SG173318A1 - Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system - Google Patents
Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system Download PDFInfo
- Publication number
- SG173318A1 SG173318A1 SG2011046695A SG2011046695A SG173318A1 SG 173318 A1 SG173318 A1 SG 173318A1 SG 2011046695 A SG2011046695 A SG 2011046695A SG 2011046695 A SG2011046695 A SG 2011046695A SG 173318 A1 SG173318 A1 SG 173318A1
- Authority
- SG
- Singapore
- Prior art keywords
- purge gas
- gas mixture
- vaporizer
- vapor
- temperature
- Prior art date
Links
- 238000010926 purge Methods 0.000 title claims abstract description 455
- 238000000034 method Methods 0.000 title claims abstract description 54
- 238000004519 manufacturing process Methods 0.000 title abstract description 10
- 239000000203 mixture Substances 0.000 claims abstract description 189
- 239000007788 liquid Substances 0.000 claims description 161
- 239000006200 vaporizer Substances 0.000 claims description 103
- 239000012528 membrane Substances 0.000 claims description 78
- 239000000356 contaminant Substances 0.000 claims description 37
- 230000033228 biological regulation Effects 0.000 claims description 36
- 230000003287 optical effect Effects 0.000 claims description 29
- 230000008569 process Effects 0.000 claims description 13
- 239000000126 substance Substances 0.000 claims description 11
- 238000009833 condensation Methods 0.000 claims description 9
- 230000005494 condensation Effects 0.000 claims description 9
- 230000015572 biosynthetic process Effects 0.000 claims description 4
- 229920000557 Nafion® Polymers 0.000 claims description 3
- 239000000446 fuel Substances 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- 239000012535 impurity Substances 0.000 claims description 2
- 238000001459 lithography Methods 0.000 claims description 2
- 229920001577 copolymer Polymers 0.000 claims 2
- 229920000554 ionomer Polymers 0.000 claims 2
- 239000004909 Moisturizer Substances 0.000 abstract description 74
- 230000001333 moisturizer Effects 0.000 abstract description 74
- 239000000758 substrate Substances 0.000 abstract description 38
- 238000000059 patterning Methods 0.000 abstract description 15
- 239000007789 gas Substances 0.000 description 510
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 92
- 230000005855 radiation Effects 0.000 description 43
- 239000012510 hollow fiber Substances 0.000 description 40
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 20
- 239000012530 fluid Substances 0.000 description 19
- 230000000694 effects Effects 0.000 description 16
- 239000010410 layer Substances 0.000 description 14
- 238000011144 upstream manufacturing Methods 0.000 description 14
- 238000011109 contamination Methods 0.000 description 13
- 229930195733 hydrocarbon Natural products 0.000 description 13
- 238000012360 testing method Methods 0.000 description 13
- 238000002474 experimental method Methods 0.000 description 12
- 239000000835 fiber Substances 0.000 description 10
- 150000002430 hydrocarbons Chemical class 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- 238000010790 dilution Methods 0.000 description 9
- 239000012895 dilution Substances 0.000 description 9
- 230000007423 decrease Effects 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 8
- 229920001169 thermoplastic Polymers 0.000 description 8
- 230000002411 adverse Effects 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 239000004215 Carbon black (E152) Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000005286 illumination Methods 0.000 description 6
