JP2010517310A - マイクロリソグラフィ投影露光装置の照明システム - Google Patents

マイクロリソグラフィ投影露光装置の照明システム Download PDF

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JP2010517310A
JP2010517310A JP2009547594A JP2009547594A JP2010517310A JP 2010517310 A JP2010517310 A JP 2010517310A JP 2009547594 A JP2009547594 A JP 2009547594A JP 2009547594 A JP2009547594 A JP 2009547594A JP 2010517310 A JP2010517310 A JP 2010517310A
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filter
plane
illumination system
field
transmittance
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JP2010517310A5 (enExample
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ニルス ディークマン
マンフレート マウル
クリスティアン ヘッティヒ
オリヴァー ナット
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カール・ツァイス・エスエムティー・アーゲー
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Publication of JP2010517310A5 publication Critical patent/JP2010517310A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2009547594A 2007-01-30 2008-01-30 マイクロリソグラフィ投影露光装置の照明システム Pending JP2010517310A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US88718607P 2007-01-30 2007-01-30
PCT/EP2008/000706 WO2008092653A2 (en) 2007-01-30 2008-01-30 Illumination system of a microlithographic projection exposure apparatus

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JP2010517310A true JP2010517310A (ja) 2010-05-20
JP2010517310A5 JP2010517310A5 (enExample) 2011-03-03

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JP2009547594A Pending JP2010517310A (ja) 2007-01-30 2008-01-30 マイクロリソグラフィ投影露光装置の照明システム

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US (2) US8169594B2 (enExample)
EP (1) EP2126636B1 (enExample)
JP (1) JP2010517310A (enExample)
KR (1) KR101440652B1 (enExample)
CN (1) CN101636695B (enExample)
WO (1) WO2008092653A2 (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009267400A (ja) * 2008-04-29 2009-11-12 Nikon Corp 補正フィルター、照明光学系、露光装置、およびデバイス製造方法
JP2010157650A (ja) * 2008-12-30 2010-07-15 Nikon Corp 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
JP2010157649A (ja) * 2008-12-30 2010-07-15 Nikon Corp 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
JP2015535096A (ja) * 2012-10-30 2015-12-07 カール・ツァイス・エスエムティー・ゲーエムベーハー 圧力変動の影響を減少させる手段を備える投影露光装置

Families Citing this family (17)

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JP4599936B2 (ja) 2004-08-17 2010-12-15 株式会社ニコン 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
KR100865554B1 (ko) * 2007-06-27 2008-10-29 주식회사 하이닉스반도체 노광 장치
US8908151B2 (en) 2008-02-14 2014-12-09 Nikon Corporation Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system
DE102008011501A1 (de) 2008-02-25 2009-08-27 Carl Zeiss Smt Ag Verfahren zum Betreiben eines Beleuchtungssystems einer mikrolithographischen Projektionsbelichtungsanlage
US8237684B2 (en) * 2008-09-26 2012-08-07 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. User input device with planar light guide illumination plate
KR101960153B1 (ko) * 2008-12-24 2019-03-19 가부시키가이샤 니콘 조명 광학계, 노광 장치 및 디바이스의 제조 방법
JP5473350B2 (ja) 2009-02-13 2014-04-16 キヤノン株式会社 照明光学系、露光装置及びデバイスの製造方法
DE102013206528B4 (de) 2013-04-12 2014-11-20 Carl Zeiss Smt Gmbh Mikrolithographische projektionsbelichtungsanlage mit einem variablen transmissionsfilter
DE102013208129B4 (de) 2013-05-03 2014-11-20 Carl Zeiss Smt Gmbh Mikrolithographische Projektionsbelichtungsanlage mit einem variablen Transmissionsfilter
CN103293877B (zh) * 2013-05-31 2014-12-31 上海华力微电子有限公司 采用四极曝光方式的光刻装置、通光单元及光刻方法
GB2540654A (en) * 2015-05-13 2017-01-25 Zeiss Carl Smt Gmbh Method of variably attenuating a beam of projection light in an optical system of a microlithographic apparatus
WO2018029962A1 (ja) 2016-08-08 2018-02-15 ソニー株式会社 内視鏡装置及び内視鏡装置の制御方法
PT3642674T (pt) 2017-06-19 2023-05-02 Suss Microtec Solutions Gmbh & Co Kg Compensação de ampliação e/ou direcionamento de feixe em sistemas óticos
US11175487B2 (en) 2017-06-19 2021-11-16 Suss Microtec Photonic Systems Inc. Optical distortion reduction in projection systems
JP7413234B2 (ja) * 2020-11-06 2024-01-15 株式会社東芝 光学撮像装置、光学検査装置、および、光学検査方法
JP7680878B2 (ja) * 2021-05-07 2025-05-21 キヤノン株式会社 照明光学系、露光装置、および物品の製造方法
DE102021120952B3 (de) * 2021-08-11 2022-11-10 Carl Zeiss Smt Gmbh Verfahren zur Korrektur eines Telezentriefehlers einer Abbildungsvorrichtung und Maskeninspektionsmikroskop

