JP2010245432A5 - - Google Patents
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- Publication number
- JP2010245432A5 JP2010245432A5 JP2009094877A JP2009094877A JP2010245432A5 JP 2010245432 A5 JP2010245432 A5 JP 2010245432A5 JP 2009094877 A JP2009094877 A JP 2009094877A JP 2009094877 A JP2009094877 A JP 2009094877A JP 2010245432 A5 JP2010245432 A5 JP 2010245432A5
- Authority
- JP
- Japan
- Prior art keywords
- transistor
- contact
- gate electrode
- distance
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 description 15
- 239000012535 impurity Substances 0.000 description 2
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009094877A JP5372578B2 (ja) | 2009-04-09 | 2009-04-09 | 半導体装置 |
| US12/756,699 US8217459B2 (en) | 2009-04-09 | 2010-04-08 | Semiconductor device |
| US13/493,579 US8803237B2 (en) | 2009-04-09 | 2012-06-11 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009094877A JP5372578B2 (ja) | 2009-04-09 | 2009-04-09 | 半導体装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010245432A JP2010245432A (ja) | 2010-10-28 |
| JP2010245432A5 true JP2010245432A5 (https=) | 2012-05-24 |
| JP5372578B2 JP5372578B2 (ja) | 2013-12-18 |
Family
ID=42933696
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009094877A Active JP5372578B2 (ja) | 2009-04-09 | 2009-04-09 | 半導体装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US8217459B2 (https=) |
| JP (1) | JP5372578B2 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5372578B2 (ja) * | 2009-04-09 | 2013-12-18 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
| JP2013110269A (ja) * | 2011-11-21 | 2013-06-06 | Samsung Electro-Mechanics Co Ltd | Cmos集積回路及び増幅回路 |
Family Cites Families (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3772536A (en) * | 1967-09-20 | 1973-11-13 | Trw Inc | Digital cell for large scale integration |
| JPS56125854A (en) * | 1980-03-10 | 1981-10-02 | Nec Corp | Integrated circuit |
| JPS6114744A (ja) * | 1984-06-29 | 1986-01-22 | Fujitsu Ltd | 半導体装置 |
| US5298774A (en) * | 1990-01-11 | 1994-03-29 | Mitsubishi Denki Kabushiki Kaisha | Gate array system semiconductor integrated circuit device |
| US5055716A (en) * | 1990-05-15 | 1991-10-08 | Siarc | Basic cell for bicmos gate array |
| JP2619119B2 (ja) * | 1990-06-21 | 1997-06-11 | 株式会社東芝 | 半導体集積回路 |
| US5175512A (en) * | 1992-02-28 | 1992-12-29 | Avasem Corporation | High speed, power supply independent CMOS voltage controlled ring oscillator with level shifting circuit |
| US5557363A (en) * | 1993-03-16 | 1996-09-17 | Olympus Optical Co., Ltd. | CMOS-analog IC for controlling camera and camera system using the same |
| JPH07235616A (ja) * | 1993-12-28 | 1995-09-05 | Matsushita Electric Ind Co Ltd | 半導体装置および半導体装置の製造方法 |
| JP3282375B2 (ja) * | 1994-05-25 | 2002-05-13 | 株式会社デンソー | 相補型絶縁ゲート電界効果トランジスタ |
| JP3725911B2 (ja) * | 1994-06-02 | 2005-12-14 | 株式会社ルネサステクノロジ | 半導体装置 |
| US5821769A (en) * | 1995-04-21 | 1998-10-13 | Nippon Telegraph And Telephone Corporation | Low voltage CMOS logic circuit with threshold voltage control |
| JP3229809B2 (ja) * | 1995-08-31 | 2001-11-19 | 三洋電機株式会社 | 半導体装置 |
| US5990502A (en) * | 1995-12-29 | 1999-11-23 | Lsi Logic Corporation | High density gate array cell architecture with metallization routing tracks having a variable pitch |
| JP4253052B2 (ja) * | 1997-04-08 | 2009-04-08 | 株式会社東芝 | 半導体装置 |
| JP3993927B2 (ja) * | 1997-12-22 | 2007-10-17 | 沖電気工業株式会社 | 静電破壊保護回路 |
| JP2000133725A (ja) * | 1998-10-26 | 2000-05-12 | Mitsubishi Electric Corp | 半導体記憶装置 |
| CA2266062C (en) * | 1999-03-31 | 2004-03-30 | Peter Gillingham | Dynamic content addressable memory cell |
| JP2002214306A (ja) * | 2001-01-15 | 2002-07-31 | Hitachi Ltd | 半導体集積回路 |
| JP2002228906A (ja) | 2001-02-01 | 2002-08-14 | Olympus Optical Co Ltd | 鏡枠装置 |
| JP3983067B2 (ja) * | 2001-03-19 | 2007-09-26 | Necエレクトロニクス株式会社 | 半導体集積回路の静電保護回路 |
| JP4031423B2 (ja) * | 2003-10-29 | 2008-01-09 | 株式会社東芝 | 半導体集積回路 |
| JP2005167536A (ja) * | 2003-12-02 | 2005-06-23 | Renesas Technology Corp | 通信用半導体集積回路および無線通信システム |
| JP4801323B2 (ja) | 2004-02-13 | 2011-10-26 | 富士通セミコンダクター株式会社 | 半導体装置の製造方法 |
| JP4280672B2 (ja) * | 2004-05-07 | 2009-06-17 | 富士通株式会社 | 半導体集積回路 |
| TW200618283A (en) | 2004-06-24 | 2006-06-01 | Koninkl Philips Electronics Nv | High frequency transistor layout for low source drain capacitance |
| JP2006013061A (ja) * | 2004-06-24 | 2006-01-12 | Matsushita Electric Ind Co Ltd | 半導体装置 |
| US20060071270A1 (en) | 2004-09-29 | 2006-04-06 | Shibib Muhammed A | Metal-oxide-semiconductor device having trenched diffusion region and method of forming same |
| WO2006131986A1 (ja) * | 2005-06-10 | 2006-12-14 | Fujitsu Limited | 半導体装置、半導体システム、および半導体装置の製造方法 |
| JP2007036216A (ja) * | 2005-06-24 | 2007-02-08 | Semiconductor Energy Lab Co Ltd | 半導体装置及び無線通信システム |
| JP4986459B2 (ja) * | 2006-01-24 | 2012-07-25 | ルネサスエレクトロニクス株式会社 | 半導体集積回路装置 |
| JP2008085117A (ja) | 2006-09-28 | 2008-04-10 | Matsushita Electric Ind Co Ltd | 半導体装置およびその製造方法 |
| JP2008252003A (ja) * | 2007-03-30 | 2008-10-16 | Mitsumi Electric Co Ltd | 半導体集積回路 |
| JP5510862B2 (ja) * | 2009-03-10 | 2014-06-04 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
| JP5375952B2 (ja) * | 2009-03-31 | 2013-12-25 | 日本電気株式会社 | 半導体装置 |
| JP5372578B2 (ja) * | 2009-04-09 | 2013-12-18 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
-
2009
- 2009-04-09 JP JP2009094877A patent/JP5372578B2/ja active Active
-
2010
- 2010-04-08 US US12/756,699 patent/US8217459B2/en not_active Expired - Fee Related
-
2012
- 2012-06-11 US US13/493,579 patent/US8803237B2/en active Active
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