JP2011139015A5 - - Google Patents
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- Publication number
- JP2011139015A5 JP2011139015A5 JP2010144572A JP2010144572A JP2011139015A5 JP 2011139015 A5 JP2011139015 A5 JP 2011139015A5 JP 2010144572 A JP2010144572 A JP 2010144572A JP 2010144572 A JP2010144572 A JP 2010144572A JP 2011139015 A5 JP2011139015 A5 JP 2011139015A5
- Authority
- JP
- Japan
- Prior art keywords
- rotating
- levitation
- processing apparatus
- rotation
- rotary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005339 levitation Methods 0.000 claims description 45
- 238000005259 measurement Methods 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 16
- 230000005291 magnetic effect Effects 0.000 claims description 14
- 238000001514 detection method Methods 0.000 claims description 10
- 238000005422 blasting Methods 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 4
- 230000003746 surface roughness Effects 0.000 claims description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 2
- 235000011089 carbon dioxide Nutrition 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 238000005530 etching Methods 0.000 claims description 2
- 239000003302 ferromagnetic material Substances 0.000 claims description 2
- 239000011521 glass Substances 0.000 claims description 2
- 239000000696 magnetic material Substances 0.000 claims 3
- 238000011017 operating method Methods 0.000 claims 2
- 238000001179 sorption measurement Methods 0.000 claims 2
- 239000003463 adsorbent Substances 0.000 claims 1
- 230000007423 decrease Effects 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010144572A JP5533335B2 (ja) | 2009-07-22 | 2010-06-25 | 処理装置及びその動作方法 |
| PCT/JP2010/062243 WO2011010661A1 (ja) | 2009-07-22 | 2010-07-21 | 処理装置及びその動作方法 |
| TW099123959A TW201120985A (en) | 2009-07-22 | 2010-07-21 | Treatment device and method for operating same |
| CN2010800331377A CN102473670A (zh) | 2009-07-22 | 2010-07-21 | 处理装置及其动作方法 |
| US13/386,572 US20120118504A1 (en) | 2009-07-22 | 2010-07-21 | Processing apparatus and method for operating same |
| KR1020127001941A KR20120030564A (ko) | 2009-07-22 | 2010-07-21 | 처리 장치 및 그 동작 방법 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009171558 | 2009-07-22 | ||
| JP2009171558 | 2009-07-22 | ||
| JP2009274987 | 2009-12-02 | ||
| JP2009274987 | 2009-12-02 | ||
| JP2010144572A JP5533335B2 (ja) | 2009-07-22 | 2010-06-25 | 処理装置及びその動作方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011139015A JP2011139015A (ja) | 2011-07-14 |
| JP2011139015A5 true JP2011139015A5 (cg-RX-API-DMAC7.html) | 2013-05-23 |
| JP5533335B2 JP5533335B2 (ja) | 2014-06-25 |
Family
ID=43499133
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010144572A Active JP5533335B2 (ja) | 2009-07-22 | 2010-06-25 | 処理装置及びその動作方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20120118504A1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP5533335B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR20120030564A (cg-RX-API-DMAC7.html) |
| CN (1) | CN102473670A (cg-RX-API-DMAC7.html) |
| TW (1) | TW201120985A (cg-RX-API-DMAC7.html) |
| WO (1) | WO2011010661A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9548223B2 (en) * | 2011-12-23 | 2017-01-17 | Lam Research Ag | Apparatus for treating surfaces of wafer-shaped articles |
| JP5937850B2 (ja) * | 2012-02-29 | 2016-06-22 | 株式会社ブリヂストン | 研削方法 |
| JP6010398B2 (ja) * | 2012-08-31 | 2016-10-19 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置 |
| JP5936505B2 (ja) * | 2012-09-25 | 2016-06-22 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置 |
| JP5973299B2 (ja) * | 2012-09-25 | 2016-08-23 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置 |
| KR101512560B1 (ko) | 2012-08-31 | 2015-04-15 | 가부시키가이샤 스크린 홀딩스 | 기판처리장치 |
