JP2011162363A - ジボランの製造方法 - Google Patents
ジボランの製造方法 Download PDFInfo
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- JP2011162363A JP2011162363A JP2010023738A JP2010023738A JP2011162363A JP 2011162363 A JP2011162363 A JP 2011162363A JP 2010023738 A JP2010023738 A JP 2010023738A JP 2010023738 A JP2010023738 A JP 2010023738A JP 2011162363 A JP2011162363 A JP 2011162363A
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- diborane
- acid
- sodium borohydride
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 19
- 239000012279 sodium borohydride Substances 0.000 claims abstract description 27
- 229910000033 sodium borohydride Inorganic materials 0.000 claims abstract description 27
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 claims abstract description 22
- 239000002253 acid Substances 0.000 claims abstract description 21
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 17
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 5
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 5
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 2
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 abstract description 32
- 239000002904 solvent Substances 0.000 abstract description 26
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 abstract description 22
- 229940050176 methyl chloride Drugs 0.000 abstract description 16
- 239000012535 impurity Substances 0.000 abstract description 15
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 238000007796 conventional method Methods 0.000 abstract description 2
- 238000006243 chemical reaction Methods 0.000 description 72
- 239000007789 gas Substances 0.000 description 22
- 239000007806 chemical reaction intermediate Substances 0.000 description 12
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 10
- 238000007664 blowing Methods 0.000 description 9
- 239000011261 inert gas Substances 0.000 description 9
- 239000012071 phase Substances 0.000 description 7
- 239000001307 helium Substances 0.000 description 6
- 229910052734 helium Inorganic materials 0.000 description 6
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 239000011780 sodium chloride Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical class B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 3
- 238000005755 formation reaction Methods 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229910000085 borane Inorganic materials 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- YVYNLIHIATTZSH-UHFFFAOYSA-N [Na+].Cl[Cl-]Cl Chemical compound [Na+].Cl[Cl-]Cl YVYNLIHIATTZSH-UHFFFAOYSA-N 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- -1 boric acid ester Chemical class 0.000 description 1
- 239000005380 borophosphosilicate glass Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- ZOCHARZZJNPSEU-UHFFFAOYSA-N diboron Chemical compound B#B ZOCHARZZJNPSEU-UHFFFAOYSA-N 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000003380 propellant Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Abstract
例えば、半導体の製造に用いられるジボランには高品質のものが要求される。しかし、従来の方法で得られるジボランは不純物として塩化メチル(CH3Cl)およびメタン(CH4)を含むため、純度、収率を十分に向上することができない。本発明によれば、不純物である塩化メチルを発生することなく純度の高いジボランを収率よく得ることができ、さらにリサイクル可能な溶媒の歩留まりを向上することができることから工業的に有利なジボランの製造方法を提供することができる。
【解決手段】
ソジウムボロハイドライドと三塩化ホウ素とを反応させた後、更に酸を反応させるジボランの製造方法。
【選択図】なし
Description
6NaB2H7+2BCl3→7B2H6+6NaCl (2)
3NaBH4+BCl3→2B2H6+3NaCl (3)
ソジウムボロハイドライドが反応系内にある間は、発生した塩化メチルは比較的速やかにメタンにまで還元される。
2NaB2H7+H2SO4→2B2H6+Na2SO4+2H2 (5)
本発明においては、第2段目の反応において、三塩化ホウ素を用いることなく、ソジウムボロハイドライドは、消費され尽くされているので、溶媒が分解して塩化メチルが副生することなく、ジボランを得ることができる。また、溶媒の分解による不純物の発生を抑えられる結果、リサイクル可能な溶媒の歩留まりを向上できる。
これは、そのモル比が0.12未満では、最終収率が低下し、0.16を超えても効果に変化はないことに拠る。
反応器の内容積が10Lで、反応器出口に−50℃に冷却した還流冷却器を備え、その後に約−78℃に冷却した第1コールドトラップおよび約−196℃に冷却した第2コールドトラップを備えたステンレス(SUS304)製電磁撹拌式反応器を用い、本発明方法を以下の条件下で実施した。
実施例1と同様にして第1段階の反応を行なった。第1段階の反応終了後、ヘリウムガスで系内の気相領域の雰囲気を置換した後に反応液温を昇温して40℃とし、さらに三塩化ホウ素294.6g(2.51モル、ソジウムボロハイドライドに対するモル比0.19)を90分で吹き込み、第2段階の反応を行った。その後、実施例1と同様にして、純度、メタン含有率、および塩化メチル含有率を求めた。さらに、反応後の溶媒をろ過し、副生した塩化ナトリウム(NaCl)を除去し、溶媒の回収量を求めた。以下の表1に求めた各値を示す。
Claims (2)
- ソジウムボロハイドライドと三塩化ホウ素とを反応させた後、更に酸を反応させるジボランの製造方法。
- 前記酸が、塩化水素、硫酸およびリン酸からなる群から選ばれる少なくとも1種である請求項1に記載のジボランの製造方法。
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Cited By (2)
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CN110627820A (zh) * | 2019-09-25 | 2019-12-31 | 博纯材料股份有限公司 | 一种乙硼烷合成系统及其方法 |
CN113120862A (zh) * | 2021-04-21 | 2021-07-16 | 沧州华宇特种气体科技有限公司 | 一种连续生产高纯乙硼烷的方法 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN110627820A (zh) * | 2019-09-25 | 2019-12-31 | 博纯材料股份有限公司 | 一种乙硼烷合成系统及其方法 |
CN110627820B (zh) * | 2019-09-25 | 2021-12-14 | 博纯材料股份有限公司 | 一种乙硼烷合成系统及其方法 |
CN113120862A (zh) * | 2021-04-21 | 2021-07-16 | 沧州华宇特种气体科技有限公司 | 一种连续生产高纯乙硼烷的方法 |
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