CN101636695B - 微光刻投射曝光设备的照明系统 - Google Patents

微光刻投射曝光设备的照明系统 Download PDF

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Publication number
CN101636695B
CN101636695B CN2008800035249A CN200880003524A CN101636695B CN 101636695 B CN101636695 B CN 101636695B CN 2008800035249 A CN2008800035249 A CN 2008800035249A CN 200880003524 A CN200880003524 A CN 200880003524A CN 101636695 B CN101636695 B CN 101636695B
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China
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plane
illuminator
filter
scanning
transmissivity
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Chinese (zh)
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CN101636695A (zh
Inventor
尼尔斯·迪克曼
曼弗雷德·莫尔
克里斯琴·赫蒂奇
奥利弗·纳特
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN2008800035249A 2007-01-30 2008-01-30 微光刻投射曝光设备的照明系统 Expired - Fee Related CN101636695B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US88718607P 2007-01-30 2007-01-30
US60/887,186 2007-01-30
PCT/EP2008/000706 WO2008092653A2 (en) 2007-01-30 2008-01-30 Illumination system of a microlithographic projection exposure apparatus

Publications (2)

Publication Number Publication Date
CN101636695A CN101636695A (zh) 2010-01-27
CN101636695B true CN101636695B (zh) 2012-06-06

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US (2) US8169594B2 (enExample)
EP (1) EP2126636B1 (enExample)
JP (1) JP2010517310A (enExample)
KR (1) KR101440652B1 (enExample)
CN (1) CN101636695B (enExample)
WO (1) WO2008092653A2 (enExample)

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US11266295B2 (en) 2016-08-08 2022-03-08 Sony Corporation Endoscope apparatus and control method of endoscope apparatus

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US8908151B2 (en) 2008-02-14 2014-12-09 Nikon Corporation Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system
DE102008011501A1 (de) 2008-02-25 2009-08-27 Carl Zeiss Smt Ag Verfahren zum Betreiben eines Beleuchtungssystems einer mikrolithographischen Projektionsbelichtungsanlage
JP5201061B2 (ja) * 2008-04-29 2013-06-05 株式会社ニコン 補正フィルター、照明光学系、露光装置、およびデバイス製造方法
US8237684B2 (en) * 2008-09-26 2012-08-07 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. User input device with planar light guide illumination plate
KR101960153B1 (ko) * 2008-12-24 2019-03-19 가부시키가이샤 니콘 조명 광학계, 노광 장치 및 디바이스의 제조 방법
JP5187631B2 (ja) * 2008-12-30 2013-04-24 株式会社ニコン 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
JP5187632B2 (ja) * 2008-12-30 2013-04-24 株式会社ニコン 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
JP5473350B2 (ja) 2009-02-13 2014-04-16 キヤノン株式会社 照明光学系、露光装置及びデバイスの製造方法
DE102012219806A1 (de) * 2012-10-30 2014-04-30 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit mindestens einem Mittel zur Reduktion des Einflusses von Druckschwankungen
DE102013206528B4 (de) 2013-04-12 2014-11-20 Carl Zeiss Smt Gmbh Mikrolithographische projektionsbelichtungsanlage mit einem variablen transmissionsfilter
DE102013208129B4 (de) 2013-05-03 2014-11-20 Carl Zeiss Smt Gmbh Mikrolithographische Projektionsbelichtungsanlage mit einem variablen Transmissionsfilter
CN103293877B (zh) * 2013-05-31 2014-12-31 上海华力微电子有限公司 采用四极曝光方式的光刻装置、通光单元及光刻方法
GB2540654A (en) * 2015-05-13 2017-01-25 Zeiss Carl Smt Gmbh Method of variably attenuating a beam of projection light in an optical system of a microlithographic apparatus
PT3642674T (pt) 2017-06-19 2023-05-02 Suss Microtec Solutions Gmbh & Co Kg Compensação de ampliação e/ou direcionamento de feixe em sistemas óticos
US11175487B2 (en) 2017-06-19 2021-11-16 Suss Microtec Photonic Systems Inc. Optical distortion reduction in projection systems
JP7413234B2 (ja) * 2020-11-06 2024-01-15 株式会社東芝 光学撮像装置、光学検査装置、および、光学検査方法
JP7680878B2 (ja) * 2021-05-07 2025-05-21 キヤノン株式会社 照明光学系、露光装置、および物品の製造方法
DE102021120952B3 (de) * 2021-08-11 2022-11-10 Carl Zeiss Smt Gmbh Verfahren zur Korrektur eines Telezentriefehlers einer Abbildungsvorrichtung und Maskeninspektionsmikroskop

