JP2011076094A5 - - Google Patents

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Publication number
JP2011076094A5
JP2011076094A5 JP2010234941A JP2010234941A JP2011076094A5 JP 2011076094 A5 JP2011076094 A5 JP 2011076094A5 JP 2010234941 A JP2010234941 A JP 2010234941A JP 2010234941 A JP2010234941 A JP 2010234941A JP 2011076094 A5 JP2011076094 A5 JP 2011076094A5
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JP
Japan
Prior art keywords
illumination
concave mirror
objective
projection objective
entrance pupil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010234941A
Other languages
English (en)
Japanese (ja)
Other versions
JP4921580B2 (ja
JP2011076094A (ja
Filing date
Publication date
Priority claimed from DE102009045217A external-priority patent/DE102009045217B3/de
Application filed filed Critical
Publication of JP2011076094A publication Critical patent/JP2011076094A/ja
Publication of JP2011076094A5 publication Critical patent/JP2011076094A5/ja
Application granted granted Critical
Publication of JP4921580B2 publication Critical patent/JP4921580B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010234941A 2009-09-30 2010-09-30 反射屈折投影対物系 Expired - Fee Related JP4921580B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102009045217A DE102009045217B3 (de) 2009-09-30 2009-09-30 Katadioptrisches Projektionsobjektiv
DE102009045217.6 2009-09-30

Publications (3)

Publication Number Publication Date
JP2011076094A JP2011076094A (ja) 2011-04-14
JP2011076094A5 true JP2011076094A5 (enExample) 2011-05-26
JP4921580B2 JP4921580B2 (ja) 2012-04-25

Family

ID=43705894

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010234941A Expired - Fee Related JP4921580B2 (ja) 2009-09-30 2010-09-30 反射屈折投影対物系

Country Status (6)

Country Link
US (1) US8300211B2 (enExample)
JP (1) JP4921580B2 (enExample)
KR (1) KR101083942B1 (enExample)
CN (1) CN102033299B (enExample)
DE (1) DE102009045217B3 (enExample)
TW (1) TWI391705B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9274311B2 (en) * 2014-01-13 2016-03-01 Genius Electronic Optical Co., Ltd. Compact narrow field of view lenses for mobile devices
CN105652606B (zh) * 2016-04-05 2017-10-10 北京理工大学 一种折反式深紫外光刻物镜设计方法
KR102798253B1 (ko) * 2020-02-25 2025-04-18 가부시키가이샤 니콘 광학 지연 시스템

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6600608B1 (en) 1999-11-05 2003-07-29 Carl-Zeiss-Stiftung Catadioptric objective comprising two intermediate images
US7301605B2 (en) 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
TWI249082B (en) 2002-08-23 2006-02-11 Nikon Corp Projection optical system and method for photolithography and exposure apparatus and method using same
KR101547077B1 (ko) 2003-04-09 2015-08-25 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2005039211A (ja) 2003-06-30 2005-02-10 Canon Inc 投影光学系、露光装置及びデバイスの製造方法
TWI282487B (en) 2003-05-23 2007-06-11 Canon Kk Projection optical system, exposure apparatus, and device manufacturing method
JP4717813B2 (ja) 2003-09-12 2011-07-06 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光設備のための照明系
DE10343333A1 (de) * 2003-09-12 2005-04-14 Carl Zeiss Smt Ag Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage
KR101150037B1 (ko) 2004-01-14 2012-07-02 칼 짜이스 에스엠티 게엠베하 반사굴절식 투영 대물렌즈
CN101727021A (zh) 2004-02-13 2010-06-09 卡尔蔡司Smt股份公司 微平版印刷投影曝光装置的投影物镜
JP4864869B2 (ja) 2004-02-26 2012-02-01 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置のための照明系
US7046339B2 (en) 2004-03-05 2006-05-16 Micron Technology, Inc. Optimized optical lithography illumination source for use during the manufacture of a semiconductor device
KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7283205B2 (en) 2005-01-19 2007-10-16 Micron Technology, Inc. Optimized optical lithography illumination source for use during the manufacture of a semiconductor device
DE102006027787A1 (de) 2005-07-05 2007-01-18 Carl Zeiss Smt Ag Projektionsbelichtungsanlage und Betriebsmethode dieser
EP1986220A4 (en) 2006-02-16 2010-08-18 Nikon Corp OPTICAL PROJECTION SYSTEM, EXPOSURE DEVICE AND METHOD, DISPLAY MANUFACTURING METHOD, MASK, AND MASK MANUFACTURING METHOD
DE102006022958A1 (de) 2006-05-11 2007-11-22 Carl Zeiss Smt Ag Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs
TWI297767B (en) * 2006-05-30 2008-06-11 Nat Univ Tsing Hua Measuring apparatus and method using surface plasmon resonance
US7557997B2 (en) 2006-09-28 2009-07-07 Nikon Corporation Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element
WO2008086827A1 (en) 2007-01-16 2008-07-24 Carl Zeiss Smt Ag Projection exposure method and projection exposure system therefor
US7929115B2 (en) 2007-06-01 2011-04-19 Carl Zeiss Smt Gmbh Projection objective and projection exposure apparatus for microlithography
US7760425B2 (en) 2007-09-05 2010-07-20 Carl Zeiss Smt Ag Chromatically corrected catadioptric objective and projection exposure apparatus including the same
ATE532105T1 (de) 2007-12-21 2011-11-15 Zeiss Carl Smt Gmbh Beleuchtungsmethode

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