JP2009532901A - リソグラフィ用投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム - Google Patents

リソグラフィ用投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム Download PDF

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Publication number
JP2009532901A
JP2009532901A JP2009504215A JP2009504215A JP2009532901A JP 2009532901 A JP2009532901 A JP 2009532901A JP 2009504215 A JP2009504215 A JP 2009504215A JP 2009504215 A JP2009504215 A JP 2009504215A JP 2009532901 A JP2009532901 A JP 2009532901A
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purge gas
gas mixture
vaporizer
liquid
pressure
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JP2009504215A
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Japanese (ja)
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JP2009532901A5 (enExample
Inventor
ホルムズ，ラツセル・ジエイ
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Entegris Inc
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Entegris Inc
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Publication of JP2009532901A publication Critical patent/JP2009532901A/ja
Publication of JP2009532901A5 publication Critical patent/JP2009532901A5/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2009504215A 2006-04-03 2007-03-28 リソグラフィ用投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム Pending JP2009532901A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/396,823 US20060285091A1 (en) 2003-07-21 2006-04-03 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application
PCT/US2007/007901 WO2007120451A1 (en) 2006-04-03 2007-03-28 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system

Publications (2)

Publication Number Publication Date
JP2009532901A true JP2009532901A (ja) 2009-09-10
JP2009532901A5 JP2009532901A5 (enExample) 2011-10-20

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JP2009504215A Pending JP2009532901A (ja) 2006-04-03 2007-03-28 リソグラフィ用投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム

Country Status (8)

Country Link
US (2) US20060285091A1 (enExample)
EP (1) EP2002309A1 (enExample)
JP (1) JP2009532901A (enExample)
KR (1) KR20080109813A (enExample)
CN (2) CN102298270A (enExample)
SG (1) SG173318A1 (enExample)
TW (2) TW201202869A (enExample)
WO (1) WO2007120451A1 (enExample)

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JP2011233573A (ja) * 2010-04-23 2011-11-17 Canon Inc 露光装置、それを用いたデバイスの製造方法、並びに気体供給装置
JP2015536487A (ja) * 2012-11-29 2015-12-21 ケーエルエー−テンカー コーポレイション 向上された非線形結晶性能のための共振キャビティ調整法
JP2021536594A (ja) * 2018-08-27 2021-12-27 ケーエルエー コーポレイション 光学システム内の保護剤としての蒸気及び寿命延長装置

