JP2010533882A - 投影対物系 - Google Patents

投影対物系 Download PDF

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Publication number
JP2010533882A
JP2010533882A JP2010516403A JP2010516403A JP2010533882A JP 2010533882 A JP2010533882 A JP 2010533882A JP 2010516403 A JP2010516403 A JP 2010516403A JP 2010516403 A JP2010516403 A JP 2010516403A JP 2010533882 A JP2010533882 A JP 2010533882A
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JP
Japan
Prior art keywords
projection objective
field
image
plane
aspect ratio
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Pending
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JP2010516403A
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English (en)
Japanese (ja)
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JP2010533882A5 (enExample
Inventor
ハンス ユールゲン マン
Original Assignee
カール・ツァイス・エスエムティー・アーゲー
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Publication of JP2010533882A publication Critical patent/JP2010533882A/ja
Publication of JP2010533882A5 publication Critical patent/JP2010533882A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G02B13/26—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances for reproducing with unit magnification
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
JP2010516403A 2007-07-19 2008-07-09 投影対物系 Pending JP2010533882A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007033967A DE102007033967A1 (de) 2007-07-19 2007-07-19 Projektionsobjektiv
PCT/EP2008/005569 WO2009010213A1 (de) 2007-07-19 2008-07-09 Projektionsobjektiv

Publications (2)

Publication Number Publication Date
JP2010533882A true JP2010533882A (ja) 2010-10-28
JP2010533882A5 JP2010533882A5 (enExample) 2011-09-01

Family

ID=39709467

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010516403A Pending JP2010533882A (ja) 2007-07-19 2008-07-09 投影対物系

Country Status (5)

Country Link
US (1) US20100134880A1 (enExample)
JP (1) JP2010533882A (enExample)
CN (1) CN101755231B (enExample)
DE (1) DE102007033967A1 (enExample)
WO (1) WO2009010213A1 (enExample)

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DE102009030501A1 (de) * 2009-06-24 2011-01-05 Carl Zeiss Smt Ag Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Beleuchtungsoptik zur Ausleuchtung eines Objektfeldes
CA2815094C (en) * 2010-10-25 2018-01-16 Nikon Corporation Apparatus, optical assembly, method for inspection or measurement of an object and method for manufacturing a structure
DE102010063618A1 (de) * 2010-12-21 2012-06-21 Robert Bosch Gmbh Abbildungssystem und Fischaugenobjektiv
CN103676489B (zh) * 2012-09-14 2015-09-30 上海微电子装备有限公司 一种反射式物镜结构及其制造方法
CN103198307B (zh) * 2013-04-24 2016-01-13 北京东方金指科技有限公司 指纹采集仪
KR102868300B1 (ko) * 2015-05-28 2025-10-13 칼 짜이스 에스엠테 게엠베하 대물 필드를 이미지 필드 내로 이미징하기 위한 이미징 광학 유닛, 및 이러한 이미징 광학 유닛을 포함하는 투영 노광 장치
JP6836213B2 (ja) * 2019-02-06 2021-02-24 セイコーエプソン株式会社 投射光学装置およびプロジェクター
DE102021205774A1 (de) 2021-06-08 2022-12-08 Carl Zeiss Smt Gmbh Abbildende Optik

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JP2000100703A (ja) * 1998-09-24 2000-04-07 Nikon Corp 投影露光装置及び方法、並びに反射縮小投影光学系
JP2000235144A (ja) * 1999-02-15 2000-08-29 Carl Zeiss Stiftung Trading As Carl Zeiss マイクロリソグラフィー縮小用対物レンズおよび投影露光装置
JP2002006221A (ja) * 2000-06-26 2002-01-09 Nikon Corp 投影光学系、露光装置及び露光方法
JP2002015979A (ja) * 2000-06-29 2002-01-18 Nikon Corp 投影光学系、露光装置及び露光方法
JP2002509653A (ja) * 1998-05-06 2002-03-26 コーニンクレッカ、フィリップス、エレクトロニクス、エヌ、ヴィ 専用鏡投写システムを備える走査リソグラフィック装置

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JP4238390B2 (ja) * 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
US7151592B2 (en) * 1999-02-15 2006-12-19 Carl Zeiss Smt Ag Projection system for EUV lithography
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Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002509653A (ja) * 1998-05-06 2002-03-26 コーニンクレッカ、フィリップス、エレクトロニクス、エヌ、ヴィ 専用鏡投写システムを備える走査リソグラフィック装置
JP2000100694A (ja) * 1998-09-22 2000-04-07 Nikon Corp 反射縮小投影光学系、該光学系を備えた投影露光装置および該装置を用いた露光方法
JP2000100703A (ja) * 1998-09-24 2000-04-07 Nikon Corp 投影露光装置及び方法、並びに反射縮小投影光学系
JP2000235144A (ja) * 1999-02-15 2000-08-29 Carl Zeiss Stiftung Trading As Carl Zeiss マイクロリソグラフィー縮小用対物レンズおよび投影露光装置
JP2002006221A (ja) * 2000-06-26 2002-01-09 Nikon Corp 投影光学系、露光装置及び露光方法
JP2002015979A (ja) * 2000-06-29 2002-01-18 Nikon Corp 投影光学系、露光装置及び露光方法

Also Published As

Publication number Publication date
CN101755231B (zh) 2013-01-16
US20100134880A1 (en) 2010-06-03
WO2009010213A1 (de) 2009-01-22
DE102007033967A1 (de) 2009-01-29
CN101755231A (zh) 2010-06-23

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