KR20080109813A - 리소그래픽 투사 장치, 가스 퍼징 방법, 장치 제조 방법 및퍼지 가스 공급 시스템 - Google Patents

리소그래픽 투사 장치, 가스 퍼징 방법, 장치 제조 방법 및퍼지 가스 공급 시스템 Download PDF

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Publication number
KR20080109813A
KR20080109813A KR1020087024264A KR20087024264A KR20080109813A KR 20080109813 A KR20080109813 A KR 20080109813A KR 1020087024264 A KR1020087024264 A KR 1020087024264A KR 20087024264 A KR20087024264 A KR 20087024264A KR 20080109813 A KR20080109813 A KR 20080109813A
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KR
South Korea
Prior art keywords
purge gas
gas mixture
liquid
pressure
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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KR1020087024264A
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English (en)
Korean (ko)
Inventor
러셀 제이. 홀름즈
Original Assignee
엔테그리스, 아이엔씨.
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Publication date
Application filed by 엔테그리스, 아이엔씨. filed Critical 엔테그리스, 아이엔씨.
Publication of KR20080109813A publication Critical patent/KR20080109813A/ko
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020087024264A 2006-04-03 2007-03-28 리소그래픽 투사 장치, 가스 퍼징 방법, 장치 제조 방법 및퍼지 가스 공급 시스템 Withdrawn KR20080109813A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/396,823 US20060285091A1 (en) 2003-07-21 2006-04-03 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application
US11/396,823 2006-04-03

Publications (1)

Publication Number Publication Date
KR20080109813A true KR20080109813A (ko) 2008-12-17

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087024264A Withdrawn KR20080109813A (ko) 2006-04-03 2007-03-28 리소그래픽 투사 장치, 가스 퍼징 방법, 장치 제조 방법 및퍼지 가스 공급 시스템

Country Status (8)

Country Link
US (2) US20060285091A1 (enExample)
EP (1) EP2002309A1 (enExample)
JP (1) JP2009532901A (enExample)
KR (1) KR20080109813A (enExample)
CN (2) CN102298270A (enExample)
SG (1) SG173318A1 (enExample)
TW (2) TW201202869A (enExample)
WO (1) WO2007120451A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210038687A (ko) * 2018-08-27 2021-04-07 케이엘에이 코포레이션 광학 시스템에서의 보호제 및 수명 연장기로서의 증기

