JP2010512260A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2010512260A5 JP2010512260A5 JP2009540670A JP2009540670A JP2010512260A5 JP 2010512260 A5 JP2010512260 A5 JP 2010512260A5 JP 2009540670 A JP2009540670 A JP 2009540670A JP 2009540670 A JP2009540670 A JP 2009540670A JP 2010512260 A5 JP2010512260 A5 JP 2010512260A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- coating
- further characterized
- plasma
- pulse
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011248 coating agent Substances 0.000 claims 12
- 238000000576 coating method Methods 0.000 claims 12
- 239000000758 substrate Substances 0.000 claims 12
- 239000002131 composite material Substances 0.000 claims 11
- 238000000034 method Methods 0.000 claims 11
- 239000007789 gas Substances 0.000 claims 8
- 229910052760 oxygen Inorganic materials 0.000 claims 7
- 229910052799 carbon Inorganic materials 0.000 claims 6
- 238000000151 deposition Methods 0.000 claims 5
- 230000008021 deposition Effects 0.000 claims 5
- 229910052710 silicon Inorganic materials 0.000 claims 5
- 229910052739 hydrogen Inorganic materials 0.000 claims 4
- 239000000203 mixture Substances 0.000 claims 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 3
- 239000001301 oxygen Substances 0.000 claims 3
- 239000007858 starting material Substances 0.000 claims 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 claims 2
- 239000002243 precursor Substances 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- WZJUBBHODHNQPW-UHFFFAOYSA-N 2,4,6,8-tetramethyl-1,3,5,7,2$l^{3},4$l^{3},6$l^{3},8$l^{3}-tetraoxatetrasilocane Chemical compound C[Si]1O[Si](C)O[Si](C)O[Si](C)O1 WZJUBBHODHNQPW-UHFFFAOYSA-N 0.000 claims 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- -1 TMDSN Chemical compound 0.000 claims 1
- 229910021529 ammonia Inorganic materials 0.000 claims 1
- 229910052786 argon Inorganic materials 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 239000012159 carrier gas Substances 0.000 claims 1
- 229920006037 cross link polymer Polymers 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 claims 1
- 239000011261 inert gas Substances 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
- 229910052756 noble gas Inorganic materials 0.000 claims 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- UHUUYVZLXJHWDV-UHFFFAOYSA-N trimethyl(methylsilyloxy)silane Chemical compound C[SiH2]O[Si](C)(C)C UHUUYVZLXJHWDV-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006058771.5A DE102006058771B4 (de) | 2006-12-12 | 2006-12-12 | Behälter mit verbesserter Restentleerbarkeit und Verfahren zu dessen Herstellung |
| DE102006058771.5 | 2006-12-12 | ||
| PCT/EP2007/011493 WO2008071458A1 (de) | 2006-12-12 | 2007-12-12 | Behälter mit verbesserter restenleerbarkeit und verfahren zu dessen herstellung |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010512260A JP2010512260A (ja) | 2010-04-22 |
| JP2010512260A5 true JP2010512260A5 (OSRAM) | 2010-10-14 |
| JP5197625B2 JP5197625B2 (ja) | 2013-05-15 |
Family
ID=39245071
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009540670A Active JP5197625B2 (ja) | 2006-12-12 | 2007-12-12 | 製品残留物の排出し易さ（ｅａｓｅｏｆｄｉｓｃｈａｒｇｅｐｒｏｄｕｃｔｒｅｓｉｄｕｅ）が改善された容器、及びその製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8592015B2 (OSRAM) |
