CN101755231B - 投射物镜 - Google Patents

投射物镜 Download PDF

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Publication number
CN101755231B
CN101755231B CN2008800252787A CN200880025278A CN101755231B CN 101755231 B CN101755231 B CN 101755231B CN 2008800252787 A CN2008800252787 A CN 2008800252787A CN 200880025278 A CN200880025278 A CN 200880025278A CN 101755231 B CN101755231 B CN 101755231B
Authority
CN
China
Prior art keywords
projection objective
field
aspect ratio
image
plane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2008800252787A
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English (en)
Chinese (zh)
Other versions
CN101755231A (zh
Inventor
汉斯-于尔根·曼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of CN101755231A publication Critical patent/CN101755231A/zh
Application granted granted Critical
Publication of CN101755231B publication Critical patent/CN101755231B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G02B13/26—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances for reproducing with unit magnification
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
CN2008800252787A 2007-07-19 2008-07-09 投射物镜 Expired - Fee Related CN101755231B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102007033967A DE102007033967A1 (de) 2007-07-19 2007-07-19 Projektionsobjektiv
DE102007033967.6 2007-07-19
PCT/EP2008/005569 WO2009010213A1 (de) 2007-07-19 2008-07-09 Projektionsobjektiv

Publications (2)

Publication Number Publication Date
CN101755231A CN101755231A (zh) 2010-06-23
CN101755231B true CN101755231B (zh) 2013-01-16

Family

ID=39709467

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2008800252787A Expired - Fee Related CN101755231B (zh) 2007-07-19 2008-07-09 投射物镜

Country Status (5)

Country Link
US (1) US20100134880A1 (enExample)
JP (1) JP2010533882A (enExample)
CN (1) CN101755231B (enExample)
DE (1) DE102007033967A1 (enExample)
WO (1) WO2009010213A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009030501A1 (de) * 2009-06-24 2011-01-05 Carl Zeiss Smt Ag Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Beleuchtungsoptik zur Ausleuchtung eines Objektfeldes
CA2815094C (en) * 2010-10-25 2018-01-16 Nikon Corporation Apparatus, optical assembly, method for inspection or measurement of an object and method for manufacturing a structure
DE102010063618A1 (de) * 2010-12-21 2012-06-21 Robert Bosch Gmbh Abbildungssystem und Fischaugenobjektiv
CN103676489B (zh) * 2012-09-14 2015-09-30 上海微电子装备有限公司 一种反射式物镜结构及其制造方法
CN103198307B (zh) * 2013-04-24 2016-01-13 北京东方金指科技有限公司 指纹采集仪
KR102868300B1 (ko) * 2015-05-28 2025-10-13 칼 짜이스 에스엠테 게엠베하 대물 필드를 이미지 필드 내로 이미징하기 위한 이미징 광학 유닛, 및 이러한 이미징 광학 유닛을 포함하는 투영 노광 장치
JP6836213B2 (ja) * 2019-02-06 2021-02-24 セイコーエプソン株式会社 投射光学装置およびプロジェクター
DE102021205774A1 (de) 2021-06-08 2022-12-08 Carl Zeiss Smt Gmbh Abbildende Optik

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999057596A1 (en) * 1998-05-06 1999-11-11 Koninklijke Philips Electronics N.V. Lithographic apparatus comprising a dedicated mirror projection system
US20040070743A1 (en) * 1999-02-15 2004-04-15 Carl-Zeiss-Smt Ag Projection system for EUV lithography
CN1985206A (zh) * 2004-05-17 2007-06-20 卡尔蔡司Smt股份公司 具有中间图像的反射折射投影物镜

