JP7294858B2 - 熱処理方法および熱処理装置 - Google Patents
熱処理方法および熱処理装置 Download PDFInfo
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- H01L21/2256—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides the applied layer comprising oxides only, e.g. P2O5, PSG, H3BO3, doped oxides through the applied layer
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Description
3 制御部
4 ハロゲン加熱部
5 フラッシュ加熱部
6 チャンバー
7 保持部
10 移載機構
65 熱処理空間
74 サセプタ
75 保持プレート
77 基板支持ピン
83 供給配管
90 ガス供給部
93 酸素供給源
94 水素供給源
99 酸素濃度計
101 自然酸化膜
102 薄膜
190 排気部
FL フラッシュランプ
HL ハロゲンランプ
W 半導体ウェハー
Claims (8)
- 基板に光を照射することによって該基板を加熱する処理方法であって、
自然酸化膜を挟み込んでドーパントおよび炭素を含む薄膜が形成された基板をチャンバー内に収容する収容工程と、
前記チャンバー内に酸化性ガスを供給して酸化雰囲気を形成する酸化雰囲気形成工程と、
前記基板に光を照射して前記基板を加熱する加熱工程と、
を備え、
前記加熱工程は、
連続点灯ランプから前記基板に光を照射する予備加熱工程と、
前記予備加熱工程の後にフラッシュランプから前記基板にフラッシュ光を照射するフラッシュ加熱工程と、
前記予備加熱工程の前に前記連続点灯ランプからの光照射によって前記予備加熱工程での前記基板の温度よりも低い温度に前記基板を維持するアニール工程と、
を含み、
前記アニール工程が前記チャンバー内に水素雰囲気を形成して行われることにより、前記薄膜に含まれる前記ドーパントの原子を前記自然酸化膜中に拡散させて前記基板の表面と前記自然酸化膜との界面に集積させることを特徴とする熱処理方法。 - 請求項1記載の熱処理方法において、
前記予備加熱工程の途中で前記チャンバー内への前記酸化性ガスの供給を開始することを特徴とする熱処理方法。 - 請求項1または請求項2記載の熱処理方法において、
前記フラッシュ加熱工程では、紫外光を含むフラッシュ光を前記基板に照射することを特徴とする熱処理方法。 - 請求項1から請求項3のいずれかに記載の熱処理方法において、
前記酸化性ガスは、酸素、オゾンおよび窒素酸化物からなる群から選択された1のガスを含むことを特徴とする熱処理方法。 - 基板に光を照射することによって該基板を加熱する熱処理装置であって、
自然酸化膜を挟み込んでドーパントおよび炭素を含む薄膜が形成された基板を収容するチャンバーと、
前記チャンバー内に酸化性ガスを供給して酸化雰囲気を形成するガス供給部と、
前記基板に光を照射して前記基板を加熱する光照射部と、
を備え、
前記光照射部は、
前記基板に光を照射して前記基板を予備加熱する連続点灯ランプと、
前記予備加熱の後に前記基板にフラッシュ光を照射するフラッシュランプと、
を含み、
前記予備加熱の前に、前記チャンバー内に水素雰囲気を形成しつつ前記連続点灯ランプからの光照射によって前記予備加熱での前記基板の温度よりも低い温度に前記基板を維持することにより、前記薄膜に含まれる前記ドーパントの原子を前記自然酸化膜中に拡散させて前記基板の表面と前記自然酸化膜との界面に集積させることを特徴とする熱処理装置。 - 請求項5記載の熱処理装置において、
前記ガス供給部は、前記予備加熱の途中で前記チャンバー内への前記酸化性ガスの供給を開始することを特徴とする熱処理装置。 - 請求項5または請求項6記載の熱処理装置において、
前記フラッシュランプは、紫外光を含むフラッシュ光を前記基板に照射することを特徴とする熱処理装置。 - 請求項5から請求項7のいずれかに記載の熱処理装置において、
前記酸化性ガスは、酸素、オゾンおよび窒素酸化物からなる群から選択された1のガスを含むことを特徴とする熱処理装置。
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