| EP (1) | EP2106461B1 (OSRAM) |
| JP (1) | JP5197625B2 (OSRAM) |
| AT (1) | ATE552360T1 (OSRAM) |
| DE (1) | DE102006058771B4 (OSRAM) |
| WO (1) | WO2008071458A1 (OSRAM) |
Families Citing this family (63)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102008058034B4 (de) | 2008-11-18 | 2014-05-15 | Imp Pape Gmbh & Co. Kg | Verwendung einer Spritze als Lagerbehälter für applikationsfertige Arzneimittelzubereitungen und Spritzenset |
| JP2010173294A (ja) * | 2009-02-02 | 2010-08-12 | Konica Minolta Holdings Inc | 防汚性積層体 |
| US7985188B2 (en) | 2009-05-13 | 2011-07-26 | Cv Holdings Llc | Vessel, coating, inspection and processing apparatus |
| DK2251454T3 (da) | 2009-05-13 | 2014-10-13 | Sio2 Medical Products Inc | Coating og inspektion af beholder |
| WO2010132591A2 (en) * | 2009-05-13 | 2010-11-18 | Cv Holdings, Llc | Pecvd coating using an organosilicon precursor |
| JP5710600B2 (ja) * | 2009-05-13 | 2015-04-30 | エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド | 被覆表面検査のためのガス放出方法 |
| US9458536B2 (en) | 2009-07-02 | 2016-10-04 | Sio2 Medical Products, Inc. | PECVD coating methods for capped syringes, cartridges and other articles |
| EP3437743A1 (en) * | 2010-05-12 | 2019-02-06 | SiO2 Medical Products, Inc. | Syringe with lubricity coating |
| US11624115B2 (en) | 2010-05-12 | 2023-04-11 | Sio2 Medical Products, Inc. | Syringe with PECVD lubrication |
| KR102157254B1 (ko) * | 2010-05-12 | 2020-09-21 | 에스아이오2메디컬 프로덕츠, 인크. | 혈액 수집 용기 |
| DE102010048960A1 (de) * | 2010-10-18 | 2012-04-19 | Khs Corpoplast Gmbh | Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken |
| US9878101B2 (en) | 2010-11-12 | 2018-01-30 | Sio2 Medical Products, Inc. | Cyclic olefin polymer vessels and vessel coating methods |
| US9272095B2 (en) | 2011-04-01 | 2016-03-01 | Sio2 Medical Products, Inc. | Vessels, contact surfaces, and coating and inspection apparatus and methods |
| JP2014518664A (ja) * | 2011-04-28 | 2014-08-07 | サノフィ−アベンティス・ドイチュラント・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング | 投薬インターフェースの接合技術 |
| US8763700B2 (en) | 2011-09-02 | 2014-07-01 | Robert Ray McDaniel | Dual function proppants |
| JP5779044B2 (ja) * | 2011-08-24 | 2015-09-16 | 麒麟麦酒株式会社 | 濡れ性の制御方法 |
| AU2012318242A1 (en) | 2011-11-11 | 2013-05-30 | Sio2 Medical Products, Inc. | Passivation, pH protective or lubricity coating for pharmaceutical package, coating process and apparatus |
| US11116695B2 (en) | 2011-11-11 | 2021-09-14 | Sio2 Medical Products, Inc. | Blood sample collection tube |
| EP2846755A1 (en) | 2012-05-09 | 2015-03-18 | SiO2 Medical Products, Inc. | Saccharide protective coating for pharmaceutical package |
| US10832904B2 (en) | 2012-06-12 | 2020-11-10 | Lam Research Corporation | Remote plasma based deposition of oxygen doped silicon carbide films |
| US10325773B2 (en) | 2012-06-12 | 2019-06-18 | Novellus Systems, Inc. | Conformal deposition of silicon carbide films |
| US9234276B2 (en) | 2013-05-31 | 2016-01-12 | Novellus Systems, Inc. | Method to obtain SiC class of films of desired composition and film properties |
