JP2009532687A5 - - Google Patents

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Publication number
JP2009532687A5
JP2009532687A5 JP2009503487A JP2009503487A JP2009532687A5 JP 2009532687 A5 JP2009532687 A5 JP 2009532687A5 JP 2009503487 A JP2009503487 A JP 2009503487A JP 2009503487 A JP2009503487 A JP 2009503487A JP 2009532687 A5 JP2009532687 A5 JP 2009532687A5
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JP
Japan
Prior art keywords
optoelectronic module
source
irradiation
voltage
optoelectronic
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JP2009503487A
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English (en)
Japanese (ja)
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JP5519271B2 (ja
JP2009532687A (ja
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Priority claimed from DE102006015714.1A external-priority patent/DE102006015714B4/de
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Publication of JP2009532687A publication Critical patent/JP2009532687A/ja
Publication of JP2009532687A5 publication Critical patent/JP2009532687A5/ja
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Publication of JP5519271B2 publication Critical patent/JP5519271B2/ja
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JP2009503487A 2006-04-04 2007-04-04 オプトエレクトロニックモジュールの光補助試験 Active JP5519271B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102006015714.1A DE102006015714B4 (de) 2006-04-04 2006-04-04 Lichtunterstütztes Testen eines optoelektronischen Moduls
DE102006015714.1 2006-04-04
PCT/EP2007/003063 WO2007115774A1 (de) 2006-04-04 2007-04-04 Lichtunterstütztes testen eines optoelektronischen moduls

Publications (3)

Publication Number Publication Date
JP2009532687A JP2009532687A (ja) 2009-09-10
JP2009532687A5 true JP2009532687A5 (enExample) 2010-03-11
JP5519271B2 JP5519271B2 (ja) 2014-06-11

Family

ID=38283920

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009503487A Active JP5519271B2 (ja) 2006-04-04 2007-04-04 オプトエレクトロニックモジュールの光補助試験

Country Status (7)

Country Link
US (1) US8222911B2 (enExample)
JP (1) JP5519271B2 (enExample)
KR (1) KR101342460B1 (enExample)
CN (1) CN101460857B (enExample)
DE (1) DE102006015714B4 (enExample)
TW (1) TWI383133B (enExample)
WO (1) WO2007115774A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5520289B2 (ja) * 2008-05-21 2014-06-11 フォトン・ダイナミクス・インコーポレイテッド 前方照明（ｆｒｏｎｔｌｉｇｈｔｉｎｇ）を用いてディスプレイパネル上の欠陥の検出を向上させること
KR101052361B1 (ko) * 2008-07-31 2011-07-27 한국표준과학연구원 중에너지 이온빔 산란을 이용한 분광분석기
WO2010140236A1 (ja) * 2009-06-03 2010-12-09 三菱電機株式会社 粒子線照射装置
US10373998B1 (en) * 2013-03-14 2019-08-06 Wavefront Research, Inc. Compact annular field imager optical interconnect
CN103353790B (zh) * 2013-06-26 2016-09-14 林大伟 光线寻迹方法与装置
CN103324304B (zh) * 2013-06-26 2016-05-11 林大伟 光传感器阵列装置
US9804000B2 (en) * 2013-09-25 2017-10-31 Yun-Shan Chang Optical sensor array apparatus
US9804688B2 (en) * 2013-09-25 2017-10-31 Yun-Shan Chang Light tracing method and apparatus thereof
US9804695B2 (en) * 2014-01-08 2017-10-31 Yun-Shan Chang Cursor control apparatus and method for the same

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8700933A (nl) * 1987-04-21 1988-11-16 Philips Nv Testmethode voor lcd-elementen.
JPH073446B2 (ja) * 1988-05-18 1995-01-18 松下電器産業株式会社 スイッチング素子を有したアクティブ基板の欠陥検査装置および欠陥検査方法
US4875004A (en) * 1988-06-01 1989-10-17 The United States Of America As Represented By The Secretary Of The Army High speed semiconductor characterization technique
US5057773A (en) 1989-03-21 1991-10-15 International Business Machines Corporation Method for opens/shorts testing of capacitively coupled networks in substrates using electron beams
US4902967A (en) * 1989-05-18 1990-02-20 The United States Of America As Represented By The Secretary Of The Navy Scanning electron microscopy by photovoltage contrast imaging
DE4003983C1 (en) * 1990-02-09 1991-08-29 Abos Automation, Bildverarbeitung, Optische Systeme Gmbh, 8057 Eching, De Automated monitoring of space=shape data for mfg. semiconductors - compares image signals for defined illumination angle range with master signals, to determine defects
US5150043A (en) * 1991-02-11 1992-09-22 The United States Of America As Represented By The Secretary Of The Navy Apparatus and method for non-contact surface voltage probing by scanning photoelectron emission
US5268638A (en) 1991-07-15 1993-12-07 Siemens Aktiengesellschaft Method for particle beam testing of substrates for liquid crystal displays "LCD"
US5943125A (en) * 1997-02-26 1999-08-24 Acuity Imaging, Llc Ring illumination apparatus for illuminating reflective elements on a generally planar surface
US5828449A (en) * 1997-02-26 1998-10-27 Acuity Imaging, Llc Ring illumination reflective elements on a generally planar surface
US5982190A (en) * 1998-02-04 1999-11-09 Toro-Lira; Guillermo L. Method to determine pixel condition on flat panel displays using an electron beam
JP3107039B2 (ja) * 1998-03-20 2000-11-06 日本電気株式会社 面光源プローバ装置及び検査方法
DE19901767A1 (de) * 1999-01-18 2000-07-20 Etec Ebt Gmbh Verfahren und Vorrichtung zum Testen der Funktion einer Vielzahl von Mikrostrukturelementen
EP1271605A4 (en) * 2000-11-02 2009-09-02 Ebara Corp ELECTRON BEAM APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE COMPRISING SAID APPARATUS
JP2003331774A (ja) * 2002-05-16 2003-11-21 Toshiba Corp 電子ビーム装置およびその装置を用いたデバイス製造方法
JP4062527B2 (ja) 2003-05-09 2008-03-19 株式会社島津製作所 Ｔｆｔアレイ検査装置
KR20060024398A (ko) 2003-06-06 2006-03-16 도시바 마쯔시따 디스플레이 테크놀로지 컴퍼니, 리미티드 기판의 검사 방법
CN101107534B (zh) * 2005-05-02 2012-04-25 株式会社岛津制作所 Tft阵列基板检查装置

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