JP2024129038A5 - - Google Patents
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- Publication number
- JP2024129038A5 JP2024129038A5 JP2024096388A JP2024096388A JP2024129038A5 JP 2024129038 A5 JP2024129038 A5 JP 2024129038A5 JP 2024096388 A JP2024096388 A JP 2024096388A JP 2024096388 A JP2024096388 A JP 2024096388A JP 2024129038 A5 JP2024129038 A5 JP 2024129038A5
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- photosensitive resin
- composition according
- following formula
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011342 resin composition Substances 0.000 claims 16
- 239000003960 organic solvent Substances 0.000 claims 7
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims 6
- 239000004642 Polyimide Substances 0.000 claims 5
- 125000000962 organic group Chemical group 0.000 claims 5
- 229920001721 polyimide Polymers 0.000 claims 5
- 239000002243 precursor Substances 0.000 claims 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims 4
- 150000001875 compounds Chemical class 0.000 claims 4
- 229910052731 fluorine Inorganic materials 0.000 claims 4
- 125000001153 fluoro group Chemical group F* 0.000 claims 4
- 239000010410 layer Substances 0.000 claims 4
- 125000002524 organometallic group Chemical group 0.000 claims 4
- 239000003505 polymerization initiator Substances 0.000 claims 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 3
- OJPDDQSCZGTACX-UHFFFAOYSA-N 2-[n-(2-hydroxyethyl)anilino]ethanol Chemical compound OCCN(CCO)C1=CC=CC=C1 OJPDDQSCZGTACX-UHFFFAOYSA-N 0.000 claims 2
- 239000006087 Silane Coupling Agent Substances 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 2
- -1 oxime compound Chemical class 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims 2
- 239000011229 interlayer Substances 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 125000004430 oxygen atom Chemical group O* 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020034872 | 2020-03-02 | ||
| JP2020034872 | 2020-03-02 | ||
| JP2022504373A JP7506735B2 (ja) | 2020-03-02 | 2021-03-02 | 感光性樹脂組成物、パターンの製造方法、感光膜、硬化物、積層体、及び、デバイス |
| PCT/JP2021/007806 WO2021177263A1 (ja) | 2020-03-02 | 2021-03-02 | 感光性樹脂組成物、パターンの製造方法、感光膜、硬化物、積層体、及び、デバイス |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022504373A Division JP7506735B2 (ja) | 2020-03-02 | 2021-03-02 | 感光性樹脂組成物、パターンの製造方法、感光膜、硬化物、積層体、及び、デバイス |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024129038A JP2024129038A (ja) | 2024-09-26 |
| JP2024129038A5 true JP2024129038A5 (enExample) | 2025-05-01 |
Family
ID=77613048
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022504373A Active JP7506735B2 (ja) | 2020-03-02 | 2021-03-02 | 感光性樹脂組成物、パターンの製造方法、感光膜、硬化物、積層体、及び、デバイス |
| JP2024096388A Pending JP2024129038A (ja) | 2020-03-02 | 2024-06-14 | 感光性樹脂組成物、パターンの製造方法、感光膜、硬化物、積層体、及び、デバイス |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022504373A Active JP7506735B2 (ja) | 2020-03-02 | 2021-03-02 | 感光性樹脂組成物、パターンの製造方法、感光膜、硬化物、積層体、及び、デバイス |
Country Status (2)
| Country | Link |
|---|---|
| JP (2) | JP7506735B2 (enExample) |
| WO (1) | WO2021177263A1 (enExample) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000131838A (ja) * | 1998-10-26 | 2000-05-12 | Hitachi Chemical Dupont Microsystems Ltd | 感光性樹脂組成物、レリーフパターンの製造法及び半導体装置 |
| JP2000356853A (ja) * | 1999-06-15 | 2000-12-26 | Hitachi Chemical Dupont Microsystems Ltd | 塩基性水溶液現像用ネガ型感光性ポリイミド前駆体組成物及びそれを用いたパターン製造方法 |
| JP2008122889A (ja) * | 2006-10-18 | 2008-05-29 | Hitachi Chemical Dupont Microsystems Ltd | 感光性樹脂組成物、この感光性樹脂組成物を用いたパターン形成方法及び電子部品 |
| JP2010224319A (ja) * | 2009-03-24 | 2010-10-07 | Fujifilm Corp | 感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板 |
| JP5571990B2 (ja) * | 2009-06-04 | 2014-08-13 | 旭化成イーマテリアルズ株式会社 | ネガ型感光性樹脂組成物、硬化レリーフパターン形成・製造方法、並びに半導体装置 |
| TWI830588B (zh) * | 2016-08-01 | 2024-01-21 | 日商富士軟片股份有限公司 | 感光性樹脂組成物、硬化膜、積層體、硬化膜的製造方法、積層體的製造方法及半導體元件 |
-
2021
- 2021-03-02 WO PCT/JP2021/007806 patent/WO2021177263A1/ja not_active Ceased
- 2021-03-02 JP JP2022504373A patent/JP7506735B2/ja active Active
-
2024
- 2024-06-14 JP JP2024096388A patent/JP2024129038A/ja active Pending
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