| US12334332B2 (en) | 2012-06-12 | 2025-06-17 | Lam Research Corporation | Remote plasma based deposition of silicon carbide films using silicon-containing and carbon-containing precursors |
| US20180347035A1 (en) | 2012-06-12 | 2018-12-06 | Lam Research Corporation | Conformal deposition of silicon carbide films using heterogeneous precursor interaction |
| US20150297800A1 (en) | 2012-07-03 | 2015-10-22 | Sio2 Medical Products, Inc. | SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS |
| GB2505685B (en) * | 2012-09-07 | 2015-11-04 | Univ Salford | Method of coating and etching |
| CA2890066C (en) | 2012-11-01 | 2021-11-09 | Sio2 Medical Products, Inc. | Coating inspection method |
| WO2014078666A1 (en) | 2012-11-16 | 2014-05-22 | Sio2 Medical Products, Inc. | Method and apparatus for detecting rapid barrier coating integrity characteristics |
| EP2925903B1 (en) | 2012-11-30 | 2022-04-13 | Si02 Medical Products, Inc. | Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like |
| US9764093B2 (en) | 2012-11-30 | 2017-09-19 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition |
| JP2014148332A (ja) * | 2013-01-31 | 2014-08-21 | Yoshino Kogyosho Co Ltd | 容器 |
| EP2961858B1 (en) | 2013-03-01 | 2022-09-07 | Si02 Medical Products, Inc. | Coated syringe. |
| US9937099B2 (en) | 2013-03-11 | 2018-04-10 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging with low oxygen transmission rate |
| CN105392916B (zh) * | 2013-03-11 | 2019-03-08 | Sio2医药产品公司 | 涂布包装材料 |
| EP2971227B1 (en) | 2013-03-15 | 2017-11-15 | Si02 Medical Products, Inc. | Coating method. |
| US10100247B2 (en) | 2013-05-17 | 2018-10-16 | Preferred Technology, Llc | Proppant with enhanced interparticle bonding |
| US10297442B2 (en) | 2013-05-31 | 2019-05-21 | Lam Research Corporation | Remote plasma based deposition of graded or multi-layered silicon carbide film |
| EP3693493A1 (en) | 2014-03-28 | 2020-08-12 | SiO2 Medical Products, Inc. | Antistatic coatings for plastic vessels |
| LU92445B1 (en) * | 2014-05-07 | 2015-11-09 | Luxembourg Inst Of Science And Technology List | Method for forming regular polymer thin films using atmospheric plasma deposition |
| US9997405B2 (en) | 2014-09-30 | 2018-06-12 | Lam Research Corporation | Feature fill with nucleation inhibition |
| US20160314964A1 (en) | 2015-04-21 | 2016-10-27 | Lam Research Corporation | Gap fill using carbon-based films |
| US9862881B2 (en) | 2015-05-13 | 2018-01-09 | Preferred Technology, Llc | Hydrophobic coating of particulates for enhanced well productivity |
| US11077233B2 (en) | 2015-08-18 | 2021-08-03 | Sio2 Medical Products, Inc. | Pharmaceutical and other packaging with low oxygen transmission rate |
| CN109563292B (zh) | 2016-07-18 | 2021-10-08 | 联合利华知识产权控股有限公司 | 一种改进容器分配特性的方法 |
| US11208591B2 (en) | 2016-11-16 | 2021-12-28 | Preferred Technology, Llc | Hydrophobic coating of particulates for enhanced well productivity |
| US10002787B2 (en) | 2016-11-23 | 2018-06-19 | Lam Research Corporation | Staircase encapsulation in 3D NAND fabrication |
| US10696896B2 (en) | 2016-11-28 | 2020-06-30 | Prefferred Technology, Llc | Durable coatings and uses thereof |
| US9837270B1 (en) | 2016-12-16 | 2017-12-05 | Lam Research Corporation | Densification of silicon carbide film using remote plasma treatment |
