JP2010524036A5 - - Google Patents

Download PDF

Info

Publication number
JP2010524036A5
JP2010524036A5 JP2010502436A JP2010502436A JP2010524036A5 JP 2010524036 A5 JP2010524036 A5 JP 2010524036A5 JP 2010502436 A JP2010502436 A JP 2010502436A JP 2010502436 A JP2010502436 A JP 2010502436A JP 2010524036 A5 JP2010524036 A5 JP 2010524036A5
Authority
JP
Japan
Prior art keywords
mirror
iris diaphragm
medium
sample
polarization sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2010502436A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010524036A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2008/002464 external-priority patent/WO2008125199A1/en
Publication of JP2010524036A publication Critical patent/JP2010524036A/ja
Publication of JP2010524036A5 publication Critical patent/JP2010524036A5/ja
Withdrawn legal-status Critical Current

Links

JP2010502436A 2007-04-11 2008-03-28 屈折率の高い芳香族ウレタンアクリレート Withdrawn JP2010524036A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US92298807P 2007-04-11 2007-04-11
PCT/EP2008/002464 WO2008125199A1 (en) 2007-04-11 2008-03-28 Aromatic urethane acrylates having a high refractive index

Publications (2)

Publication Number Publication Date
JP2010524036A JP2010524036A (ja) 2010-07-15
JP2010524036A5 true JP2010524036A5 (enExample) 2011-05-12

Family

ID=39381885

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010502436A Withdrawn JP2010524036A (ja) 2007-04-11 2008-03-28 屈折率の高い芳香族ウレタンアクリレート

Country Status (12)

Country Link
US (1) US7981987B2 (enExample)
EP (1) EP2137220B1 (enExample)
JP (1) JP2010524036A (enExample)
KR (1) KR20100015471A (enExample)
CN (1) CN101668782A (enExample)
BR (1) BRPI0810831A2 (enExample)
CA (1) CA2683882A1 (enExample)
IL (1) IL200719A0 (enExample)
IN (1) IN2009DN05755A (enExample)
RU (1) RU2009141367A (enExample)
TW (1) TW200909451A (enExample)
WO (1) WO2008125199A1 (enExample)

