JP2011154052A - 光導波路形成用液状樹脂組成物およびそれを用いた光導波路、ならびにその光導波路の製法 - Google Patents
光導波路形成用液状樹脂組成物およびそれを用いた光導波路、ならびにその光導波路の製法 Download PDFInfo
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- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
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- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
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- G—PHYSICS
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- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12035—Materials
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Abstract
【解決手段】下記の(A)を主成分とし、下記の(B)および(C)成分を含有する光導波路形成用液状樹脂組成物である。
(A)1分子中に複数の(メタ)アクリル基を有する(メタ)アクリレートポリマー。
(B)1分子中に複数のチオール基を有する液状チオールモノマー。
(C)光重合開始剤。
【選択図】なし
Description
(A)1分子中に複数の(メタ)アクリル基を有する(メタ)アクリレートポリマー。
(B)1分子中に複数のチオール基を有する液状チオールモノマー。
(C)光重合開始剤。
ビスフェノールAジメタクリレートとジ酸無水物との共重合体(FNR−019、ナガセケムテックス社製)
ペンタエリスリトールテトラキス(3−メルカプトプロピオネート)(PEMP)(堺化学工業社製)
エトキシ化ビスフェノールAジアクリレート(ABE−300、新中村化学工業社製)
2−メチル−1−〔4−(メチルチオ)フェニル〕−2−モリフォリノプロパン−1−オン(イルガキュア907、長瀬産業社製)
1−ヒドロキシ−シクロヘキシル−フェニル−ケトン(イルガキュア184、長瀬産業社製)
遮光性褐色瓶中に、上記メタクリレートポリマー56%の酢酸ブチル溶液10g(ポリマー含量5.6g)と、上記液状チオールモノマー0.28gと、上記光重合開始剤(i) 0.06gと、上記光重合開始剤(ii)0.6gとを配合し、これらを常温下にて混合し、溶解させ、光導波路形成用樹脂組成物(ワニス)を得た。
遮光性褐色瓶中に、上記メタクリレートポリマー56%の酢酸ブチル溶液10g(ポリマー含量5.6g)と、上記液状チオールモノマー0.17gと、上記光重合開始剤(i) 0.06gと、上記光重合開始剤(ii)0.6gと、上記アクリレートモノマー0.11gとを配合し、これらを常温下にて混合し、溶解させ、光導波路形成用樹脂組成物(ワニス)を得た。そして、実施例1と同様の方法で、コア層の作製を行った。
遮光性褐色瓶中に、上記メタクリレートポリマー56%の酢酸ブチル溶液10g(ポリマー含量5.6g)と、上記アクリレートモノマー0.28gと、上記光重合開始剤(i) 0.06gと、上記光重合開始剤(ii)0.6gとを配合し、これらを常温下にて混合し、溶解させ、光導波路形成用樹脂組成物(ワニス)を得た。そして、実施例1と同様の方法で、コア層の作製を行った。
光導波路形成用樹脂組成物(ワニス)を、塗工乾燥させて未硬化フィルムを作製した。そして、その表面のタック性を、指触試験にて確認した。すなわち、タック性(表面粘着性)が認められたものを×、タック性が認められなかったものを○と評価した。
前記のように低露光量(500mJ/cm2 )で作製したコア層のパターニングの断面形状を、顕微鏡写真にとり、その写真から、コア層の断面凸部が略直角のエッジ形状を有していることがはっきりと確認されたものを○、エッジ形状が明確には確認されなかったものを×と評価した。
Claims (4)
- 下記の(A)を主成分とし、下記の(B)および(C)成分を含有することを特徴とする光導波路形成用液状樹脂組成物。
(A)1分子中に複数の(メタ)アクリル基を有する(メタ)アクリレートポリマー。
(B)1分子中に複数のチオール基を有する液状チオールモノマー。
(C)光重合開始剤。 - 上記(A)成分の(メタ)アクリレートポリマー100重量部に対して、(B)成分のチオールモノマーの含有割合が1〜10重量部の範囲に設定されている請求項1記載の光導波路形成用液状樹脂組成物。
- 光信号を伝搬するコア部と、クラッド部とを備えた光導波路であって、上記クラッド部およびコア部の少なくとも一方が、請求項1または2記載の樹脂組成物からなることを特徴とする光導波路。
- ロール・トゥ・ロール方式で光導波路を連続的に製造する方法であって、第1のロールから繰り出された屈曲性基材上に、請求項1または2記載の樹脂組成物を塗工して塗膜層を形成する工程と、上記塗膜層に所定パターンで紫外線照射し、その照射領域を硬化させて、光導波路のコア部を形成する工程と、上記工程を経由して得られた光導波路を第2のロールに巻き取る工程とを備えたことを特徴とする光導波路の製法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010013668A JP5411723B2 (ja) | 2010-01-25 | 2010-01-25 | 光導波路形成用液状樹脂組成物およびそれを用いた光導波路、ならびにその光導波路の製法 |
TW100100306A TWI480291B (zh) | 2010-01-25 | 2011-01-05 | 光波導形成用液狀樹脂組成物及使用其之光波導、以及該光波導之製法 |
US12/985,711 US8901196B2 (en) | 2010-01-25 | 2011-01-06 | Liquid resin composition for production of optical waveguide, optical waveguide produced by using the liquid resin composition, and production method of the optical waveguide |
KR1020110004879A KR101775729B1 (ko) | 2010-01-25 | 2011-01-18 | 광 도파로 형성용 액상 수지 조성물 및 그것을 이용한 광 도파로, 및 그 광 도파로의 제법 |
CN201110022475.7A CN102134429B (zh) | 2010-01-25 | 2011-01-18 | 光波导形成用液态树脂组合物和光波导及其制造方法 |
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JP2010013668A JP5411723B2 (ja) | 2010-01-25 | 2010-01-25 | 光導波路形成用液状樹脂組成物およびそれを用いた光導波路、ならびにその光導波路の製法 |
