JP2010533882A5 - - Google Patents
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- Publication number
- JP2010533882A5 JP2010533882A5 JP2010516403A JP2010516403A JP2010533882A5 JP 2010533882 A5 JP2010533882 A5 JP 2010533882A5 JP 2010516403 A JP2010516403 A JP 2010516403A JP 2010516403 A JP2010516403 A JP 2010516403A JP 2010533882 A5 JP2010533882 A5 JP 2010533882A5
- Authority
- JP
- Japan
- Prior art keywords
- projection objective
- field
- image
- plane
- dimension
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000003384 imaging method Methods 0.000 claims 4
- 238000009434 installation Methods 0.000 claims 4
- 230000003287 optical effect Effects 0.000 claims 2
- 238000000034 method Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102007033967A DE102007033967A1 (de) | 2007-07-19 | 2007-07-19 | Projektionsobjektiv |
| PCT/EP2008/005569 WO2009010213A1 (de) | 2007-07-19 | 2008-07-09 | Projektionsobjektiv |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010533882A JP2010533882A (ja) | 2010-10-28 |
| JP2010533882A5 true JP2010533882A5 (enExample) | 2011-09-01 |
Family
ID=39709467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010516403A Pending JP2010533882A (ja) | 2007-07-19 | 2008-07-09 | 投影対物系 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20100134880A1 (enExample) |
| JP (1) | JP2010533882A (enExample) |
| CN (1) | CN101755231B (enExample) |
| DE (1) | DE102007033967A1 (enExample) |
| WO (1) | WO2009010213A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009030501A1 (de) * | 2009-06-24 | 2011-01-05 | Carl Zeiss Smt Ag | Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Beleuchtungsoptik zur Ausleuchtung eines Objektfeldes |
| CA2815094C (en) * | 2010-10-25 | 2018-01-16 | Nikon Corporation | Apparatus, optical assembly, method for inspection or measurement of an object and method for manufacturing a structure |
| DE102010063618A1 (de) * | 2010-12-21 | 2012-06-21 | Robert Bosch Gmbh | Abbildungssystem und Fischaugenobjektiv |
| CN103676489B (zh) * | 2012-09-14 | 2015-09-30 | 上海微电子装备有限公司 | 一种反射式物镜结构及其制造方法 |
| CN103198307B (zh) * | 2013-04-24 | 2016-01-13 | 北京东方金指科技有限公司 | 指纹采集仪 |
| KR102868300B1 (ko) * | 2015-05-28 | 2025-10-13 | 칼 짜이스 에스엠테 게엠베하 | 대물 필드를 이미지 필드 내로 이미징하기 위한 이미징 광학 유닛, 및 이러한 이미징 광학 유닛을 포함하는 투영 노광 장치 |
| JP6836213B2 (ja) * | 2019-02-06 | 2021-02-24 | セイコーエプソン株式会社 | 投射光学装置およびプロジェクター |
| DE102021205774A1 (de) | 2021-06-08 | 2022-12-08 | Carl Zeiss Smt Gmbh | Abbildende Optik |
Family Cites Families (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3748015A (en) | 1971-06-21 | 1973-07-24 | Perkin Elmer Corp | Unit power imaging catoptric anastigmat |
| JPS612124A (ja) * | 1984-06-14 | 1986-01-08 | Canon Inc | 結像光学系 |
| GB8612609D0 (en) | 1986-05-23 | 1986-07-02 | Wynne C G | Optical imaging systems |
| US5416632A (en) * | 1993-05-04 | 1995-05-16 | Carlisle; James H. | Newtonian binocular telescope |
| US6229595B1 (en) * | 1995-05-12 | 2001-05-08 | The B. F. Goodrich Company | Lithography system and method with mask image enlargement |
| US6631036B2 (en) * | 1996-09-26 | 2003-10-07 | Carl-Zeiss-Stiftung | Catadioptric objective |
| JP3459753B2 (ja) | 1997-06-09 | 2003-10-27 | キヤノン株式会社 | 露光装置 |
| JP4238390B2 (ja) * | 1998-02-27 | 2009-03-18 | 株式会社ニコン | 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法 |
| US6396067B1 (en) * | 1998-05-06 | 2002-05-28 | Koninklijke Philips Electronics N.V. | Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
| JP2000100694A (ja) * | 1998-09-22 | 2000-04-07 | Nikon Corp | 反射縮小投影光学系、該光学系を備えた投影露光装置および該装置を用いた露光方法 |
| JP2000100703A (ja) * | 1998-09-24 | 2000-04-07 | Nikon Corp | 投影露光装置及び方法、並びに反射縮小投影光学系 |