Citations (11)

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Publication number Priority date Publication date Assignee Title
JPH06291016A (ja) * 1993-04-06 1994-10-18 Nikon Corp 投影露光装置
JPH11176746A (ja) * 1997-10-07 1999-07-02 Nikon Corp 走査型露光方法、装置及び素子製造方法
JP2001135564A (ja) * 1999-11-05 2001-05-18 Canon Inc 投影露光装置
JP2002175980A (ja) * 2000-09-19 2002-06-21 Carl Zeiss:Fa 投影露光装置
JP2002231625A (ja) * 2000-12-20 2002-08-16 Carl Zeiss Semiconductor Manufacturing Technologies Ag 照明装置用の光学積分器
WO2003023832A1 (en) * 2001-09-07 2003-03-20 Nikon Corporation Exposure method and system, and device production method
JP2005196180A (ja) * 2003-12-31 2005-07-21 Asml Netherlands Bv 光減衰器デバイス、放射システム、及び、それらの付属するリソグラフィ装置、及び、デバイス製造方法
WO2005119369A1 (en) * 2004-06-04 2005-12-15 Carl Zeiss Smt Ag Projection system with compensation of intensity variatons and compensation element therefor
WO2006018972A1 (ja) * 2004-08-17 2006-02-23 Nikon Corporation 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
JP2006066429A (ja) * 2004-08-24 2006-03-09 Nikon Corp 照明光学装置、露光装置、および露光方法
WO2006066638A1 (en) * 2004-12-23 2006-06-29 Carl Zeiss Smt Ag A filter device for the compensation of an asymmetric pupil illumination

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JPH09199390A (ja) 1996-01-16 1997-07-31 Hitachi Ltd パターン形成方法、投影露光装置および半導体装置の製造方法
US7130129B2 (en) 1996-12-21 2006-10-31 Carl Zeiss Smt Ag Reticle-masking objective with aspherical lenses
US6013401A (en) 1997-03-31 2000-01-11 Svg Lithography Systems, Inc. Method of controlling illumination field to reduce line width variation
EP0952491A3 (en) 1998-04-21 2001-05-09 Asm Lithography B.V. Lithography apparatus
DE10043315C1 (de) 2000-09-02 2002-06-20 Zeiss Carl Projektionsbelichtungsanlage
JP4923370B2 (ja) 2001-09-18 2012-04-25 株式会社ニコン 照明光学系、露光装置、及びマイクロデバイスの製造方法
DE10158921A1 (de) 2001-11-30 2003-06-26 Zeiss Carl Smt Ag Verfahren zum Bestimmen von mindestens einer Kenngröße, die für die Beleuchtungswinkelverteilung einer der Beleuchtung eines Gegenstandes dienenden Lichtquelle einer Projektionsbelichtungsanlage charakteristisch ist
WO2005006079A1 (de) 2003-07-07 2005-01-20 Carl Zeiss Smt Ag Beleuchtungseinrichtung für eine mikrolithographische projektionsbelichtungsanlage
KR100598095B1 (ko) * 2003-07-10 2006-07-07 삼성전자주식회사 노광 장치
US20060268251A1 (en) * 2003-07-16 2006-11-30 Markus Deguenther Illumination system for a microlithographic projection exposure apparatus
DE102004011733A1 (de) * 2004-03-04 2005-09-22 Carl Zeiss Smt Ag Transmissionsfiltervorrichtung
US7283209B2 (en) * 2004-07-09 2007-10-16 Carl Zeiss Smt Ag Illumination system for microlithography
JP5030944B2 (ja) 2005-04-26 2012-09-19 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ露光装置のための照明システム
DE102006013459A1 (de) 2006-03-23 2007-09-27 Infineon Technologies Ag Anordnung zur Übertragung von Strukturelementen einer Photomaske auf ein Substrat und Verfahren zur Übertragung von Strukturelementen einer Photomaske auf ein Substrat