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JP2011154052A true JP2011154052A (ja) | 2011-08-11 |
JP5411723B2 JP5411723B2 (ja) | 2014-02-12 |
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JP2010013668A Active JP5411723B2 (ja) | 2010-01-25 | 2010-01-25 | 光導波路形成用液状樹脂組成物およびそれを用いた光導波路、ならびにその光導波路の製法 |
Country Status (5)
Country | Link |
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US (1) | US8901196B2 (ja) |
JP (1) | JP5411723B2 (ja) |
KR (1) | KR101775729B1 (ja) |
CN (1) | CN102134429B (ja) |
TW (1) | TWI480291B (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130163941A1 (en) * | 2011-12-26 | 2013-06-27 | Nitto Denko Corporation | Resin composition for forming optical waveguide and optical waveguide using the composition |
WO2020196819A1 (ja) * | 2019-03-27 | 2020-10-01 | 株式会社Adeka | 硬化性樹脂組成物 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6007981B2 (ja) * | 2012-06-25 | 2016-10-19 | Jsr株式会社 | 硬化性組成物、硬化膜及び表示素子 |
WO2021118525A1 (en) * | 2019-12-09 | 2021-06-17 | Ares Materials Inc. | Optically clear resin composition, flexible optical film and image display device |
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JPH01182314A (ja) * | 1988-01-14 | 1989-07-20 | Mitsubishi Gas Chem Co Inc | 高アッベ数レンズ用組成物 |
JP2006047506A (ja) * | 2004-08-02 | 2006-02-16 | Nitto Denko Corp | 光導波路の製造方法 |
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2010
- 2010-01-25 JP JP2010013668A patent/JP5411723B2/ja active Active
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2011
- 2011-01-05 TW TW100100306A patent/TWI480291B/zh active
- 2011-01-06 US US12/985,711 patent/US8901196B2/en active Active
- 2011-01-18 CN CN201110022475.7A patent/CN102134429B/zh active Active
- 2011-01-18 KR KR1020110004879A patent/KR101775729B1/ko not_active Application Discontinuation
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JPH01182314A (ja) * | 1988-01-14 | 1989-07-20 | Mitsubishi Gas Chem Co Inc | 高アッベ数レンズ用組成物 |
JP2006047506A (ja) * | 2004-08-02 | 2006-02-16 | Nitto Denko Corp | 光導波路の製造方法 |
JP2007269969A (ja) * | 2006-03-31 | 2007-10-18 | Nof Corp | 光硬化性樹脂組成物 |
JP2008285648A (ja) * | 2006-12-25 | 2008-11-27 | Osaka Gas Co Ltd | フルオレン骨格を有するウレタン(メタ)アクリレート |
JP2009260231A (ja) * | 2008-03-28 | 2009-11-05 | Hitachi Chem Co Ltd | 光電気複合基板の製造方法、これによって製造される光電気複合基板、及びこれを用いた光電気複合モジュール |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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US20130163941A1 (en) * | 2011-12-26 | 2013-06-27 | Nitto Denko Corporation | Resin composition for forming optical waveguide and optical waveguide using the composition |
US9034566B2 (en) * | 2011-12-26 | 2015-05-19 | Nitto Denko Corporation | Resin composition for forming optical waveguide and optical waveguide using the composition |
WO2020196819A1 (ja) * | 2019-03-27 | 2020-10-01 | 株式会社Adeka | 硬化性樹脂組成物 |
Also Published As
Publication number | Publication date |
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US20110182555A1 (en) | 2011-07-28 |
CN102134429B (zh) | 2014-11-12 |
US8901196B2 (en) | 2014-12-02 |
TWI480291B (zh) | 2015-04-11 |
CN102134429A (zh) | 2011-07-27 |
TW201129587A (en) | 2011-09-01 |
KR101775729B1 (ko) | 2017-09-06 |
JP5411723B2 (ja) | 2014-02-12 |
KR20110087216A (ko) | 2011-08-02 |
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