JP2010538829A - 大気圧プラズマ蒸着による基板の安定な親水性強化のための方法 - Google Patents
大気圧プラズマ蒸着による基板の安定な親水性強化のための方法 Download PDFInfo
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
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- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
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Abstract
【解決手段】 この方法は基板(1)を準備し、ガスの存在下に大気圧プラズマ放電を作成し、基板を前記大気圧プラズマ放電に少なくとも部分的に露出し、被膜形成物質の液体エアロゾル(6)または蒸気を前記大気圧プラズマ放電中に導入し、それにより基板上に被膜を形成する工程を含み、前記被膜形成物質は非重合性酢酸エステル誘導体を含む。好適実施態様によれば、前記酢酸エステル誘導体は酢酸エチルである。
【選択図】 図1
Description
− 基板を準備する、
− ガスの存在下に大気圧プラズマ放電を生成する、
− 基板を前記大気圧プラズマ放電に少なくとも部分的に露出する、
− 被膜形成物質の液体エアロゾルまたは蒸気を前記大気圧プラズマ放電中に導入し、それにより基板上に被膜を形成する、
を含み、さらに前記被膜形成物質は非重合性酢酸エステル誘導体、すなわち古典的連鎖成長重合により重合不可能な酢酸エステル誘導体、言い換えれば炭素原子間に二重または三重結合を持たない酢酸エステル誘導体、を含む。
プラズマ処理は、特別に設計された平行板DBDプラズマ設備内で大気圧で1.5kHzの放電周波数を用いて実施される。20×30cm2のポリ(エチレンテレフタレート)のシートが設備の下方電極上に置かれる。活性化工程は40slmの流量の窒素下に13秒間0.8W/cm2の出力で実施される。酢酸エチルが次いで20slmの窒素流れ下のプラズマ領域においてエアロゾルの形の下で注入される。被膜付着は30秒間実施される。
プラズマ処理は、特別に設計された平行板DBDプラズマ設備内で大気圧で40kHzの放電周波数を用いて実施される。20×30cm2のポリ(プロピレン)のシートが設備の下方電極上に置かれる。処理は20slmの流量の窒素下に実施され、そこで酢酸エチルがエアロゾルの形の下でプラズマ領域に注入される。プラズマ処理は13秒間0.8W/cm2の出力で実施される。
Claims (14)
- 基板上に親水性被膜を付与するための方法であって、前記方法が以下の工程:
− 基板(1)を準備する、
− ガスの存在下に大気圧プラズマ放電を生成する、
− 基板を前記大気圧プラズマ放電に少なくとも部分的に露出する、
− 被膜形成物質の液体エアロゾル(6)または蒸気を前記大気圧プラズマ放電中に導入し、それにより基板上に被膜を形成する、
を含み、さらに前記被膜形成物質が非重合性酢酸エステル誘導体を含むことを特徴とする方法。 - 前記被膜形成物質が複数の非重合性酢酸エステル誘導体の混合物を含むことを特徴とする請求項1に記載の方法。
- 前記被膜形成物質が酢酸エチルを含むことを特徴とする請求項1または2に記載の方法。
- 前記被膜形成物質が酢酸エチルであることを特徴とする請求項1〜3のいずれか一つに記載の方法。
- 前記基板が被膜形成物質の導入の前に前記プラズマ放電により予備処理されることを特徴とする請求項1に記載の方法。
- 前記プラズマ放電が誘電体バリヤー放電であることを特徴とする請求項1または2に記載の方法。
- 前記放電が二つの平行電極間で起こり、それらの電極の少なくとも一方が誘電体層により覆われ、さらに前記誘電体層間または一つの誘電体層と電極の間の隙間幅が5mmより小さいかまたは5mmに等しいことを特徴とする請求項6に記載の方法。
- 前記ガスがHe,Ar,N2,CO2,O2,N2O,H2またはこれらの二つ以上の混合物からなる群から選ばれることを特徴とする請求項1〜7のいずれか一つに記載の方法。
- 前記ガスがN2であることを特徴とする請求項1〜8のいずれか一つに記載の方法。
- 前記プラズマ放電が0.4W/cm2〜1W/cm2の出力で起こることを特徴とする請求項1〜9のいずれか一つに記載の方法。
- 前記プラズマ放電が以下の条件:
− 1kHz〜40kHzの周波数
− 10slm〜60slmのガス流量
下で起こることを特徴とする請求項10に記載の方法。 - 請求項1〜11のいずれか一つに記載の方法により付与された親水性被膜を含む基板において、前記被膜上の水に対する接触角が30°未満であることを特徴とする基板。
- 前記接触角が10°未満であることを特徴とする請求項12に記載の基板。
- 前記接触角が10°であることを特徴とする請求項12に記載の基板。
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EP07116708.4 | 2007-09-19 | ||
EP07116708 | 2007-09-19 | ||
PCT/EP2008/062497 WO2009037331A1 (en) | 2007-09-19 | 2008-09-19 | A method for stable hydrophilicity enhancement of a substrate by atmospheric pressure plasma deposition |
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JP5318876B2 JP5318876B2 (ja) | 2013-10-16 |
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US (1) | US8663751B2 (ja) |
EP (1) | EP2268846B1 (ja) |
JP (1) | JP5318876B2 (ja) |
AT (1) | ATE554197T1 (ja) |
DK (1) | DK2268846T3 (ja) |