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JPH09199390A (ja) 1996-01-16 1997-07-31 Hitachi Ltd パターン形成方法、投影露光装置および半導体装置の製造方法
US7130129B2 (en) 1996-12-21 2006-10-31 Carl Zeiss Smt Ag Reticle-masking objective with aspherical lenses
JPH11176746A (ja) * 1997-10-07 1999-07-02 Nikon Corp 走査型露光方法、装置及び素子製造方法
US6013401A (en) 1997-03-31 2000-01-11 Svg Lithography Systems, Inc. Method of controlling illumination field to reduce line width variation
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JP4545854B2 (ja) * 1999-11-05 2010-09-15 キヤノン株式会社 投影露光装置
DE10043315C1 (de) 2000-09-02 2002-06-20 Zeiss Carl Projektionsbelichtungsanlage
DE10046218B4 (de) * 2000-09-19 2007-02-22 Carl Zeiss Smt Ag Projektionsbelichtungsanlage
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WO2003023832A1 (en) * 2001-09-07 2003-03-20 Nikon Corporation Exposure method and system, and device production method
JP4923370B2 (ja) 2001-09-18 2012-04-25 株式会社ニコン 照明光学系、露光装置、及びマイクロデバイスの製造方法
DE10158921A1 (de) 2001-11-30 2003-06-26 Zeiss Carl Smt Ag Verfahren zum Bestimmen von mindestens einer Kenngröße, die für die Beleuchtungswinkelverteilung einer der Beleuchtung eines Gegenstandes dienenden Lichtquelle einer Projektionsbelichtungsanlage charakteristisch ist
WO2005006079A1 (de) 2003-07-07 2005-01-20 Carl Zeiss Smt Ag Beleuchtungseinrichtung für eine mikrolithographische projektionsbelichtungsanlage
KR100598095B1 (ko) * 2003-07-10 2006-07-07 삼성전자주식회사 노광 장치
US20060268251A1 (en) * 2003-07-16 2006-11-30 Markus Deguenther Illumination system for a microlithographic projection exposure apparatus
US7030958B2 (en) * 2003-12-31 2006-04-18 Asml Netherlands B.V. Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method
DE102004011733A1 (de) * 2004-03-04 2005-09-22 Carl Zeiss Smt Ag Transmissionsfiltervorrichtung
JP4913041B2 (ja) * 2004-06-04 2012-04-11 カール・ツァイス・エスエムティー・ゲーエムベーハー 強度変化の補償を伴う投影系及びそのための補償素子
US7283209B2 (en) * 2004-07-09 2007-10-16 Carl Zeiss Smt Ag Illumination system for microlithography
JP4599936B2 (ja) * 2004-08-17 2010-12-15 株式会社ニコン 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
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JP5030944B2 (ja) 2005-04-26 2012-09-19 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ露光装置のための照明システム
DE102006013459A1 (de) 2006-03-23 2007-09-27 Infineon Technologies Ag Anordnung zur Übertragung von Strukturelementen einer Photomaske auf ein Substrat und Verfahren zur Übertragung von Strukturelementen einer Photomaske auf ein Substrat

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DE102004063314A1 (de) * 2004-12-23 2006-07-13 Carl Zeiss Smt Ag Filtereinrichtung für die Kompensation einer asymmetrischen Pupillenausleuchtung

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11266295B2 (en) 2016-08-08 2022-03-08 Sony Corporation Endoscope apparatus and control method of endoscope apparatus

Also Published As

Publication number Publication date
KR20090129409A (ko) 2009-12-16
JP2010517310A (ja) 2010-05-20
CN101636695A (zh) 2010-01-27
KR101440652B1 (ko) 2014-09-22
EP2126636A2 (en) 2009-12-02
US9116441B2 (en) 2015-08-25
WO2008092653A2 (en) 2008-08-07
WO2008092653A3 (en) 2008-10-09
US20120188527A1 (en) 2012-07-26
EP2126636B1 (en) 2012-06-13
US20090323043A1 (en) 2009-12-31
US8169594B2 (en) 2012-05-01

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