JP2010510494A5 - - Google Patents

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Publication number
JP2010510494A5
JP2010510494A5 JP2009537384A JP2009537384A JP2010510494A5 JP 2010510494 A5 JP2010510494 A5 JP 2010510494A5 JP 2009537384 A JP2009537384 A JP 2009537384A JP 2009537384 A JP2009537384 A JP 2009537384A JP 2010510494 A5 JP2010510494 A5 JP 2010510494A5
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JP
Japan
Prior art keywords
optical system
curved
layers
rays
diffractive
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JP2009537384A
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English (en)
Japanese (ja)
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JP5315251B2 (ja
JP2010510494A (ja
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Priority claimed from PCT/US2007/084938 external-priority patent/WO2008061221A2/en
Publication of JP2010510494A publication Critical patent/JP2010510494A/ja
Publication of JP2010510494A5 publication Critical patent/JP2010510494A5/ja
Application granted granted Critical
Publication of JP5315251B2 publication Critical patent/JP5315251B2/ja
Expired - Fee Related legal-status Critical Current
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JP2009537384A 2006-11-16 2007-11-16 それぞれの結晶方位を持つ多層を有するｘ線集束光学系及びこの光学系を形成する方法 Expired - Fee Related JP5315251B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US86613406P 2006-11-16 2006-11-16
US60/866,134 2006-11-16
PCT/US2007/084938 WO2008061221A2 (en) 2006-11-16 2007-11-16 X-ray focusing optic having multiple layers with respective crystal orientations

Publications (3)

Publication Number Publication Date
JP2010510494A JP2010510494A (ja) 2010-04-02
JP2010510494A5 true JP2010510494A5 (enExample) 2013-06-13
JP5315251B2 JP5315251B2 (ja) 2013-10-16

Family

ID=39358362

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009537384A Expired - Fee Related JP5315251B2 (ja) 2006-11-16 2007-11-16 それぞれの結晶方位を持つ多層を有するｘ線集束光学系及びこの光学系を形成する方法

Country Status (5)

Country Link
US (1) US7738629B2 (enExample)
EP (1) EP2097907B1 (enExample)
JP (1) JP5315251B2 (enExample)
CN (1) CN101558454B (enExample)
WO (1) WO2008061221A2 (enExample)

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US9057685B2 (en) 2011-08-15 2015-06-16 X-Ray Optical Systems, Inc. Sample viscosity and flow control for heavy samples, and X-ray analysis applications thereof
CN103946693B (zh) 2011-10-06 2017-05-03 X射线光学系统公司 可移除式x‑射线分析仪用的可移动型运输及屏蔽装置
CN103765201B (zh) 2011-10-26 2017-11-07 X射线光学系统公司 X射线分析引擎和分析仪的支撑结构及高度对准的单色x射线光学器件
US20150117599A1 (en) * 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
BR112014021312B1 (pt) 2012-04-25 2022-01-11 Nippon Steel Corporation Método e aparelho para determinação da espessura da fase de liga fe-zn de uma chapa de aço galvanizada por imersão a quente
JP5928363B2 (ja) * 2013-02-01 2016-06-01 信越半導体株式会社 シリコン単結晶ウエーハの評価方法
WO2015027225A1 (en) 2013-08-23 2015-02-26 The Schepens Eye Research Institute, Inc. Spatial modeling of visual fields
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
EP3062094A4 (en) 2013-10-25 2017-05-24 Nippon Steel & Sumitomo Metal Corporation On-line plating adhesion determination device for galvannealed steel sheet and galvannealed steel sheet production line
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法
US10020087B1 (en) * 2015-04-21 2018-07-10 Michael Kozhukh Highly reflective crystalline mosaic neutron monochromator
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
CN112424591B (zh) * 2018-06-04 2024-05-24 斯格瑞公司 波长色散x射线光谱仪
JP7394464B2 (ja) * 2018-07-04 2023-12-08 株式会社リガク 蛍光ｘ線分析装置
DE112019003777B4 (de) 2018-07-26 2025-09-11 Sigray, Inc. Röntgenreflexionsquelle mit hoher helligkeit
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
CN112638261B (zh) 2018-09-04 2025-06-27 斯格瑞公司 利用滤波的x射线荧光的系统和方法
US11056308B2 (en) 2018-09-07 2021-07-06 Sigray, Inc. System and method for depth-selectable x-ray analysis
US11217357B2 (en) 2020-02-10 2022-01-04 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal/hyperbolic surface profiles
US12247934B2 (en) 2022-07-29 2025-03-11 X-Ray Optical Systems, Inc. Polarized, energy dispersive x-ray fluorescence system and method

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4261771A (en) 1979-10-31 1981-04-14 Bell Telephone Laboratories, Incorporated Method of fabricating periodic monolayer semiconductor structures by molecular beam epitaxy
US4675889A (en) * 1985-07-08 1987-06-23 Ovonic Synthetic Materials Company, Inc. Multiple wavelength X-ray dispersive devices and method of making the devices
US5127028A (en) * 1990-08-01 1992-06-30 Wittry David B Diffractord with doubly curved surface steps
JP2968993B2 (ja) * 1990-11-29 1999-11-02 株式会社リコー Ｘ線分光器
JP2968995B2 (ja) * 1990-11-30 1999-11-02 株式会社リコー 多波長分光素子
US5164975A (en) * 1991-06-13 1992-11-17 The United States Of America As Represented By The United States Department Of Energy Multiple wavelength X-ray monochromators
CN1030551C (zh) * 1991-07-30 1995-12-20 双向合成材料有限公司 改进型中子反射超级镜面结构
WO1996034274A2 (en) * 1995-04-26 1996-10-31 Philips Electronics N.V. Method of manufacturing an x-ray optical element for an x-ray analysis apparatus
US6285506B1 (en) * 1999-01-21 2001-09-04 X-Ray Optical Systems, Inc. Curved optical device and method of fabrication
US6498830B2 (en) * 1999-02-12 2002-12-24 David B. Wittry Method and apparatus for fabricating curved crystal x-ray optics
CN1122830C (zh) * 2000-03-10 2003-10-01 中国科学院高能物理研究所 同步辐射x射线多层膜反射率计装置
ATE488011T1 (de) * 2002-08-02 2010-11-15 X Ray Optical Sys Inc Optische vorrichtung aus einer vielzahl von gekrümmten optischen kristallen zum fokussieren von röntgenstrahlen
EP1634065A2 (en) * 2003-06-02 2006-03-15 X-Ray Optical Systems, Inc. Method and apparatus for implementing xanes analysis

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