JP2010203915A5 - - Google Patents

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Publication number
JP2010203915A5
JP2010203915A5 JP2009049734A JP2009049734A JP2010203915A5 JP 2010203915 A5 JP2010203915 A5 JP 2010203915A5 JP 2009049734 A JP2009049734 A JP 2009049734A JP 2009049734 A JP2009049734 A JP 2009049734A JP 2010203915 A5 JP2010203915 A5 JP 2010203915A5
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JP
Japan
Prior art keywords
measured
measurement
partial
error
measurement method
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Application number
JP2009049734A
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English (en)
Japanese (ja)
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JP5312100B2 (ja
JP2010203915A (ja
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Priority to JP2009049734A priority Critical patent/JP5312100B2/ja
Priority claimed from JP2009049734A external-priority patent/JP5312100B2/ja
Priority to US12/716,699 priority patent/US8762099B2/en
Publication of JP2010203915A publication Critical patent/JP2010203915A/ja
Publication of JP2010203915A5 publication Critical patent/JP2010203915A5/ja
Application granted granted Critical
Publication of JP5312100B2 publication Critical patent/JP5312100B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009049734A 2009-03-03 2009-03-03 測定方法及び測定装置 Expired - Fee Related JP5312100B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009049734A JP5312100B2 (ja) 2009-03-03 2009-03-03 測定方法及び測定装置
US12/716,699 US8762099B2 (en) 2009-03-03 2010-03-03 Measurement method and measurement apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009049734A JP5312100B2 (ja) 2009-03-03 2009-03-03 測定方法及び測定装置

Publications (3)

Publication Number Publication Date
JP2010203915A JP2010203915A (ja) 2010-09-16
JP2010203915A5 true JP2010203915A5 (enExample) 2012-04-19
JP5312100B2 JP5312100B2 (ja) 2013-10-09

Family

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Family Applications (1)

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JP2009049734A Expired - Fee Related JP5312100B2 (ja) 2009-03-03 2009-03-03 測定方法及び測定装置

Country Status (2)

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US (1) US8762099B2 (enExample)
JP (1) JP5312100B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5725883B2 (ja) * 2011-01-26 2015-05-27 キヤノン株式会社 部分計測を合成する形状計測方法
DE102012019026A1 (de) * 2012-09-26 2014-03-27 Blum-Novotest Gmbh Verfahren und Vorrichtung zum Vermessen eines in einer Werkstückbearbeitungsmaschine aufgenommenen Werkzeugs
JP6452086B2 (ja) * 2013-10-31 2019-01-16 キヤノン株式会社 形状算出装置及び方法、計測装置、物品製造方法、及び、プログラム
JP7119949B2 (ja) * 2018-11-28 2022-08-17 セイコーエプソン株式会社 判定装置及び判定方法
DE102019204096A1 (de) 2019-03-26 2020-10-01 Carl Zeiss Smt Gmbh Messverfahren zur interferometrischen Bestimmung einer Oberflächenform

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3162355B2 (ja) * 1989-03-31 2001-04-25 キヤノン株式会社 面形状等測定方法及び装置
JPH1137732A (ja) 1997-07-19 1999-02-12 Fuji Xerox Co Ltd 形状測定方法および装置
JP3403668B2 (ja) 1999-05-27 2003-05-06 理化学研究所 部分測定データの合成方法
JP2001066123A (ja) 1999-08-27 2001-03-16 Ricoh Co Ltd ３次元形状の形状測定装置及び形状測定方法
US7455407B2 (en) * 2000-02-11 2008-11-25 Amo Wavefront Sciences, Llc System and method of measuring and mapping three dimensional structures
JP2002372415A (ja) * 2001-06-15 2002-12-26 Olympus Optical Co Ltd 形状測定方法
US6956657B2 (en) * 2001-12-18 2005-10-18 Qed Technologies, Inc. Method for self-calibrated sub-aperture stitching for surface figure measurement
JP2003269952A (ja) * 2002-03-13 2003-09-25 Canon Inc ３次元形状測定装置および方法
US7728987B2 (en) * 2004-05-14 2010-06-01 Carl Zeiss Smt Ag Method of manufacturing an optical element
US7221461B2 (en) * 2004-08-13 2007-05-22 Zygo Corporation Method and apparatus for interferometric measurement of components with large aspect ratios
US7593599B2 (en) * 2005-06-30 2009-09-22 Corning Incorporated Method of assembling a composite data map having a closed-form solution
WO2009126269A2 (en) * 2008-04-08 2009-10-15 Qed Technologies International, Inc. Stitching of near-nulled subaperture measurements

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