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US7384149B2 (en) * 2003-07-21 2008-06-10 Asml Netherlands B.V. Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
JP2009503899A (ja) * 2005-08-03 2009-01-29 インテグリス・インコーポレーテッド 移送容器
US7420194B2 (en) * 2005-12-27 2008-09-02 Asml Netherlands B.V. Lithographic apparatus and substrate edge seal
US20080073596A1 (en) * 2006-08-24 2008-03-27 Asml Netherlands B.V. Lithographic apparatus and method
US7866637B2 (en) * 2007-01-26 2011-01-11 Asml Netherlands B.V. Humidifying apparatus, lithographic apparatus and humidifying method
JP2008263173A (ja) * 2007-03-16 2008-10-30 Canon Inc 露光装置
US8514365B2 (en) * 2007-06-01 2013-08-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7856737B2 (en) * 2007-08-28 2010-12-28 Mathews Company Apparatus and method for reducing a moisture content of an agricultural product
NL1036510A1 (nl) * 2008-02-21 2009-08-24 Asml Netherlands Bv Lithographic apparatus with temperature sensor and device manufacturing method.
JP2009212313A (ja) * 2008-03-04 2009-09-17 Canon Inc 露光装置およびデバイス製造方法
US20110151590A1 (en) * 2009-08-05 2011-06-23 Applied Materials, Inc. Apparatus and method for low-k dielectric repair
EP2515170B1 (en) * 2011-04-20 2020-02-19 ASML Netherlands BV Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method
CN105892238B (zh) * 2011-08-31 2018-04-13 Asml荷兰有限公司 确定聚焦位置修正的方法、光刻处理元和器件制造方法
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DE102015011228B4 (de) 2015-08-27 2017-06-14 Süss Microtec Photomask Equipment Gmbh & Co. Kg Vorrichtung zum Aufbringen eines mit UV-Strahlung beaufschlagten flüssigen Mediums auf ein Substrat
US10307803B2 (en) * 2016-07-20 2019-06-04 The United States Of America As Represented By Secretary Of The Navy Transmission window cleanliness for directed energy devices
US10670959B2 (en) * 2017-05-10 2020-06-02 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle and method of using the same
US10274847B2 (en) 2017-09-19 2019-04-30 Taiwan Semiconductor Manufacturing Co., Ltd. Humidity control in EUV lithography
US11949202B2 (en) 2018-02-15 2024-04-02 Cymer, Llc Gas management system
CN111727533A (zh) 2018-02-15 2020-09-29 西默有限公司 气体管理系统
US10871722B2 (en) * 2018-07-16 2020-12-22 Taiwan Semiconductor Manufacturing Co., Ltd. Photomask purging system and method
US10990026B2 (en) * 2018-08-14 2021-04-27 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography apparatus and cleaning method thereof
US11624904B2 (en) 2019-08-06 2023-04-11 Kla Corporation Vapor as a protectant and lifetime extender in optical systems
US10877378B2 (en) 2018-09-28 2020-12-29 Taiwan Semiconductor Manufacturing Co., Ltd. Vessel for extreme ultraviolet radiation source
WO2020146398A1 (en) * 2019-01-07 2020-07-16 Strata Skin Sciences, Inc. Excimer laser system with long service intervals
CN113457318B (zh) * 2020-03-31 2022-08-30 上海微电子装备（集团）股份有限公司 一种超洁净湿空气制备装置及光刻设备
US12085860B2 (en) 2021-01-15 2024-09-10 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for monitoring and controlling extreme ultraviolet photolithography processes
EP4356194A1 (en) * 2021-06-14 2024-04-24 ASML Netherlands B.V. An illumination source and associated method apparatus
TWI892035B (zh) 2021-08-24 2025-08-01 南韓商三星電子股份有限公司 基板處理設備
DE102021214981A1 (de) * 2021-12-23 2023-06-29 Carl Zeiss Smt Gmbh Verfahren und trockenvorrichtung
DE102023200132A1 (de) 2022-05-04 2023-11-09 Carl Zeiss Smt Gmbh Einrichtung zur Entfernung von gasförmigen Kontaminationen und Vorrichtung, insbesondere Lithographiesystem, mit einer solchen Einrichtung
CN119404138A (zh) * 2022-07-26 2025-02-07 Asml荷兰有限公司 用于向光刻系统供应气体的设备和方法
CN117405479B (zh) * 2023-08-11 2025-04-18 陕西裕隆气体有限公司 一种微量多组分混合气配制工艺方法
CN117234032B (zh) * 2023-11-13 2024-02-06 睿晶半导体(宁波)有限公司 掩模版上污染物的去除方法及吹扫装置

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011233573A (ja) * 2010-04-23 2011-11-17 Canon Inc 露光装置、それを用いたデバイスの製造方法、並びに気体供給装置
JP2015536487A (ja) * 2012-11-29 2015-12-21 ケーエルエー−テンカー コーポレイション 向上された非線形結晶性能のための共振キャビティ調整法
JP2021536594A (ja) * 2018-08-27 2021-12-27 ケーエルエー コーポレイション 光学システム内の保護剤としての蒸気及び寿命延長装置
JP2024096694A (ja) * 2018-08-27 2024-07-17 ケーエルエー コーポレイション 光学システム及び方法

Also Published As

Publication number Publication date
TW201202869A (en) 2012-01-16
KR20080109813A (ko) 2008-12-17
CN101410760B (zh) 2011-09-21
EP2002309A1 (en) 2008-12-17
WO2007120451A1 (en) 2007-10-25
US20090231559A1 (en) 2009-09-17
US20060285091A1 (en) 2006-12-21
CN102298270A (zh) 2011-12-28
CN101410760A (zh) 2009-04-15
SG173318A1 (en) 2011-08-29
TW200745727A (en) 2007-12-16

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