Families Citing this family (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2683905A1 (en) * 2007-04-11 2008-10-23 Bayer Materialscience Ag Advantageous recording media for holographic applications
JP5667438B2 (ja) * 2007-04-11 2015-02-12 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトＢａｙｅｒ ＭａｔｅｒｉａｌＳｃｉｅｎｃｅ ＡＧ 放射線架橋性および熱架橋性のイソシアネート反応性ブロックコポリマーをベースとするｐｕ系
RU2009141369A (ru) * 2007-04-11 2011-05-20 Байер МатириальСайенс АГ (DE) Радиационно-сшиваемые и термически-сшиваемые полиуретановые системы, содержащие иминооксадиазиндион
EP2193294B1 (en) 2007-10-04 2013-01-02 Integran Technologies Vehicular transmission parts
WO2009045416A1 (en) 2007-10-04 2009-04-09 E.I. Du Pont De Nemours And Company Vehicular electrical and electronic housings
US20100270767A1 (en) * 2007-10-04 2010-10-28 Morph Technologies, Inc. Vehicular suspension components
US20100290899A1 (en) * 2007-10-04 2010-11-18 Morph Technologies, Inc. Vehicular turbocharger components
WO2009045415A1 (en) * 2007-10-04 2009-04-09 E. I. Du Pont De Nemours And Company Internal combustion engine covers
KR20100086480A (ko) * 2007-11-19 2010-07-30 사이텍 설패이스 스페셜티즈, 에스.에이. 방사선 경화성 조성물
ATE493383T1 (de) 2008-08-08 2011-01-15 Bayer Materialscience Ag Phenylisocyanat-basierte urethanacrylate mit hohem brechungsindex
JP2012504777A (ja) * 2008-10-01 2012-02-23 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト 自己現像性ポリマーをベースとする体積ホログラフィックのための媒体
KR101808493B1 (ko) * 2008-10-01 2017-12-12 코베스트로 도이칠란드 아게 홀로그래피 매체의 제조를 위한 예비중합체-기재 폴리우레탄 제제
IL200996A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer formulations having a low crosslinking density
IL200997A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Special polyether-based polyurethane formulations for the production of holographic media
IL200722A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer compositions for optical elements and visual displays
IL200995A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Polyether-based polyurethane formulations for the production of holographic media
EP2218743A1 (de) * 2009-02-12 2010-08-18 Bayer MaterialScience AG Prepolymerbasierte Polyurethanformulierungen zur Herstellung holographischer Filme
EP2218742A1 (de) 2009-02-12 2010-08-18 Bayer MaterialScience AG Photopolymerzusammensetzungen als verdruckbare Formulierungen
EP2218744A1 (de) * 2009-02-12 2010-08-18 Bayer MaterialScience AG Methode zur Herstellung von holografischen Photopolymeren auf Polymerfolien
US8284234B2 (en) 2009-03-20 2012-10-09 Absolute Imaging LLC Endoscopic imaging using reflection holographic optical element for autostereoscopic 3-D viewing
US8323854B2 (en) * 2009-04-23 2012-12-04 Akonia Holographics, Llc Photopolymer media with enhanced dynamic range
JP5483065B2 (ja) * 2009-09-28 2014-05-07 川崎化成工業株式会社 アントラセン骨格を有するエポキシアクリレート及びその製造法
US20120316256A1 (en) * 2009-11-02 2012-12-13 Abdul Rashid Polymers for Contact Lenses
CN102667936B (zh) * 2009-11-03 2016-03-30 拜尔材料科学股份公司 生产全息介质的方法
RU2570662C9 (ru) 2009-11-03 2016-07-20 Байер Матириальсайенс Аг Фторуретаны в качестве добавки в фотополимерной композиции
IN2012DN03900A (enExample) 2009-11-03 2015-09-04 Bayer Materialscience Ag
CN102667935B (zh) * 2009-11-03 2016-01-20 拜尔材料科学股份公司 具有不同书写共聚单体的光聚合物制剂
EP2497080B1 (de) 2009-11-03 2013-12-25 Bayer Intellectual Property GmbH Verfahren zur herstellung eines holographischen films
EP2496549B1 (de) 2009-11-03 2014-10-08 Bayer Intellectual Property GmbH Neue, nicht kristallisierende methacrylate, deren herstellung und verwendung
US8877408B2 (en) 2009-11-03 2014-11-04 Bayer Materialscience Ag Urethanes used as additives in a photopolymer formulation
US8808946B2 (en) 2009-11-03 2014-08-19 Bayer Materialscience Ag Urethane acrylate having a high refractive index and reduced double bond density
PL2317511T3 (pl) * 2009-11-03 2012-08-31 Bayer Materialscience Ag Formulacje fotopolimerowe z nastawialnym mechanicznym modułem Guv
WO2011091550A1 (en) 2010-01-28 2011-08-04 Bayer Materialscience Ag High speed dvds
CN102947885A (zh) * 2010-01-28 2013-02-27 拜耳材料科技股份有限公司 高速dvd
EP2531892B1 (de) * 2010-02-02 2016-01-27 Covestro Deutschland AG Verwendung einer photopolymer-formulierung mit triazin-basierten schreibmonomeren
KR101804591B1 (ko) * 2010-02-02 2017-12-04 바이엘 인텔렉쳐 프로퍼티 게엠베하 에스테르-기재 기록 단량체를 갖는 광중합체 배합물
EP2368934A1 (de) * 2010-03-26 2011-09-28 Bayer MaterialScience AG Polymerschichtenverbund mit verbesserter Haftung der Schichten
EP2372454A1 (de) * 2010-03-29 2011-10-05 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme
US8957086B2 (en) 2010-05-05 2015-02-17 The Board Of Trustees Of The University Of Illinois Compounds and methods of treating brain disorders
US9057946B2 (en) * 2010-08-11 2015-06-16 Bayer Intellectual Property Gmbh Difunctional (meth)acrylate writing monomers
JP2012077278A (ja) * 2010-10-04 2012-04-19 Pelnox Ltd 光学材料用樹脂組成物およびその硬化物
JP5859280B2 (ja) * 2011-11-14 2016-02-10 新日鉄住金化学株式会社 感光性材料、ホログラフィック記録媒体、及びホログラフィック記録方法
JP6062732B2 (ja) * 2012-12-19 2017-01-18 株式会社Adeka 新規化合物及び着色感光性組成物
US10001703B2 (en) * 2013-10-17 2018-06-19 Covestro Deutschland Ag Photopolymer formulation for production of holographic media comprising borates with low TG
KR102382218B1 (ko) 2014-04-25 2022-04-05 코베스트로 도이칠란트 아게 홀로그래픽 광중합체 배합물에서의 기록 단량체로서의 방향족 글리콜 에테르
WO2016047691A1 (ja) * 2014-09-24 2016-03-31 旭化成イーマテリアルズ株式会社 感光性樹脂組成物、感光性樹脂積層体、樹脂パターンの製造方法、硬化膜及び表示装置
TWI574257B (zh) * 2015-02-17 2017-03-11 駿康科技有限公司 資訊記錄媒體塗佈溶劑組合物
JP6208398B2 (ja) * 2015-09-10 2017-10-04 三井化学東セロ株式会社 粘着剤組成物及びその製造方法並びに粘着フィルム
CN105418674A (zh) * 2015-11-10 2016-03-23 中国乐凯集团有限公司 一种高折射率树脂及其应用
US11718580B2 (en) 2019-05-08 2023-08-08 Meta Platforms Technologies, Llc Fluorene derivatized monomers and polymers for volume Bragg gratings
US20210155639A1 (en) * 2019-11-27 2021-05-27 Facebook Technologies, Llc Thiophosphate and phosphine sulfide derivatized monomers and polymers for volume bragg gratings
US11780819B2 (en) 2019-11-27 2023-10-10 Meta Platforms Technologies, Llc Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings
US20210155584A1 (en) * 2019-11-27 2021-05-27 Facebook Technologies, Llc Aromatic substituted methane-core monomers and polymers thereof for volume bragg gratings
US11879024B1 (en) 2020-07-14 2024-01-23 Meta Platforms Technologies, Llc Soft mold formulations for surface relief grating fabrication with imprinting lithography
US20220153895A1 (en) * 2020-11-13 2022-05-19 Facebook Technologies, Llc Substituted propane-core monomers and polymers thereof for volume bragg gratings
US20220153693A1 (en) * 2020-11-13 2022-05-19 Facebook Technologies, Llc Substituted mono- and poly-phenyl-core monomers and polymers thereof for volume bragg gratings
CN113621121B (zh) * 2021-07-15 2022-08-23 中联重科股份有限公司 聚氨酯组合物和聚氨酯材料的制备方法及应用
CN114213626B (zh) * 2021-12-09 2023-04-28 江苏三木化工股份有限公司 一种植物油基光固化聚氨酯丙烯酸酯的制备方法
CN114231163A (zh) * 2021-12-22 2022-03-25 武汉工程大学 一种聚氨酯类有机无机复合材料及其制备方法和应用
CN115785756B (zh) * 2022-12-12 2023-07-28 江苏视科新材料股份有限公司 一种折光指数可调节的防蓝光涂层材料的制备方法
CN115785811B (zh) * 2022-12-12 2023-07-28 江苏视科新材料股份有限公司 一种高折射率防蓝光材料和防蓝光滤光片
CN118685059A (zh) * 2024-06-24 2024-09-24 杭州福斯特应用材料股份有限公司 有机涂层组合物、有机涂层及其制备方法和应用