| JP5973300B2 (ja) * | 2012-09-25 | 2016-08-23 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置 |
| CN104425331B (zh) * | 2013-09-09 | 2017-09-29 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 转盘定位装置、装载传输系统及等离子体加工设备 |
| US10600673B2 (en) * | 2015-07-07 | 2020-03-24 | Asm Ip Holding B.V. | Magnetic susceptor to baseplate seal |
| CN107022754B (zh) * | 2016-02-02 | 2020-06-02 | 东京毅力科创株式会社 | 基板处理装置 |
| JP6559347B2 (ja) * | 2016-06-23 | 2019-08-14 | 株式会社アルバック | 保持装置 |
| CN106637141B (zh) * | 2017-01-20 | 2019-08-27 | 广东爱康太阳能科技有限公司 | 一种太阳能电池镀膜石墨舟片及石墨舟 |
| JP6763321B2 (ja) * | 2017-03-01 | 2020-09-30 | 東京エレクトロン株式会社 | 自転検出用冶具、基板処理装置及び基板処理装置の運転方法 |
| EP3413340B1 (en) | 2017-06-08 | 2021-11-17 | Brooks Automation (Germany) GmbH | Method for inspecting a container and inspection system |
| JP7448534B2 (ja) * | 2018-11-05 | 2024-03-12 | アプライド マテリアルズ インコーポレイテッド | 磁気ハウジングシステム |
| KR102721972B1 (ko) * | 2019-07-08 | 2024-10-29 | 삼성전자주식회사 | 회전체 모듈 및 이를 구비하는 화학 기계적 연마 장치 |
| KR20210113043A (ko) * | 2020-03-04 | 2021-09-15 | 에이에스엠 아이피 홀딩 비.브이. | 반응기 시스템용 정렬 고정구 |
| CN115679294A (zh) * | 2021-07-23 | 2023-02-03 | 北京北方华创微电子装备有限公司 | 半导体工艺腔室及半导体工艺设备 |
| KR102766145B1 (ko) * | 2021-12-16 | 2025-02-12 | 에이피시스템 주식회사 | 자기부상 회전 장치 및 자기부상 회전 방법 |
| KR102424176B1 (ko) * | 2021-12-17 | 2022-07-25 | 김상조 | 자기부상 회전 장치 및 이를 포함하는 진공 처리 장치 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3930157A1 (de) * | 1989-09-09 | 1991-03-21 | Bosch Gmbh Robert | Einrichtung zur verstellung der drehwinkelzuordnung einer nockenwelle zu ihrem antriebselement |
| JP2001524259A (ja) * | 1995-07-10 | 2001-11-27 | シーヴィシー、プラダクツ、インク | マイクロエレクトロニクス製造装置用プログラマブル超クリーン電磁サブストレート回転装置及び方法 |
| US5818137A (en) * | 1995-10-26 | 1998-10-06 | Satcon Technology, Inc. | Integrated magnetic levitation and rotation system |
| JP3035577B2 (ja) * | 1997-03-04 | 2000-04-24 | オムロン株式会社 | 距離センサ装置 |
| US6157106A (en) * | 1997-05-16 | 2000-12-05 | Applied Materials, Inc. | Magnetically-levitated rotor system for an RTP chamber |
| JP3923696B2 (ja) * | 1999-07-19 | 2007-06-06 | 株式会社荏原製作所 | 基板回転装置 |
| JP2001090967A (ja) * | 1999-09-27 | 2001-04-03 | Matsushita Electric Works Ltd | 床暖房パネル構造 |
| WO2001082348A1 (en) * | 2000-04-20 | 2001-11-01 | Tokyo Electron Limited | Thermal processing system |
| JP2001351874A (ja) * | 2000-06-09 | 2001-12-21 | Ebara Corp | 基板回転装置 |
| JP2002016125A (ja) * | 2000-06-29 | 2002-01-18 | Ebara Corp | 基板回転装置 |
| US6437290B1 (en) * | 2000-08-17 | 2002-08-20 | Tokyo Electron Limited | Heat treatment apparatus having a thin light-transmitting window |
| JP2002093724A (ja) * | 2000-09-18 | 2002-03-29 | Tokyo Electron Ltd | 熱処理装置 |
| EP1244152A3 (en) * | 2001-01-26 | 2008-12-03 | Toyoda Gosei Co., Ltd. | Reflective light emitting diode, reflective optical device and its manufacturing method |
| US6770146B2 (en) * | 2001-02-02 | 2004-08-03 | Mattson Technology, Inc. | Method and system for rotating a semiconductor wafer in processing chambers |
| JP4867074B2 (ja) * | 2001-03-15 | 2012-02-01 | 東京エレクトロン株式会社 | 枚葉式の処理装置 |
| JP2003322852A (ja) * | 2002-05-07 | 2003-11-14 | Nitto Denko Corp | 反射型液晶表示装置及び光学フィルム |
| JP4575202B2 (ja) * | 2005-03-24 | 2010-11-04 | 日本板硝子株式会社 | 透明板状体の欠点検査方法及び欠点検査装置 |
| JP4979472B2 (ja) * | 2007-06-05 | 2012-07-18 | 東京エレクトロン株式会社 | 処理装置 |
| US8974632B2 (en) * | 2011-11-30 | 2015-03-10 | Lam Research Ag | Device and method for treating wafer-shaped articles |
-
2010
- 2010-06-25 JP JP2010144572A patent/JP5533335B2/ja active Active
- 2010-07-21 WO PCT/JP2010/062243 patent/WO2011010661A1/ja not_active Ceased
- 2010-07-21 CN CN2010800331377A patent/CN102473670A/zh active Pending
- 2010-07-21 KR KR1020127001941A patent/KR20120030564A/ko not_active Abandoned
- 2010-07-21 TW TW099123959A patent/TW201120985A/zh unknown
- 2010-07-21 US US13/386,572 patent/US20120118504A1/en not_active Abandoned