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3748015A (en) 1971-06-21 1973-07-24 Perkin Elmer Corp Unit power imaging catoptric anastigmat
JPS612124A (ja) * 1984-06-14 1986-01-08 Canon Inc 結像光学系
GB8612609D0 (en) 1986-05-23 1986-07-02 Wynne C G Optical imaging systems
US5416632A (en) * 1993-05-04 1995-05-16 Carlisle; James H. Newtonian binocular telescope
US6229595B1 (en) * 1995-05-12 2001-05-08 The B. F. Goodrich Company Lithography system and method with mask image enlargement
US6631036B2 (en) * 1996-09-26 2003-10-07 Carl-Zeiss-Stiftung Catadioptric objective
JP3459753B2 (ja) 1997-06-09 2003-10-27 キヤノン株式会社 露光装置
JP4238390B2 (ja) * 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
JP2000100694A (ja) * 1998-09-22 2000-04-07 Nikon Corp 反射縮小投影光学系、該光学系を備えた投影露光装置および該装置を用いた露光方法
JP2000100703A (ja) * 1998-09-24 2000-04-07 Nikon Corp 投影露光装置及び方法、並びに反射縮小投影光学系
EP1035445B1 (de) * 1999-02-15 2007-01-31 Carl Zeiss SMT AG Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
US6985210B2 (en) * 1999-02-15 2006-01-10 Carl Zeiss Smt Ag Projection system for EUV lithography
US6600552B2 (en) * 1999-02-15 2003-07-29 Carl-Zeiss Smt Ag Microlithography reduction objective and projection exposure apparatus
US20020091301A1 (en) * 1999-05-18 2002-07-11 Levin John M. Retractor with memory
US6485145B1 (en) * 1999-12-21 2002-11-26 Scram Technologies, Inc. Optical system for display panel
JP2002006221A (ja) * 2000-06-26 2002-01-09 Nikon Corp 投影光学系、露光装置及び露光方法
JP2002015979A (ja) * 2000-06-29 2002-01-18 Nikon Corp 投影光学系、露光装置及び露光方法
DE10052289A1 (de) * 2000-10-20 2002-04-25 Zeiss Carl 8-Spiegel-Mikrolithographie-Projektionsobjektiv
US6387723B1 (en) * 2001-01-19 2002-05-14 Silicon Light Machines Reduced surface charging in silicon-based devices
TW594043B (en) * 2001-04-11 2004-06-21 Matsushita Electric Industrial Co Ltd Reflection type optical apparatus and photographing apparatus using the same, multi-wavelength photographing apparatus, monitoring apparatus for vehicle
TW558861B (en) * 2001-06-15 2003-10-21 Semiconductor Energy Lab Laser irradiation stage, laser irradiation optical system, laser irradiation apparatus, laser irradiation method, and method of manufacturing semiconductor device
JP2003045782A (ja) * 2001-07-31 2003-02-14 Canon Inc 反射型縮小投影光学系及びそれを用いた露光装置
JP2003233002A (ja) * 2002-02-07 2003-08-22 Canon Inc 反射型投影光学系、露光装置及びデバイス製造方法
JP3938040B2 (ja) * 2002-12-27 2007-06-27 キヤノン株式会社 反射型投影光学系、露光装置及びデバイス製造方法
US6813098B2 (en) 2003-01-02 2004-11-02 Ultratech, Inc. Variable numerical aperture large-field unit-magnification projection system
JP2004252363A (ja) * 2003-02-21 2004-09-09 Canon Inc 反射型投影光学系
JP2004252358A (ja) * 2003-02-21 2004-09-09 Canon Inc 反射型投影光学系及び露光装置
WO2005098504A1 (en) * 2004-04-08 2005-10-20 Carl Zeiss Smt Ag Imaging system with mirror group
US7114818B2 (en) * 2004-05-06 2006-10-03 Olympus Corporation Optical system, and electronic equipment that incorporates the same
DE102005042005A1 (de) * 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
WO2007020004A1 (de) * 2005-08-17 2007-02-22 Carl Zeiss Smt Ag Projektionsobjektiv und verfahren zur optimierung einer systemblende eines projektionsobjektivs
TWI366004B (en) 2005-09-13 2012-06-11 Zeiss Carl Smt Gmbh Microlithography projection optical system, microlithographic tool comprising such an optical system, method for microlithographic production of microstructured components using such a microlithographic tool, microstructured component being produced by s
EP2005250B1 (en) * 2006-04-07 2012-11-07 Carl Zeiss SMT GmbH Microlithography projection optical system, tool and method of production

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999057596A1 (en) * 1998-05-06 1999-11-11 Koninklijke Philips Electronics N.V. Lithographic apparatus comprising a dedicated mirror projection system
US20040070743A1 (en) * 1999-02-15 2004-04-15 Carl-Zeiss-Smt Ag Projection system for EUV lithography
CN1985206A (zh) * 2004-05-17 2007-06-20 卡尔蔡司Smt股份公司 具有中间图像的反射折射投影物镜

Also Published As

Publication number Publication date
US20100134880A1 (en) 2010-06-03
WO2009010213A1 (de) 2009-01-22
DE102007033967A1 (de) 2009-01-29
JP2010533882A (ja) 2010-10-28
CN101755231A (zh) 2010-06-23

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Granted publication date: 20130116

Termination date: 20210709

CF01 Termination of patent right due to non-payment of annual fee