| US7151592B2 (en) * | 1999-02-15 | 2006-12-19 | Carl Zeiss Smt Ag | Projection system for EUV lithography |
| EP1035445B1 (de) * | 1999-02-15 | 2007-01-31 | Carl Zeiss SMT AG | Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage |
| US6985210B2 (en) * | 1999-02-15 | 2006-01-10 | Carl Zeiss Smt Ag | Projection system for EUV lithography |
| US6600552B2 (en) * | 1999-02-15 | 2003-07-29 | Carl-Zeiss Smt Ag | Microlithography reduction objective and projection exposure apparatus |
| US20020091301A1 (en) * | 1999-05-18 | 2002-07-11 | Levin John M. | Retractor with memory |
| US6485145B1 (en) * | 1999-12-21 | 2002-11-26 | Scram Technologies, Inc. | Optical system for display panel |
| JP2002006221A (ja) * | 2000-06-26 | 2002-01-09 | Nikon Corp | 投影光学系、露光装置及び露光方法 |
| JP2002015979A (ja) * | 2000-06-29 | 2002-01-18 | Nikon Corp | 投影光学系、露光装置及び露光方法 |
| DE10052289A1 (de) * | 2000-10-20 | 2002-04-25 | Zeiss Carl | 8-Spiegel-Mikrolithographie-Projektionsobjektiv |
| US6387723B1 (en) * | 2001-01-19 | 2002-05-14 | Silicon Light Machines | Reduced surface charging in silicon-based devices |
| TW594043B (en) * | 2001-04-11 | 2004-06-21 | Matsushita Electric Industrial Co Ltd | Reflection type optical apparatus and photographing apparatus using the same, multi-wavelength photographing apparatus, monitoring apparatus for vehicle |
| TW558861B (en) * | 2001-06-15 | 2003-10-21 | Semiconductor Energy Lab | Laser irradiation stage, laser irradiation optical system, laser irradiation apparatus, laser irradiation method, and method of manufacturing semiconductor device |
| JP2003045782A (ja) * | 2001-07-31 | 2003-02-14 | Canon Inc | 反射型縮小投影光学系及びそれを用いた露光装置 |
| JP2003233002A (ja) * | 2002-02-07 | 2003-08-22 | Canon Inc | 反射型投影光学系、露光装置及びデバイス製造方法 |
| JP3938040B2 (ja) * | 2002-12-27 | 2007-06-27 | キヤノン株式会社 | 反射型投影光学系、露光装置及びデバイス製造方法 |
| US6813098B2 (en) | 2003-01-02 | 2004-11-02 | Ultratech, Inc. | Variable numerical aperture large-field unit-magnification projection system |
| JP2004252363A (ja) * | 2003-02-21 | 2004-09-09 | Canon Inc | 反射型投影光学系 |
| JP2004252358A (ja) * | 2003-02-21 | 2004-09-09 | Canon Inc | 反射型投影光学系及び露光装置 |
| WO2005098504A1 (en) * | 2004-04-08 | 2005-10-20 | Carl Zeiss Smt Ag | Imaging system with mirror group |
| US7114818B2 (en) * | 2004-05-06 | 2006-10-03 | Olympus Corporation | Optical system, and electronic equipment that incorporates the same |
| KR101376931B1 (ko) * | 2004-05-17 | 2014-03-25 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
| DE102005042005A1 (de) * | 2004-12-23 | 2006-07-06 | Carl Zeiss Smt Ag | Hochaperturiges Objektiv mit obskurierter Pupille |
| WO2007020004A1 (de) * | 2005-08-17 | 2007-02-22 | Carl Zeiss Smt Ag | Projektionsobjektiv und verfahren zur optimierung einer systemblende eines projektionsobjektivs |
| TWI366004B (en) | 2005-09-13 | 2012-06-11 | Zeiss Carl Smt Gmbh | Microlithography projection optical system, microlithographic tool comprising such an optical system, method for microlithographic production of microstructured components using such a microlithographic tool, microstructured component being produced by s |
| EP2005250B1 (en) * | 2006-04-07 | 2012-11-07 | Carl Zeiss SMT GmbH | Microlithography projection optical system, tool and method of production |
-
2007
- 2007-07-19 DE DE102007033967A patent/DE102007033967A1/de not_active Ceased
-
2008
- 2008-07-09 JP JP2010516403A patent/JP2010533882A/ja active Pending
- 2008-07-09 WO PCT/EP2008/005569 patent/WO2009010213A1/de not_active Ceased
- 2008-07-09 CN CN2008800252787A patent/CN101755231B/zh not_active Expired - Fee Related
-
2010
- 2010-01-14 US US12/687,325 patent/US20100134880A1/en not_active Abandoned
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