JPWO2023021971A5 - - Google Patents
Info
- Publication number
- JPWO2023021971A5 JPWO2023021971A5 JP2023542312A JP2023542312A JPWO2023021971A5 JP WO2023021971 A5 JPWO2023021971 A5 JP WO2023021971A5 JP 2023542312 A JP2023542312 A JP 2023542312A JP 2023542312 A JP2023542312 A JP 2023542312A JP WO2023021971 A5 JPWO2023021971 A5 JP WO2023021971A5
- Authority
- JP
- Japan
- Prior art keywords
- forming
- underlayer film
- resist underlayer
- compound
- aromatic ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021133576 | 2021-08-18 | ||
| PCT/JP2022/029433 WO2023021971A1 (ja) | 2021-08-18 | 2022-08-01 | レジスト下層膜の形成方法、半導体基板の製造方法、レジスト下層膜形成用組成物及びレジスト下層膜 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023021971A1 JPWO2023021971A1 (enExample) | 2023-02-23 |
| JPWO2023021971A5 true JPWO2023021971A5 (enExample) | 2025-10-21 |
Family
ID=85240616
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023542312A Pending JPWO2023021971A1 (enExample) | 2021-08-18 | 2022-08-01 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20240231231A1 (enExample) |
| JP (1) | JPWO2023021971A1 (enExample) |
| KR (1) | KR20240046494A (enExample) |
| WO (1) | WO2023021971A1 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2025010495A (ja) * | 2023-07-07 | 2025-01-21 | 信越化学工業株式会社 | レジスト下層膜形成方法及びパターン形成方法 |
| TW202505989A (zh) * | 2023-07-19 | 2025-02-01 | 日商Jsr 股份有限公司 | 磁穿隧接面元件的製造方法 |
| JP2025027679A (ja) * | 2023-08-16 | 2025-02-28 | 信越化学工業株式会社 | レジスト下層膜形成方法、パターン形成方法 |
| WO2026042732A1 (ja) * | 2024-08-23 | 2026-02-26 | Jsr株式会社 | レジスト下層膜形成用組成物、半導体基板の製造方法及び窒素含有化合物の製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3928278B2 (ja) | 1998-11-16 | 2007-06-13 | Ｊｓｒ株式会社 | 反射防止膜形成組成物 |
| JP4288776B2 (ja) | 1999-08-03 | 2009-07-01 | Ｊｓｒ株式会社 | 反射防止膜形成組成物 |
| JPWO2020111068A1 (ja) * | 2018-11-29 | 2021-10-28 | Jsr株式会社 | レジスト下層膜形成用組成物、レジスト下層膜及びレジストパターン形成方法 |
| JP7666322B2 (ja) * | 2019-03-19 | 2025-04-22 | 三菱瓦斯化学株式会社 | リソグラフィー用膜形成材料、リソグラフィー用膜形成用組成物、リソグラフィー用下層膜、パターン形成方法、及び精製方法 |
| TW202108558A (zh) * | 2019-05-30 | 2021-03-01 | 日商三菱瓦斯化學股份有限公司 | 具有三嗪骨架之預聚物、包含其之組成物、阻劑圖型形成方法、電路圖型形成方法，及該預聚物之精製方法 |
-
2022
- 2022-08-01 JP JP2023542312A patent/JPWO2023021971A1/ja active Pending
- 2022-08-01 WO PCT/JP2022/029433 patent/WO2023021971A1/ja not_active Ceased
- 2022-08-01 KR KR1020247004599A patent/KR20240046494A/ko active Pending
-
2024
- 2024-02-13 US US18/440,124 patent/US20240231231A1/en active Pending