JP7286194B2 - 有機ポリマーフィルム及びその製造方法 - Google Patents
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- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/14—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
- B05D3/141—Plasma treatment
- B05D3/145—After-treatment
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- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
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- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/16—Chemical modification with polymerisable compounds
- C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32018—Glow discharge
- H01J37/32027—DC powered
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2201/00—Polymeric substrate or laminate
- B05D2201/02—Polymeric substrate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2202/00—Metallic substrate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2518/00—Other type of polymers
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- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
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- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/10—Definition of the polymer structure
- C08G2261/14—Side-groups
- C08G2261/141—Side-chains having aliphatic units
- C08G2261/1412—Saturated aliphatic units
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- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
- C08G2261/31—Monomer units or repeat units incorporating structural elements in the main chain incorporating aromatic structural elements in the main chain
- C08G2261/312—Non-condensed aromatic systems, e.g. benzene
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- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
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- C08J2365/00—Characterised by the use of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Derivatives of such polymers
Description
10 キシレン前駆体
11 パルス電源供給システム
4 チャンバ
51 上電極
52 下電極
6 排気口
7 吸気口
8 基板
9 有機ポリマーフィルム
Claims (12)
- (A) キシレン前駆体と、基板を提供する工程と、
(B) 前記基板をプラズマ装置内に配置する工程と、
(C) 前記プラズマ装置を真空にすると同時に、キャリアガスと、前記キャリアガスが運ぶ前記キシレン前駆体の蒸気を導入する工程と、
(D) 前記プラズマ装置を起動にして、短パルスプラズマを生成する工程と、
(E) 前記基板上に有機ポリマーフィルムを形成する工程と、
を含み、そのうち、当該短パルスプラズマの周波数が1ヘルツ(Hz)~10,000ヘルツ(Hz)の間であり、短パルスプラズマのパルス持続時間が1マイクロ秒(μs)~60マイクロ秒(μs)の間である、ことを特徴とする、有機ポリマーフィルムの製造方法。 - 前記キシレン前駆体が、o-キシレン(1,2-Dimethylbenzene)、m-キシレン(1,3-Dimethylbenzene)、p-キシレン(1,4-Dimethylbenzene)またはこれらからなる群から選択される、ことを特徴とする、請求項1に記載の有機ポリマーフィルムの製造方法。
- 前記キシレン前駆体が、1,2-ビス(トリフルオロメチル)ベンゼン(1,2-Bis(trifluoromethyl)benzene)、1,3-ビス(トリフルオロメチル)ベンゼン(1,3-Bis(trifluoromethyl)benzene)、1,4-ビス(トリフルオロメチル)ベンゼン(1,4-Bis(trifluoromethyl)benzene)またはこれらの組み合わせからなる群から選択される、ことを特徴とする、請求項1に記載の有機ポリマーフィルムの製造方法。
- 前記基板が高分子材料(Polymer)または金属である、ことを特徴とする、請求項1に記載の有機ポリマーフィルムの製造方法。
- 前記(B)工程の前記プラズマ装置が、
チャンバと、
前記チャンバに連通された吸気口と、
前記チャンバに連通された排気口と、
上電極及び下電極を含み、前記上電極と前記下電極が前記チャンバに挿通されて前記チャンバ内に設置されたパルス電源供給システムと、
を含み、そのうち、前記基板が前記下電極の上に設置される、ことを特徴とする、請求項1に記載の有機ポリマーフィルムの製造方法。 - 前記キャリアガスがアルゴン(Ar)である、ことを特徴とする、請求項1に記載の有機ポリマーフィルムの製造方法。
- 前記短パルスプラズマの周波数は、1,000ヘルツ(Hz)である、ことを特徴とする、請求項1に記載の有機ポリマーフィルムの製造方法。
- 前記キシレン前駆体は、p-キシレン(1,4-Dimethylbenzene)である、ことを特徴とする、請求項2に記載の有機ポリマーフィルムの製造方法。
- 前記短パルスプラズマのパルス持続時間は、60マイクロ秒(μs)である、ことを特徴とする、請求項8に記載の有機ポリマーフィルムの製造方法。
- 前記キシレン前駆体は、1,4-ビス(トリフルオロメチル)ベンゼン(1,4-Bis(trifluoromethyl)benzene)である、ことを特徴とする、請求項3に記載の有機ポリマーフィルムの製造方法。
- 前記短パルスプラズマのパルス持続時間は、20マイクロ秒(μs)である、ことを特徴とする、請求項10に記載の有機ポリマーフィルムの製造方法。
- 前記短パルスプラズマの出力が50ワット(W)である、ことを特徴とする、請求項1に記載の有機ポリマーフィルムの製造方法。
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TW109145193 | 2020-12-19 | ||
TW109145193A TWI766488B (zh) | 2020-12-19 | 2020-12-19 | 有機高分子薄膜及其製作方法 |
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JP7286194B2 true JP7286194B2 (ja) | 2023-06-05 |
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KR (1) | KR102641603B1 (ja) |
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Citations (5)
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US20030054117A1 (en) | 2001-02-02 | 2003-03-20 | Brewer Science, Inc. | Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition |
JP2005522581A (ja) | 2002-04-11 | 2005-07-28 | ブルーワー サイエンス アイ エヌ シー. | プラズマ強化型化学蒸着法により形成された重合性反射防止コーティング |
US20090297731A1 (en) | 2008-05-30 | 2009-12-03 | Asm Japan K.K. | Apparatus and method for improving production throughput in cvd chamber |
US20190276933A1 (en) | 2016-11-30 | 2019-09-12 | Jiangsu Favored Nanotechnology Co., Ltd. | Plasma polymerization coating with uniformity control |
JP2020509220A (ja) | 2017-01-23 | 2020-03-26 | 江蘇菲沃泰納米科技有限公司Jiangsu Favored Nanotechnology Co., Ltd | 耐水性と耐電気的破壊性を有するコーティングの製造方法 |
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CN1839468B (zh) * | 2003-10-08 | 2010-11-24 | 霍尼韦尔国际公司 | 使用甲硅烷基化剂修复低k介电材料的损伤 |
TWI350006B (en) * | 2007-10-05 | 2011-10-01 | Ind Tech Res Inst | Plasma enhanced thin film deposition method |
TWI585233B (zh) * | 2012-03-06 | 2017-06-01 | 辛柏朗有限公司 | 經塗佈之電總成 |
US10005716B2 (en) * | 2014-02-07 | 2018-06-26 | Cheorwon Plasma Research Institute | Method for synthesizing catecholamines by using plasma polymerization |
CN106654071A (zh) * | 2017-03-09 | 2017-05-10 | 南京迈智芯微光电科技有限公司 | 一种有机电致发光器件的制作与封装方法 |
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2020
- 2020-12-19 TW TW109145193A patent/TWI766488B/zh active
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- 2021-12-16 JP JP2021204067A patent/JP7286194B2/ja active Active
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030054117A1 (en) | 2001-02-02 | 2003-03-20 | Brewer Science, Inc. | Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition |
JP2005522581A (ja) | 2002-04-11 | 2005-07-28 | ブルーワー サイエンス アイ エヌ シー. | プラズマ強化型化学蒸着法により形成された重合性反射防止コーティング |
US20090297731A1 (en) | 2008-05-30 | 2009-12-03 | Asm Japan K.K. | Apparatus and method for improving production throughput in cvd chamber |
US20190276933A1 (en) | 2016-11-30 | 2019-09-12 | Jiangsu Favored Nanotechnology Co., Ltd. | Plasma polymerization coating with uniformity control |
JP2020509220A (ja) | 2017-01-23 | 2020-03-26 | 江蘇菲沃泰納米科技有限公司Jiangsu Favored Nanotechnology Co., Ltd | 耐水性と耐電気的破壊性を有するコーティングの製造方法 |
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TWI766488B (zh) | 2022-06-01 |
KR102641603B1 (ko) | 2024-02-27 |
US20220193719A1 (en) | 2022-06-23 |
JP2022097436A (ja) | 2022-06-30 |
CN114644770A (zh) | 2022-06-21 |
TW202225250A (zh) | 2022-07-01 |
KR20220088625A (ko) | 2022-06-28 |
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