JP2011058015A - 電解装置 - Google Patents

電解装置 Download PDF

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Publication number
JP2011058015A
JP2011058015A JP2009205491A JP2009205491A JP2011058015A JP 2011058015 A JP2011058015 A JP 2011058015A JP 2009205491 A JP2009205491 A JP 2009205491A JP 2009205491 A JP2009205491 A JP 2009205491A JP 2011058015 A JP2011058015 A JP 2011058015A
Authority
JP
Japan
Prior art keywords
electrolytic cell
temperature
electrolytic
cooling
electrolyzer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009205491A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011058015A5 (zh
Inventor
Osamu Yoshimoto
修 吉本
Makoto Motomiya
誠 本宮
Hiroshi Okubo
博 大久保
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Tanso Co Ltd
Original Assignee
Toyo Tanso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Tanso Co Ltd filed Critical Toyo Tanso Co Ltd
Priority to JP2009205491A priority Critical patent/JP2011058015A/ja
Priority to EP10813517A priority patent/EP2476783A4/en
Priority to US13/394,482 priority patent/US20120160667A1/en
Priority to CN2010800397675A priority patent/CN102482790A/zh
Priority to PCT/JP2010/005419 priority patent/WO2011027566A1/ja
Priority to KR1020127006048A priority patent/KR20120083311A/ko
Publication of JP2011058015A publication Critical patent/JP2011058015A/ja
Publication of JP2011058015A5 publication Critical patent/JP2011058015A5/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/02—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/02—Process control or regulation
    • C25B15/021—Process control or regulation of heating or cooling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F2213/00—Aspects of inhibiting corrosion of metals by anodic or cathodic protection
    • C23F2213/30—Anodic or cathodic protection specially adapted for a specific object

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Inorganic Chemistry (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
JP2009205491A 2009-09-07 2009-09-07 電解装置 Pending JP2011058015A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2009205491A JP2011058015A (ja) 2009-09-07 2009-09-07 電解装置
EP10813517A EP2476783A4 (en) 2009-09-07 2010-09-02 ELECTROLYSIS DEVICE
US13/394,482 US20120160667A1 (en) 2009-09-07 2010-09-02 Electrolytic device
CN2010800397675A CN102482790A (zh) 2009-09-07 2010-09-02 电解装置
PCT/JP2010/005419 WO2011027566A1 (ja) 2009-09-07 2010-09-02 電解装置
KR1020127006048A KR20120083311A (ko) 2009-09-07 2010-09-02 전해장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009205491A JP2011058015A (ja) 2009-09-07 2009-09-07 電解装置

Publications (2)

Publication Number Publication Date
JP2011058015A true JP2011058015A (ja) 2011-03-24
JP2011058015A5 JP2011058015A5 (zh) 2012-05-10

Family

ID=43649121

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009205491A Pending JP2011058015A (ja) 2009-09-07 2009-09-07 電解装置

Country Status (6)

Country Link
US (1) US20120160667A1 (zh)
EP (1) EP2476783A4 (zh)
JP (1) JP2011058015A (zh)
KR (1) KR20120083311A (zh)
CN (1) CN102482790A (zh)
WO (1) WO2011027566A1 (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013010989A (ja) * 2011-06-29 2013-01-17 Toyo Tanso Kk 電解装置
WO2013054433A1 (ja) * 2011-10-14 2013-04-18 株式会社エスマック 水素-酸素ガス発生装置
WO2013103042A1 (ja) * 2012-01-05 2013-07-11 セントラル硝子株式会社 フッ素ガス生成装置

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101077199B1 (ko) * 2011-03-14 2011-10-27 김경수 오픈셀 방식의 차아염소산나트륨 제조장치
WO2014021794A1 (en) * 2012-08-01 2014-02-06 Sukij Tridsadeerak Hpc2 hydrogen separation tank with liquid cooling system
CN108950594B (zh) * 2018-09-29 2020-02-07 青海铜业有限责任公司 电解槽和电解槽系统
AU2020399915B2 (en) * 2019-12-10 2023-12-21 Sunfire Gmbh Solid oxide cell assembly

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0373899A (ja) * 1989-08-15 1991-03-28 Toshiba Corp 溶融塩電解精製装置
JP2000042555A (ja) * 1998-08-04 2000-02-15 Sanyo Electric Co Ltd 電解水冷却装置
JP2004089702A (ja) * 2002-07-26 2004-03-25 Heraeus Kulzer Gmbh 補綴の金属製の歯科用成形部材を電気めっきにより析出するための装置
JP2004204347A (ja) * 2002-12-21 2004-07-22 Sang Nam Kim ブラウンガス発生装置
JP2005048290A (ja) * 2003-01-22 2005-02-24 Toyo Tanso Kk 溶融塩電解装置
JP2007046110A (ja) * 2005-08-10 2007-02-22 Honda Motor Co Ltd 水電解システムの運転方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB812817A (en) * 1954-05-21 1959-04-29 Solar Aircraft Co Electrolytic production of titanium
US2841544A (en) * 1956-04-24 1958-07-01 Minnesota Mining & Mfg Process for the production of fluorinecontaining compounds
US3645879A (en) * 1970-06-08 1972-02-29 Haskett Barry F Construction of electrolytic cell
IT1199898B (it) * 1985-07-22 1989-01-05 Ginatta Marco Elettrochim Impianto per la produzione elettrolitica in bagno di sali fusi di metalli reattivi
CN1327032C (zh) * 2001-12-17 2007-07-18 东洋炭素株式会社 F2气体发生装置与f2气体发生方法及f2气体
JP2004244724A (ja) * 2003-01-22 2004-09-02 Toyo Tanso Kk 溶融塩電解装置
KR100515412B1 (ko) * 2003-01-22 2005-09-14 도요탄소 가부시키가이샤 용융염 전해장치

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0373899A (ja) * 1989-08-15 1991-03-28 Toshiba Corp 溶融塩電解精製装置
JP2000042555A (ja) * 1998-08-04 2000-02-15 Sanyo Electric Co Ltd 電解水冷却装置
JP2004089702A (ja) * 2002-07-26 2004-03-25 Heraeus Kulzer Gmbh 補綴の金属製の歯科用成形部材を電気めっきにより析出するための装置
JP2004204347A (ja) * 2002-12-21 2004-07-22 Sang Nam Kim ブラウンガス発生装置
JP2005048290A (ja) * 2003-01-22 2005-02-24 Toyo Tanso Kk 溶融塩電解装置
JP2007046110A (ja) * 2005-08-10 2007-02-22 Honda Motor Co Ltd 水電解システムの運転方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013010989A (ja) * 2011-06-29 2013-01-17 Toyo Tanso Kk 電解装置
WO2013054433A1 (ja) * 2011-10-14 2013-04-18 株式会社エスマック 水素-酸素ガス発生装置
WO2013103042A1 (ja) * 2012-01-05 2013-07-11 セントラル硝子株式会社 フッ素ガス生成装置
JP2013139606A (ja) * 2012-01-05 2013-07-18 Central Glass Co Ltd フッ素ガス生成装置

Also Published As

Publication number Publication date
EP2476783A4 (en) 2012-10-31
US20120160667A1 (en) 2012-06-28
KR20120083311A (ko) 2012-07-25
CN102482790A (zh) 2012-05-30
EP2476783A1 (en) 2012-07-18
WO2011027566A1 (ja) 2011-03-10

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