JP2010541264A5 - - Google Patents

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Publication number
JP2010541264A5
JP2010541264A5 JP2010527410A JP2010527410A JP2010541264A5 JP 2010541264 A5 JP2010541264 A5 JP 2010541264A5 JP 2010527410 A JP2010527410 A JP 2010527410A JP 2010527410 A JP2010527410 A JP 2010527410A JP 2010541264 A5 JP2010541264 A5 JP 2010541264A5
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JP
Japan
Prior art keywords
projection objective
optical
end element
immersion liquid
facing surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010527410A
Other languages
English (en)
Japanese (ja)
Other versions
JP5498385B2 (ja
JP2010541264A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2008/062835 external-priority patent/WO2009043790A2/en
Publication of JP2010541264A publication Critical patent/JP2010541264A/ja
Publication of JP2010541264A5 publication Critical patent/JP2010541264A5/ja
Application granted granted Critical
Publication of JP5498385B2 publication Critical patent/JP5498385B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2010527410A 2007-10-02 2008-09-25 マイクロリソグラフィ用の投影対物系 Expired - Fee Related JP5498385B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US97693507P 2007-10-02 2007-10-02
DE102007047148 2007-10-02
DE102007047148.5 2007-10-02
US60/976,935 2007-10-02
PCT/EP2008/062835 WO2009043790A2 (en) 2007-10-02 2008-09-25 Projection objective for microlithography

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2014045298A Division JP2014140060A (ja) 2007-10-02 2014-03-07 マイクロリソグラフィ用の投影対物系

Publications (3)

Publication Number Publication Date
JP2010541264A JP2010541264A (ja) 2010-12-24
JP2010541264A5 true JP2010541264A5 (https=) 2011-11-04
JP5498385B2 JP5498385B2 (ja) 2014-05-21

Family

ID=40298812

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2010527410A Expired - Fee Related JP5498385B2 (ja) 2007-10-02 2008-09-25 マイクロリソグラフィ用の投影対物系
JP2014045298A Withdrawn JP2014140060A (ja) 2007-10-02 2014-03-07 マイクロリソグラフィ用の投影対物系
JP2017111353A Pending JP2017194697A (ja) 2007-10-02 2017-06-06 マイクロリソグラフィ用の投影対物系

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2014045298A Withdrawn JP2014140060A (ja) 2007-10-02 2014-03-07 マイクロリソグラフィ用の投影対物系
JP2017111353A Pending JP2017194697A (ja) 2007-10-02 2017-06-06 マイクロリソグラフィ用の投影対物系

Country Status (5)

Country Link
US (1) US8436982B2 (https=)
JP (3) JP5498385B2 (https=)
KR (1) KR101510493B1 (https=)
CN (1) CN101815969B (https=)
WO (1) WO2009043790A2 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101611178B1 (ko) 2014-09-17 2016-04-11 한국생산기술연구원 렌즈 부착형 조직세포 가압장치
EP3401718A4 (en) * 2016-01-06 2019-09-04 Olympus Corporation OPTICAL LENS SYSTEM

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
KR20010006578A (ko) * 1999-01-20 2001-01-26 에이에스엠 리소그라피 비.브이. 광학 보정 플레이트, 및 전사 투영 장치에의 적용
DE10127227A1 (de) * 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
JP3679736B2 (ja) * 2001-07-04 2005-08-03 キヤノン株式会社 露光装置、露光方法、デバイス製造方法、並びに、デバイス
JP3720788B2 (ja) * 2002-04-15 2005-11-30 キヤノン株式会社 投影露光装置及びデバイス製造方法
JP4496782B2 (ja) 2003-01-21 2010-07-07 株式会社ニコン 反射光学系及び露光装置
DE10324477A1 (de) * 2003-05-30 2004-12-30 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
US8149381B2 (en) * 2003-08-26 2012-04-03 Nikon Corporation Optical element and exposure apparatus
JP4218475B2 (ja) 2003-09-11 2009-02-04 株式会社ニコン 極端紫外線光学系及び露光装置
CN1860585B (zh) * 2003-09-29 2010-04-28 株式会社尼康 液浸型透镜系统和投影曝光装置
WO2005059645A2 (en) * 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
JP4370992B2 (ja) * 2004-02-18 2009-11-25 株式会社ニコン 光学素子及び露光装置
CN1954408B (zh) 2004-06-04 2012-07-04 尼康股份有限公司 曝光装置、曝光方法及元件制造方法
KR20070026603A (ko) 2004-06-10 2007-03-08 가부시키가이샤 니콘 노광 장치, 노광 방법, 및 디바이스 제조 방법
RU2346996C2 (ru) 2004-06-29 2009-02-20 ЮРОПИЭН НИКЕЛЬ ПиЭлСи Усовершенствованное выщелачивание основных металлов
SG158922A1 (en) * 2005-01-28 2010-02-26 Nikon Corp Projection optical system, exposure system, and exposure method
US7710653B2 (en) * 2005-01-28 2010-05-04 Nikon Corporation Projection optical system, exposure system, and exposure method
JP2006222222A (ja) * 2005-02-09 2006-08-24 Canon Inc 投影光学系及びそれを有する露光装置
EP1851574A1 (en) * 2005-02-25 2007-11-07 Carl Zeiss SMT AG Optical system, in particular objective or illumination system for a microlithographic projection exposure apparatus
JP2006309220A (ja) * 2005-04-29 2006-11-09 Carl Zeiss Smt Ag 投影対物レンズ
JP2006319064A (ja) * 2005-05-11 2006-11-24 Canon Inc 測定装置、露光方法及び装置
JP2007027439A (ja) * 2005-07-15 2007-02-01 Nikon Corp 投影光学系、露光装置、およびデバイスの製造方法
TWI450044B (zh) * 2005-08-31 2014-08-21 尼康股份有限公司 An optical element, an exposure apparatus using the same, an exposure method, and a manufacturing method of the micro-element
US20080100909A1 (en) * 2006-10-30 2008-05-01 Nikon Corporation Optical element, liquid immersion exposure apparatus, liquid immersion exposure method, and method for producing microdevice
JP2008218653A (ja) * 2007-03-02 2008-09-18 Canon Inc 露光装置及びデバイス製造方法

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