JP2010073743A5 - - Google Patents

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Publication number
JP2010073743A5
JP2010073743A5 JP2008236819A JP2008236819A JP2010073743A5 JP 2010073743 A5 JP2010073743 A5 JP 2010073743A5 JP 2008236819 A JP2008236819 A JP 2008236819A JP 2008236819 A JP2008236819 A JP 2008236819A JP 2010073743 A5 JP2010073743 A5 JP 2010073743A5
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JP
Japan
Prior art keywords
substrate
film
heating
polymer film
heating mechanism
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Application number
JP2008236819A
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English (en)
Japanese (ja)
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JP2010073743A (ja
JP5292032B2 (ja
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Application filed filed Critical
Priority claimed from JP2008236819A external-priority patent/JP5292032B2/ja
Priority to JP2008236819A priority Critical patent/JP5292032B2/ja
Priority to CN2009801363461A priority patent/CN102160156B/zh
Priority to PCT/JP2009/062956 priority patent/WO2010032547A1/ja
Priority to KR1020117006035A priority patent/KR101236160B1/ko
Priority to US13/063,779 priority patent/US8691338B2/en
Publication of JP2010073743A publication Critical patent/JP2010073743A/ja
Publication of JP2010073743A5 publication Critical patent/JP2010073743A5/ja
Publication of JP5292032B2 publication Critical patent/JP5292032B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
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JP2008236819A 2008-09-16 2008-09-16 重合膜の成膜方法および成膜装置 Expired - Fee Related JP5292032B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2008236819A JP5292032B2 (ja) 2008-09-16 2008-09-16 重合膜の成膜方法および成膜装置
US13/063,779 US8691338B2 (en) 2008-09-16 2009-07-17 Polymerized film forming method and polymerized film forming apparatus
PCT/JP2009/062956 WO2010032547A1 (ja) 2008-09-16 2009-07-17 重合膜の成膜方法および成膜装置
KR1020117006035A KR101236160B1 (ko) 2008-09-16 2009-07-17 중합막의 성막 방법 및 성막 장치
CN2009801363461A CN102160156B (zh) 2008-09-16 2009-07-17 聚合膜的成膜方法和成膜装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008236819A JP5292032B2 (ja) 2008-09-16 2008-09-16 重合膜の成膜方法および成膜装置

Publications (3)

Publication Number Publication Date
JP2010073743A JP2010073743A (ja) 2010-04-02
JP2010073743A5 true JP2010073743A5 (enExample) 2011-09-15
JP5292032B2 JP5292032B2 (ja) 2013-09-18

Family

ID=42039389

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008236819A Expired - Fee Related JP5292032B2 (ja) 2008-09-16 2008-09-16 重合膜の成膜方法および成膜装置

Country Status (5)

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US (1) US8691338B2 (enExample)
JP (1) JP5292032B2 (enExample)
KR (1) KR101236160B1 (enExample)
CN (1) CN102160156B (enExample)
WO (1) WO2010032547A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014005478A (ja) * 2010-10-08 2014-01-16 Kaneka Corp 蒸着装置
JP2012209393A (ja) * 2011-03-29 2012-10-25 Tokyo Electron Ltd クリーニング方法及び成膜方法
US20140014036A1 (en) * 2011-03-30 2014-01-16 Sharp Kabushiki Kaisha Deposition particle emitting device, deposition particle emission method, and deposition device
JP6224479B2 (ja) * 2014-02-18 2017-11-01 東京エレクトロン株式会社 重合膜の成膜方法および成膜装置
CN106555159B (zh) * 2015-09-28 2018-12-11 北京北方华创微电子装备有限公司 一种基片的加热设备及加热方法
JP6851171B2 (ja) * 2016-10-14 2021-03-31 株式会社アルバック 微細機能素子及び微細機能素子の製造方法
KR102120537B1 (ko) * 2017-04-02 2020-06-09 황창훈 고해상도 ｏｌｅｄ 소자 제작용 면증발원 동시증발 증착공정방법
CN108570645B (zh) * 2017-11-30 2023-09-29 上海微电子装备（集团）股份有限公司 真空蒸镀装置及其蒸发头、真空蒸镀方法
JP6799550B2 (ja) * 2018-01-16 2020-12-16 東京エレクトロン株式会社 プラズマ処理装置の部品をクリーニングする方法
JP7236953B2 (ja) * 2019-08-05 2023-03-10 東京エレクトロン株式会社 成膜装置および成膜方法
CN120683456B (zh) * 2025-08-25 2025-11-04 浙江晟霖益嘉科技有限公司 一种双晶圆处理腔及其控制方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3231373B2 (ja) 1991-12-20 2001-11-19 松下電器産業株式会社 合成樹脂被膜の形成装置及び形成方法
JPH09326388A (ja) * 1996-06-05 1997-12-16 Ulvac Japan Ltd 低比誘電率高分子膜の形成方法及び層間絶縁膜の形成方法並びに低比誘電率高分子膜形成装置
US5937272A (en) * 1997-06-06 1999-08-10 Eastman Kodak Company Patterned organic layers in a full-color organic electroluminescent display array on a thin film transistor array substrate
JP2001011176A (ja) * 1999-06-25 2001-01-16 Matsushita Electric Works Ltd ポリイミド皮膜の形成方法及びポリイミド皮膜
JP2002285320A (ja) * 2001-03-27 2002-10-03 Fukushima Prefecture 有機高分子薄膜の形成方法
JP4043488B2 (ja) * 2003-02-04 2008-02-06 東京エレクトロン株式会社 処理システム及び処理システムの稼動方法
JP4257576B2 (ja) * 2003-03-25 2009-04-22 ローム株式会社 成膜装置
WO2005109486A1 (en) * 2004-05-12 2005-11-17 Viatron Technologies Inc. System for heat treatment of semiconductor device
JP2006351814A (ja) 2005-06-15 2006-12-28 Tokyo Electron Ltd クリーニング方法、コンピュータプログラム及び成膜装置
WO2008069259A1 (en) * 2006-12-05 2008-06-12 Semiconductor Energy Laboratory Co., Ltd. Film formation apparatus, film formation method, manufacturing apparatus, and method for manufacturing light-emitting device
KR20090028413A (ko) * 2007-09-13 2009-03-18 가부시키가이샤 한도오따이 에네루기 켄큐쇼 발광장치 제작방법 및 증착용 기판

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