B2 (ja) * | 2012-12-18 | 2015-11-24 | 信越化学工業株式会社 | ネガ型レジスト材料及びこれを用いたパターン形成方法 |
| JP6088827B2 (ja) * | 2013-01-10 | 2017-03-01 | 富士フイルム株式会社 | ネガ型レジスト組成物、それを用いたレジスト膜及びパターン形成方法、並びにレジスト膜を備えたマスクブランクス |
| JP6010564B2 (ja) * | 2014-01-10 | 2016-10-19 | 信越化学工業株式会社 | 化学増幅型ネガ型レジスト組成物及びパターン形成方法 |
| JP6059675B2 (ja) * | 2014-03-24 | 2017-01-11 | 信越化学工業株式会社 | 化学増幅型ネガ型レジスト組成物及びレジストパターン形成方法 |
| US10345700B2 (en) * | 2014-09-08 | 2019-07-09 | International Business Machines Corporation | Negative-tone resist compositions and multifunctional polymers therein |
| JP6323302B2 (ja) * | 2014-11-07 | 2018-05-16 | 信越化学工業株式会社 | 新規オニウム塩化合物及びそれを用いたレジスト組成物並びにパターン形成方法 |
| JP6451469B2 (ja) * | 2015-04-07 | 2019-01-16 | 信越化学工業株式会社 | フォトマスクブランク、レジストパターン形成方法、及びフォトマスクの製造方法 |
| JP6531684B2 (ja) * | 2015-04-13 | 2019-06-19 | 信越化学工業株式会社 | 新規オニウム塩化合物を用いた化学増幅型ネガ型レジスト組成物及びレジストパターン形成方法 |
| JP6609193B2 (ja) * | 2016-01-25 | 2019-11-20 | 信越化学工業株式会社 | 高分子化合物、ネガ型レジスト組成物、積層体、パターン形成方法、及び化合物 |
| JP6743781B2 (ja) * | 2016-08-08 | 2020-08-19 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| US10191405B2 (en) * | 2016-11-11 | 2019-01-29 | Xerox Corporation | Electrostatic charging member |
| JP2018109701A (ja) * | 2017-01-04 | 2018-07-12 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ | 化学増幅型ポジ型フォトレジスト組成物およびそれを用いたパターン形成方法 |
| CN110582728B (zh) * | 2017-05-02 | 2023-11-17 | 日产化学株式会社 | 耐受过氧化氢水溶液的保护膜形成用组合物 |
| JP7334683B2 (ja) * | 2019-08-02 | 2023-08-29 | 信越化学工業株式会社 | ポジ型レジスト材料及びパターン形成方法 |
| JP7782480B2 (ja) * | 2022-02-04 | 2025-12-09 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0473547A1 (de) | 1990-08-27 | 1992-03-04 | Ciba-Geigy Ag | Olefinisch ungesättigte Oniumsalze |
| JPH09309874A (ja) | 1996-05-21 | 1997-12-02 | Fuji Photo Film Co Ltd | ポジ型感光性組成物 |
| JP4231622B2 (ja) | 2000-01-27 | 2009-03-04 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| TWI224713B (en) * | 2000-01-27 | 2004-12-01 | Fuji Photo Film Co Ltd | Positive photoresist composition |
| JP4244755B2 (ja) | 2003-09-09 | 2009-03-25 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| JP4396849B2 (ja) * | 2005-01-21 | 2010-01-13 | 信越化学工業株式会社 | ネガ型レジスト材料及びパターン形成方法 |
| JP4478589B2 (ja) | 2005-02-02 | 2010-06-09 | 富士フイルム株式会社 | ネガ型レジスト組成物及びそれを用いたパターン形成方法 |
| US7655378B2 (en) * | 2006-07-24 | 2010-02-02 | Shin-Etsu Chemical Co., Ltd. | Negative resist composition and patterning process using the same |
| JP4880523B2 (ja) * | 2006-07-24 | 2012-02-22 | 信越化学工業株式会社 | ネガ型レジスト材料及びこれを用いたパターン形成方法 |
| JP4784760B2 (ja) | 2006-10-20 | 2011-10-05 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| JP4893580B2 (ja) | 2006-10-27 | 2012-03-07 | 信越化学工業株式会社 | 重合性アニオンを有するスルホニウム塩及び高分子化合物、レジスト材料及びパターン形成方法 |
| US7569326B2 (en) * | 2006-10-27 | 2009-08-04 | Shin-Etsu Chemical Co., Ltd. | Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process |
| KR101417168B1 (ko) * | 2006-11-10 | 2014-07-08 | 제이에스알 가부시끼가이샤 | 중합성 술폰산 오늄염 및 수지 |
| US8003294B2 (en) * | 2007-03-09 | 2011-08-23 | Fujifilm Corporation | Photosensitive composition, compound used for photosensitive composition and pattern-forming method using photosensitive composition |