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7189291B2 (en) * 2003-06-02 2007-03-13 Entegris, Inc. Method for the removal of airborne molecular contaminants using oxygen gas mixtures
US20060285091A1 (en) * 2003-07-21 2006-12-21 Parekh Bipin S Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application
US7384149B2 (en) * 2003-07-21 2008-06-10 Asml Netherlands B.V. Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
JP2009503899A (ja) * 2005-08-03 2009-01-29 インテグリス・インコーポレーテッド 移送容器
US7420194B2 (en) * 2005-12-27 2008-09-02 Asml Netherlands B.V. Lithographic apparatus and substrate edge seal
US20080073596A1 (en) * 2006-08-24 2008-03-27 Asml Netherlands B.V. Lithographic apparatus and method
US7866637B2 (en) * 2007-01-26 2011-01-11 Asml Netherlands B.V. Humidifying apparatus, lithographic apparatus and humidifying method
JP2008263173A (ja) * 2007-03-16 2008-10-30 Canon Inc 露光装置
US8514365B2 (en) * 2007-06-01 2013-08-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7856737B2 (en) * 2007-08-28 2010-12-28 Mathews Company Apparatus and method for reducing a moisture content of an agricultural product
NL1036510A1 (nl) * 2008-02-21 2009-08-24 Asml Netherlands Bv Lithographic apparatus with temperature sensor and device manufacturing method.
JP2009212313A (ja) * 2008-03-04 2009-09-17 Canon Inc 露光装置およびデバイス製造方法
US20110151590A1 (en) * 2009-08-05 2011-06-23 Applied Materials, Inc. Apparatus and method for low-k dielectric repair
JP5574799B2 (ja) * 2010-04-23 2014-08-20 キヤノン株式会社 露光装置、それを用いたデバイスの製造方法、並びに気体供給装置
EP2515170B1 (en) * 2011-04-20 2020-02-19 ASML Netherlands BV Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method
CN105892238B (zh) * 2011-08-31 2018-04-13 Asml荷兰有限公司 确定聚焦位置修正的方法、光刻处理元和器件制造方法
NL2009378A (en) * 2011-10-07 2013-04-09 Asml Netherlands Bv Lithographic apparatus and method of cooling a component in a lithographic apparatus.
US9116445B2 (en) * 2012-11-29 2015-08-25 Kla-Tencor Corporation Resonant cavity conditioning for improved nonlinear crystal performance
DE102015011228B4 (de) 2015-08-27 2017-06-14 Süss Microtec Photomask Equipment Gmbh & Co. Kg Vorrichtung zum Aufbringen eines mit UV-Strahlung beaufschlagten flüssigen Mediums auf ein Substrat
US10307803B2 (en) * 2016-07-20 2019-06-04 The United States Of America As Represented By Secretary Of The Navy Transmission window cleanliness for directed energy devices
US10670959B2 (en) * 2017-05-10 2020-06-02 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle and method of using the same
US10274847B2 (en) 2017-09-19 2019-04-30 Taiwan Semiconductor Manufacturing Co., Ltd. Humidity control in EUV lithography
US11949202B2 (en) 2018-02-15 2024-04-02 Cymer, Llc Gas management system
CN111727533A (zh) 2018-02-15 2020-09-29 西默有限公司 气体管理系统
US10871722B2 (en) * 2018-07-16 2020-12-22 Taiwan Semiconductor Manufacturing Co., Ltd. Photomask purging system and method
US10990026B2 (en) * 2018-08-14 2021-04-27 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography apparatus and cleaning method thereof
US11624904B2 (en) 2019-08-06 2023-04-11 Kla Corporation Vapor as a protectant and lifetime extender in optical systems
US10877378B2 (en) 2018-09-28 2020-12-29 Taiwan Semiconductor Manufacturing Co., Ltd. Vessel for extreme ultraviolet radiation source
WO2020146398A1 (en) * 2019-01-07 2020-07-16 Strata Skin Sciences, Inc. Excimer laser system with long service intervals
CN113457318B (zh) * 2020-03-31 2022-08-30 上海微电子装备（集团）股份有限公司 一种超洁净湿空气制备装置及光刻设备
US12085860B2 (en) 2021-01-15 2024-09-10 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for monitoring and controlling extreme ultraviolet photolithography processes
EP4356194A1 (en) * 2021-06-14 2024-04-24 ASML Netherlands B.V. An illumination source and associated method apparatus
TWI892035B (zh) 2021-08-24 2025-08-01 南韓商三星電子股份有限公司 基板處理設備
DE102021214981A1 (de) * 2021-12-23 2023-06-29 Carl Zeiss Smt Gmbh Verfahren und trockenvorrichtung
DE102023200132A1 (de) 2022-05-04 2023-11-09 Carl Zeiss Smt Gmbh Einrichtung zur Entfernung von gasförmigen Kontaminationen und Vorrichtung, insbesondere Lithographiesystem, mit einer solchen Einrichtung
CN119404138A (zh) * 2022-07-26 2025-02-07 Asml荷兰有限公司 用于向光刻系统供应气体的设备和方法
CN117405479B (zh) * 2023-08-11 2025-04-18 陕西裕隆气体有限公司 一种微量多组分混合气配制工艺方法
CN117234032B (zh) * 2023-11-13 2024-02-06 睿晶半导体(宁波)有限公司 掩模版上污染物的去除方法及吹扫装置