| US12330186B2 (en) | 2017-11-02 | 2025-06-17 | Preferred Technology, Llc | Continuous mixers and methods of using the same |
| EP3560897B1 (en) | 2018-04-26 | 2021-11-24 | Schott AG | Process for making a functionalised hollow body, having a layer of glass, including a superposition of one or more siloxanes and contacting with a plasma |
| DE102018114776A1 (de) * | 2018-06-20 | 2019-12-24 | Khs Corpoplast Gmbh | Vorrichtung zum Beschichten von Behältern mit einer Barriereschicht und Verfahren zur Heizung eines Behälters |
| US10840087B2 (en) | 2018-07-20 | 2020-11-17 | Lam Research Corporation | Remote plasma based deposition of boron nitride, boron carbide, and boron carbonitride films |
| JP7487189B2 (ja) | 2018-10-19 | 2024-05-20 | ラム リサーチ コーポレーション | 間隙充填のためのドープまたは非ドープシリコン炭化物および遠隔水素プラズマ曝露 |
| CN115244017A (zh) * | 2020-03-09 | 2022-10-25 | 日本电气硝子株式会社 | 医药品容器、医药品容器的制造方法以及涂布剂 |
| US12269645B2 (en) * | 2021-03-25 | 2025-04-08 | Schott Ag | Coated glass element |
| US20220306525A1 (en) * | 2021-03-25 | 2022-09-29 | Schott Ag | Coated glass element |
| EP4063334A1 (en) | 2021-03-25 | 2022-09-28 | Schott Ag | Coated glass element |
| KR20220133819A (ko) | 2021-03-25 | 2022-10-05 | 쇼트 슈바이츠 아게 | 품질 평가를 위한 시험 방법 및 용기 |
| WO2022200623A1 (en) * | 2021-03-25 | 2022-09-29 | Schott Ag | Pharmaceutical container |
| EP4339171A1 (en) | 2022-09-13 | 2024-03-20 | Schott Ag | Treatment of a glass container |
| US20240180947A1 (en) | 2022-10-20 | 2024-06-06 | Arcus Biosciences, Inc. | Lyophilized formulations of cd73 compounds |
| CN121038814A (zh) | 2023-04-14 | 2025-11-28 | 中外制药株式会社 | 用于稳定含蛋白质药物制剂的方法 |
| DE102023132995A1 (de) * | 2023-11-27 | 2025-05-28 | Khs Gmbh | Verfahren zum Beschichten von Mehrwegbehältern, nach diesem Verfahren hergestellte Behälter und Behälterbeschichtungsmaschine zum Beschichten von Mehrweg-Kunststoffbehältern |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2504482A (en) * | 1949-06-17 | 1950-04-18 | Premo Pharmaceutical Lab Inc | Drain-clear container for aqueous-vehicle liquid pharmaceutical preparations |
| DE4438359C2 (de) * | 1994-10-27 | 2001-10-04 | Schott Glas | Behälter aus Kunststoff mit einer Sperrbeschichtung |
| JP3495116B2 (ja) * | 1994-10-31 | 2004-02-09 | 東レ・ダウコーニング・シリコーン株式会社 | 撥水性薄膜およびその製造方法 |
| DE4445427C2 (de) | 1994-12-20 | 1997-04-30 | Schott Glaswerke | Plasma-CVD-Verfahren zur Herstellung einer Gradientenschicht |
| DE19543133C2 (de) | 1995-11-18 | 1999-05-06 | Fraunhofer Ges Forschung | Verfahren zur Erzeugung stark hydrophober Polymerschichten mittels Plasmapolymerisation |
| DE19629877C1 (de) * | 1996-07-24 | 1997-03-27 | Schott Glaswerke | CVD-Verfahren und Vorrichtung zur Innenbeschichtung von Hohlkörpern |
| US6159871A (en) | 1998-05-29 | 2000-12-12 | Dow Corning Corporation | Method for producing hydrogenated silicon oxycarbide films having low dielectric constant |
| DE19921303C1 (de) * | 1999-05-07 | 2000-10-12 | Schott Glas | Glasbehälter für medizinische Zwecke |
| CN1432035A (zh) * | 2000-06-06 | 2003-07-23 | 陶氏化学公司 | 用于聚合物与容器的阻隔层 |
| US20030215652A1 (en) * | 2001-06-04 | 2003-11-20 | O'connor Paul J. | Transmission barrier layer for polymers and containers |