| JP4678383B2 (ja) | 2007-03-29 | 2011-04-27 | 信越化学工業株式会社 | 化学増幅ネガ型レジスト組成物及びパターン形成方法 |
| KR100985929B1 (ko) * | 2007-06-12 | 2010-10-06 | 샌트랄 글래스 컴퍼니 리미티드 | 불소 함유 화합물, 불소 함유 고분자 화합물, 포지티브형레지스트 조성물 및 이것을 사용한 패턴 형성방법 |
| KR100971066B1 (ko) * | 2007-06-29 | 2010-07-20 | 샌트랄 글래스 컴퍼니 리미티드 | 불소 함유 화합물, 불소 함유 고분자 화합물, 네거티브형레지스트 조성물 및 이것을 사용한 패턴 형성방법 |
| JP2010037259A (ja) * | 2008-08-04 | 2010-02-18 | Kuraray Co Ltd | 含窒素アクリル酸エステル誘導体の製造方法 |
| JP5401910B2 (ja) * | 2008-10-17 | 2014-01-29 | セントラル硝子株式会社 | 重合性アニオンを有する含フッ素スルホン塩類とその製造方法、含フッ素樹脂、レジスト組成物及びそれを用いたパターン形成方法 |
| JP5589281B2 (ja) * | 2008-12-25 | 2014-09-17 | セントラル硝子株式会社 | 含フッ素化合物、含フッ素高分子化合物、レジスト組成物及びそれを用いたパターン形成方法 |
| WO2010119910A1 (ja) * | 2009-04-15 | 2010-10-21 | Jsr株式会社 | 感放射線性樹脂組成物、それに用いる重合体及びそれに用いる化合物 |
| JP5126163B2 (ja) * | 2009-05-28 | 2013-01-23 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物、それに用いる重合体およびそれに用いる化合物 |
| JP5658932B2 (ja) * | 2009-07-14 | 2015-01-28 | 住友化学株式会社 | 新規化合物、レジスト組成物及びパターン形成方法 |
| JP5561192B2 (ja) * | 2010-02-26 | 2014-07-30 | 信越化学工業株式会社 | 高分子化合物及びこれを用いた化学増幅ポジ型レジスト組成物並びにパターン形成方法 |
| JP5585123B2 (ja) * | 2010-02-26 | 2014-09-10 | セントラル硝子株式会社 | 含フッ素不飽和カルボン酸オニウム塩類 |
-
2010
- 2010-02-26 JP JP2010041472A patent/JP5007846B2/ja active Active
-
2011
- 2011-02-24 US US13/033,647 patent/US8859181B2/en active Active
- 2011-02-25 EP EP11001591A patent/EP2362267B1/en active Active
- 2011-02-25 TW TW100106397A patent/TWI446113B/zh active
- 2011-02-25 KR KR1020110016896A patent/KR101623604B1/ko active Active
- 2011-02-25 CN CN201110141668.4A patent/CN102253600B/zh active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2011180185A5 (https=) | ||
| KR101945119B1 (ko) | 화학 증폭 네가티브형 레지스트 조성물 및 패턴 형성 방법 | |
| KR101517666B1 (ko) | 고분자 화합물 및 그것을 포함한 레지스트 재료, 패턴 형성 방법, 및 상기 고분자 화합물의 제조 방법 | |
| JP4583790B2 (ja) | ポジ型レジスト組成物及びそれを用いたレジストパターン形成方法 | |
| JP5445320B2 (ja) | 化学増幅型レジスト材料及びパターン形成方法 | |
| CN101470349B (zh) | 抗蚀剂组合物、抗蚀剂图案的形成方法、新型化合物以及产酸剂 | |
| KR101809314B1 (ko) | 술포늄염, 레지스트 조성물 및 레지스트 패턴 형성 방법 | |
| JP6059675B2 (ja) | 化学増幅型ネガ型レジスト組成物及びレジストパターン形成方法 | |
| JP7171601B2 (ja) | 光酸発生剤、レジスト組成物及び、該レジスト組成物を用いたデバイスの製造方法 | |
| US20120214100A1 (en) | Resist composition and patterning process using the same | |
| JP2017008068A (ja) | 塩基反応性光酸発生剤およびこれを含むフォトレジスト | |
| JP6142847B2 (ja) | 化学増幅型レジスト組成物及びパターン形成方法 | |
| KR20180034283A (ko) | 술포늄염, 레지스트 조성물 및 패턴 형성 방법 | |
| JP6046646B2 (ja) | オニウム塩、化学増幅型ポジ型レジスト組成物、及びパターン形成方法 | |
| KR20130056827A (ko) | 규소 화합물, 축합물 및 그것을 사용한 조성물, 및 그것을 사용하는 패턴 형성 방법 | |
| KR20180016986A (ko) | 감방사선성 조성물 | |
| JP2011013502A (ja) | レジスト組成物及びレジストパターン形成方法 | |
| US9329476B2 (en) | Chemically amplified negative resist composition and patterning process | |
| TW200821292A (en) | Compound, acid generator, resist composition, and resist pattern forming method | |
| JP4628809B2 (ja) | ネガ型レジスト組成物およびレジストパターン形成方法 | |
| TW200914473A (en) | Polymer compound, positive resist composition and resist pattern formation method | |
| WO2023053877A1 (ja) | 光酸発生剤、レジスト組成物及び、該レジスト組成物を用いたデバイスの製造方法 | |
| JP2008203612A (ja) | ネガ型レジスト組成物およびレジストパターン形成方法 | |
| JP2005258362A (ja) | 共重合体およびそれを用いた感放射線性樹脂組成物 | |
| JP2025130875A (ja) | ポリマー、化学増幅ネガ型レジスト組成物及びレジストパターン形成方法 |