TW201202869A - Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system - Google Patents
Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system Download PDFInfo
- Publication number
- TW201202869A TW201202869A TW100123486A TW100123486A TW201202869A TW 201202869 A TW201202869 A TW 201202869A TW 100123486 A TW100123486 A TW 100123486A TW 100123486 A TW100123486 A TW 100123486A TW 201202869 A TW201202869 A TW 201202869A
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- Prior art keywords
- gas
- temperature
- scrubbing
- scrubbing gas
- evaporator
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- 238000010926 purge Methods 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 title claims description 49
- 238000004519 manufacturing process Methods 0.000 title description 8
- 239000000203 mixture Substances 0.000 claims abstract description 191
- 238000005201 scrubbing Methods 0.000 claims description 280
- 239000007788 liquid Substances 0.000 claims description 163
- 238000005406 washing Methods 0.000 claims description 83
- 239000012528 membrane Substances 0.000 claims description 43
- 230000003287 optical effect Effects 0.000 claims description 42
- 239000000356 contaminant Substances 0.000 claims description 30
- 238000001459 lithography Methods 0.000 claims description 28
- 230000001105 regulatory effect Effects 0.000 claims description 16
- 230000008569 process Effects 0.000 claims description 14
- 229920000642 polymer Polymers 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims description 12
- 238000009833 condensation Methods 0.000 claims description 10
- 230000005494 condensation Effects 0.000 claims description 10
- 238000002156 mixing Methods 0.000 claims description 10
- 238000004140 cleaning Methods 0.000 claims description 9
- 230000033228 biological regulation Effects 0.000 claims description 8
- 230000001276 controlling effect Effects 0.000 claims description 8
- 229920000557 Nafion® Polymers 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 239000000446 fuel Substances 0.000 claims description 3
- 239000012535 impurity Substances 0.000 claims description 3
- 238000010025 steaming Methods 0.000 claims description 3
- 229920000831 ionic polymer Polymers 0.000 claims 2
- 238000012986 modification Methods 0.000 claims 2
- 230000004048 modification Effects 0.000 claims 2
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims 2
- 238000004821 distillation Methods 0.000 claims 1
- 238000012423 maintenance Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 46
- 238000000059 patterning Methods 0.000 abstract description 5
- 239000004909 Moisturizer Substances 0.000 abstract 1
- 230000001333 moisturizer Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 532
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 96
- 230000005855 radiation Effects 0.000 description 42
- 239000012510 hollow fiber Substances 0.000 description 37
- 239000010408 film Substances 0.000 description 30
- 239000000835 fiber Substances 0.000 description 22
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 19
- 230000000694 effects Effects 0.000 description 15
- 238000012360 testing method Methods 0.000 description 15
- 239000010410 layer Substances 0.000 description 14
- 239000000463 material Substances 0.000 description 14
- 238000011144 upstream manufacturing Methods 0.000 description 14
- 238000011109 contamination Methods 0.000 description 12
- 230000001172 regenerating effect Effects 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 10
- 238000002474 experimental method Methods 0.000 description 10
- 239000012530 fluid Substances 0.000 description 10
- 229930195733 hydrocarbon Natural products 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 230000008859 change Effects 0.000 description 8
- 238000001704 evaporation Methods 0.000 description 8
- 150000002430 hydrocarbons Chemical class 0.000 description 8
- 238000005286 illumination Methods 0.000 description 8
- 238000000746 purification Methods 0.000 description 8
- 230000002829 reductive effect Effects 0.000 description 8
- 229920001169 thermoplastic Polymers 0.000 description 8
- 238000000576 coating method Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 238000000889 atomisation Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 239000003595 mist Substances 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 239000004416 thermosoftening plastic Substances 0.000 description 6
- 230000002411 adverse Effects 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 5
- 229910021641 deionized water Inorganic materials 0.000 description 5
- 238000010790 dilution Methods 0.000 description 5
- 239000012895 dilution Substances 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- 239000001307 helium Substances 0.000 description 5
- 229910052734 helium Inorganic materials 0.000 description 5
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 5
- 239000011159 matrix material Substances 0.000 description 5
- 239000006199 nebulizer Substances 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 230000036961 partial effect Effects 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 150000003568 thioethers Chemical class 0.000 description 5
- 239000004215 Carbon black (E152) Substances 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000003638 chemical reducing agent Substances 0.000 description 4
- 230000033001 locomotion Effects 0.000 description 4
- 230000035515 penetration Effects 0.000 description 4
- -1 polytetrafluoroethylene Polymers 0.000 description 4
- 238000005096 rolling process Methods 0.000 description 4
- 238000005200 wet scrubbing Methods 0.000 description 4
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 3
- 229920006362 Teflon® Polymers 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000000839 emulsion Substances 0.000 description 3
- 238000000769 gas chromatography-flame ionisation detection Methods 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 210000003127 knee Anatomy 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 239000002689 soil Substances 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 238000009736 wetting Methods 0.000 description 3
- 229910052724 xenon Inorganic materials 0.000 description 3
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 206010011469 Crying Diseases 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 206010036790 Productive cough Diseases 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005203 dry scrubbing Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003344 environmental pollutant Substances 0.000 description 2
- 210000003414 extremity Anatomy 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000004900 laundering Methods 0.000 description 2
- 238000013507 mapping Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 231100000719 pollutant Toxicity 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 238000004382 potting Methods 0.000 description 2
- 239000008213 purified water Substances 0.000 description 2
- 230000003134 recirculating effect Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 210000003802 sputum Anatomy 0.000 description 2
- 208000024794 sputum Diseases 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 241000251468 Actinopterygii Species 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 101100165177 Caenorhabditis elegans bath-15 gene Proteins 0.000 description 1
- 244000025254 Cannabis sativa Species 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 241000790917 Dioxys <bee> Species 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 241000997494 Oneirodidae Species 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 244000170916 Paeonia officinalis Species 0.000 description 1
- 235000006484 Paeonia officinalis Nutrition 0.000 description 1
- 241000282320 Panthera leo Species 0.000 description 1
- 244000046052 Phaseolus vulgaris Species 0.000 description 1
- 235000010627 Phaseolus vulgaris Nutrition 0.000 description 1
- 244000018633 Prunus armeniaca Species 0.000 description 1
- 235000009827 Prunus armeniaca Nutrition 0.000 description 1
- 239000004990 Smectic liquid crystal Substances 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 244000269722 Thea sinensis Species 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000005377 adsorption chromatography Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 210000000349 chromosome Anatomy 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 235000003642 hunger Nutrition 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Natural products C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- BQJCRHHNABKAKU-KBQPJGBKSA-N morphine Chemical compound O([C@H]1[C@H](C=C[C@H]23)O)C4=C5[C@@]12CCN(C)[C@@H]3CC5=CC=C4O BQJCRHHNABKAKU-KBQPJGBKSA-N 0.000 description 1
- DIOQZVSQGTUSAI-UHFFFAOYSA-N n-butylhexane Natural products CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000002941 palladium compounds Chemical class 0.000 description 1
- 238000009304 pastoral farming Methods 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 235000020004 porter Nutrition 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 235000021251 pulses Nutrition 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 235000015067 sauces Nutrition 0.000 description 1
- 238000009991 scouring Methods 0.000 description 1
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000010897 surface acoustic wave method Methods 0.000 description 1
- 230000035922 thirst Effects 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 230000002463 transducing effect Effects 0.000 description 1
