PL2268846T3 - Sposób trwałego zwiększenia hydrofilowości podłoża przez osadzanie plazmowe pod ciśnieniem atmosferycznym - Google Patents
Sposób trwałego zwiększenia hydrofilowości podłoża przez osadzanie plazmowe pod ciśnieniem atmosferycznymInfo
- Publication number
- PL2268846T3 PL2268846T3 PL08804431T PL08804431T PL2268846T3 PL 2268846 T3 PL2268846 T3 PL 2268846T3 PL 08804431 T PL08804431 T PL 08804431T PL 08804431 T PL08804431 T PL 08804431T PL 2268846 T3 PL2268846 T3 PL 2268846T3
- Authority
- PL
- Poland
- Prior art keywords
- substrate
- atmospheric pressure
- pressure plasma
- plasma deposition
- coating
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Dispersion Chemistry (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Chemical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP07116708 | 2007-09-19 | ||
PCT/EP2008/062497 WO2009037331A1 (en) | 2007-09-19 | 2008-09-19 | A method for stable hydrophilicity enhancement of a substrate by atmospheric pressure plasma deposition |
EP20080804431 EP2268846B1 (en) | 2007-09-19 | 2008-09-19 | A method for stable hydrophilicity enhancement of a substrate by atmospheric pressure plasma deposition |
Publications (1)
Publication Number | Publication Date |
---|---|
PL2268846T3 true PL2268846T3 (pl) | 2012-09-28 |
Family
ID=39099807
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PL08804431T PL2268846T3 (pl) | 2007-09-19 | 2008-09-19 | Sposób trwałego zwiększenia hydrofilowości podłoża przez osadzanie plazmowe pod ciśnieniem atmosferycznym |
Country Status (8)
Country | Link |
---|---|
US (1) | US8663751B2 (pl) |
EP (1) | EP2268846B1 (pl) |
JP (1) | JP5318876B2 (pl) |
AT (1) | ATE554197T1 (pl) |
DK (1) | DK2268846T3 (pl) |
ES (1) | ES2387130T3 (pl) |
PL (1) | PL2268846T3 (pl) |
WO (1) | WO2009037331A1 (pl) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102011076806A1 (de) | 2011-05-31 | 2012-12-06 | Leibniz-Institut für Plasmaforschung und Technologie e.V. | Vorrichtung und Verfahren zur Erzeugung eines kalten, homogenen Plasmas unter Atmosphärendruckbedingungen |
EP2589438B1 (en) | 2011-11-07 | 2017-05-03 | Vlaamse Instelling voor Technologisch Onderzoek (VITO) | Plasma surface activation method and resulting object |
GB201205243D0 (en) | 2012-03-26 | 2012-05-09 | Kraft Foods R & D Inc | Packaging and method of opening |
DK2666544T3 (en) | 2012-05-24 | 2018-01-02 | Vito Nv | PROCEDURE FOR DEPOSITING AND CHARACTERIZING A COATING |
EP3088451B1 (en) | 2015-04-30 | 2018-02-21 | VITO NV (Vlaamse Instelling voor Technologisch Onderzoek NV) | Plasma assisted hydrophilicity enhancement of polymer materials |
PL3088450T3 (pl) | 2015-04-30 | 2018-08-31 | Vito Nv (Vlaamse Instelling Voor Technologisch Onderzoek Nv) | Zwiększenie hydrofilowości przez obróbkę plazmową materiałów polimerowych |
US10273577B2 (en) * | 2015-11-16 | 2019-04-30 | Applied Materials, Inc. | Low vapor pressure aerosol-assisted CVD |
WO2022240706A1 (en) * | 2021-05-08 | 2022-11-17 | Perriquest Defense Research Enterprises, Llc | Plasma engine using reactive species |
WO2023102465A1 (en) | 2021-12-02 | 2023-06-08 | Ddp Specialty Electronic Materials Us, Llc | Process for preparation of functionalized fiber |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2517771B2 (ja) * | 1990-02-13 | 1996-07-24 | 幸子 岡崎 | 大気圧プラズマ表面処理法 |
TW253849B (pl) | 1993-08-09 | 1995-08-11 | Ciba Geigy | |
EP0801809A2 (en) * | 1995-06-19 | 1997-10-22 | The University Of Tennessee Research Corporation | Discharge methods and electrodes for generating plasmas at one atmosphere of pressure, and materials treated therewith |
JP3236475B2 (ja) | 1995-06-27 | 2001-12-10 | 住友金属工業株式会社 | 溶接管の製造方法 |
US6379741B1 (en) | 1998-11-30 | 2002-04-30 | The Regents Of The University Of California | Plasma-assisted surface modification of polymers for medical device applications |
US6765069B2 (en) * | 2001-09-28 | 2004-07-20 | Biosurface Engineering Technologies, Inc. | Plasma cross-linked hydrophilic coating |
GB0208261D0 (en) * | 2002-04-10 | 2002-05-22 | Dow Corning | An atmospheric pressure plasma assembly |
JP2005223167A (ja) * | 2004-02-06 | 2005-08-18 | Shinko Electric Ind Co Ltd | 親水性処理方法及び配線パターンの形成方法 |
WO2005089957A1 (en) | 2004-03-15 | 2005-09-29 | Ciba Specialty Chemicals Holding Inc. | Process for the production of strongly adherent coatings |
EP1582270A1 (en) | 2004-03-31 | 2005-10-05 | Vlaamse Instelling voor Technologisch Onderzoek | Method and apparatus for coating a substrate using dielectric barrier discharge |
US20050232658A1 (en) * | 2004-04-14 | 2005-10-20 | Toshiyuki Kabata | Member and method of sealing and storing photoreceptor and process cartridge for electrophotographic image forming apparatus |
EP1689216A1 (en) * | 2005-02-04 | 2006-08-09 | Vlaamse Instelling Voor Technologisch Onderzoek (Vito) | Atmospheric-pressure plasma jet |
US7615931B2 (en) * | 2005-05-02 | 2009-11-10 | International Technology Center | Pulsed dielectric barrier discharge |
EP1785198A1 (en) | 2005-11-14 | 2007-05-16 | Vlaamse Instelling voor Technologisch Onderzoek | A method for atmospheric plasma deposition of conjugated polymer coatings |
-
2008
- 2008-09-19 JP JP2010525358A patent/JP5318876B2/ja active Active
- 2008-09-19 ES ES08804431T patent/ES2387130T3/es active Active
- 2008-09-19 WO PCT/EP2008/062497 patent/WO2009037331A1/en active Application Filing
- 2008-09-19 DK DK08804431T patent/DK2268846T3/da active
- 2008-09-19 US US12/663,405 patent/US8663751B2/en active Active
- 2008-09-19 EP EP20080804431 patent/EP2268846B1/en active Active
- 2008-09-19 AT AT08804431T patent/ATE554197T1/de active
- 2008-09-19 PL PL08804431T patent/PL2268846T3/pl unknown
Also Published As
Publication number | Publication date |
---|---|
US8663751B2 (en) | 2014-03-04 |
DK2268846T3 (da) | 2012-07-23 |
EP2268846A1 (en) | 2011-01-05 |
JP2010538829A (ja) | 2010-12-16 |
JP5318876B2 (ja) | 2013-10-16 |
WO2009037331A1 (en) | 2009-03-26 |
ES2387130T3 (es) | 2012-09-14 |
US20100173162A1 (en) | 2010-07-08 |
EP2268846B1 (en) | 2012-04-18 |
ATE554197T1 (de) | 2012-05-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
PL2268846T3 (pl) | Sposób trwałego zwiększenia hydrofilowości podłoża przez osadzanie plazmowe pod ciśnieniem atmosferycznym | |
WO2005026409A3 (en) | Replaceable plate expanded thermal plasma apparatus and method | |
WO2008052705A8 (en) | Method for forming a film with a graded bandgap by deposition of an amorphous material from a plasma | |
WO2007061633A3 (en) | Method and system for performing plasma enhanced atomic layer deposition | |
WO2007084558A3 (en) | Method of producing particles by physical vapor deposition in an ionic liquid | |
WO2006118735A3 (en) | Method of making diamond-like carbon hydrophilic using barrier discharge pyrolysis | |
WO2010047755A3 (en) | Gas environment for imprint lithography | |
EP2298957A3 (en) | Method and apparatus of using solution based precursors for atomic layer deposition | |
WO2008146575A1 (ja) | 化合物系薄膜及びその形成方法、並びにその薄膜を用いた電子装置 | |
WO2007019188A3 (en) | Manufacture of photovoltaic devices | |
WO2020089180A3 (de) | Beschichtungsvorrichtung, prozesskammer, sowie verfahren zum beschichten eines substrats und substrat beschichtet mit zumindest einer materialschicht | |
SG171631A1 (en) | A method for the manufacture of a coating | |
TW200801231A (en) | Multi-wall plastic sheet having an internal plasma-enhanced chemical vapor deposition coating and process for manufacturing the same | |
ZA200900949B (en) | Method and device for plasma-assisted chemical vapour deposition on the inner wall of a hollow body | |
WO2009102564A3 (en) | Substrate coating apparatus having a solvent vapor emitter | |
WO2007124879A3 (de) | Vorrichtung und verfahren zur homogenen pvd-beschichtung | |
DE502006004463D1 (de) | Vorrichtung und verfahren zur kontinuierlichen gasphasenabscheidung unter atmosphärendruck und deren verwendung | |
TW200730652A (en) | Silicon body formation method and device thereof | |
WO2008078502A1 (ja) | 成膜装置および成膜方法 | |
TW200721265A (en) | Silicon dot forming method and silicon dot forming apparatus | |
WO2010144761A3 (en) | Ionized physical vapor deposition for microstructure controlled thin film deposition | |
EP2390381A3 (en) | Method of producing coated member | |
EA201290598A1 (ru) | Устройство и способ для покрытия подложки | |
TW200710291A (en) | Vapor phase growing apparatus and vapor phase growing method | |
WO2010008754A3 (en) | Methods for forming an amorphous silicon film in display devices |