JP2007226244A5 - - Google Patents

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Publication number
JP2007226244A5
JP2007226244A5 JP2007042832A JP2007042832A JP2007226244A5 JP 2007226244 A5 JP2007226244 A5 JP 2007226244A5 JP 2007042832 A JP2007042832 A JP 2007042832A JP 2007042832 A JP2007042832 A JP 2007042832A JP 2007226244 A5 JP2007226244 A5 JP 2007226244A5
Authority
JP
Japan
Prior art keywords
silica source
tri
triethoxysilane
group
topcoat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007042832A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007226244A (ja
Filing date
Publication date
Priority claimed from US11/706,243 external-priority patent/US20070196773A1/en
Application filed filed Critical
Publication of JP2007226244A publication Critical patent/JP2007226244A/ja
Publication of JP2007226244A5 publication Critical patent/JP2007226244A5/ja
Pending legal-status Critical Current

Links

JP2007042832A 2006-02-22 2007-02-22 リソグラフィプロセス用のトップコート及びその製造方法 Pending JP2007226244A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US77661006P 2006-02-22 2006-02-22
US11/706,243 US20070196773A1 (en) 2006-02-22 2007-02-15 Top coat for lithography processes

Publications (2)

Publication Number Publication Date
JP2007226244A JP2007226244A (ja) 2007-09-06
JP2007226244A5 true JP2007226244A5 (enExample) 2007-10-18

Family

ID=37872215

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007042832A Pending JP2007226244A (ja) 2006-02-22 2007-02-22 リソグラフィプロセス用のトップコート及びその製造方法

Country Status (6)

Country Link
US (1) US20070196773A1 (enExample)
EP (1) EP1826613A3 (enExample)
JP (1) JP2007226244A (enExample)
KR (1) KR100893120B1 (enExample)
CN (1) CN101063818A (enExample)
TW (1) TW200732847A (enExample)

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JP5399347B2 (ja) 2010-09-01 2014-01-29 信越化学工業株式会社 ケイ素含有膜形成用組成物、ケイ素含有膜形成基板及びこれを用いたパターン形成方法
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KR20140116908A (ko) * 2012-01-09 2014-10-06 다우 코닝 코포레이션 하드마스크 반사방지 코팅재로서의 다이-t-부톡시다이아세톡시실란계 실세스퀴옥산 수지 및 그의 제조방법
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CN107403717B (zh) * 2016-04-28 2023-07-18 应用材料公司 一种用于处理腔室的改进侧注入喷嘴设计
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WO2021213986A1 (en) 2020-04-21 2021-10-28 Carl Zeiss Smt Gmbh Method for operating an euv lithography apparatus, and euv lithography apparatus
CN111781220A (zh) * 2020-07-03 2020-10-16 中国科学院上海应用物理研究所 一种多功能同步辐射干涉曝光实验平台及实验方法
US20220334482A1 (en) * 2021-04-15 2022-10-20 Taiwan Semiconductor Manufacturing Co., Ltd. Photoresist top coating material for etching rate control
WO2025140917A1 (en) 2023-12-28 2025-07-03 Merck Patent Gmbh Top coat composition, and method for producing resist pattern and method for producing device using same

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