JP2010125352A5 - - Google Patents

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Publication number
JP2010125352A5
JP2010125352A5 JP2008299657A JP2008299657A JP2010125352A5 JP 2010125352 A5 JP2010125352 A5 JP 2010125352A5 JP 2008299657 A JP2008299657 A JP 2008299657A JP 2008299657 A JP2008299657 A JP 2008299657A JP 2010125352 A5 JP2010125352 A5 JP 2010125352A5
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JP
Japan
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waste water
treatment system
photoresist development
wastewater
anion exchange
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JP2008299657A
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English (en)
Japanese (ja)
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JP2010125352A (ja
JP5256002B2 (ja
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Publication of JP2010125352A5 publication Critical patent/JP2010125352A5/ja
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Publication of JP5256002B2 publication Critical patent/JP5256002B2/ja
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JP2008299657A 2008-11-25 2008-11-25 フォトレジスト現像排水の排水処理システム Expired - Fee Related JP5256002B2 (ja)

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JP2008299657A JP5256002B2 (ja) 2008-11-25 2008-11-25 フォトレジスト現像排水の排水処理システム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008299657A JP5256002B2 (ja) 2008-11-25 2008-11-25 フォトレジスト現像排水の排水処理システム

Publications (3)

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JP2010125352A JP2010125352A (ja) 2010-06-10
JP2010125352A5 true JP2010125352A5 (enExample) 2011-09-22
JP5256002B2 JP5256002B2 (ja) 2013-08-07

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JP2008299657A Expired - Fee Related JP5256002B2 (ja) 2008-11-25 2008-11-25 フォトレジスト現像排水の排水処理システム

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Families Citing this family (10)

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JP6526506B2 (ja) * 2015-07-07 2019-06-05 リファインホールディングス株式会社 アニオン性界面活性剤を含有する水の水処理方法
CA3035672A1 (en) * 2016-09-12 2018-05-31 Aecom (Delaware Corporation) Use of electrochemical oxidation for treatment of per-and polyfluoroalkyl substances (pfas) in waste generated from sorbent and resin regeneration processes
JP7494216B2 (ja) * 2019-06-07 2024-06-03 エヴォクア ウォーター テクノロジーズ エルエルシー 分離および電気化学的排除を使用したｐｆａｓ処理スキーム
US11401180B2 (en) * 2019-06-28 2022-08-02 Battelle Memorial Institute Destruction of PFAS via an oxidation process and apparatus suitable for transportation to contaminated sites
CA3180965A1 (en) * 2020-08-06 2022-02-10 Stephen H. Rosansky Salt separation and destruction of pfas utilizing reverse osmosis and salt separation
TW202423849A (zh) 2022-08-25 2024-06-16 日商東京威力科創股份有限公司 處理系統及處理方法
JP2024151434A (ja) 2023-04-12 2024-10-25 東京エレクトロン株式会社 処理システム及び処理方法
JP2024151433A (ja) 2023-04-12 2024-10-25 東京エレクトロン株式会社 処理システム及び処理方法
US20250019268A1 (en) 2023-07-14 2025-01-16 Claros Technologies Inc. Methods and Systems of Photo-Electrochemical PFAS Destruction
WO2025234057A1 (ja) * 2024-05-09 2025-11-13 東京エレクトロン株式会社 処理システム及び処理方法

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JP5051004B2 (ja) * 2008-05-30 2012-10-17 栗田工業株式会社 水溶性樹脂成分含有アルカリ廃液の処理方法および処理装置
JP5062093B2 (ja) * 2008-08-06 2012-10-31 栗田工業株式会社 アミノ基を有する水溶性有機溶媒の回収方法

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