JP2009545101A - プラズマ源 - Google Patents
プラズマ源 Download PDFInfo
- Publication number
- JP2009545101A JP2009545101A JP2009520035A JP2009520035A JP2009545101A JP 2009545101 A JP2009545101 A JP 2009545101A JP 2009520035 A JP2009520035 A JP 2009520035A JP 2009520035 A JP2009520035 A JP 2009520035A JP 2009545101 A JP2009545101 A JP 2009545101A
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- JP
- Japan
- Prior art keywords
- plasma
- chamber
- plasma source
- source according
- density
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Plasma Technology (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (13)
- プラズマ発生器は、
前記プラズマのための空間を有するチャンバーと、
局所的な損失を生じさせるために前記空間の中に位置し、その結果、局所的なプラズマ密度を減少させて、前記空間内の前記プラズマ密度の勾配を規定するための部材と、
を含むプラズマ源。 - 前記部材は、概ね平坦である請求項1に記載のプラズマ源。
- 前記部材は、前記チャンバーの概ね横平面上に配置される請求項2に記載のプラズマ源。
- 前記部材は、切り取り部あるいは開口を有する請求項1〜3のいずれか1項に記載のプラズマ源。
- 前記部材は、前記チャンバーの前記横平面の概ね中心に位置する請求項1〜4のいずれか1項に記載のプラズマ源。
- 前記部材は、絶縁体である請求項1〜5のいずれか1項に記載のプラズマ源。
- 前記部材は、導体である請求項1〜5のいずれか1項に記載のプラズマ源。
- 前記プラズマ発生器は、使用中に前記チャンバー内で不均一なプラズマを発生し、
前記部材は、前記部材が無い場合には最大のプラズマ密度が生成されるであろう領域に配置されている、
請求項1〜7のいずれか1項に記載のプラズマ源。 - 前記部材は、概ね三角形状、円板状、ダイアモンド形状、正方形状、長方形状である請求項1〜8のいずれか1項に記載のプラズマ源。
- 前記部材は、複数個ある請求項1〜9のいずれか1項に記載のプラズマ源。
- 複数の前記部材は、スペースを空けて概ね並列である請求項10に記載のプラズマ源。
- 前記プラズマ源は、イオン源の一部である請求項1〜11のいずれか1項に記載のプラズマ源。
- 約100W以上の入力電力を有するプラズマ生成器と、
プラズマチャンバーと、
前記チャンバーに包含されるプラズマから電力を吸収するために前記プラズマチャンバー内に位置する、少なくとも1つの部材と、
を有する100Vまたは100V以下の低電力イオンビームを生成するためのイオン源。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US83237806P | 2006-07-20 | 2006-07-20 | |
GB0614500A GB0614500D0 (en) | 2006-07-21 | 2006-07-21 | Plasma sources |
PCT/GB2007/002550 WO2008009892A1 (en) | 2006-07-20 | 2007-07-06 | Plasma sources |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013242892A Division JP5878512B2 (ja) | 2006-07-20 | 2013-11-25 | プラズマ源およびイオン源 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2009545101A true JP2009545101A (ja) | 2009-12-17 |
Family
ID=38512635
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009520035A Withdrawn JP2009545101A (ja) | 2006-07-20 | 2007-07-06 | プラズマ源 |
JP2013242892A Active JP5878512B2 (ja) | 2006-07-20 | 2013-11-25 | プラズマ源およびイオン源 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013242892A Active JP5878512B2 (ja) | 2006-07-20 | 2013-11-25 | プラズマ源およびイオン源 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8400063B2 (ja) |
EP (1) | EP2044610B1 (ja) |
JP (2) | JP2009545101A (ja) |
WO (1) | WO2008009892A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2044610B1 (en) | 2006-07-20 | 2012-11-28 | SPP Process Technology Systems UK Limited | Plasma sources |
EP2044609B1 (en) | 2006-07-20 | 2011-01-12 | SPP Process Technology Systems UK Limited | Ion deposition apparatus |
WO2008009898A1 (en) | 2006-07-20 | 2008-01-24 | Aviza Technology Limited | Ion sources |
DE102008022181B4 (de) * | 2008-05-05 | 2019-05-02 | Arianegroup Gmbh | Ionentriebwerk |
JP5265275B2 (ja) * | 2008-09-05 | 2013-08-14 | 株式会社アルバック | 真空処理装置 |
AU2010213360B2 (en) * | 2009-02-13 | 2013-11-28 | Gallium Enterprises Pty Ltd | Plasma deposition |
CN102486985B (zh) * | 2010-12-03 | 2014-07-30 | 上海凯世通半导体有限公司 | 离子源装置 |
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2007
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2013
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Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH06326039A (ja) * | 1993-05-14 | 1994-11-25 | Nippon Telegr & Teleph Corp <Ntt> | 中性粒子加工方法およびその装置 |
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Also Published As
Publication number | Publication date |
---|---|
JP2014078514A (ja) | 2014-05-01 |
US20100108905A1 (en) | 2010-05-06 |
WO2008009892A1 (en) | 2008-01-24 |
EP2044610A1 (en) | 2009-04-08 |
JP5878512B2 (ja) | 2016-03-08 |
US8400063B2 (en) | 2013-03-19 |
EP2044610B1 (en) | 2012-11-28 |
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