- 230000026683 transduction Effects 0.000 description 1
- 238000010361 transduction Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
- 230000002792 vascular Effects 0.000 description 1
- 230000001755 vocal effect Effects 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Optics & Photonics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/396,823 US20060285091A1 (en) | 2003-07-21 | 2006-04-03 | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW201202869A true TW201202869A (en) | 2012-01-16 |
Family
ID=38326249
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100123486A TW201202869A (en) | 2006-04-03 | 2007-03-29 | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system |
| TW096111016A TW200745727A (en) | 2006-04-03 | 2007-03-29 | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096111016A TW200745727A (en) | 2006-04-03 | 2007-03-29 | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US20060285091A1 (enExample) |
| EP (1) | EP2002309A1 (enExample) |
| JP (1) | JP2009532901A (enExample) |
| KR (1) | KR20080109813A (enExample) |
| CN (2) | CN101410760B (enExample) |
| SG (1) | SG173318A1 (enExample) |
| TW (2) | TW201202869A (enExample) |
| WO (1) | WO2007120451A1 (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI655509B (zh) * | 2017-09-19 | 2019-04-01 | 台灣積體電路製造股份有限公司 | 半導體裝置的製造方法、微影材料及製造系統 |
| TWI703410B (zh) * | 2018-02-15 | 2020-09-01 | 美商希瑪有限責任公司 | 氣體管理系統 |
| TWI706219B (zh) * | 2015-08-27 | 2020-10-01 | 德商休斯微科光罩儀器股份有限公司 | 用於將暴露於ｕｖ照射的液體介質施予在基板上的裝置 |
| TWI827391B (zh) * | 2021-12-23 | 2023-12-21 | 德商卡爾蔡司Ｓｍｔ有限公司 | 用於乾燥設置在投影曝光設備的部件中的腔室的方法及乾燥裝置 |
| US11949202B2 (en) | 2018-02-15 | 2024-04-02 | Cymer, Llc | Gas management system |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7189291B2 (en) * | 2003-06-02 | 2007-03-13 | Entegris, Inc. | Method for the removal of airborne molecular contaminants using oxygen gas mixtures |
| US20060285091A1 (en) * | 2003-07-21 | 2006-12-21 | Parekh Bipin S | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application |
| US7384149B2 (en) * | 2003-07-21 | 2008-06-10 | Asml Netherlands B.V. | Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system |
| WO2007019105A1 (en) * | 2005-08-03 | 2007-02-15 | Entegris, Inc. | A transfer container |
| US7420194B2 (en) * | 2005-12-27 | 2008-09-02 | Asml Netherlands B.V. | Lithographic apparatus and substrate edge seal |
| US20080073596A1 (en) * | 2006-08-24 | 2008-03-27 | Asml Netherlands B.V. | Lithographic apparatus and method |
| US7866637B2 (en) * | 2007-01-26 | 2011-01-11 | Asml Netherlands B.V. | Humidifying apparatus, lithographic apparatus and humidifying method |
| JP2008263173A (ja) * | 2007-03-16 | 2008-10-30 | Canon Inc | 露光装置 |
| US8514365B2 (en) * | 2007-06-01 | 2013-08-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7856737B2 (en) * | 2007-08-28 | 2010-12-28 | Mathews Company | Apparatus and method for reducing a moisture content of an agricultural product |
| NL1036510A1 (nl) * | 2008-02-21 | 2009-08-24 | Asml Netherlands Bv | Lithographic apparatus with temperature sensor and device manufacturing method. |
| JP2009212313A (ja) * | 2008-03-04 | 2009-09-17 | Canon Inc | 露光装置およびデバイス製造方法 |
| US20110151590A1 (en) * | 2009-08-05 | 2011-06-23 | Applied Materials, Inc. | Apparatus and method for low-k dielectric repair |
| JP5574799B2 (ja) * | 2010-04-23 | 2014-08-20 | キヤノン株式会社 | 露光装置、それを用いたデバイスの製造方法、並びに気体供給装置 |
| EP2515170B1 (en) * | 2011-04-20 | 2020-02-19 | ASML Netherlands BV | Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method |
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| TWI706219B (zh) * | 2015-08-27 | 2020-10-01 | 德商休斯微科光罩儀器股份有限公司 | 用於將暴露於ｕｖ照射的液體介質施予在基板上的裝置 |
| TWI655509B (zh) * | 2017-09-19 | 2019-04-01 | 台灣積體電路製造股份有限公司 | 半導體裝置的製造方法、微影材料及製造系統 |
| US10274847B2 (en) | 2017-09-19 | 2019-04-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Humidity control in EUV lithography |
| US11307504B2 (en) | 2017-09-19 | 2022-04-19 | Taiwan Semiconductor Manufacturing Co., Ltd. | Humidity control in EUV lithography |
| TWI703410B (zh) * | 2018-02-15 | 2020-09-01 | 美商希瑪有限責任公司 | 氣體管理系統 |
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| TWI827391B (zh) * | 2021-12-23 | 2023-12-21 | 德商卡爾蔡司Ｓｍｔ有限公司 | 用於乾燥設置在投影曝光設備的部件中的腔室的方法及乾燥裝置 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101410760A (zh) | 2009-04-15 |
| US20060285091A1 (en) | 2006-12-21 |
| EP2002309A1 (en) | 2008-12-17 |
| TW200745727A (en) | 2007-12-16 |
| KR20080109813A (ko) | 2008-12-17 |
| SG173318A1 (en) | 2011-08-29 |
| US20090231559A1 (en) | 2009-09-17 |
| WO2007120451A1 (en) | 2007-10-25 |
| CN101410760B (zh) | 2011-09-21 |
| JP2009532901A (ja) | 2009-09-10 |
| CN102298270A (zh) | 2011-12-28 |
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