Family Cites Families (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19910441C1 (de) * 1999-03-10 2000-06-21 Fraunhofer Ges Forschung Luftbefeuchtung
DE2964203D1 (en) * 1978-07-12 1983-01-13 Jackson Richard R Nested hollow fiber humidifier
DD160756A3 (de) * 1981-04-24 1984-02-29 Gudrun Dietz Anordnung zur verbesserung fotochemischer umsetzungsprozesse in fotoresistschichten
JPH0636993A (ja) * 1992-05-21 1994-02-10 Canon Inc 露光装置及び半導体素子の製造方法
US5240472A (en) * 1992-05-29 1993-08-31 Air Products And Chemicls, Inc. Moisture removal from a wet gas
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
US5348691A (en) * 1993-06-11 1994-09-20 United Technologies Corporation Atmosphere membrane humidifier and method and system for producing humidified air
US5996976A (en) * 1993-07-13 1999-12-07 Lynntech, Inc. Gas humidification system using water permeable membranes
JP3500619B2 (ja) * 1993-10-28 2004-02-23 株式会社ニコン 投影露光装置
JPH08266631A (ja) * 1995-03-31 1996-10-15 Asahi Glass Co Ltd 呼吸用気体の加湿装置
US6297871B1 (en) * 1995-09-12 2001-10-02 Nikon Corporation Exposure apparatus
KR100542414B1 (ko) * 1996-03-27 2006-05-10 가부시키가이샤 니콘 노광장치및공조장치
US5910292A (en) * 1997-08-19 1999-06-08 Aeronex, Inc. Method for water removal from corrosive gas streams
US6059859A (en) * 1997-09-19 2000-05-09 Aeronex, Inc. Method, composition and apparatus for water removal from non-corrosive gas streams
US6089282A (en) * 1998-05-08 2000-07-18 Aeronex, Inc. Method for recovery and reuse of gas
KR20010087356A (ko) * 1998-09-09 2001-09-15 와이너 길버트 피. 유체 처리 요소, 유체 처리 요소 세척 방법 및 유체 처리방법
US6254936B1 (en) * 1998-09-14 2001-07-03 Silicon Valley Group, Inc. Environment exchange control for material on a wafer surface
US6582496B1 (en) * 2000-01-28 2003-06-24 Mykrolis Corporation Hollow fiber membrane contactor
WO2000044480A1 (en) * 1999-01-29 2000-08-03 Mykrolis Corporation Method for manufacturing hollow fiber membranes
US6802972B1 (en) * 1999-01-29 2004-10-12 Mykrolis Corporation Microporous hollow fiber membranes from perfluorinated thermoplastic polymers
US6394109B1 (en) * 1999-04-13 2002-05-28 Applied Materials, Inc. Method and apparatus for removing carbon contamination in a sub-atmospheric charged particle beam lithography system
WO2000074120A1 (en) * 1999-05-28 2000-12-07 Nikon Corporation Exposure method and apparatus
JP3927344B2 (ja) * 2000-01-19 2007-06-06 本田技研工業株式会社 加湿装置
JP3869999B2 (ja) * 2000-03-30 2007-01-17 キヤノン株式会社 露光装置および半導体デバイス製造方法
JP2002158170A (ja) * 2000-09-08 2002-05-31 Nikon Corp 露光装置及びデバイス製造方法
DE10054473A1 (de) * 2000-11-03 2002-05-08 Siemens Ag Verfahren zum Austausch von Datenpaketen zwischen zwei Diensteerbringern eines Funkübertragungssystems
JP2002158154A (ja) * 2000-11-16 2002-05-31 Canon Inc 露光装置
DE10059910C2 (de) * 2000-12-01 2003-01-16 Daimler Chrysler Ag Vorrichtung zur kontinuierlichen Befeuchtung und Entfeuchtung der Zuluft von Fertigungsprozessen oder Raumlufttechnik-Anlagen
US6842998B2 (en) * 2001-04-06 2005-01-18 Akrion Llc Membrane dryer
US6514313B1 (en) * 2001-06-22 2003-02-04 Aeronex, Inc. Gas purification system and method
US6724460B2 (en) * 2001-11-19 2004-04-20 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects
US6828569B2 (en) * 2001-11-19 2004-12-07 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method and device manufactured thereby
US20030162305A1 (en) * 2002-02-25 2003-08-28 Daniel Alvarez Gas contaminant detection and quantification method
US6638341B1 (en) * 2002-06-14 2003-10-28 Aeronex, Inc. Method for rapid activation or preconditioning of porous gas purification substrates
AU2003250287A1 (en) * 2002-07-18 2004-03-03 Daimlerchrysler Ag Device and method for humidifying a gas flow
DE10234956B4 (de) * 2002-07-31 2007-01-04 Advanced Micro Devices, Inc., Sunnyvale Verfahren zum Steuern des chemisch mechanischen Polierens von gestapelten Schichten mit einer Oberflächentopologie
EP1595132B1 (en) * 2003-02-21 2007-01-17 Entegris, Inc. Method for analysis of contaminants in a process fluid stream
US7189291B2 (en) * 2003-06-02 2007-03-13 Entegris, Inc. Method for the removal of airborne molecular contaminants using oxygen gas mixtures
US20060285091A1 (en) * 2003-07-21 2006-12-21 Parekh Bipin S Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application
US7384149B2 (en) * 2003-07-21 2008-06-10 Asml Netherlands B.V. Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210038687A (ko) * 2018-08-27 2021-04-07 케이엘에이 코포레이션 광학 시스템에서의 보호제 및 수명 연장기로서의 증기

Also Published As

Publication number Publication date
TW201202869A (en) 2012-01-16
CN101410760B (zh) 2011-09-21
EP2002309A1 (en) 2008-12-17
WO2007120451A1 (en) 2007-10-25
US20090231559A1 (en) 2009-09-17
US20060285091A1 (en) 2006-12-21
CN102298270A (zh) 2011-12-28
CN101410760A (zh) 2009-04-15
SG173318A1 (en) 2011-08-29
JP2009532901A (ja) 2009-09-10
TW200745727A (en) 2007-12-16

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Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20081002

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid