CN102298270A - 微影投射设备、气体洗涤方法、装置制造方法及洗涤气体的供应系统 - Google Patents

微影投射设备、气体洗涤方法、装置制造方法及洗涤气体的供应系统 Download PDF

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Publication number
CN102298270A
CN102298270A CN2011102111005A CN201110211100A CN102298270A CN 102298270 A CN102298270 A CN 102298270A CN 2011102111005 A CN2011102111005 A CN 2011102111005A CN 201110211100 A CN201110211100 A CN 201110211100A CN 102298270 A CN102298270 A CN 102298270A
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CN
China
Prior art keywords
washing gas
evaporator
potpourri
washing
gas
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Pending
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CN2011102111005A
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English (en)
Chinese (zh)
Inventor
罗瑟·J.·霍姆斯
约翰·E.·皮莱恩
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Entegris Inc
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Entegris Inc
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Publication of CN102298270A publication Critical patent/CN102298270A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN2011102111005A 2006-04-03 2007-03-28 微影投射设备、气体洗涤方法、装置制造方法及洗涤气体的供应系统 Pending CN102298270A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/396,823 US20060285091A1 (en) 2003-07-21 2006-04-03 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application
US11/396,823 2006-04-03

Related Parent Applications (1)

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CN2007800115338A Division CN101410760B (zh) 2006-04-03 2007-03-28 微影投射设备、气体洗涤方法、装置制造方法及洗涤气体的供应系统

Publications (1)

Publication Number Publication Date
CN102298270A true CN102298270A (zh) 2011-12-28

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CN2011102111005A Pending CN102298270A (zh) 2006-04-03 2007-03-28 微影投射设备、气体洗涤方法、装置制造方法及洗涤气体的供应系统
CN2007800115338A Expired - Fee Related CN101410760B (zh) 2006-04-03 2007-03-28 微影投射设备、气体洗涤方法、装置制造方法及洗涤气体的供应系统

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CN2007800115338A Expired - Fee Related CN101410760B (zh) 2006-04-03 2007-03-28 微影投射设备、气体洗涤方法、装置制造方法及洗涤气体的供应系统

Country Status (8)

Country Link
US (2) US20060285091A1 (enExample)
EP (1) EP2002309A1 (enExample)
JP (1) JP2009532901A (enExample)
KR (1) KR20080109813A (enExample)
CN (2) CN102298270A (enExample)
SG (1) SG173318A1 (enExample)
TW (2) TW200745727A (enExample)
WO (1) WO2007120451A1 (enExample)

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CN117405479A (zh) * 2023-08-11 2024-01-16 陕西裕隆气体有限公司 一种微量多组分混合气配制工艺方法

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Also Published As

Publication number Publication date
TW200745727A (en) 2007-12-16
TW201202869A (en) 2012-01-16
SG173318A1 (en) 2011-08-29
CN101410760A (zh) 2009-04-15
US20060285091A1 (en) 2006-12-21
JP2009532901A (ja) 2009-09-10
CN101410760B (zh) 2011-09-21
EP2002309A1 (en) 2008-12-17
US20090231559A1 (en) 2009-09-17
WO2007120451A1 (en) 2007-10-25
KR20080109813A (ko) 2008-12-17

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Application publication date: 20111228