JP2010121207A - 成膜用基板、成膜方法、及び発光装置の作製方法 - Google Patents
成膜用基板、成膜方法、及び発光装置の作製方法 Download PDFInfo
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- JP2010121207A JP2010121207A JP2009239102A JP2009239102A JP2010121207A JP 2010121207 A JP2010121207 A JP 2010121207A JP 2009239102 A JP2009239102 A JP 2009239102A JP 2009239102 A JP2009239102 A JP 2009239102A JP 2010121207 A JP2010121207 A JP 2010121207A
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- 239000012299 nitrogen atmosphere Substances 0.000 description 1
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- 229920003986 novolac Polymers 0.000 description 1
- HCIIFBHDBOCSAF-UHFFFAOYSA-N octaethylporphyrin Chemical compound N1C(C=C2C(=C(CC)C(C=C3C(=C(CC)C(=C4)N3)CC)=N2)CC)=C(CC)C(CC)=C1C=C1C(CC)=C(CC)C4=N1 HCIIFBHDBOCSAF-UHFFFAOYSA-N 0.000 description 1
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- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
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- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- HRGDZIGMBDGFTC-UHFFFAOYSA-N platinum(2+) Chemical compound [Pt+2] HRGDZIGMBDGFTC-UHFFFAOYSA-N 0.000 description 1
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
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- 229920001690 polydopamine Polymers 0.000 description 1
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- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- VLRICFVOGGIMKK-UHFFFAOYSA-N pyrazol-1-yloxyboronic acid Chemical compound OB(O)ON1C=CC=N1 VLRICFVOGGIMKK-UHFFFAOYSA-N 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
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- 229910003449 rhenium oxide Inorganic materials 0.000 description 1
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- 239000010979 ruby Substances 0.000 description 1
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- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910000314 transition metal oxide Inorganic materials 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- OYQCBJZGELKKPM-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O-2].[Zn+2].[O-2].[In+3] OYQCBJZGELKKPM-UHFFFAOYSA-N 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- GWDUZCIBPDVBJM-UHFFFAOYSA-L zinc;2-(2-hydroxyphenyl)-3h-1,3-benzothiazole-2-carboxylate Chemical compound [Zn+2].OC1=CC=CC=C1C1(C([O-])=O)SC2=CC=CC=C2N1.OC1=CC=CC=C1C1(C([O-])=O)SC2=CC=CC=C2N1 GWDUZCIBPDVBJM-UHFFFAOYSA-L 0.000 description 1
- QEPMORHSGFRDLW-UHFFFAOYSA-L zinc;2-(2-hydroxyphenyl)-3h-1,3-benzoxazole-2-carboxylate Chemical compound [Zn+2].OC1=CC=CC=C1C1(C([O-])=O)OC2=CC=CC=C2N1.OC1=CC=CC=C1C1(C([O-])=O)OC2=CC=CC=C2N1 QEPMORHSGFRDLW-UHFFFAOYSA-L 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Abstract
【解決手段】光による加熱成膜法において、成膜する材料層(有機化合物材料を含む層)が設けられる成膜用基板の光吸収部表面を凹凸を有する粗面(梨子地形状)とする。光による加熱により溶融した有機化合物材料は粗面上にあるために凝集せず、被成膜用基板に均一な膜厚で成膜することができる。
【選択図】図1
Description
本実施の形態では、被成膜基板に均一な膜厚分布を有する良質の薄膜を形成することを目的とした成膜用基板及び成膜方法の一例について図1乃至図5を用いて説明する。
本実施の形態では、成膜用基板の他の例を図7を用いて説明する。実施の形態1と同様な機能を有する構成の材料や作製方法は、実施の形態1と同様とすればよい。
本実施の形態では、発光素子および発光装置を作製する方法について説明する。
本実施の形態では、本明細書に開示する成膜用基板及び成膜方法を用いて作製されたパッシブマトリクス型の発光装置について図8及び図9を用いて説明する。
本実施の形態では、本明細書に開示する成膜用基板及び成膜方法を用いて作製されたアクティブマトリクス型の発光装置について図12を用いて説明する。
本明細書に開示する成膜用基板、成膜方法、及び発光装置の作製方法を適用して、様々な表示機能を有する発光装置を作製することができる。即ち、それら表示機能を有する発光装置を表示部に組み込んだ様々な電子機器に本明細書に開示する成膜用基板、成膜方法、及び発光装置の作製方法を適用できる。
Claims (13)
- 凹凸を有する光吸収部と、前記凹凸を有する光吸収部上に有機化合物材料を含む層とを含み、
前記有機化合物材料を含む層は前記凹凸を反映して形成されることを特徴とする成膜用基板。 - 凹凸を有する光吸収部と、前記凹凸を有する光吸収部上に有機化合物材料を含む層とを含み、
前記光吸収部は光吸収膜と透光性膜との積層構造であり、前記透光性膜表面に凹凸を有し、
前記有機化合物材料を含む層は前記凹凸を反映して形成されることを特徴とする成膜用基板。 - 凹凸を有する光吸収部と、前記凹凸を有する光吸収部上に有機化合物材料を含む層とを含み、
前記光吸収部は透光性膜と光吸収膜との積層構造であり、前記透光性膜表面に凹凸を有し、前記光吸収膜表面は前記透光性膜表面の凹凸を反映し、
前記有機化合物材料を含む層は前記凹凸を反映して形成されることを特徴とする成膜用基板。 - 請求項1乃至3のいずれか一項において、前記凹凸は梨子地形状であることを特徴とする成膜用基板。
- 請求項1乃至4のいずれか一項において、前記凹凸は複数の柱状の凸部により構成されることを特徴とする成膜用基板。
- 請求項1乃至4のいずれか一項において、前記凹凸は複数の錐状の凸部により構成されることを特徴とする成膜用基板。
- 請求項1乃至4のいずれか一項において、前記凹凸はストライプ構造であることを特徴とする成膜用基板。
- 請求項1乃至7のいずれか一項において、前記凹凸の高さの差は50nm以上2000nm以下であることを特徴とする成膜用基板。
- 凹凸を有する光吸収部と、前記凹凸を有する光吸収部上に有機化合物材料を含む層とを含み、
前記有機化合物材料を含む層は前記凹凸を反映して形成される成膜用基板を用い、
前記成膜用基板の前記有機化合物材料を含む層形成面と、被成膜基板とを向き合うように、前記成膜用基板と前記被成膜基板とを配置し、
前記透光性基板を通過させて、光を前記光吸収部に照射して前記光を照射された前記光吸収部上の前記有機化合物材料を含む層に含まれる材料を前記被成膜基板上に成膜することを特徴とする成膜方法。 - 請求項9において、前記有機化合物材料を含む層に含まれる材料は、前記凹凸の凹部に流動することを特徴とする成膜方法。
- 請求項9又は請求項10において、前記光吸収部は凹凸を有する透光性膜と光吸収膜との積層構造であり、
前記光は、前記凹凸を有する透光性膜を透過して前記光吸収部に照射することを特徴とする成膜方法。 - 請求項9乃至11のいずれか一項に記載の成膜方法を用いて、
前記光を照射された前記光吸収部上の前記有機化合物材料を含む層に含まれる材料を前記被成膜基板の第1の電極層上に成膜して発光層を形成し、
前記発光層上に第2の電極層を形成することを特徴とする発光装置の作製方法。 - 請求項12において、前記光を照射された前記光吸収部上の前記有機化合物材料を含む層に含まれる材料を前記被成膜基板の前記第1の電極層上に成膜して複数の画素の発光層を形成することを特徴とする発光装置の作製方法。
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