JP2011179934A5 - - Google Patents

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Publication number
JP2011179934A5
JP2011179934A5 JP2010043690A JP2010043690A JP2011179934A5 JP 2011179934 A5 JP2011179934 A5 JP 2011179934A5 JP 2010043690 A JP2010043690 A JP 2010043690A JP 2010043690 A JP2010043690 A JP 2010043690A JP 2011179934 A5 JP2011179934 A5 JP 2011179934A5
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JP
Japan
Prior art keywords
wavelength
light beam
reference wavelength
interference
tunable laser
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JP2010043690A
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English (en)
Japanese (ja)
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JP5550384B2 (ja
JP2011179934A (ja
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Priority to JP2010043690A priority Critical patent/JP5550384B2/ja
Priority claimed from JP2010043690A external-priority patent/JP5550384B2/ja
Priority to US13/037,849 priority patent/US8502986B2/en
Publication of JP2011179934A publication Critical patent/JP2011179934A/ja
Publication of JP2011179934A5 publication Critical patent/JP2011179934A5/ja
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Publication of JP5550384B2 publication Critical patent/JP5550384B2/ja
Expired - Fee Related legal-status Critical Current
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JP2010043690A 2010-03-01 2010-03-01 光波干渉計測装置 Expired - Fee Related JP5550384B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2010043690A JP5550384B2 (ja) 2010-03-01 2010-03-01 光波干渉計測装置
US13/037,849 US8502986B2 (en) 2010-03-01 2011-03-01 Lightwave interference measurement apparatus that calculates absolute distance using lightwave interference

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010043690A JP5550384B2 (ja) 2010-03-01 2010-03-01 光波干渉計測装置

Publications (3)

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JP2011179934A JP2011179934A (ja) 2011-09-15
JP2011179934A5 true JP2011179934A5 (enExample) 2013-08-08
JP5550384B2 JP5550384B2 (ja) 2014-07-16

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JP2010043690A Expired - Fee Related JP5550384B2 (ja) 2010-03-01 2010-03-01 光波干渉計測装置

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US (1) US8502986B2 (enExample)
JP (1) JP5550384B2 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5572067B2 (ja) * 2010-11-09 2014-08-13 キヤノン株式会社 計測装置
JP2013064682A (ja) * 2011-09-20 2013-04-11 Canon Inc 計測装置
JP2013083581A (ja) * 2011-10-11 2013-05-09 Canon Inc 計測装置
JP2013181780A (ja) 2012-02-29 2013-09-12 Canon Inc 計測装置及び物品の製造方法
US10267709B2 (en) * 2012-05-07 2019-04-23 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Optical sensor interrogation system a method of manufacturing the optical sensor interrogation system
EP2662661A1 (de) 2012-05-07 2013-11-13 Leica Geosystems AG Messgerät mit einem Interferometer und einem ein dichtes Linienspektrum definierenden Absorptionsmedium
JP6537972B2 (ja) * 2012-12-20 2019-07-03 ファズ テクノロジー リミテッド 光システムにおいて周波数歪および偏光誘因効果を補償するシステムおよび方法
US9506739B2 (en) * 2012-12-21 2016-11-29 Magiq Technologies, Inc. Distance measurement by beating a varying test signal with reference signal having absolute frequency value predetermined with a specified accuracy
EP2806246B1 (en) * 2013-05-24 2019-11-20 Attocube Systems AG Dual laser interferometer
US10161768B2 (en) * 2014-07-30 2018-12-25 Luna Innovations Incorporated Methods and apparatus for interferometric interrogation of an optical sensor
CN104132676B (zh) * 2014-08-19 2016-06-08 中国工程物理研究院流体物理研究所 一种基于双fp腔的同轴分幅高速成像和干涉测量方法
WO2016154780A1 (zh) * 2015-03-27 2016-10-06 浙江理工大学 激光干涉波长杠杆式绝对距离测量装置与方法
CN105737733A (zh) * 2016-02-04 2016-07-06 浙江理工大学 一种大范围绝对距离测量中空气折射率的修正方法
WO2019149515A1 (en) 2018-01-31 2019-08-08 Asml Netherlands B.V. Wavelength tracking system, method to calibrate a wavelength tracking system, lithographic apparatus, method to determine an absolute position of a movable object, and interferometer system
CN110174058B (zh) * 2019-06-06 2020-06-23 浙江理工大学 动态偏频锁定式正弦频率扫描干涉绝对测距装置和方法
CN111609798B (zh) * 2020-05-12 2021-04-16 浙江理工大学 锁至动态边带的可变合成波长绝对距离测量装置与方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2808136B2 (ja) * 1989-06-07 1998-10-08 キヤノン株式会社 測長方法及び装置
JP2725434B2 (ja) 1990-03-30 1998-03-11 横河電機株式会社 Ｆｍヘテロダイン法を用いたアブソリュート測長方法およびアブソリュート測長器
JPH06117810A (ja) * 1991-05-28 1994-04-28 Yokogawa Electric Corp 外乱補正機能付きアブソリュ−ト測長器
DE4314486C2 (de) * 1993-05-03 1998-08-27 Heidenhain Gmbh Dr Johannes Absolutinterferometrisches Meßverfahren sowie dafür geeignete Laserinterferometeranordnung
JP3400503B2 (ja) * 1993-10-26 2003-04-28 松下電工株式会社 干渉測長器
DE19522262C2 (de) * 1995-06-20 1997-05-22 Zeiss Carl Jena Gmbh Heterodyn-Interferometer-Anordnung
JPH11183116A (ja) * 1997-12-18 1999-07-09 Nikon Corp 光波干渉測定方法および装置
JP3510569B2 (ja) * 2000-06-22 2004-03-29 三菱重工業株式会社 光周波数変調方式距離計
JP4198929B2 (ja) * 2002-03-27 2008-12-17 パイオニア株式会社 レーザ測長器及びレーザ測長方法
EP1906137A1 (en) * 2006-09-29 2008-04-02 Leica Geosystems AG Method and device for generating a synthetic wavelength
KR100951618B1 (ko) * 2008-02-19 2010-04-09 한국과학기술원 광주파수 발생기를 이용한 절대거리 측정방법 및 시스템
JP2010112768A (ja) * 2008-11-04 2010-05-20 Canon Inc 計測装置

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