| DE10131156A1 (de) * | 2001-06-29 | 2003-01-16 | Fraunhofer Ges Forschung | Arikel mit plasmapolymerer Beschichtung und Verfahren zu dessen Herstellung |
| WO2003031362A1 (en) | 2001-10-05 | 2003-04-17 | Dow Global Technologies Inc. | Coated glass for use in displays and other electronic devices |
| DE10258681A1 (de) | 2002-08-07 | 2004-02-26 | Schott Glas | Verfahren zum Herstellen von glatten Barriereschichten und Verbundmaterial mit glatter Barriereschicht |
| US7488683B2 (en) * | 2003-03-28 | 2009-02-10 | Toyo Seikan Kaisha, Ltd. | Chemical vapor deposited film based on a plasma CVD method and method of forming the film |
| JP4424033B2 (ja) * | 2003-08-08 | 2010-03-03 | 東洋製罐株式会社 | プラズマｃｖｄ法による蒸着膜 |
| DE102004017236B4 (de) * | 2004-04-05 | 2012-10-25 | Schott Ag | Verbundmaterial mit verbesserter chemischer Beständigkeit und Verfahren zu dessen Herstellung |
| JP2006131938A (ja) * | 2004-11-04 | 2006-05-25 | Stanley Electric Co Ltd | 超撥水膜の製造方法および製造装置並びにその製品 |
| WO2006121556A2 (en) * | 2005-05-06 | 2006-11-16 | Dow Global Technologies Inc. | Process for plasma coating a polypropylene object |
| DE102005040266A1 (de) * | 2005-08-24 | 2007-03-01 | Schott Ag | Verfahren und Vorrichtung zur innenseitigen Plasmabehandlung von Hohlkörpern |
-
2006
- 2006-12-12 DE DE102006058771.5A patent/DE102006058771B4/de active Active
-
2007
- 2007-12-12 WO PCT/EP2007/011493 patent/WO2008071458A1/de not_active Ceased
- 2007-12-12 EP EP20070857182 patent/EP2106461B1/de active Active
- 2007-12-12 US US12/448,232 patent/US8592015B2/en active Active
- 2007-12-12 JP JP2009540670A patent/JP5197625B2/ja active Active
- 2007-12-12 AT AT07857182T patent/ATE552360T1/de active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2010512260A5 (OSRAM) | ||
| JP2004160977A5 (OSRAM) | ||
| US7270849B2 (en) | Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film | |
| CN100483636C (zh) | 原子层沉积方法 | |
| TWI605501B (zh) | 半導體裝置之製造方法，基板處理方法，基板處理裝置及記錄媒體 | |
| JP2005290560A (ja) | 改善された耐薬品性を有する複合材料 | |
| CN101109074A (zh) | 在硅和有机前驱物的pecvd工艺中减少气相反应以沉积无缺陷起始层方法 | |
| JP2004068159A5 (OSRAM) | ||
| JP2007516355A5 (OSRAM) | ||
| TWI382467B (zh) | 使用數位式液體流量計以改良低ｋ介電薄膜之起始層的方法 | |
| WO2006026350A3 (en) | Low temperature silicon compound deposition | |
| WO2013039866A2 (en) | Activated silicon precursors for low temperature deposition | |
| JP4881153B2 (ja) | 水素化シリコンオキシカーバイド膜の生成方法。 | |
| US20220122841A1 (en) | Methods for depositing gap-filling fluids and related systems and devices | |
| JP5814328B2 (ja) | Ｃ／ＳｉＣ傾斜コーティング膜の形成方法及び装置 | |
| TW202018119A (zh) | 含矽膜的高溫原子層沉積 | |
| WO2001066834A3 (en) | Chemical vapor deposition process for fabricating layered superlattice materials | |
| JP5023056B2 (ja) | 側面の少なくとも１つにプラズマにより形成された薄膜コーティングを有するポリマー製品およびこのような製品の製造方法 | |
| CN101450995A (zh) | 低介电常数的等离子聚合薄膜及其制造方法 | |
| Karg et al. | Atomic layer deposition of silica on carbon nanotubes | |
| US9169552B2 (en) | Process for depositing ceramic or organoceramic material on a substrate | |
| JP2007054825A (ja) | 製膜方法及びパターニング方法、並びにこれらを用いた電子装置の製造方法 | |
| TW202321499A (zh) | 多層矽氮化物膜 | |
| JP7143514B2 (ja) | 異性体エンリッチド高級シランを製造するためのプロセス | |
| JP6287634B2 (ja) | ガスバリア性フィルム、その製造方法、およびこれを用いた電子デバイス |