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5916987A (en) 1996-05-29 1999-06-29 Mitsui Chemicals, Inc. Thiol and Sulfur-containing O-(meth) acrylate compounds and use thereof
US6232038B1 (en) * 1998-10-07 2001-05-15 Mitsubishi Chemical Corporation Photosensitive composition, image-forming material and image-forming method employing it
ATE265481T1 (de) * 1998-11-17 2004-05-15 Showa Denko Kk Photohärtbare zusammensetzung
EP1014113A3 (en) * 1998-12-21 2001-05-09 Dsm N.V. Photo curable resin composition and optical parts
IL149733A0 (en) * 1999-11-18 2002-11-10 Ppg Industries Inc Optical resin composition
KR100453344B1 (ko) 2000-09-22 2004-10-20 미쯔이카가쿠 가부시기가이샤 아크릴산 에스테르화합물 및 그 용도
US6780546B2 (en) 2001-08-30 2004-08-24 Inphase Technologies, Inc. Blue-sensitized holographic media
AU2003281687A1 (en) * 2002-07-29 2004-02-16 Mitsui Chemicals, Inc. Photopolymerizable composition and use thereof
JP3852613B2 (ja) * 2003-02-12 2006-12-06 三菱化学株式会社 感光性組成物、並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法
JP2004295058A (ja) * 2003-02-14 2004-10-21 Mitsubishi Chemicals Corp 感光性組成物
JP3896098B2 (ja) * 2003-06-27 2007-03-22 株式会社東芝 ホログラム記録媒体およびその作製方法
JP2006307159A (ja) * 2005-03-28 2006-11-09 Toyo Ink Mfg Co Ltd 硬化性高屈折率材料及び該硬化性高屈折率材料を用いてなる積層体
JP4675197B2 (ja) * 2005-09-20 2011-04-20 富士フイルム株式会社 溶媒非含有の光記録用組成物及びその製造方法、並びに光記録媒体

Similar Documents

Publication Publication Date Title
CN102252823B (zh) 基于双波长相移干涉测量光学非均匀性的方法
CN107179127B (zh) 偏振态参量的点衍射式数字全息测量装置与方法
CN105136289A (zh) 一种用于探测多路复用涡旋光束的复合光栅及测量方法
CN102087481A (zh) 一种凹面全息光栅曝光光路中实时监测装置的调整方法
CN110057543B (zh) 基于同轴干涉的波面测量装置
CN103792795A (zh) 以光纤作为空间滤波器与扩束器的激光干涉微影设备
Voigtländer et al. Inscription of high contrast volume Bragg gratings in fused silica with femtosecond laser pulses
CN203848938U (zh) 一种真空紫外激光线宽的测量装置
CN110837213A (zh) 用于激光干涉光刻系统的相位测量装置及其使用方法
Blain et al. An in-line shearography setup based on circular polarization gratings
Jin et al. Design of double-layer metal-dielectric reflecting polarizing beam splitter grating based on simplified mode method
CN112378626B (zh) 体布拉格光栅折射率调制度测量方法
JP3730629B2 (ja) 光ファイバの残留応力測定装置
CN103278105B (zh) 轴锥镜面形和锥角的检测方法
CN104076620A (zh) 一种体全息光栅的一步曝光装置及方法
CN103994734A (zh) 基于双波长光源的轴锥镜锥角检测装置及检测方法
CN101866141A (zh) 大折射率调制度的斜条纹全息波导器件制作方法
Lee et al. Photopolymer-based surface-normal input/output volume holographic grating coupler for 1550-nm optical wavelength
CN100504504C (zh) 利用光折变高阶衍射对携带信息的光束进行分束的方法
CN109470455B (zh) 一种介质膜光栅检测装置
Sirvent-Verdú et al. Characterization and optimization of the low-toxicity nanocomposite photopolymer Biophotopol for holographic couplers
RU2690230C1 (ru) Способ формирования массива волоконных решеток Брэгга с различными длинами волн отражения
WO2016183602A1 (en) Centrally symmetric liquid crystal polarization diffractive waveplate and its fabrication
CN223021374U (zh) 一种基于全息技术的特殊光束探测器制备装置
CN101251653A (zh) 二维光学高阶衍射分束器的制备方法