KR101083942B1 - 반사굴절식 투사 대물렌즈 - Google Patents

반사굴절식 투사 대물렌즈 Download PDF

Info

Publication number
KR101083942B1
KR101083942B1 KR1020100094322A KR20100094322A KR101083942B1 KR 101083942 B1 KR101083942 B1 KR 101083942B1 KR 1020100094322 A KR1020100094322 A KR 1020100094322A KR 20100094322 A KR20100094322 A KR 20100094322A KR 101083942 B1 KR101083942 B1 KR 101083942B1
Authority
KR
South Korea
Prior art keywords
illumination
concave mirror
lens
pupil
projection objective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020100094322A
Other languages
English (en)
Korean (ko)
Other versions
KR20110035964A (ko
Inventor
알렉산더 에플레
토랄프 그루너
랄프 뮬러
Original Assignee
칼 짜이스 에스엠티 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 칼 짜이스 에스엠티 게엠베하 filed Critical 칼 짜이스 에스엠티 게엠베하
Publication of KR20110035964A publication Critical patent/KR20110035964A/ko
Application granted granted Critical
Publication of KR101083942B1 publication Critical patent/KR101083942B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B13/00—Viewfinders; Focusing aids for cameras; Means for focusing for cameras; Autofocus systems for cameras
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B17/00—Details of cameras or camera bodies; Accessories therefor
    • G03B17/02—Bodies
    • G03B17/08—Waterproof bodies or housings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020100094322A 2009-09-30 2010-09-29 반사굴절식 투사 대물렌즈 Expired - Fee Related KR101083942B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102009045217A DE102009045217B3 (de) 2009-09-30 2009-09-30 Katadioptrisches Projektionsobjektiv
DE102009045217.6 2009-09-30

Publications (2)

Publication Number Publication Date
KR20110035964A KR20110035964A (ko) 2011-04-06
KR101083942B1 true KR101083942B1 (ko) 2011-11-15

Family

ID=43705894

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020100094322A Expired - Fee Related KR101083942B1 (ko) 2009-09-30 2010-09-29 반사굴절식 투사 대물렌즈

Country Status (6)

Country Link
US (1) US8300211B2 (enExample)
JP (1) JP4921580B2 (enExample)
KR (1) KR101083942B1 (enExample)
CN (1) CN102033299B (enExample)
DE (1) DE102009045217B3 (enExample)
TW (1) TWI391705B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9274311B2 (en) * 2014-01-13 2016-03-01 Genius Electronic Optical Co., Ltd. Compact narrow field of view lenses for mobile devices
CN105652606B (zh) * 2016-04-05 2017-10-10 北京理工大学 一种折反式深紫外光刻物镜设计方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005039211A (ja) * 2003-06-30 2005-02-10 Canon Inc 投影光学系、露光装置及びデバイスの製造方法
US20070268474A1 (en) 2000-03-03 2007-11-22 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
US20080297884A1 (en) * 2007-06-01 2008-12-04 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus for microlithography
US20090021712A1 (en) * 2006-02-16 2009-01-22 Nikon Corporation Projection optical system, exposure apparatus, exposure method, display manufacturing method, mask, and mask manufacturing method

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6600608B1 (en) 1999-11-05 2003-07-29 Carl-Zeiss-Stiftung Catadioptric objective comprising two intermediate images
TWI249082B (en) 2002-08-23 2006-02-11 Nikon Corp Projection optical system and method for photolithography and exposure apparatus and method using same
KR101532824B1 (ko) 2003-04-09 2015-07-01 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
CN1307456C (zh) 2003-05-23 2007-03-28 佳能株式会社 投影光学系统、曝光装置及器件的制造方法
KR101159867B1 (ko) 2003-09-12 2012-06-26 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투사 노출 장치용 조명 시스템
DE10343333A1 (de) * 2003-09-12 2005-04-14 Carl Zeiss Smt Ag Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage
CN1910494B (zh) 2004-01-14 2011-08-10 卡尔蔡司Smt有限责任公司 反射折射投影物镜
US20070165198A1 (en) 2004-02-13 2007-07-19 Carl Zeiss Smt Ag Projection objective for a microlithographic projection exposure apparatus
US7551261B2 (en) 2004-02-26 2009-06-23 Carl Zeiss Smt Ag Illumination system for a microlithography projection exposure installation
US7046339B2 (en) 2004-03-05 2006-05-16 Micron Technology, Inc. Optimized optical lithography illumination source for use during the manufacture of a semiconductor device
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7283205B2 (en) * 2005-01-19 2007-10-16 Micron Technology, Inc. Optimized optical lithography illumination source for use during the manufacture of a semiconductor device
DE102006027787A1 (de) 2005-07-05 2007-01-18 Carl Zeiss Smt Ag Projektionsbelichtungsanlage und Betriebsmethode dieser
DE102006022958A1 (de) 2006-05-11 2007-11-22 Carl Zeiss Smt Ag Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs
TWI297767B (en) * 2006-05-30 2008-06-11 Nat Univ Tsing Hua Measuring apparatus and method using surface plasmon resonance
US7557997B2 (en) 2006-09-28 2009-07-07 Nikon Corporation Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element
WO2008086827A1 (en) 2007-01-16 2008-07-24 Carl Zeiss Smt Ag Projection exposure method and projection exposure system therefor
US7760425B2 (en) 2007-09-05 2010-07-20 Carl Zeiss Smt Ag Chromatically corrected catadioptric objective and projection exposure apparatus including the same
WO2009080231A1 (en) 2007-12-21 2009-07-02 Carl Zeiss Smt Ag Illumination system for illuminating a mask in a microlithographic exposure apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070268474A1 (en) 2000-03-03 2007-11-22 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP2005039211A (ja) * 2003-06-30 2005-02-10 Canon Inc 投影光学系、露光装置及びデバイスの製造方法
US20090021712A1 (en) * 2006-02-16 2009-01-22 Nikon Corporation Projection optical system, exposure apparatus, exposure method, display manufacturing method, mask, and mask manufacturing method
US20080297884A1 (en) * 2007-06-01 2008-12-04 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus for microlithography