ES (1) | ES2387130T3 (ja) |
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CN106967962A (zh) * | 2015-11-16 | 2017-07-21 | 应用材料公司 | 低蒸汽压气溶胶辅助的cvd |
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DE102011076806A1 (de) | 2011-05-31 | 2012-12-06 | Leibniz-Institut für Plasmaforschung und Technologie e.V. | Vorrichtung und Verfahren zur Erzeugung eines kalten, homogenen Plasmas unter Atmosphärendruckbedingungen |
EP2589438B1 (en) | 2011-11-07 | 2017-05-03 | Vlaamse Instelling voor Technologisch Onderzoek (VITO) | Plasma surface activation method and resulting object |
GB201205243D0 (en) | 2012-03-26 | 2012-05-09 | Kraft Foods R & D Inc | Packaging and method of opening |
EP2666544B1 (en) | 2012-05-24 | 2017-11-01 | Vito NV | Process for deposition and characterization of a coating |
EP3088451B1 (en) | 2015-04-30 | 2018-02-21 | VITO NV (Vlaamse Instelling voor Technologisch Onderzoek NV) | Plasma assisted hydrophilicity enhancement of polymer materials |
PL3088450T3 (pl) | 2015-04-30 | 2018-08-31 | Vito Nv (Vlaamse Instelling Voor Technologisch Onderzoek Nv) | Zwiększenie hydrofilowości przez obróbkę plazmową materiałów polimerowych |
US11510307B1 (en) * | 2021-05-08 | 2022-11-22 | Perriquest Defense Research Enterprises, Llc | Plasma engine using reactive species |
WO2023102465A1 (en) | 2021-12-02 | 2023-06-08 | Ddp Specialty Electronic Materials Us, Llc | Process for preparation of functionalized fiber |
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EP1785198A1 (en) | 2005-11-14 | 2007-05-16 | Vlaamse Instelling voor Technologisch Onderzoek | A method for atmospheric plasma deposition of conjugated polymer coatings |
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Patent Citations (3)
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JPH03236475A (ja) * | 1990-02-13 | 1991-10-22 | Sachiko Okazaki | 大気圧プラズマ表面処理法 |
JP2005524930A (ja) * | 2002-04-10 | 2005-08-18 | ダウ・コーニング・アイルランド・リミテッド | 大気圧プラズマアセンブリ |
WO2006081637A1 (en) * | 2005-02-04 | 2006-08-10 | Vlaamse Instelling Voor Technologisch Onderzoek N.V. (Vito) | Atmospheric-pressure plasma jet |
Cited By (2)
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CN106967962A (zh) * | 2015-11-16 | 2017-07-21 | 应用材料公司 | 低蒸汽压气溶胶辅助的cvd |
CN106967962B (zh) * | 2015-11-16 | 2021-03-09 | 应用材料公司 | 低蒸汽压气溶胶辅助的cvd |
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JP5318876B2 (ja) | 2013-10-16 |
WO2009037331A1 (en) | 2009-03-26 |
ATE554197T1 (de) | 2012-05-15 |
ES2387130T3 (es) | 2012-09-14 |
US8663751B2 (en) | 2014-03-04 |
US20100173162A1 (en) | 2010-07-08 |
DK2268846T3 (da) | 2012-07-23 |
EP2268846A1 (en) | 2011-01-05 |
PL2268846T3 (pl) | 2012-09-28 |
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