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06291016A (ja) * 1993-04-06 1994-10-18 Nikon Corp 投影露光装置
JPH11176746A (ja) * 1997-10-07 1999-07-02 Nikon Corp 走査型露光方法、装置及び素子製造方法
JP2001135564A (ja) * 1999-11-05 2001-05-18 Canon Inc 投影露光装置
JP2002175980A (ja) * 2000-09-19 2002-06-21 Carl Zeiss:Fa 投影露光装置
JP2002231625A (ja) * 2000-12-20 2002-08-16 Carl Zeiss Semiconductor Manufacturing Technologies Ag 照明装置用の光学積分器
WO2003023832A1 (en) * 2001-09-07 2003-03-20 Nikon Corporation Exposure method and system, and device production method
JP2005196180A (ja) * 2003-12-31 2005-07-21 Asml Netherlands Bv 光減衰器デバイス、放射システム、及び、それらの付属するリソグラフィ装置、及び、デバイス製造方法
WO2005119369A1 (en) * 2004-06-04 2005-12-15 Carl Zeiss Smt Ag Projection system with compensation of intensity variatons and compensation element therefor
WO2006018972A1 (ja) * 2004-08-17 2006-02-23 Nikon Corporation 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
JP2006059834A (ja) * 2004-08-17 2006-03-02 Nikon Corp 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
JP2006066429A (ja) * 2004-08-24 2006-03-09 Nikon Corp 照明光学装置、露光装置、および露光方法
WO2006066638A1 (en) * 2004-12-23 2006-06-29 Carl Zeiss Smt Ag A filter device for the compensation of an asymmetric pupil illumination
DE102004063314A1 (de) * 2004-12-23 2006-07-13 Carl Zeiss Smt Ag Filtereinrichtung für die Kompensation einer asymmetrischen Pupillenausleuchtung

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009267400A (ja) * 2008-04-29 2009-11-12 Nikon Corp 補正フィルター、照明光学系、露光装置、およびデバイス製造方法
JP2010157650A (ja) * 2008-12-30 2010-07-15 Nikon Corp 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
JP2010157649A (ja) * 2008-12-30 2010-07-15 Nikon Corp 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
JP2015535096A (ja) * 2012-10-30 2015-12-07 カール・ツァイス・エスエムティー・ゲーエムベーハー 圧力変動の影響を減少させる手段を備える投影露光装置

Also Published As

Publication number Publication date
KR20090129409A (ko) 2009-12-16
CN101636695B (zh) 2012-06-06
CN101636695A (zh) 2010-01-27
KR101440652B1 (ko) 2014-09-22
EP2126636A2 (en) 2009-12-02
US9116441B2 (en) 2015-08-25
WO2008092653A2 (en) 2008-08-07
WO2008092653A3 (en) 2008-10-09
US20120188527A1 (en) 2012-07-26
EP2126636B1 (en) 2012-06-13
US20090323043A1 (en) 2009-12-31
US8169594B2 (en) 2012-05-01

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