Also Published As

Publication number Publication date
TW201142349A (en) 2011-12-01
TWI391705B (zh) 2013-04-01
JP4921580B2 (ja) 2012-04-25
CN102033299A (zh) 2011-04-27
KR20110035964A (ko) 2011-04-06
JP2011076094A (ja) 2011-04-14
US20110075121A1 (en) 2011-03-31
DE102009045217B3 (de) 2011-04-07
US8300211B2 (en) 2012-10-30
CN102033299B (zh) 2015-03-11

Similar Documents

Publication Publication Date Title
KR100962911B1 (ko) 마이크로리소그라피 투영 광학 시스템, 디바이스 제작 방법 및 광학 표면을 설계하기 위한 방법
KR100792652B1 (ko) 마이크로 리소그래피용 투영 대물렌즈
CN109196420B (zh) 图案形成装置
US9678438B2 (en) Illumination system of a microlithographic projection exposure apparatus
KR100606491B1 (ko) 리소그래피를 위한 파라미터를 판정하는 방법,컴퓨터시스템 및 이를 위한 컴퓨터 프로그램, 디바이스제조방법 및 그에 따라 제조된 디바이스
US7126757B2 (en) Illumination apparatus, exposure apparatus using the same, and device fabricating method
US11181826B2 (en) Projection exposure method and projection exposure apparatus for microlithography
US9625827B2 (en) Imaging optical unit for EUV projection lithography
KR20120101116A (ko) 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
JP6917477B2 (ja) リソグラフィ装置及びリソグラフィ方法
KR20120109635A (ko) 마스크 검사 장치의 조명 시스템 및 투영 오브젝티브
CN107636539A (zh) 微光刻投射设备的操作方法
US20130077076A1 (en) Microlithography illumination optical system and microlithography projection exposure apparatus including same
JP2007515660A (ja) 浸漬リソグラフィー用屈折性投影対物レンズ
JP2015511405A (ja) マイクロリソグラフィのための投影露光方法及び投影露光装置
KR101083942B1 (ko) 반사굴절식 투사 대물렌즈
JP2015219522A (ja) 紫外線損傷に対する感受性を減少させたウイン−ダイソン投影レンズ
JP2008530788A (ja) マイクロリソグラフィ投影露光装置
JP6457754B2 (ja) 投影リソグラフィのための照明光学ユニット
US10018917B2 (en) Illumination optical unit for EUV projection lithography
JP2011076094A5 (enExample)
TW202043942A (zh) 偏振像差檢測裝置、物鏡測試台及光刻設備
JP2008172272A (ja) マイクロリソグラフィ投影露光装置
JP2006135346A (ja) 露光方法及び装置
JP2000021753A (ja) 露光方法及び露光装置

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PN2301 Change of applicant

St.27 status event code: A-3-3-R10-R13-asn-PN2301

St.27 status event code: A-3-3-R10-R11-asn-PN2301

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

A201 Request for examination
A302 Request for accelerated examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PA0302 Request for accelerated examination

St.27 status event code: A-1-2-D10-D17-exm-PA0302

St.27 status event code: A-1-2-D10-D16-exm-PA0302

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20141030

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20151029

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20161027

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

FPAY Annual fee payment

Payment date: 20171026

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

FPAY Annual fee payment

Payment date: 20181101

Year of fee payment: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20211110

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20211110