DE102009045217B3 - Katadioptrisches Projektionsobjektiv - Google Patents

Katadioptrisches Projektionsobjektiv Download PDF

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Publication number
DE102009045217B3
DE102009045217B3 DE102009045217A DE102009045217A DE102009045217B3 DE 102009045217 B3 DE102009045217 B3 DE 102009045217B3 DE 102009045217 A DE102009045217 A DE 102009045217A DE 102009045217 A DE102009045217 A DE 102009045217A DE 102009045217 B3 DE102009045217 B3 DE 102009045217B3
Authority
DE
Germany
Prior art keywords
illumination
concave mirror
lens
entrance pupil
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE102009045217A
Other languages
German (de)
English (en)
Inventor
Alexander Dr. Epple
Toralf Dr. Gruner
Ralf Dr. Müller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102009045217A priority Critical patent/DE102009045217B3/de
Priority to US12/748,862 priority patent/US8300211B2/en
Priority to TW099128672A priority patent/TWI391705B/zh
Priority to CN201010299110.4A priority patent/CN102033299B/zh
Priority to KR1020100094322A priority patent/KR101083942B1/ko
Priority to JP2010234941A priority patent/JP4921580B2/ja
Application granted granted Critical
Publication of DE102009045217B3 publication Critical patent/DE102009045217B3/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B13/00—Viewfinders; Focusing aids for cameras; Means for focusing for cameras; Autofocus systems for cameras
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B17/00—Details of cameras or camera bodies; Accessories therefor
    • G03B17/02—Bodies
    • G03B17/08—Waterproof bodies or housings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE102009045217A 2009-09-30 2009-09-30 Katadioptrisches Projektionsobjektiv Expired - Fee Related DE102009045217B3 (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
DE102009045217A DE102009045217B3 (de) 2009-09-30 2009-09-30 Katadioptrisches Projektionsobjektiv
US12/748,862 US8300211B2 (en) 2009-09-30 2010-03-29 Catadioptric projection objective
TW099128672A TWI391705B (zh) 2009-09-30 2010-08-26 折反射投射物鏡
CN201010299110.4A CN102033299B (zh) 2009-09-30 2010-09-29 折反射投射物镜
KR1020100094322A KR101083942B1 (ko) 2009-09-30 2010-09-29 반사굴절식 투사 대물렌즈
JP2010234941A JP4921580B2 (ja) 2009-09-30 2010-09-30 反射屈折投影対物系

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102009045217A DE102009045217B3 (de) 2009-09-30 2009-09-30 Katadioptrisches Projektionsobjektiv

Publications (1)

Publication Number Publication Date
DE102009045217B3 true DE102009045217B3 (de) 2011-04-07

Family

ID=43705894

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102009045217A Expired - Fee Related DE102009045217B3 (de) 2009-09-30 2009-09-30 Katadioptrisches Projektionsobjektiv

Country Status (6)

Country Link
US (1) US8300211B2 (enExample)
JP (1) JP4921580B2 (enExample)
KR (1) KR101083942B1 (enExample)
CN (1) CN102033299B (enExample)
DE (1) DE102009045217B3 (enExample)
TW (1) TWI391705B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9274311B2 (en) * 2014-01-13 2016-03-01 Genius Electronic Optical Co., Ltd. Compact narrow field of view lenses for mobile devices
CN105652606B (zh) * 2016-04-05 2017-10-10 北京理工大学 一种折反式深紫外光刻物镜设计方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090059358A1 (en) * 2007-09-05 2009-03-05 Carl Zeiss Smt Ag Chromatically corrected catadioptric objective and projection exposure apparatus including the same

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6600608B1 (en) 1999-11-05 2003-07-29 Carl-Zeiss-Stiftung Catadioptric objective comprising two intermediate images
US7301605B2 (en) 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
TWI249082B (en) 2002-08-23 2006-02-11 Nikon Corp Projection optical system and method for photolithography and exposure apparatus and method using same
KR101532824B1 (ko) 2003-04-09 2015-07-01 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2005039211A (ja) 2003-06-30 2005-02-10 Canon Inc 投影光学系、露光装置及びデバイスの製造方法
CN1307456C (zh) 2003-05-23 2007-03-28 佳能株式会社 投影光学系统、曝光装置及器件的制造方法
KR101159867B1 (ko) 2003-09-12 2012-06-26 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투사 노출 장치용 조명 시스템
DE10343333A1 (de) * 2003-09-12 2005-04-14 Carl Zeiss Smt Ag Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage
CN1910494B (zh) 2004-01-14 2011-08-10 卡尔蔡司Smt有限责任公司 反射折射投影物镜
US20070165198A1 (en) 2004-02-13 2007-07-19 Carl Zeiss Smt Ag Projection objective for a microlithographic projection exposure apparatus
US7551261B2 (en) 2004-02-26 2009-06-23 Carl Zeiss Smt Ag Illumination system for a microlithography projection exposure installation
US7046339B2 (en) 2004-03-05 2006-05-16 Micron Technology, Inc. Optimized optical lithography illumination source for use during the manufacture of a semiconductor device
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7283205B2 (en) * 2005-01-19 2007-10-16 Micron Technology, Inc. Optimized optical lithography illumination source for use during the manufacture of a semiconductor device
DE102006027787A1 (de) 2005-07-05 2007-01-18 Carl Zeiss Smt Ag Projektionsbelichtungsanlage und Betriebsmethode dieser
CN101385123B (zh) 2006-02-16 2010-12-15 株式会社尼康 投影光学系统、曝光装置及方法、光罩及显示器的制造方法
DE102006022958A1 (de) 2006-05-11 2007-11-22 Carl Zeiss Smt Ag Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs
TWI297767B (en) * 2006-05-30 2008-06-11 Nat Univ Tsing Hua Measuring apparatus and method using surface plasmon resonance
US7557997B2 (en) 2006-09-28 2009-07-07 Nikon Corporation Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element
WO2008086827A1 (en) 2007-01-16 2008-07-24 Carl Zeiss Smt Ag Projection exposure method and projection exposure system therefor
US7929115B2 (en) 2007-06-01 2011-04-19 Carl Zeiss Smt Gmbh Projection objective and projection exposure apparatus for microlithography
WO2009080231A1 (en) 2007-12-21 2009-07-02 Carl Zeiss Smt Ag Illumination system for illuminating a mask in a microlithographic exposure apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090059358A1 (en) * 2007-09-05 2009-03-05 Carl Zeiss Smt Ag Chromatically corrected catadioptric objective and projection exposure apparatus including the same

Also Published As

Publication number Publication date
TW201142349A (en) 2011-12-01
TWI391705B (zh) 2013-04-01
JP4921580B2 (ja) 2012-04-25
CN102033299A (zh) 2011-04-27
KR20110035964A (ko) 2011-04-06
JP2011076094A (ja) 2011-04-14
US20110075121A1 (en) 2011-03-31
KR101083942B1 (ko) 2011-11-15
US8300211B2 (en) 2012-10-30
CN102033299B (zh) 2015-03-11

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R020 Patent grant now final
R020 Patent grant now final

Effective date: 20110823

R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee