JP2017526969A5 - - Google Patents
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- Publication number
- JP2017526969A5 JP2017526969A5 JP2017511203A JP2017511203A JP2017526969A5 JP 2017526969 A5 JP2017526969 A5 JP 2017526969A5 JP 2017511203 A JP2017511203 A JP 2017511203A JP 2017511203 A JP2017511203 A JP 2017511203A JP 2017526969 A5 JP2017526969 A5 JP 2017526969A5
- Authority
- JP
- Japan
- Prior art keywords
- mirror
- facet
- optical unit
- illumination
- facet mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005286 illumination Methods 0.000 claims description 116
- 230000003287 optical effect Effects 0.000 claims description 81
- 238000003384 imaging method Methods 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 9
- 238000011144 upstream manufacturing Methods 0.000 claims description 7
- 238000001459 lithography Methods 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 210000001747 pupil Anatomy 0.000 description 18
- 230000000694 effects Effects 0.000 description 6
- 238000009826 distribution Methods 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 3
- 201000009310 astigmatism Diseases 0.000 description 2
- 206010027646 Miosis Diseases 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 210000003734 kidney Anatomy 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102014216802.3 | 2014-08-25 | ||
| DE102014216802.3A DE102014216802A1 (de) | 2014-08-25 | 2014-08-25 | Beleuchtungsoptik für die EUV-Projektions-Lithographie |
| PCT/EP2015/069038 WO2016030248A1 (de) | 2014-08-25 | 2015-08-19 | Beleuchtungsoptik für die euv-projektions-lithografie |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017526969A JP2017526969A (ja) | 2017-09-14 |
| JP2017526969A5 true JP2017526969A5 (enExample) | 2018-09-27 |
| JP6691105B2 JP6691105B2 (ja) | 2020-04-28 |
Family
ID=53872074
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017511203A Active JP6691105B2 (ja) | 2014-08-25 | 2015-08-19 | Euv投影リソグラフィのための照明光学ユニット |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10018917B2 (enExample) |
| JP (1) | JP6691105B2 (enExample) |
| DE (1) | DE102014216802A1 (enExample) |
| WO (1) | WO2016030248A1 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102017220586A1 (de) * | 2017-11-17 | 2019-05-23 | Carl Zeiss Smt Gmbh | Pupillenfacettenspiegel, Beleuchtungsoptik und optisches System für eine Projek-tionsbelichtungsanlage |
| DE102020210829A1 (de) | 2020-08-27 | 2022-03-03 | Carl Zeiss Smt Gmbh | Pupillenfacettenspiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19903807A1 (de) * | 1998-05-05 | 1999-11-11 | Zeiss Carl Fa | Beleuchtungssystem insbesondere für die EUV-Lithographie |
| DE10100265A1 (de) * | 2001-01-08 | 2002-07-11 | Zeiss Carl | Beleuchtungssystem mit Rasterelementen unterschiedlicher Größe |
| CN101946190B (zh) * | 2008-02-15 | 2013-06-19 | 卡尔蔡司Smt有限责任公司 | 微光刻的投射曝光设备使用的分面镜 |
| DE102008009600A1 (de) * | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie |
| JP5525550B2 (ja) | 2009-03-06 | 2014-06-18 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ用の照明光学系及び光学系 |
| US9372413B2 (en) * | 2011-04-15 | 2016-06-21 | Asml Netherlands B.V. | Optical apparatus for conditioning a radiation beam for use by an object, lithography apparatus and method of manufacturing devices |
| DE102012206612A1 (de) * | 2012-04-23 | 2013-10-24 | Carl Zeiss Smt Gmbh | Optisches Bauelement zur Führung eines Strahlungsbündels |
| DE102012212453A1 (de) * | 2012-07-17 | 2014-01-23 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik |
-
2014
- 2014-08-25 DE DE102014216802.3A patent/DE102014216802A1/de not_active Ceased
-
2015
- 2015-08-19 JP JP2017511203A patent/JP6691105B2/ja active Active
- 2015-08-19 WO PCT/EP2015/069038 patent/WO2016030248A1/de not_active Ceased
-
2017
- 2017-02-17 US US15/435,851 patent/US10018917B2/en active Active
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