JP2011173387A - 圧電素子、液体噴射ヘッド及び液体噴射装置 - Google Patents
圧電素子、液体噴射ヘッド及び液体噴射装置 Download PDFInfo
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Abstract
【解決手段】第1電極60と、第1電極60上に設けられた圧電体層70と、圧電体層70上に設けられたランタンニッケル酸化物からなる金属酸化膜200と、金属酸化膜200上に設けられた第2電極80とを備え、金属酸化膜200は、ペロブスカイト構造を有し、ニッケルに対するランタンのモル比を1.2〜1.5とする。
【選択図】図3
Description
かかる態様では、繰り返し駆動による飽和分極値の低下がほとんど無く、耐圧性に優れ、変位量も大きい圧電素子が提供される。
かかる態様では、金属酸化膜が1nm以上形成されていれば、圧電体層に第2電極を形成することにより圧電体層と第2電極との界面にダメージ層が形成されることが防止される。
かかる態様では、圧電素子の繰り返し駆動による変位低下を抑制し、長寿命化した液体噴射ヘッドを実現できる。
かかる態様では、長寿命化すると共に長期信頼性を向上した液体噴射装置を実現できる。
図1は、本発明の実施形態に係る液体噴射ヘッドの一例であるインクジェット式記録ヘッドの概略構成を示す分解斜視図であり、図2は、図1の平面図及びそのA−A′線断面図であり、図3は、図2の要部を拡大した図である。
上述した製造方法と同じ方法でインクジェット式記録ヘッドIを形成した。具体的には、チタン酸ジルコン酸鉛からなる圧電体層上にランタンニッケル酸化物からなる厚さが10nmの金属酸化膜200をスパッタリング法により250℃で、アルゴンと酸素の混合ガス(ガス流量比がO2/(Ar+O2)=50%)を用いて1.2Paのガス圧で形成した。また、第2電極として、厚さが40nmのイリジウムをスパッタリング法により、250℃で、約6kW/m2のパワー密度で形成した。
金属酸化膜200を形成する工程以外は、上述した実施例1と同じ材料、同じ製造方法で比較例1のインクジェット式記録ヘッドを形成した。具体的には、圧電体層上にイリジウムからなり厚さが50nmの第2電極80を形成した。
実施例、比較例の各インクジェット式記録ヘッドの圧電素子を繰り返し駆動して変位させた。このときの各インクジェット式記録ヘッドの圧力発生室に相対向しない領域における圧電素子の飽和分極値(最大分極値:Pm)を測定した。なお、本実施形態では、圧電素子を繰り返し駆動する駆動波形として、±25Vの電圧で、50kHzの周波数の矩形波を用いた。また、飽和分極値(Pm)の測定は、±35Vで、66Hzの三角波を繰り返し印加して測定した。この結果を図9に示す。なお、飽和分極値(Pm)は、繰り返し変位前の初期状態のPmを100%として、初期状態に対する比率を求めている。
以上、本発明の一実施形態を説明したが、本発明の基本的な構成は上述したものに限定されるものではない。例えば、上述した実施形態1では、流路形成基板10として、シリコン単結晶基板を例示したが、特にこれに限定されず、例えば、SOI基板、ガラス等の材料を用いるようにしてもよい。
Claims (5)
- 第1電極と、前記第1電極上に設けられた圧電体層と、前記圧電体層上に設けられた金属酸化膜と、前記金属酸化膜上に設けられた第2電極とを備え、
前記金属酸化膜は、ペロブスカイト構造を有し、ニッケルに対するランタンのモル比が1.2〜1.5であるランタンニッケル酸化物からなる
ことを特徴とする圧電素子。 - 請求項1に記載する圧電素子において、
前記金属酸化膜は、1nm以上である
ことを特徴とする圧電素子。 - 請求項1又は請求項2に記載する圧電素子において、
前記第1電極は、プラチナ又はイリジウムを主成分とする
ことを特徴とする圧電素子。 - 請求項1〜請求項3の何れか一項に記載の圧電素子を、液体を噴射するノズル開口に連通する圧力発生室に圧力変化を生じさせる圧力発生手段として具備する
ことを特徴とする液体噴射ヘッド。 - 請求項4に記載する液体噴射ヘッドを具備することを特徴とする液体噴射装置。
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US13/033,494 US20110205310A1 (en) | 2010-02-25 | 2011-02-23 | Piezoelectric device, liquid ejecting head, and liquid ejecting apparatus |
CN2011100468535A CN102189791A (zh) | 2010-02-25 | 2011-02-24 | 压电元件、液体喷射头及液体喷射装置 |
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CN112968123B (zh) * | 2021-02-04 | 2022-11-04 | 电子科技大学 | 一种柔性薄膜式压电声发射传感器及其制作方法 |
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JP2006269958A (ja) * | 2005-03-25 | 2006-10-05 | Seiko Epson Corp | 圧電素子およびその製造方法、インクジェット式記録ヘッド、並びに、インクジェットプリンタ |
JP2007134566A (ja) * | 2005-11-11 | 2007-05-31 | Seiko Epson Corp | 圧電材料、圧電素子、圧電アクチュエータ、液体噴射ヘッド、表面弾性波素子およびデバイス |
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JP3102481B1 (ja) * | 1998-06-08 | 2000-10-23 | セイコーエプソン株式会社 | インクジェット式記録ヘッド及びインクジェット式記録装置 |
EP0963846B1 (en) * | 1998-06-08 | 2005-08-31 | Seiko Epson Corporation | Ink jet recording head and ink jet recording apparatus |
CN100546064C (zh) * | 2005-07-08 | 2009-09-30 | 精工爱普生株式会社 | 致动器装置、液体喷射头以及液体喷射装置 |
JP4553143B2 (ja) * | 2006-02-24 | 2010-09-29 | セイコーエプソン株式会社 | 圧電アクチュエータの製造方法、インクジェット式記録ヘッド |
CN101544113A (zh) * | 2008-03-27 | 2009-09-30 | 精工爱普生株式会社 | 液体喷射头、液体喷射装置、以及执行器 |
JP4662084B2 (ja) * | 2008-07-25 | 2011-03-30 | セイコーエプソン株式会社 | 液体吐出ヘッドおよび液体噴射装置 |
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JP2006269958A (ja) * | 2005-03-25 | 2006-10-05 | Seiko Epson Corp | 圧電素子およびその製造方法、インクジェット式記録ヘッド、並びに、インクジェットプリンタ |
JP2007134566A (ja) * | 2005-11-11 | 2007-05-31 | Seiko Epson Corp | 圧電材料、圧電素子、圧電アクチュエータ、液体噴射ヘッド、表面弾性波素子およびデバイス |
JP2010030077A (ja) * | 2008-07-25 | 2010-02-12 | Seiko Epson Corp | 液体吐出ヘッドの製造方法 |
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