JP2010016130A5 - - Google Patents
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- Publication number
- JP2010016130A5 JP2010016130A5 JP2008173910A JP2008173910A JP2010016130A5 JP 2010016130 A5 JP2010016130 A5 JP 2010016130A5 JP 2008173910 A JP2008173910 A JP 2008173910A JP 2008173910 A JP2008173910 A JP 2008173910A JP 2010016130 A5 JP2010016130 A5 JP 2010016130A5
- Authority
- JP
- Japan
- Prior art keywords
- precursor composition
- solution
- compound
- porous membrane
- porous film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000002243 precursor Substances 0.000 claims 9
- 239000012528 membrane Substances 0.000 claims 7
- 238000004519 manufacturing process Methods 0.000 claims 6
- 125000000962 organic group Chemical group 0.000 claims 6
- 150000001875 compounds Chemical class 0.000 claims 5
- 150000002894 organic compounds Chemical class 0.000 claims 4
- 239000003054 catalyst Substances 0.000 claims 3
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 230000002209 hydrophobic effect Effects 0.000 claims 2
- 239000012535 impurity Substances 0.000 claims 2
- 229910021645 metal ion Inorganic materials 0.000 claims 2
- 150000007524 organic acids Chemical class 0.000 claims 2
- 150000002978 peroxides Chemical class 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 239000004094 surface-active agent Substances 0.000 claims 2
- YKFRUJSEPGHZFJ-UHFFFAOYSA-N N-trimethylsilylimidazole Chemical compound C[Si](C)(C)N1C=CN=C1 YKFRUJSEPGHZFJ-UHFFFAOYSA-N 0.000 claims 1
- 239000003377 acid catalyst Substances 0.000 claims 1
- 230000002378 acidificating effect Effects 0.000 claims 1
- SIOVKLKJSOKLIF-UHFFFAOYSA-N bis(trimethylsilyl)acetamide Chemical compound C[Si](C)(C)OC(C)=N[Si](C)(C)C SIOVKLKJSOKLIF-UHFFFAOYSA-N 0.000 claims 1
- 238000010574 gas phase reaction Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- KAHVZNKZQFSBFW-UHFFFAOYSA-N n-methyl-n-trimethylsilylmethanamine Chemical compound CN(C)[Si](C)(C)C KAHVZNKZQFSBFW-UHFFFAOYSA-N 0.000 claims 1
- 235000005985 organic acids Nutrition 0.000 claims 1
- 150000003961 organosilicon compounds Chemical class 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008173910A JP4989571B2 (ja) | 2008-07-02 | 2008-07-02 | 多孔質膜の前駆体組成物の溶液 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008173910A JP4989571B2 (ja) | 2008-07-02 | 2008-07-02 | 多孔質膜の前駆体組成物の溶液 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010016130A JP2010016130A (ja) | 2010-01-21 |
| JP2010016130A5 true JP2010016130A5 (enExample) | 2011-05-26 |
| JP4989571B2 JP4989571B2 (ja) | 2012-08-01 |
Family
ID=41701979
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008173910A Active JP4989571B2 (ja) | 2008-07-02 | 2008-07-02 | 多孔質膜の前駆体組成物の溶液 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4989571B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101977927B1 (ko) | 2012-07-11 | 2019-05-13 | 인텔렉츄얼 키스톤 테크놀로지 엘엘씨 | 광전소자 및 그 제조방법 |
| JP6187115B2 (ja) * | 2013-10-04 | 2017-08-30 | 三菱ケミカル株式会社 | シリカ多孔質膜 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3403402B2 (ja) * | 1990-01-25 | 2003-05-06 | モービル・オイル・コーポレイション | 合成多孔質結晶性物質、それの合成および用途 |
| JP2002173641A (ja) * | 2000-09-29 | 2002-06-21 | Asahi Kasei Corp | 絶縁薄膜用の多孔性シリカ薄膜 |
| US7307343B2 (en) * | 2002-05-30 | 2007-12-11 | Air Products And Chemicals, Inc. | Low dielectric materials and methods for making same |
| JP4447846B2 (ja) * | 2003-02-28 | 2010-04-07 | 宇部日東化成株式会社 | 多孔質シリカ系薄膜の製造方法 |
| JP4279064B2 (ja) * | 2003-06-27 | 2009-06-17 | 三菱化学株式会社 | 多孔性シリカ膜、それを有する積層体 |
| JP5030478B2 (ja) * | 2006-06-02 | 2012-09-19 | 株式会社アルバック | 多孔質膜の前駆体組成物及びその調製方法、多孔質膜及びその作製方法、並びに半導体装置 |
-
2008
- 2008-07-02 JP JP2008173910A patent/JP4989571B2/ja active Active
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