JP2010533882A5 - - Google Patents

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Publication number
JP2010533882A5
JP2010533882A5 JP2010516403A JP2010516403A JP2010533882A5 JP 2010533882 A5 JP2010533882 A5 JP 2010533882A5 JP 2010516403 A JP2010516403 A JP 2010516403A JP 2010516403 A JP2010516403 A JP 2010516403A JP 2010533882 A5 JP2010533882 A5 JP 2010533882A5
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JP
Japan
Prior art keywords
projection objective
field
image
plane
dimension
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010516403A
Other languages
English (en)
Japanese (ja)
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JP2010533882A (ja
Filing date
Publication date
Priority claimed from DE102007033967A external-priority patent/DE102007033967A1/de
Application filed filed Critical
Publication of JP2010533882A publication Critical patent/JP2010533882A/ja
Publication of JP2010533882A5 publication Critical patent/JP2010533882A5/ja
Pending legal-status Critical Current

Links

JP2010516403A 2007-07-19 2008-07-09 投影対物系 Pending JP2010533882A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007033967A DE102007033967A1 (de) 2007-07-19 2007-07-19 Projektionsobjektiv
PCT/EP2008/005569 WO2009010213A1 (de) 2007-07-19 2008-07-09 Projektionsobjektiv

Publications (2)

Publication Number Publication Date
JP2010533882A JP2010533882A (ja) 2010-10-28
JP2010533882A5 true JP2010533882A5 (enExample) 2011-09-01

Family

ID=39709467

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010516403A Pending JP2010533882A (ja) 2007-07-19 2008-07-09 投影対物系

Country Status (5)

Country Link
US (1) US20100134880A1 (enExample)
JP (1) JP2010533882A (enExample)
CN (1) CN101755231B (enExample)
DE (1) DE102007033967A1 (enExample)
WO (1) WO2009010213A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009030501A1 (de) 2009-06-24 2011-01-05 Carl Zeiss Smt Ag Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Beleuchtungsoptik zur Ausleuchtung eines Objektfeldes
EP2633364B1 (en) * 2010-10-25 2023-09-06 Nikon Corporation Apparatus, optical assembly, method for inspection or measurement of an object and method for manufacturing a structure
DE102010063618A1 (de) * 2010-12-21 2012-06-21 Robert Bosch Gmbh Abbildungssystem und Fischaugenobjektiv
CN103676489B (zh) * 2012-09-14 2015-09-30 上海微电子装备有限公司 一种反射式物镜结构及其制造方法
CN103198307B (zh) * 2013-04-24 2016-01-13 北京东方金指科技有限公司 指纹采集仪
WO2016188934A1 (de) * 2015-05-28 2016-12-01 Carl Zeiss Smt Gmbh Abbildende optik zur abbildung eines objektfeldes in ein bildfeld sowie projektionsbelichtungsanlage mit einer derartigen abbildenden optik
JP6836213B2 (ja) * 2019-02-06 2021-02-24 セイコーエプソン株式会社 投射光学装置およびプロジェクター
DE102021205774A1 (de) 2021-06-08 2022-12-08 Carl Zeiss Smt Gmbh Abbildende Optik

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JP2004252358A (ja) * 2003-02-21 2004-09-09 Canon Inc 反射型投影光学系及び露光装置
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US7114818B2 (en) * 2004-05-06 2006-10-03 Olympus Corporation Optical system, and electronic equipment that incorporates the same
WO2005111689A2 (en) * 2004-05-17 2005-11-24 Carl Zeiss Smt Ag Catadioptric projection objective with intermediate images
DE102005042005A1 (de) * 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
WO2007020004A1 (de) * 2005-08-17 2007-02-22 Carl Zeiss Smt Ag Projektionsobjektiv und verfahren zur optimierung einer systemblende eines projektionsobjektivs
TWI451125B (zh) * 2005-09-13 2014-09-01 卡爾蔡司Ｓｍｔ有限公司 顯微蝕刻投影光學系統、包含此一光學系統之顯微蝕刻工具、使用此一顯微蝕刻工具於顯微蝕刻生產微結構元件之方法、藉此一方法所生產之微結構元件以及於此一光學系統中設計一光學表面的方法
JP5479890B2 (ja) * 2006-04-07 2014-04-23 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影光学システム、装置、及び製造方法

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