- 150000003464 sulfur compounds Chemical class 0.000 description 6
- 239000004416 thermosoftening plastic Substances 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 230000003247 decreasing effect Effects 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 5
- 238000000769 gas chromatography-flame ionisation detection Methods 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 230000002829 reductive effect Effects 0.000 description 5
- 230000004044 response Effects 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 238000004891 communication Methods 0.000 description 4
- -1 polytetrafluoroethylene Polymers 0.000 description 4
- 239000000523 sample Substances 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 4
- 229920006362 Teflon® Polymers 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 3
- 239000003638 chemical reducing agent Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 238000004817 gas chromatography Methods 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Natural products C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 230000036961 partial effect Effects 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 238000004382 potting Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000001172 regenerating effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 239000012498 ultrapure water Substances 0.000 description 2
- 241001155433 Centrarchus macropterus Species 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000012982 microporous membrane Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- 150000002941 palladium compounds Chemical class 0.000 description 1
- 238000009304 pastoral farming Methods 0.000 description 1
- 238000004375 physisorption Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 235000020004 porter Nutrition 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 230000037452 priming Effects 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000010897 surface acoustic wave method Methods 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Optics & Photonics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/396,823 US20060285091A1 (en) | 2003-07-21 | 2006-04-03 | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG173318A1 true SG173318A1 (en) | 2011-08-29 |
Family
ID=38326249
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG2011046695A SG173318A1 (en) | 2006-04-03 | 2007-03-28 | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US20060285091A1 (enExample) |
| EP (1) | EP2002309A1 (enExample) |
| JP (1) | JP2009532901A (enExample) |
| KR (1) | KR20080109813A (enExample) |
| CN (2) | CN101410760B (enExample) |
| SG (1) | SG173318A1 (enExample) |
| TW (2) | TW201202869A (enExample) |
| WO (1) | WO2007120451A1 (enExample) |
Families Citing this family (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7189291B2 (en) * | 2003-06-02 | 2007-03-13 | Entegris, Inc. | Method for the removal of airborne molecular contaminants using oxygen gas mixtures |
| US20060285091A1 (en) * | 2003-07-21 | 2006-12-21 | Parekh Bipin S | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application |
| US7384149B2 (en) * | 2003-07-21 | 2008-06-10 | Asml Netherlands B.V. | Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system |
| WO2007019105A1 (en) * | 2005-08-03 | 2007-02-15 | Entegris, Inc. | A transfer container |
| US7420194B2 (en) * | 2005-12-27 | 2008-09-02 | Asml Netherlands B.V. | Lithographic apparatus and substrate edge seal |
| US20080073596A1 (en) * | 2006-08-24 | 2008-03-27 | Asml Netherlands B.V. | Lithographic apparatus and method |
