JP5312100B2 - 測定方法及び測定装置 - Google Patents
測定方法及び測定装置 Download PDFInfo
- Publication number
- JP5312100B2 JP5312100B2 JP2009049734A JP2009049734A JP5312100B2 JP 5312100 B2 JP5312100 B2 JP 5312100B2 JP 2009049734 A JP2009049734 A JP 2009049734A JP 2009049734 A JP2009049734 A JP 2009049734A JP 5312100 B2 JP5312100 B2 JP 5312100B2
- Authority
- JP
- Japan
- Prior art keywords
- measured
- measurement
- partial
- error
- measuring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009049734A JP5312100B2 (ja) | 2009-03-03 | 2009-03-03 | 測定方法及び測定装置 |
| US12/716,699 US8762099B2 (en) | 2009-03-03 | 2010-03-03 | Measurement method and measurement apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009049734A JP5312100B2 (ja) | 2009-03-03 | 2009-03-03 | 測定方法及び測定装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010203915A JP2010203915A (ja) | 2010-09-16 |
| JP2010203915A5 JP2010203915A5 (enExample) | 2012-04-19 |
| JP5312100B2 true JP5312100B2 (ja) | 2013-10-09 |
Family
ID=42679002
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009049734A Expired - Fee Related JP5312100B2 (ja) | 2009-03-03 | 2009-03-03 | 測定方法及び測定装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US8762099B2 (enExample) |
| JP (1) | JP5312100B2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5725883B2 (ja) * | 2011-01-26 | 2015-05-27 | キヤノン株式会社 | 部分計測を合成する形状計測方法 |
| DE102012019026A1 (de) * | 2012-09-26 | 2014-03-27 | Blum-Novotest Gmbh | Verfahren und Vorrichtung zum Vermessen eines in einer Werkstückbearbeitungsmaschine aufgenommenen Werkzeugs |
| JP6452086B2 (ja) * | 2013-10-31 | 2019-01-16 | キヤノン株式会社 | 形状算出装置及び方法、計測装置、物品製造方法、及び、プログラム |
| JP7119949B2 (ja) * | 2018-11-28 | 2022-08-17 | セイコーエプソン株式会社 | 判定装置及び判定方法 |
| DE102019204096A1 (de) | 2019-03-26 | 2020-10-01 | Carl Zeiss Smt Gmbh | Messverfahren zur interferometrischen Bestimmung einer Oberflächenform |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3162355B2 (ja) * | 1989-03-31 | 2001-04-25 | キヤノン株式会社 | 面形状等測定方法及び装置 |
| JPH1137732A (ja) | 1997-07-19 | 1999-02-12 | Fuji Xerox Co Ltd | 形状測定方法および装置 |
| JP3403668B2 (ja) | 1999-05-27 | 2003-05-06 | 理化学研究所 | 部分測定データの合成方法 |
| JP2001066123A (ja) | 1999-08-27 | 2001-03-16 | Ricoh Co Ltd | 3次元形状の形状測定装置及び形状測定方法 |
| US7455407B2 (en) * | 2000-02-11 | 2008-11-25 | Amo Wavefront Sciences, Llc | System and method of measuring and mapping three dimensional structures |
| JP2002372415A (ja) * | 2001-06-15 | 2002-12-26 | Olympus Optical Co Ltd | 形状測定方法 |
| US6956657B2 (en) * | 2001-12-18 | 2005-10-18 | Qed Technologies, Inc. | Method for self-calibrated sub-aperture stitching for surface figure measurement |
| JP2003269952A (ja) * | 2002-03-13 | 2003-09-25 | Canon Inc | 3次元形状測定装置および方法 |
| US7728987B2 (en) * | 2004-05-14 | 2010-06-01 | Carl Zeiss Smt Ag | Method of manufacturing an optical element |
| US7221461B2 (en) * | 2004-08-13 | 2007-05-22 | Zygo Corporation | Method and apparatus for interferometric measurement of components with large aspect ratios |
| US7593599B2 (en) * | 2005-06-30 | 2009-09-22 | Corning Incorporated | Method of assembling a composite data map having a closed-form solution |
| WO2009126269A2 (en) * | 2008-04-08 | 2009-10-15 | Qed Technologies International, Inc. | Stitching of near-nulled subaperture measurements |
-
2009
- 2009-03-03 JP JP2009049734A patent/JP5312100B2/ja not_active Expired - Fee Related
-
2010
- 2010-03-03 US US12/716,699 patent/US8762099B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US20100228519A1 (en) | 2010-09-09 |
| US8762099B2 (en) | 2014-06-24 |
| JP2010203915A (ja) | 2010-09-16 |
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