| US7866637B2 (en) * | 2007-01-26 | 2011-01-11 | Asml Netherlands B.V. | Humidifying apparatus, lithographic apparatus and humidifying method |
| JP2008263173A (ja) * | 2007-03-16 | 2008-10-30 | Canon Inc | 露光装置 |
| US8514365B2 (en) * | 2007-06-01 | 2013-08-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7856737B2 (en) * | 2007-08-28 | 2010-12-28 | Mathews Company | Apparatus and method for reducing a moisture content of an agricultural product |
| NL1036510A1 (nl) * | 2008-02-21 | 2009-08-24 | Asml Netherlands Bv | Lithographic apparatus with temperature sensor and device manufacturing method. |
| JP2009212313A (ja) * | 2008-03-04 | 2009-09-17 | Canon Inc | 露光装置およびデバイス製造方法 |
| US20110151590A1 (en) * | 2009-08-05 | 2011-06-23 | Applied Materials, Inc. | Apparatus and method for low-k dielectric repair |
| JP5574799B2 (ja) * | 2010-04-23 | 2014-08-20 | キヤノン株式会社 | 露光装置、それを用いたデバイスの製造方法、並びに気体供給装置 |
| EP2515170B1 (en) * | 2011-04-20 | 2020-02-19 | ASML Netherlands BV | Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method |
| KR20140068970A (ko) * | 2011-08-31 | 2014-06-09 | 에이에스엠엘 네델란즈 비.브이. | 포커스 보정을 결정하는 방법, 리소그래피 처리 셀 및 디바이스 제조 방법 |
| NL2009378A (en) * | 2011-10-07 | 2013-04-09 | Asml Netherlands Bv | Lithographic apparatus and method of cooling a component in a lithographic apparatus. |
| US9116445B2 (en) * | 2012-11-29 | 2015-08-25 | Kla-Tencor Corporation | Resonant cavity conditioning for improved nonlinear crystal performance |
| DE102015011228B4 (de) | 2015-08-27 | 2017-06-14 | Süss Microtec Photomask Equipment Gmbh & Co. Kg | Vorrichtung zum Aufbringen eines mit UV-Strahlung beaufschlagten flüssigen Mediums auf ein Substrat |
| US10307803B2 (en) * | 2016-07-20 | 2019-06-04 | The United States Of America As Represented By Secretary Of The Navy | Transmission window cleanliness for directed energy devices |
| US10670959B2 (en) | 2017-05-10 | 2020-06-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle and method of using the same |
| US10274847B2 (en) * | 2017-09-19 | 2019-04-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Humidity control in EUV lithography |
| CN111727533A (zh) | 2018-02-15 | 2020-09-29 | 西默有限公司 | 气体管理系统 |
| CN111727497B (zh) | 2018-02-15 | 2024-12-06 | 西默有限公司 | 气体管理系统 |
| US10871722B2 (en) * | 2018-07-16 | 2020-12-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Photomask purging system and method |
| US10990026B2 (en) * | 2018-08-14 | 2021-04-27 | Taiwan Semiconductor Manufacturing Co., Ltd. | Lithography apparatus and cleaning method thereof |
| US11624904B2 (en) | 2019-08-06 | 2023-04-11 | Kla Corporation | Vapor as a protectant and lifetime extender in optical systems |
| EP3811141A4 (en) | 2018-08-27 | 2022-03-23 | KLA Corporation | STEAM AS A PROTECTIVE AND LIFE EXTENDED IN OPTICAL SYSTEMS |
| US10877378B2 (en) | 2018-09-28 | 2020-12-29 | Taiwan Semiconductor Manufacturing Co., Ltd. | Vessel for extreme ultraviolet radiation source |
| US12160080B2 (en) * | 2019-01-07 | 2024-12-03 | Strata Skin Sciences, Inc. | Excimer laser system with long service intervals |
| CN113457318B (zh) * | 2020-03-31 | 2022-08-30 | 上海微电子装备（集团）股份有限公司 | 一种超洁净湿空气制备装置及光刻设备 |
| US12085860B2 (en) | 2021-01-15 | 2024-09-10 | Taiwan Semiconductor Manufacturing Co., Ltd. | System and method for monitoring and controlling extreme ultraviolet photolithography processes |
| KR20250150135A (ko) * | 2021-06-14 | 2025-10-17 | 에이에스엠엘 네델란즈 비.브이. | 조명 소스 및 연관된 방법, 장치 |
| TWI892035B (zh) | 2021-08-24 | 2025-08-01 | 南韓商三星電子股份有限公司 | 基板處理設備 |
| DE102021214981A1 (de) * | 2021-12-23 | 2023-06-29 | Carl Zeiss Smt Gmbh | Verfahren und trockenvorrichtung |
| DE102023200132A1 (de) | 2022-05-04 | 2023-11-09 | Carl Zeiss Smt Gmbh | Einrichtung zur Entfernung von gasförmigen Kontaminationen und Vorrichtung, insbesondere Lithographiesystem, mit einer solchen Einrichtung |
| WO2024022796A1 (en) * | 2022-07-26 | 2024-02-01 | Asml Netherlands B.V. | Apparatus for and method of supplying gas to a lithography system |
| CN117405479B (zh) * | 2023-08-11 | 2025-04-18 | 陕西裕隆气体有限公司 | 一种微量多组分混合气配制工艺方法 |
| CN117234032B (zh) * | 2023-11-13 | 2024-02-06 | 睿晶半导体(宁波)有限公司 | 掩模版上污染物的去除方法及吹扫装置 |
Family Cites Families (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19910441C1 (de) * | 1999-03-10 | 2000-06-21 | Fraunhofer Ges Forschung | Luftbefeuchtung |
| DE2964203D1 (en) * | 1978-07-12 | 1983-01-13 | Jackson Richard R | Nested hollow fiber humidifier |
| DD160756A3 (de) * | 1981-04-24 | 1984-02-29 | Gudrun Dietz | Anordnung zur verbesserung fotochemischer umsetzungsprozesse in fotoresistschichten |
| JPH0636993A (ja) * | 1992-05-21 | 1994-02-10 | Canon Inc | 露光装置及び半導体素子の製造方法 |
| US5240472A (en) * | 1992-05-29 | 1993-08-31 | Air Products And Chemicls, Inc. | Moisture removal from a wet gas |
| JP2753930B2 (ja) * | 1992-11-27 | 1998-05-20 | キヤノン株式会社 | 液浸式投影露光装置 |
| US5348691A (en) * | 1993-06-11 | 1994-09-20 | United Technologies Corporation | Atmosphere membrane humidifier and method and system for producing humidified air |
| US5996976A (en) * | 1993-07-13 | 1999-12-07 | Lynntech, Inc. | Gas humidification system using water permeable membranes |
| JP3500619B2 (ja) * | 1993-10-28 | 2004-02-23 | 株式会社ニコン | 投影露光装置 |
| JPH08266631A (ja) * | 1995-03-31 | 1996-10-15 | Asahi Glass Co Ltd | 呼吸用気体の加湿装置 |
| US6297871B1 (en) * | 1995-09-12 | 2001-10-02 | Nikon Corporation | Exposure apparatus |
| KR100542414B1 (ko) * | 1996-03-27 | 2006-05-10 | 가부시키가이샤 니콘 | 노광장치및공조장치 |
| US5910292A (en) * | 1997-08-19 | 1999-06-08 | Aeronex, Inc. | Method for water removal from corrosive gas streams |
| US6059859A (en) * | 1997-09-19 | 2000-05-09 | Aeronex, Inc. | Method, composition and apparatus for water removal from non-corrosive gas streams |
| US6089282A (en) * | 1998-05-08 | 2000-07-18 | Aeronex, Inc. | Method for recovery and reuse of gas |
| KR20010087356A (ko) * | 1998-09-09 | 2001-09-15 | 와이너 길버트 피. | 유체 처리 요소, 유체 처리 요소 세척 방법 및 유체 처리방법 |
| US6254936B1 (en) * | 1998-09-14 | 2001-07-03 | Silicon Valley Group, Inc. | Environment exchange control for material on a wafer surface |
| US6582496B1 (en) * | 2000-01-28 | 2003-06-24 | Mykrolis Corporation | Hollow fiber membrane contactor |
| US6802972B1 (en) * | 1999-01-29 | 2004-10-12 | Mykrolis Corporation | Microporous hollow fiber membranes from perfluorinated thermoplastic polymers |
| EP1148932B1 (en) * | 1999-01-29 | 2005-06-08 | Mykrolis Corporation | Method for manufacturing hollow fiber membranes |
| US6394109B1 (en) * | 1999-04-13 | 2002-05-28 | Applied Materials, Inc. | Method and apparatus for removing carbon contamination in a sub-atmospheric charged particle beam lithography system |
| WO2000074120A1 (en) * | 1999-05-28 | 2000-12-07 | Nikon Corporation | Exposure method and apparatus |
| JP3927344B2 (ja) * | 2000-01-19 | 2007-06-06 | 本田技研工業株式会社 | 加湿装置 |
| JP3869999B2 (ja) * | 2000-03-30 | 2007-01-17 | キヤノン株式会社 | 露光装置および半導体デバイス製造方法 |
| JP2002158170A (ja) * | 2000-09-08 | 2002-05-31 | Nikon Corp | 露光装置及びデバイス製造方法 |
| DE10054473A1 (de) * | 2000-11-03 | 2002-05-08 | Siemens Ag | Verfahren zum Austausch von Datenpaketen zwischen zwei Diensteerbringern eines Funkübertragungssystems |
| JP2002158154A (ja) * | 2000-11-16 | 2002-05-31 | Canon Inc | 露光装置 |
| DE10059910C2 (de) * | 2000-12-01 | 2003-01-16 | Daimler Chrysler Ag | Vorrichtung zur kontinuierlichen Befeuchtung und Entfeuchtung der Zuluft von Fertigungsprozessen oder Raumlufttechnik-Anlagen |
| US6842998B2 (en) * | 2001-04-06 | 2005-01-18 | Akrion Llc | Membrane dryer |
| US6514313B1 (en) * | 2001-06-22 | 2003-02-04 | Aeronex, Inc. | Gas purification system and method |
| US6828569B2 (en) * | 2001-11-19 | 2004-12-07 | Asml Netherlands B.V. | Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
| US6724460B2 (en) * | 2001-11-19 | 2004-04-20 | Asml Netherlands B.V. | Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects |
| US20030162305A1 (en) * | 2002-02-25 | 2003-08-28 | Daniel Alvarez | Gas contaminant detection and quantification method |
| US6638341B1 (en) * | 2002-06-14 | 2003-10-28 | Aeronex, Inc. | Method for rapid activation or preconditioning of porous gas purification substrates |
| EP1527492A2 (de) * | 2002-07-18 | 2005-05-04 | DaimlerChrysler AG | Vorrichtung und verfahren zur befeuchtung eines gasstroms |
| DE10234956B4 (de) * | 2002-07-31 | 2007-01-04 | Advanced Micro Devices, Inc., Sunnyvale | Verfahren zum Steuern des chemisch mechanischen Polierens von gestapelten Schichten mit einer Oberflächentopologie |
| JP2006518468A (ja) * | 2003-02-21 | 2006-08-10 | インテグリス・インコーポレーテッド | プロセス流体流中の汚染物質の分析方法 |
| US7189291B2 (en) * | 2003-06-02 | 2007-03-13 | Entegris, Inc. | Method for the removal of airborne molecular contaminants using oxygen gas mixtures |
| US7384149B2 (en) * | 2003-07-21 | 2008-06-10 | Asml Netherlands B.V. | Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system |
| US20060285091A1 (en) * | 2003-07-21 | 2006-12-21 | Parekh Bipin S | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application |
-
2006
- 2006-04-03 US US11/396,823 patent/US20060285091A1/en not_active Abandoned
-
2007
- 2007-03-28 KR KR1020087024264A patent/KR20080109813A/ko not_active Withdrawn
- 2007-03-28 WO PCT/US2007/007901 patent/WO2007120451A1/en not_active Ceased
- 2007-03-28 JP JP2009504215A patent/JP2009532901A/ja active Pending
- 2007-03-28 EP EP07754421A patent/EP2002309A1/en not_active Ceased
- 2007-03-28 CN CN2007800115338A patent/CN101410760B/zh not_active Expired - Fee Related
- 2007-03-28 CN CN2011102111005A patent/CN102298270A/zh active Pending
- 2007-03-28 SG SG2011046695A patent/SG173318A1/en unknown
- 2007-03-29 TW TW100123486A patent/TW201202869A/zh unknown
- 2007-03-29 TW TW096111016A patent/TW200745727A/zh unknown
-
2008
- 2008-07-11 US US12/218,091 patent/US20090231559A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| CN101410760A (zh) | 2009-04-15 |
| TW201202869A (en) | 2012-01-16 |
| US20060285091A1 (en) | 2006-12-21 |
| EP2002309A1 (en) | 2008-12-17 |
| TW200745727A (en) | 2007-12-16 |
| KR20080109813A (ko) | 2008-12-17 |
| US20090231559A1 (en) | 2009-09-17 |
| WO2007120451A1 (en) | 2007-10-25 |
| CN101410760B (zh) | 2011-09-21 |
| JP2009532901A (ja) | 2009-09-10 |
| CN102298270A (zh) | 2011-12-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20090231559A1 (en) | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system | |
| US7879137B2 (en) | Lithographic projection apparatus, purge gas supply system and gas purging method | |
| US7866637B2 (en) | Humidifying apparatus, lithographic apparatus and humidifying method | |
| WO2011146432A2 (en) | Controlled vaporization system and method for surface priming in semiconductor manufacturing | |
| WO2008024263A1 (en) | System and method for vortex condensation trapping in purge gas humidification |